| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/22/2010 | US20100097588 Exposure method, device manufacturing method, and mask |
| 04/22/2010 | US20100097487 Optical imaging system with an extended depth-of-field and method for designing an optical imaging system |
| 04/22/2010 | DE102009027150A1 Phasenverschiebungsmaskenrohling, Phasenverschiebungsmaske und Verfahren zur Herstellung eines Phasenverschiebungsmaskenrohlings Phase shift mask blank and phase shift mask method of manufacturing a phase shift mask blank |
| 04/22/2010 | DE102007009265B4 Verfahren und Vorrichtung zur photolithographischen Strukturierung in der Halbleitertechnologie Method and apparatus for photolithographic structuring in the semiconductor technology |
| 04/21/2010 | EP2177949A1 Method of correcting proximity effects in a tri-tone attenuated phase shifting mask |
| 04/21/2010 | EP2177948A1 Method of Fabricating an Integrated Circuit using a Tri-Tone Attenuated Phase Shifting Mask Corrected for Proximity Effects |
| 04/21/2010 | EP2177487A1 Method of removing foreign matter from surface of glass substrate |
| 04/21/2010 | EP2176708A1 Apparatus and method for modifying optical material properties |
| 04/21/2010 | EP2176073A1 Method of pre-exposing relief image printing plate |
| 04/21/2010 | CN201439178U Phase mask supporting platform device of phase mask edge chamfering and smoothing machine |
| 04/21/2010 | CN1716090B Method and system for projecting an alternating phase shift mask of image of integrated circuit |
| 04/21/2010 | CN101697063A Manufacturing process of semiconductor for use in manufacture of adjacent contact and semiconductor device |
| 04/20/2010 | US7703068 Technique for determining a mask pattern corresponding to a photo-mask |
| 04/20/2010 | US7703066 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 04/20/2010 | US7703049 System, masks, and methods for photomasks optimized with approximate and accurate merit functions |
| 04/20/2010 | US7701742 Semiconductor device |
| 04/20/2010 | US7701635 Microlens, and method of fabricating thereof |
| 04/20/2010 | US7700245 Reflective mask blank, reflective mask, and method of manufacturing semiconductor device |
| 04/20/2010 | US7700244 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method |
| 04/15/2010 | WO2010041609A1 Process for production of synthetic quartz glass |
| 04/15/2010 | WO2010041508A1 Photomask |
| 04/15/2010 | US20100092878 Phase shift mask with two-phase clear feature |
| 04/15/2010 | US20100092877 formed with resist pattern by electron beam writing and having laminated film including a first film and a second film; first film is not charged up during patterning, second film is charged up during the patterning by the electron beam writing; prevent mask film from being formed at the side surface |
| 04/15/2010 | US20100092876 Method for repairing photo mask, system for repairing photo mask and program for repairing photo mask |
| 04/15/2010 | US20100092875 Exposure Mask for Forming Photodiode and Method of Manufacturing Image Sensor Using the Same |
| 04/15/2010 | US20100092874 Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank |
| 04/15/2010 | US20100092873 Methods Of Utilizing Block Copolymer To Form Patterns |
| 04/15/2010 | DE102009043442A1 Maskenrohlingssubstrat und Maskenrohlingssatz Mask blank substrate and mask blank record |
| 04/14/2010 | EP1354325B1 Collector with an unused area for lighting systems having a wavelength inferior or equal of 193 nm |
| 04/14/2010 | EP0945761B1 Method of manufacturing a pellicle and pellicle manufacturing trimming jig |
| 04/14/2010 | CN201437211U Chamfering and edging transmission for mask chamfering and edging machine |
| 04/14/2010 | CN1711502B Membrane used for light mask protection, manufacturing method and using method therefor and method for manufacturing the light mask and semiconductor component having the membrane |
| 04/14/2010 | CN101131539B LCD panel, LCD light reflection structure and their manufacturing method |
| 04/13/2010 | USRE41220 Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| 04/13/2010 | US7698665 Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern |
