| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/10/2010 | US7773296 Ultra-broadband UV microscope imaging system with wide range zoom capability |
| 08/10/2010 | US7773213 Optical exterior inspection apparatus and method |
| 08/10/2010 | US7773198 Filtered device container assembly with shield for a reticle |
| 08/10/2010 | US7771904 Photomask, and method and apparatus for producing the same |
| 08/10/2010 | US7771903 Photolithography with optical masks having more transparent features surrounded by less transparent features |
| 08/10/2010 | US7771902 large scale semiconductor integrated circuit; roundness of resist pattern corners is suppressed; mask error factor rduced in an opposing region of the pattern; semi-light-shielding portion is between a transparent portion disposed in an opposing region of a mask pattern and each pattern region |
| 08/10/2010 | US7771901 Layout method for mask |
| 08/10/2010 | US7771900 Manufacturing method for photo mask |
| 08/10/2010 | US7771899 forming first patterns over a transparent substrate, detecting a defect die by inspection, forming a mask pattern that selectively exposes the defect die, removing the defect pattern of the defect die using the mask pattern as an etching mask, forming a material layer for forming a second pattern |
| 08/10/2010 | US7771898 Extreme Ultraviolet; stress compensation layer between substrate and reflection layer; for fine semiconductor device photolithography; precision; molybdenum and silicon films; silicon wafers |
| 08/10/2010 | US7771897 Resist-pattern forming method capable of improving the positional accuracy of a resist pattern by performing multiple-exposure through use of a mask pattern in a cellular form; pattern can beformed changing in film thickness on the overlying layer by performing development |
| 08/10/2010 | US7771896 Rewriteable patterning device to transfer of patterns to substrates through extreme ultraviolet waves; improved optical properties; imparting a cross-sectional pattern during reflection; the device comprising a layer of phase-change material undergoing an induced structural phase change in stability |
| 08/10/2010 | US7771895 selective etching quartz substrates having multilayer absorbers comprising tantalum nitrides, silicides, oxynitrides or boronitrides, capping and photoresist layers, to form patterned images; fabrication of semiconductors, integrated circuits or chips |
| 08/10/2010 | US7771894 quartz substrates having opaque multilayer absorbers comprising tantalum nitrides, silicides, oxynitrides or boronitrides, used for to form patterned images in photoresist layers; fabrication of semiconductors, integrated circuits or chips |
| 08/10/2010 | US7771893 Photomask blank, photomask and fabrication method thereof |
| 08/10/2010 | US7771892 Double exposure method and photomask for same |
| 08/05/2010 | WO2010087345A1 Method of manufacturing reflective mask blanks for euv lithography |
| 08/05/2010 | WO2010086850A2 Process for producing a photomask on a photopolymeric surface |
| 08/05/2010 | US20100196807 Prevention of photoresist scumming |
| 08/05/2010 | US20100196806 Structures and methods for low-k or ultra low-k interlayer dielectric pattern transfer |
| 08/05/2010 | US20100196805 Mask and method to pattern chromeless phase lithography contact hole |
| 08/05/2010 | US20100196804 Mask inspection apparatus and image creation method |
| 08/05/2010 | US20100196803 Methods for Cell Boundary Isolation in Double Patterning Design |
| 08/05/2010 | US20100195076 Optical membrane element |
| 08/05/2010 | US20100195030 Colored photosensitive resin composition, coating film of colored photosensitive resin composition, photosensitive resin transfer material, method of foaming photosensitive resin layer, color filter, method for producing color filter, and liquid crystal display device |
| 08/05/2010 | US20100194672 Color filter, method of fabricating the same and display device |
| 08/05/2010 | US20100193960 Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device |
| 08/05/2010 | US20100193912 Methods and apparatus for the manufacture of microstructures |
| 08/05/2010 | CA2787249A1 Process for producing a photomask on a photopolymeric surface |
| 08/04/2010 | CN201540453U Mask cassette |
| 08/04/2010 | CN101794070A Device for reducing projection super-resolution imaging and photoetching method |
| 08/04/2010 | CN101441381B Method for preparing solvent resistance agent electronic paper micro-cup and material for preparing solvent resistance agent electric paper micro-cup |
