| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/09/2010 | CN101728277A Method for manufacturing semiconductor device |
| 06/09/2010 | CN101728276A Method for manufacturing semiconductor device |
| 06/09/2010 | CN101727517A Method and apparatus for determining a photolithography process model which models the influence of topography variations |
| 06/09/2010 | CN101727516A Assist feature placement based on a focus-sensitive cost-covariance field |
| 06/09/2010 | CN101727014A Photoetching method for controlling characteristic dimension and photoetching system thereof |
| 06/09/2010 | CN101727007A Reflective surface plasma imaging and photo-etching method for processing nano graph with high depth-to-width ratio |
| 06/09/2010 | CN101726994A Porous mask plate capable of being recognized by APS solar sensor |
| 06/09/2010 | CN101726993A Bi-layer, tri-layer mask CD control |
| 06/09/2010 | CN101726992A Exposure mask for forming a photodiode and method of manufacturing the image sensor using the exposure mask |
| 06/09/2010 | CN101726991A Test method of optical proximity correction and manufacturing method of photomask |
| 06/09/2010 | CN101726990A Silicon mask used for super-diffraction photoetching with line width of below 200 nanometers and manufacturing method thereof |
| 06/09/2010 | CN101726989A Method for manufacturing base plate with recognized mark |
| 06/09/2010 | CN101726988A Design and layout of phase shifting photolithographic masks |
| 06/09/2010 | CN101726987A Mask cleaning device |
| 06/09/2010 | CN101190723B Vessel for containing protection thin film components |
| 06/09/2010 | CN101053077B Method of forming narrowly spaced flash memory contact openings |
| 06/09/2010 | CN101042526B Mask data correction method, photomask and optical image prediction method |
| 06/08/2010 | US7735056 Automated circuit design dimension change responsive to low contrast condition determination in photomask phase pattern |
| 06/08/2010 | US7735055 Method of creating photo mask data, method of photo mask manufacturing, and method of manufacturing semiconductor device |
| 06/08/2010 | US7735054 Photomask manufacturing method and semiconductor device manufacturing method |
| 06/08/2010 | US7735053 Correction method and correction system for design data or mask data, validation method and validation system for design data or mask data, yield estimation method for semiconductor integrated circuit, method for improving design rule, mask production method, and semiconductor integrated circuit production method |
| 06/08/2010 | US7733463 Lithographic apparatus and device manufacturing method |
| 06/08/2010 | US7732120 Method for making soft pellicles |
| 06/08/2010 | US7732107 makes it possible to estimate and correct flare with high accuracy over entire portion not only of single shot region but also of single chip region to thereby realize lithographic process causative of only a small dimensional variation in line width, and to realize highly-reliable semiconductor devices |
| 06/08/2010 | US7732106 Methods for etching devices used in lithography |
| 06/08/2010 | US7732105 photomask substrate including chip region and scribe lane region, with overlay mark formed in scribe lane region; overlay mark includes sub-overlay marks; each includes plurality of unit regions sequentially connected to each other and having different widths, where width of given unit region is constant |
| 06/08/2010 | US7732104 Changing polarization direction during photomask treatment |
| 06/08/2010 | US7732103 Photomask, focus measurement apparatus and focus measurement method |
| 06/08/2010 | US7732102 Cr-capped chromeless phase lithography |
| 06/08/2010 | US7732101 polishing the surfaces of substrates using abrasive grains comprising silica sol and applying pressure to suppress surface projections; phase shifting masks used for producing semiconductors |
| 06/08/2010 | US7731470 Clean stocker and method of storing articles |
| 06/03/2010 | WO2010061828A1 Mask blank substrate |
| 06/03/2010 | WO2010061725A1 Substrate with multilayer reflection film, reflective mask blank and method for manufacturing reflective mask blank |
| 06/03/2010 | US20100138806 Resolution enhancing technology using phase assignment bridges |
| 06/03/2010 | US20100138019 Method of performing optical proximity effect corrections to photomask pattern |
| 06/03/2010 | US20100136781 Simultaneous via and trench patterning using different etch rates |
| 06/03/2010 | US20100136488 Pattern creation method, semiconductor device manufacturing method, and computer-readable storage medium |
| 06/03/2010 | US20100136487 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 06/03/2010 | US20100136467 Oxime ester photoinitiators |
| 06/03/2010 | US20100136466 Exposure mask and method for manufacturing semiconductor device using the same |
| 06/03/2010 | US20100136465 Method of fabricating photomask |
| 06/03/2010 | US20100136464 Reflective mask blank and method of producing the same, and method of producing a reflective mask |
| 06/02/2010 | DE10314212B4 Verfahren zur Herstellung eines Maskenrohlings, Verfahren zur Herstellung einer Transfermaske A method of producing a mask blank, method of manufacturing a transfer mask |
| 06/02/2010 | CN1739066B Electron beam processing technology for mask repair |
| 06/02/2010 | CN101720448A Method and apparatus for determining the effect of process variations |
| 06/02/2010 | CN101320219B Field measurement method for optical aberration of imaging optical system |
