| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/20/2010 | US7760368 Method and system for measuring patterned structures |
| 07/20/2010 | US7760349 Mask-defect inspecting apparatus with movable focusing lens |
| 07/20/2010 | US7760348 Particle inspection apparatus, exposure apparatus, and device manufacturing method |
| 07/20/2010 | US7759606 Method and apparatus for repair of reflective photomasks |
| 07/20/2010 | US7759049 laser engravable printing element which is a photocured resin formulation containing a solid state resin ( e.g butadiene-styrene copolymer), an organic compound containing a polymerizable unsaturated group e.g divinylbenzene, and inorganic porous particles (silica) |
| 07/20/2010 | US7759029 High reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, comprising scattering structures for scattering and absorbing radiation |
| 07/20/2010 | US7759028 Sub-resolution assist features |
| 07/20/2010 | US7759025 transparent substrate, half-tone film provided on a part on which light-shielding pattern is to be formed and a part on which semi-light shielding pattern is to be formed, where semi-light shielding pattern includes first and second light shielding patterns, second having smaller dimensions than first |
| 07/20/2010 | US7759024 forming a thin film over a backside of a reticle, deforming backside into a global convex shape, coupling voltage across thin film, and conforming backside of reticle to topside of electrostatic chuck by sliding reticle across electrostatic chuck via thin film |
| 07/20/2010 | US7759023 Hybrid topography mask; each pattern element defines a surface parallel to the light receiving surface; pattern sides extend between elements and surface; Each side extends perpendicularly between surface and elements;tapered sub-resolution assist element to position mask on semiconductor wafer |
| 07/20/2010 | US7759022 Phase shift mask structure and fabrication process |
| 07/20/2010 | US7759021 Multi-transmission phase mask and exposure method using the same |
| 07/20/2010 | US7758930 Polymers with (alk)acrylic acid units reacted with glycidyl (meth)acrylate and/or hydroxyalkyl (alk)acrylate units reacted with an isocyanatoalkyl (meth)acrylate; tertiary amine photoinitiator; photocurable acid with 3 curable groups (pentaerythritol triacrylate monomaleate); high exposure sensitivity |
| 07/20/2010 | CA2338271C Laser delivery system and method for photolithographic mask repair |
| 07/15/2010 | WO2010080796A1 Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations |
| 07/15/2010 | WO2010079771A1 Method for manufacturing glass substrate for mask blank, method for manufacturing mask blank and method for manufacturing photomask for exposure |
| 07/15/2010 | US20100180252 Computer readable storage medium storing program for generating reticle data, and method of generating reticle data |
| 07/15/2010 | US20100178618 Patterning process |
| 07/15/2010 | US20100178601 Photomask defect correcting method and device |
| 07/15/2010 | US20100178600 Process for etching a metal layer suitable for use in photomask fabrication |
| 07/15/2010 | US20100178599 Photomask Used in Fabrication of Semiconductor Device |
| 07/15/2010 | US20100178598 Method and apparatus for sub-pellicle defect reduction on photomasks |
| 07/15/2010 | US20100178597 Mask fabrication supporting method, mask blank providing method, and mask blank dealing system |
| 07/15/2010 | US20100178596 Extreme ultraviolet photolithography mask, with absorbent cavities |
| 07/15/2010 | US20100177546 Semiconductor device |
| 07/15/2010 | US20100177417 Color filter substrate and method of manufacturing the same |
| 07/15/2010 | US20100177290 Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method |
| 07/15/2010 | US20100176087 Photomask making method, photomask blank and dry etching method |
| 07/15/2010 | DE102004063140B4 Fotomaske und Verfahren für die Herstellung derselben Photo mask and method for manufacturing the same |
| 07/14/2010 | CN201527539U Exposure film for resistance welding pattern |
| 07/14/2010 | CN1955841B Laser induced thermal imaging mask and fabrication method for organic electroluminescent device |
| 07/14/2010 | CN1773373B Mosaic method used for multi-transmissivity photomask structure and gained structure |
