| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 05/19/2010 | CN201477362U Photoetching plate used for manufacturing LED chips |
| 05/19/2010 | CN101191996B Process for preparing light mask and optical proximity correction repairing method |
| 05/18/2010 | US7718994 Array substrates for use in liquid crystal displays and fabrication methods thereof |
| 05/18/2010 | US7718351 cell growth templates; multi-photon lithography; photopolymerization |
| 05/18/2010 | US7718348 integrated circuits; photoresists |
| 05/18/2010 | US7718324 absorber layer contains tantalum (Ta) and hafnium (Hf), has a content of nitrogen being 0 to at most 35 at. %.; has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness |
| 05/18/2010 | US7718323 photomasks; photolithography; semiconductors; prevent line-end shortening |
| 05/18/2010 | US7718008 Method for cleaning photo mask |
| 05/14/2010 | WO2010054350A1 Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration |
| 05/13/2010 | US20100122224 Method and apparatus for designing an integrated circuit |
| 05/13/2010 | US20100121627 Method and system for measuring patterned structures |
| 05/13/2010 | US20100119959 Pigment-dispersed composition, curable composition, and color filter and production method thereof |
| 05/13/2010 | US20100119958 Mask blank, mask formed from the blank, and method of forming a mask |
| 05/13/2010 | US20100119698 Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof |
| 05/13/2010 | US20100118398 Method for producing polarisation filters and use of polarisation-sensitive photo-sensors and polarisation-generating reproduction devices |
| 05/12/2010 | EP1125167B1 Methods of reducing proximity effects in lithographic processes |
| 05/12/2010 | CN201464800U Clamp and corresponding mask plate component |
| 05/12/2010 | CN1886697B Method and device for creating print data |
| 05/12/2010 | CN1720483B Local flare correction |
| 05/12/2010 | CN1630032B Design pattern correction method, mask producing method and semiconductor device producing method |
| 05/12/2010 | CN101080671B Phase shift mask, phase shift mask manufacturing method, and semiconductor element manufacturing method |
| 05/11/2010 | US7716628 System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effects |
| 05/11/2010 | US7715641 Graphics engine for high precision lithography |
| 05/11/2010 | US7713684 illuminating with first wavelength in form of standing illumination waveform a region of a reversible contrast-enhancement material located on photoresist material, illuminating with second wavelength regions of minimum intensity provided by first illumination waveform to produce image in photoresist |
| 05/11/2010 | US7713666 absorber layer contains tantalum (Ta) and hafnium (Hf), containign nitrogen or oxygen or both ( nitrides, oxides, oxynitride) has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness |
| 05/11/2010 | US7713665 Lithographic apparatus and patterning device |
| 05/11/2010 | US7713664 Method for fabricating an attenuated phase shift photomask by separate patterning of negative and positive resist layers with corresponding etching steps for underlying light-shielding and phase shift layers on a transparent substrate |
| 05/11/2010 | US7713663 provides mask blank capable of suppressing deformation of transfer mask when transfer mask is mounted on substrate holding member of an exposure device, suppressing lowering of the positional accuracy of transfer pattern to minimum, and suppressing the lowering of focus accuracy to minimum |
| 05/06/2010 | WO2010050520A1 Reflection-type mask blank for euv lithography |
| 05/06/2010 | WO2010050518A1 Reflection-type mask blank for euv lithography |
| 05/06/2010 | WO2010050447A1 Photomask blank, photomask and method for manufacturing the photomask |
| 05/06/2010 | US20100115481 Shape-Based Geometry Engine To Perform Smoothing And Other Layout Beautification Operations |
| 05/06/2010 | US20100112812 Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device |
| 05/06/2010 | US20100112485 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 05/06/2010 | US20100112466 Optical masks and methods for measuring aberration of a beam |
| 05/06/2010 | US20100112465 Optical arrangement for three-dimensionally patterning a material layer |
| 05/06/2010 | US20100112464 Defect correction method for euv mask |
| 05/06/2010 | US20100112463 Method for forming fine contact hole pattern of semiconductor device |
| 05/06/2010 | US20100112462 Reticles with subdivided blocking regions |
| 05/06/2010 | US20100112461 Photolithographic reticles with electrostatic discharge protection structures |
| 05/06/2010 | US20100112116 Double-Sided Nano-Imprint Lithography System |
| 05/06/2010 | US20100111401 Mask inspection system and mask inspection method |
| 05/06/2010 | US20100110242 Anthraquinone dye containing material, composition including the same, camera including the same, and associated methods |
| 05/06/2010 | US20100107724 Method and Apparatus for Calibrating a Metrology Tool |
| 05/05/2010 | EP1481288B1 Reduced striae extreme ultraviolet lithographic elements and a method of manufacturing the same |
| 05/05/2010 | EP1344107B1 Method of correcting proximity effects in a tri-tone attenuated phase-shifting mask |
| 05/05/2010 | CN1973244B Levenson type phase shift mask and production method therefor |
| 05/05/2010 | CN1892420B Mask for continuously transverse solidifying technology and method for forming polycrystal silicon layer |
| 05/05/2010 | CN1782869B Thermal detector of contracted photolithographic mask |