| 04/13/2010 | US7697382 Near-field light generating method and near-field optical head using a light blocking metal film having a fine opening whose size is not more than a wavelength of irradiated light, and near-field optical microscope having the optical head |
| 04/13/2010 | US7696081 Method of manufacturing semiconductor device that uses both a normal photomask and a phase shift mask for defining interconnect patterns |
| 04/13/2010 | US7695877 Methods and devices for lithography using electromagnetic radiation with short wavelengths |
| 04/13/2010 | US7695872 defocusing into a beam used during production of the mask to image the pattern on the mask; may eliminate the need for a second exposure with a trim mask; alignment problems associated with the second exposure may be avoided; single exposure may be more compatible with high speed manufacturing |
| 04/13/2010 | US7695871 Notched trim mask for phase shifting mask |
| 04/08/2010 | WO2010038445A1 Photomask blank, photomask, process for producing same, and process for producing semiconductor device |
| 04/08/2010 | WO2010038444A1 Photomask blank, photomask, and process for producing same |
| 04/08/2010 | US20100086864 Method of polishing glass substrate |
| 04/08/2010 | US20100086863 Lithographic processing method, and device manufactured thereby |
| 04/08/2010 | US20100086862 Mask pattern correction and layout method |
| 04/08/2010 | US20100086751 Imaging element for use as a recording element and process of using the imaging element |
| 04/08/2010 | US20100085518 Photo-sensitive resin composition for black matrix, black matrix produced by the composition and liquid crystal display including the black matrix |
| 04/08/2010 | US20100084375 Method of producing a reflective mask |
| 04/08/2010 | DE102008049880A1 Method for enhancing image characteristics of mask for photo lithography in context of mask manufacturing, involves manufacturing mask and providing list with critical places on basis of mask layout |
| 04/07/2010 | EP2172965A1 Optical characteristic measurement method, optical characteristic adjusting method, exposure device, exposure method, and exposure device manufacturing method |
| 04/07/2010 | EP2172766A1 Lithographic apparatus and humidity measurement system |
| 04/07/2010 | EP2172455A1 Oxime ester photoinitiators |
| 04/07/2010 | EP2171539A2 Method and apparatus for duv transmission mapping |
| 04/07/2010 | EP2170778A1 Method for removing foreign matter from glass substrate surface and method for processing glass substrate surface |
| 04/07/2010 | CN1702547B Method for making high accuracy grey scale masks |
| 04/07/2010 | CN101692439A Manufacturing method for a plurality of groups of substrates of thin-film transistor |
| 04/07/2010 | CN101692423A 等离子体蚀刻方法 The plasma etching method |
| 04/07/2010 | CN101692417A Control method of platform |
| 04/07/2010 | CN101692154A Deflector |
| 04/07/2010 | CN101692150A Method of manufacturing relief printing plate and printing plate precursor for laser engraving |
| 04/06/2010 | US7692799 Measurement apparatus, exposure apparatus, and device fabrication method |
| 04/06/2010 | US7692128 Focus control method for an optical apparatus which inspects a photo-mask or the like |
| 04/06/2010 | US7691554 Forming full color diffraction grating image using black ink without gradation expression or high print resolution |
| 04/06/2010 | US7691547 Reticle containing structures for sensing electric field exposure and a method for its use |
| 04/06/2010 | US7691546 Photomask blank and photomask |
| 04/06/2010 | US7691545 Crystallization mask, crystallization method, and method of manufacturing thin film transistor including crystallized semiconductor |
| 04/06/2010 | US7691544 Measurement of a scattered light point spread function (PSF) for microelectronic photolithography |
| 04/06/2010 | US7691543 photomasks; photoresists; semiconductors |
| 04/06/2010 | US7691542 Projects images of grating pattern and test pattern; photoresists |
| 04/06/2010 | US7691541 Additive and subtractive correction using direct write nanolithography; fine control over lateral dimensions and height |