| 07/14/2010 | CN1749851B Mask plate supply system, method for producing mask plate and mask plate transparent substrate |
| 07/14/2010 | CN101295630B Substrate treatment apparatus |
| 07/13/2010 | US7756661 Method and apparatus for measuring dimension of photo-mask pattern |
| 07/13/2010 | US7756318 Pattern inspection apparatus and method with local critical dimension error detectability |
| 07/13/2010 | US7755751 Optical inspection method and optical inspection apparatus |
| 07/13/2010 | US7755169 Semiconductor device, method of manufacturing the same, and phase shift mask |
| 07/13/2010 | US7755149 Photo mask and semiconductor device fabricated using the same |
| 07/13/2010 | US7754414 polymer comprising one or more functional groups capable of interactions selected from covalent, ionic, and hydrogen bonding, and thermal acid generator which upon heating disassociates into constituent parts capable of interactions selected from covalent, ionic, and hydrogen bonding; reduced outgassing |
| 07/13/2010 | US7754399 Methods of forming reticles |
| 07/13/2010 | US7754398 photomask has highly reliable assist patterns, and a method of fabricating the same is provided. The photomask includes a transparent substrate, circuit pattern and assist patterns. The circuit pattern recessed into the transparent substrate relative to a surface thereof has a first thickness |
| 07/13/2010 | US7754397 provides a phase-shift mask which makes it possible to obtain a pattern of high precision without generating misregistration even if defocusing is produced due to various magnitude of pitch |
| 07/13/2010 | US7754396 Mask with focus measurement pattern and method for measuring focus value in exposure process using the same |
| 07/13/2010 | US7754395 improved critical dimension uniformity by improving the reticles utilized for photolithography; halftone or bulk attenuating structures on reticle backsides; MoSi mask; mask across a portion of the backside partially block transmission of electromagnetic radiation through portion of pattern |
| 07/13/2010 | US7754394 Method to etch chrome for photomask fabrication |
| 07/13/2010 | US7753674 A designated resist pattern is formed by applying pressure to the resist using a soft mold made of polydimethylsiloxane and resist include ethylene glycol dimetharcylate, hydroxypropyl arcylate and diethylene glycol dimethacrylate; free of photolithography; cost efficiecy; solubility parameter difference |
| 07/08/2010 | WO2010077274A1 Relief printing plate |
| 07/08/2010 | US20100173234 Photomask producing method and photomask blank |
| 07/08/2010 | US20100173233 Photomask blank, photomask, and methods of manufacturing the same |
| 07/08/2010 | US20100173232 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method |
| 07/08/2010 | US20100173231 Lcd device including a reflection film having a convex-concave surface |
| 07/08/2010 | US20100173230 Photomask |
| 07/07/2010 | CN1782868B Photo mask and method for manufacturing patterns using the same |
| 07/07/2010 | CN101772424A Method of pre-exposing relief image printing plate |
| 07/07/2010 | CN101772272A Design technique for internal layer plate edge of multi-layer printing circuit board |
| 07/07/2010 | CN101771032A Method for forming through hole structure, semiconductor device, metal interconnection structure and mask plate |
| 07/07/2010 | CN101770588A Management method and system for automatic photo-mask identification |
| 07/07/2010 | CN101770162A Backside phase grating mask and method for manufacturing the same |
| 07/07/2010 | CN101770161A Method for manufacturing phase shift mask plate and structure thereof |
| 07/07/2010 | CN101770160A Method for protecting mask |
| 07/07/2010 | CN101770159A Method and device for storing mask plate |
| 07/07/2010 | CN101147148B Method of adding fabrication monitors to integrated circuit chips |
| 07/06/2010 | US7752595 Method for verifying and correcting post-OPC pattern layout |
| 07/06/2010 | US7750318 Working method by focused ion beam and focused ion beam working apparatus |
| 07/06/2010 | US7749916 Additive printed mask process and structures produced thereby |