| 05/05/2010 | CN1782867B Reticle and method of fabricating semiconductor device |
| 05/05/2010 | CN1737680B Advanced oriented assist features for integrated circuit hole patterns |
| 05/05/2010 | CN1721987B Method and apparatus for inspecting a mura defect, and method of manufacturing a photomask |
| 05/05/2010 | CN1653388B Patterning semiconductor layers using phase shifting and assist features |
| 05/05/2010 | CN1639638B Mask repair with electron beam-induced chemical etching |
| 05/05/2010 | CN1577099B Method and apparatus of simultaneous optimization for NA-sigma exposure settings and scattering bars OPC using a device layout |
| 05/04/2010 | US7712070 Method for transferring self-assembled dummy pattern to substrate |
| 05/04/2010 | US7712069 Method for interlayer and yield based optical proximity correction |
| 05/04/2010 | US7712056 Characterization and verification for integrated circuit designs |
| 05/04/2010 | US7710634 Pattern generator |
| 05/04/2010 | US7709304 Thin film transistor array panel, manufacturing method thereof, and mask therefor |
| 05/04/2010 | US7709180 A pellicle for use in semiconductor lithography, comprising a radiation transparent, cross-linked polytetrefluoroethylene film; cost efficient |
| 05/04/2010 | US7709166 Measuring the effect of flare on line width |
| 05/04/2010 | US7709161 Photomask producing method and photomask blank |
| 05/04/2010 | US7709160 Method for manufacturing attenuated phase-shift masks and devices obtained therefrom |
| 05/04/2010 | US7709159 Mask, mask forming method, pattern forming method, and wiring pattern forming method |
| 04/29/2010 | WO2010047362A1 Exposure apparatus and photomask |
| 04/29/2010 | US20100104986 Method for forming pattern |
| 04/29/2010 | US20100104983 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 04/29/2010 | US20100104958 Photosensitive Resin Composition for Color Filter and Color Filter Prepared Using the Same |
| 04/29/2010 | US20100104957 Method of Curing Color Filter for Electronic Display Using Electron-Beam and Method of Fabricating Color Filter for Electronic Display Using the Same |
| 04/29/2010 | US20100104956 Manufacturing methods of asymmetric bumps and pixel structure |
| 04/29/2010 | US20100104955 Mask blank substrate manufacturing method, reflective mask blank manufacturing method, and mask blank substrate |
| 04/29/2010 | US20100104954 Matching method of pattern layouts from inverse lithography |
| 04/29/2010 | US20100104953 Process and hardware for plasma treatments |
| 04/29/2010 | US20100103401 Method and device for forming poly-silicon film |
| 04/29/2010 | US20100101940 Method for removing foreign matter from glass substrate surface and method for processing glass substrate surface |
| 04/29/2010 | DE102009045008A1 EUV-Lithographievorrichtung und Verfahren zum Bearbeiten einer Maske EUV lithography apparatus and method for processing a mask |
| 04/29/2010 | DE102009043145A1 Maskenrohling und Verfahren zum Herstellen einer Übertragungsmaske Mask blank and method for producing a transmission mask |
| 04/28/2010 | EP2178655A1 Apparatus and method for indirect surface cleaning |
| 04/28/2010 | CN1761913B Method of manufacturing mask blank |
| 04/28/2010 | CN1646994B Attenuated embedded phase shift photomask blanks |
| 04/28/2010 | CN1633515B Aperture masks for circuit fabrication |
| 04/28/2010 | CN1552000B Removable optical pellicle |
| 04/28/2010 | CN1530746B Design change-over method and apparatus based on model by doublet illumination |
| 04/28/2010 | CN1479175B Method for etching surface material with induced chemical reaction by focused electron beam on surface |
| 04/28/2010 | CN101699332A Glass substrate, detection method using glass substrate, and matrix mask |
| 04/27/2010 | US7707542 Creating a situation repository |
| 04/27/2010 | US7704684 Methods and devices for fabricating three-dimensional nanoscale structures |
| 04/27/2010 | US7704681 Manufacturing method for pixel structure |
| 04/27/2010 | US7704673 Forming a first hard mask layer over a substrate;forming an acid layer over the first hard mask layer;depositing a photoresist layer over the acid layer; patterning the photoresist layer to form a pattern; transferring the pattern to the first hard mask layer below the acid layer |
| 04/27/2010 | US7704647 forming the transmitting layer from a transparent substrate having three regions; forming a phase shift (halftone) mask with reduce cost; avoid uneven thickness induced by etching process by using a lift-off process in the manufacturing process of transmitting layers |
| 04/27/2010 | US7704646 Half tone mask and method for fabricating the same |
| 04/27/2010 | US7704645 Method of generating writing pattern data of mask and method of writing mask |
| 04/27/2010 | US7704568 Sensitized photochemical switching for cholesteric liquid crystal displays |
| 04/27/2010 | CA2370911C Method of producing phase mask for processing optical fiber and optical fiber with bragg diffraction grating fabricated by using the optical fiber-processing phase mask |
| 04/22/2010 | WO2010045654A1 Curved radiation detector fabrication methods and systems |
| 04/22/2010 | WO2010043398A1 Euv lithography device and method for processing an optical element |
| 04/22/2010 | WO2010025031A3 Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography |
| 04/22/2010 | US20100099033 Method and system for measuring in patterned structures |
| 04/22/2010 | US20100099032 System for generating and optimizing mask assist features based on hybrid (model and rules) methodology |