| 06/02/2010 | CN101304025B Mask layout method, and semiconductor device and method for fabricating the same |
| 06/02/2010 | CN101221371B Device and method for detecting pattern positioning precision |
| 06/02/2010 | CN101192000B Central symmetry continuous microstructure diffraction element mask manufacture method |
| 06/02/2010 | CN101169550B Colorful filter substrate and pattern mask |
| 06/02/2010 | CN101075088B Protection film assembly and device for stripping protection film assembly |
| 06/01/2010 | US7730445 Pattern data verification method for semiconductor device, computer-readable recording medium having pattern data verification program for semiconductor device recorded, and semiconductor device manufacturing method |
| 06/01/2010 | US7727684 includes transparent quartz substrate, and nano inorganic material-polymer complex layer formed on surface of mask layer to adsorb residual contamination source |
| 06/01/2010 | US7727683 Quartz transparent substrates; first dummy pad pattern containing phase shifting material; opaque pattern positioned in center of dummy pad; phase shift mask; pattern transferring |
| 06/01/2010 | US7727682 System and method for providing a passivation layer for a phase shift mask ("PSM") are described. In one embodiment, a PSM comprises a transparent substrate; a phase shift pattern disposed on the transparent substrate; and a passivation layer disposed to substantially cover exposed surfaces |
| 06/01/2010 | US7727681 regeneration transmission to quartz substrate doped with gallium; using etching gas; radiation transparent; controlling thickness; photolithography |
| 05/27/2010 | WO2010058586A1 Pellicle film, pellicle used with mask for tft liquid crystal panel production, and photomask containing the pellicle |
| 05/27/2010 | US20100131915 Method, device, and program for predicting a manufacturing defect part of a semiconductor device |
| 05/27/2010 | US20100129738 Positive resist composition and pattering process |
| 05/27/2010 | US20100129737 Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device |
| 05/27/2010 | US20100129736 Photomask Having A Reduced Field Size And Method Of Using The Same |
| 05/27/2010 | US20100129735 Production of stamps, masks or templates for semiconductor device manufacturing |
| 05/27/2010 | US20100129617 Laser ablation tooling via sparse patterned masks |
| 05/27/2010 | US20100128966 Pattern shape evaluation method and pattern shape evaluation apparatus utilizing the same |
| 05/26/2010 | EP2190002A1 Apparatus for detecting a fine geometry and device manufacturing method |
| 05/26/2010 | EP2189842A2 Reflective mask blank, reflective mask and methods of producing the mask blank and the mask |
| 05/26/2010 | EP2188673A1 Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate |
| 05/26/2010 | CN201489270U Mask plate for manufacturing liquid crystal display panel |
| 05/26/2010 | CN201483318U Beveling device of mask beveling edger |
| 05/26/2010 | CN1688934B Method for fabricating semiconductor device |
| 05/26/2010 | CN1646987B Radiation patterning tools, and methods of forming radiation patterning tools |
| 05/26/2010 | CN1591189B Source and mask optimization |
| 05/26/2010 | CN1580957B Multilayer reflective extreme ultraviolet lithography mask blanks |
| 05/26/2010 | CN1577722B Image correcting method ,system and mask, semiconductor producing method and semiconductor device |
| 05/26/2010 | CN101715567A Solvent-assisted layer formation for imprint lithography |
| 05/26/2010 | CN101713920A 半导体器件 Semiconductor devices |
| 05/26/2010 | CN101713919A A multilevel greyscale photo mask and method for producing the same |
| 05/26/2010 | CN101713918A Techniques for reducing degradation and/or modifying feature size of photomasks |
| 05/26/2010 | CN101713917A Gray mask blank, mask and manufacture methods thereof |
| 05/26/2010 | CN101713916A Method of making an aperture mask |
| 05/26/2010 | CN101713915A A tri-state mask and a mehtod for making semiconductor device using it |
| 05/26/2010 | CN101713914A Photomask and method of fabricating a photomask |
| 05/26/2010 | CN101713913A A photomask board and photomask |
| 05/26/2010 | CN101713912A Alignment mark of mask |
| 05/26/2010 | CN101059649B Mask pattern generating method |
| 05/26/2010 | CN101047109B Critical dimension (CD) control method by spectrum metrology |
| 05/25/2010 | US7725872 Orientation dependent shielding for use with dipole illumination techniques |
| 05/25/2010 | US7724939 Method and apparatus for inspecting reticles implementing parallel processing |
| 05/25/2010 | US7724418 Electrophoretic display medium and method of forming the same |
| 05/25/2010 | US7724361 Apparatus and method of inspecting defects in photomask and method of fabricating photomask |
| 05/25/2010 | US7723704 EUV pellicle with increased EUV light transmittance |
| 05/25/2010 | US7723230 Method for manufacturing semiconductor device and method for designing photomask pattern |
| 05/25/2010 | US7722998 Reflective mask blank |
| 05/25/2010 | US7722997 Holographic reticle and patterning method |
| 05/20/2010 | US20100124711 Photomask blank, photomask blank manufacturing method, and photomask manufacturing method |
| 05/20/2010 | US20100124710 Photomask |
| 05/20/2010 | US20100124709 Image mask assembly for photolithography |
| 05/20/2010 | US20100123207 Bottom electrode mask design for ultra-thin interlayer dielectric approach in MRAM device fabrication |
| 05/19/2010 | CN201477364U Maskplate |
| 05/19/2010 | CN201477363U LED display screen mask repair device |