| 07/06/2010 | US7749691 latent imaging; color filters; photomasks; semiconductors |
| 07/06/2010 | US7749688 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device |
| 07/06/2010 | US7749683 Photopolymerizable composition |
| 07/06/2010 | US7749665 photoresists, photomasks; immersion lithography; latent images |
| 07/06/2010 | US7749664 Mixture containing acid generator, crosslinking agent and dye; reproduction, photostability, heat resistance |
| 07/06/2010 | US7749663 Subjecting the chrome-containing layer of a photomask to a wet etch process using deionized water and ozone; length of exposure is directly proportional to the degree of adjustment desired |
| 07/06/2010 | US7749662 improving the yield of a lithographic imaging system; mitigates resist residue that can result from the use of a contiguous scatterbar; photomask; improving wafer yield |
| 07/06/2010 | CA2401111C Process for the fabrication of a phase mask for optical fiber processing, optical fiber-processing phase mask, optical fiber with a bragg grating, and dispersion compensating device using the optical fiber |
| 07/01/2010 | WO2010074659A1 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof |
| 07/01/2010 | WO2010074481A2 Half tone mask and fabricating method |
| 07/01/2010 | WO2010074125A1 Reflective mask blank and reflective mask manufacturing method |
| 07/01/2010 | WO2010072279A1 Method for determining a repair shape of a defect on or in the vicinity of an edge of a substrate of a photomask |
| 07/01/2010 | WO2009147014A9 Multilayer mirror and lithographic apparatus |
| 07/01/2010 | US20100168895 Mask verification method, method of manufacturing semiconductor device, and computer readable medium |
| 07/01/2010 | US20100167537 Partitioning features of a single ic layer onto multiple photolithographic masks |
| 07/01/2010 | US20100167190 Pattern-correction supporting method, method of manufacturing semiconductor device and pattern-correction supporting program |
| 07/01/2010 | US20100167188 Pigment Dispersion Composition, Resist Composition for Color Filter Including the Same, and Color Filter Using the Same |
| 07/01/2010 | US20100167187 Reflective-type mask blank for euv lithography |
| 07/01/2010 | US20100167186 Extreme ultraviolet photomask and methods and apparatuses for manufacturing the extreme ultraviolet photomask |
| 07/01/2010 | US20100167185 Photomask blank manufacturing method and photomask manufacturing method |
| 07/01/2010 | US20100167184 Lithographic processing method, and device manufactured thereby |
| 07/01/2010 | US20100167183 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 07/01/2010 | US20100167182 Backside phase grating mask and method for manufacturing the same |
| 07/01/2010 | US20100167181 Photomask for Extreme Ultraviolet Lithography and Method for Fabricating the Same |
| 07/01/2010 | US20100166289 Feature-quantity extracting method, designed-circuit-pattern verifying method, and computer program product |
| 07/01/2010 | US20100164911 Photosensitive resist composition for color filters for use in electronic paper display devices |
| 07/01/2010 | DE102008062928A1 Verfahren zum Ermitteln einer Reparaturform eines Defekts an oder in der Nähe einer Kante eines Substrats einer Photomaske A method for determining a form of a defect repair at or in the vicinity of an edge of a substrate of a photomask |
| 06/30/2010 | EP2202577A1 Chemically amplified positive resist composition and resist patterning process |
| 06/30/2010 | EP2201426A2 Optical membrane element |
| 06/30/2010 | EP1953117B1 Scanning jet nanolithograph and the operation method thereof |
| 06/30/2010 | CN101762969A Microlens mask of image sensor and method for forming microlens using the same |
| 06/30/2010 | CN101261454B Method for accomplishing sub-wavelength interference photolithography utilizing multiple layer metal dielectric-coating structure |
| 06/29/2010 | US7745842 Graytone mask and method thereof |
| 06/29/2010 | US7745103 Exposure, cleaning, and drying z photosensitive resin film; radiating laser on the concave-convex pattern of the semi-finished decoration film; smooth concave-convex parts and/or provide difference in height of a convex part and depth of a concave part; automobile instrument panels; cost efficiency |