| 04/06/2010 | US7691540 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method |
| 04/06/2010 | US7691279 Method of producing a glass substrate for a mask blank and method of producing a mask blank |
| 04/01/2010 | WO2010034433A1 Microscope for reticle inspection with variable illumination settings |
| 04/01/2010 | WO2010013052A3 Exposure apparatus and methods |
| 04/01/2010 | US20100082144 Method of calculating pattern-failure-occurrence-region, computer program product, pattern-layout evaluating method, and semiconductor-device manufacturing method |
| 04/01/2010 | US20100081294 Pattern data creating method, pattern data creating program, and semiconductor device manufacturing method |
| 04/01/2010 | US20100081282 Process for adjusting the size and shape of nanostructures |
| 04/01/2010 | US20100081071 Colored curable composition, fluorine-containing dipyrromethene compound and tautomer thereof, and fluorine-containing dipyrromethene metal complex and tautomer thereof, and color filter using the same and method for producing the color filter |
| 04/01/2010 | US20100081070 Colored curable composition, color filter and production method thereof, and solid-state imaging device |
| 04/01/2010 | US20100081069 preparing a plate-like substrate with a rectangular main surface, forming a marker for identifying the substrate on each of at least a plurality of end faces among four end faces of the substrate, the four end faces continuous with sides of the main surface; avoiding defective portion; semiconductors |
| 04/01/2010 | US20100081068 photomasks with test patterns adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during a lithographic process |
| 04/01/2010 | US20100081067 Mask blank substrate set and mask blank set |
| 04/01/2010 | US20100081066 Mask blank and method of manufacturing a transfer mask |
| 04/01/2010 | US20100081065 Photomask and method of fabricating a photomask |
| 04/01/2010 | US20100080647 Manufacturing method of semiconductor device and manufacturing method of mask |
| 04/01/2010 | US20100078433 Container for housing a mask blank, method of housing a mask blank, and a mask blank package |
| 04/01/2010 | DE102008049365A1 Maskeninspektionsmikroskop mit variabler Beleuchtungseinstellung Mask inspection microscope with variable illumination setting |
| 04/01/2010 | DE102005009554B4 Verfahren zur Fokuskorrektur eines Belichtungsgeräts bei der lithographischen Projektion und Verfahren zur Auswertung von Messergebnissen eines Messgeräts für die Fokuskorrektur eines Belichtungsgeräts in einer Halbleiterfertigungsanlage Method of focus correction of an exposure apparatus for the lithographic projection and methods for evaluation of measurement results of a measuring instrument for the focus correction of an exposure apparatus in a semiconductor fabrication facility |
| 03/31/2010 | EP2167440A2 Synthetic quartz glass body, process for producing the same, optical element, and optical apparatus |
| 03/31/2010 | CN101689018A Frame of large pellicle and grasping method of frame |
| 03/31/2010 | CN101687696A Method for removing foreign matter from glass substrate surface and method for processing glass substrate surface |
| 03/31/2010 | CN101685254A Photomask manufacturing method and photomask |
| 03/31/2010 | CN101685253A Method for manufacturing photomask |
| 03/31/2010 | CN101683579A Filtering device configured in photomask picking and placing device of microlithography system |
| 03/30/2010 | US7689968 Proximity effect correction with regard to a semiconductor circuit design pattern |
| 03/30/2010 | US7689967 Reference image generation from subject image for photolithography mask analysis |
| 03/30/2010 | US7689966 Methods, systems, and carrier media for evaluating reticle layout data |
| 03/30/2010 | US7688436 Measuring and/or inspecting method, measuring and/or inspecting apparatus, exposure method, device manufacturing method, and device manufacturing apparatus |
| 03/30/2010 | US7687225 Optical coatings |
| 03/30/2010 | US7687207 System for coloring a partially colored design in an alternating phase shift mask |