| 08/03/2010 | US7770145 Semiconductor device pattern creation method, pattern data processing program, and semiconductor device manufacturing method |
| 08/03/2010 | US7767985 EUV pellicle and method for fabricating semiconductor dies using same |
| 08/03/2010 | US7767506 Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask |
| 08/03/2010 | US7767384 Method for making a negative-working lithographic printing plate precursor |
| 08/03/2010 | US7767383 Photosensitivity; flexography |
| 08/03/2010 | US7767369 Photo-mask and thin-film transistor substrate |
| 08/03/2010 | US7767368 Method of fabricating photomask blank |
| 08/03/2010 | US7767367 A transparent substrate having a light-shielding film of a metal dry-etchable by fluorine and an etching mask film deposited on the light-shielding film of another resistant to fluorine dry etching; pattern size variation arising from density dependency reduced so high accuracy; microstructure |
| 08/03/2010 | US7767366 Resolution, accurate etching; stable thickness and aspect ratio; light shielding film composed of silicon and molybdenum; etch resistance; halftones; semiconductors; integrated circuits |
| 08/03/2010 | US7767365 Purification by removing sulfur, carbon and oxygen compounds by contact with excited oxygen; photoresist layer is removed with a sulfur hexafluoride; etching; binary, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks; molybdenum-doped silicon oxynitride and chrome layers |
| 08/03/2010 | US7767364 Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device |
| 08/03/2010 | US7767363 exposing to actinic radiation, forming flare spots; semiconductors, integrated circuits |
| 08/03/2010 | US7767104 Method for repairing errors of patterns embodied in thin layers |
| 07/29/2010 | WO2010085714A2 Pre-opc layout editing for improved image fidelity |
| 07/29/2010 | WO2010083655A1 Cleaning method for photomask |
| 07/29/2010 | US20100191357 Pattern layout creation method, program product, and semiconductor device manufacturing method |
| 07/29/2010 | US20100190342 Pattern generating method, method of manufacturing semiconductor device, computer program product, and pattern-shape-determination-parameter generating method |
| 07/29/2010 | US20100190097 Pellicle for photolithography |
| 07/29/2010 | US20100190096 Target and method for mask-to-wafer cd, pattern placement and overlay measurement and control |
| 07/29/2010 | US20100190095 Pellicle mounting method and apparatus |
| 07/29/2010 | US20100187714 Pattern generation method, recording medium, and pattern formation method |
| 07/29/2010 | US20100187658 Multi-material hard mask or prepatterned layer for use with multi-patterning photolithography |
| 07/29/2010 | US20100187609 Boosting transistor performance with non-rectangular channels |
| 07/29/2010 | US20100186768 Foreign matter removing method for lithographic plate and method for manufacturing lithographic plate |
| 07/28/2010 | EP2211294A1 Process for correcting the recording skew when illuminating a printing master |
| 07/28/2010 | EP2211232A1 Reduced striae extreme ultraviolet elements |
| 07/28/2010 | EP2211231A2 Pellicle for photolithography |
| 07/28/2010 | CN101788768A Exposure method |
| 07/28/2010 | CN101788762A Pattern correction method, exposure mask, semiconductor device and manufacturing method of semiconductor device |
| 07/28/2010 | CN101788761A Porection thin film set for photolithography |
| 07/28/2010 | CN101788760A Optimization method of optical proximity correction rule |
| 07/28/2010 | CN101788759A Method for correcting auxiliary figure with low resolution |
| 07/28/2010 | CN101788758A Correction method of a photomask |
| 07/28/2010 | CN101788757A Multi-color light adjustment mask, its manufacture method and a pattern transfer-printing method |
| 07/28/2010 | CN101382728B Gray level mask plate structure |
| 07/27/2010 | US7764825 Pattern inspection apparatus and method with enhanced test image correctability using frequency division scheme |
| 07/27/2010 | US7764368 Method and apparatus for inspecting defects on mask |
| 07/27/2010 | US7763414 Pseudo low volume reticle (PLVR) design for ASIC manufacturing |
| 07/27/2010 | US7763399 preparing a Ru-coated extreme ultraviolet (EUV) lithographic surface for cleaning; removing oxide from the Ru-coated EUV lithographic surface using radical H2 to reduce Ru2O3 to Ru; removal of oxide contamination creates a H2-terminated passivation layer of EUV lithographic surface |
| 07/27/2010 | US7763398 Forming dummy pattern blocking layer and dummy pattern layers; inserting cell in main chip; overcoating; masking; pattern uniformity |
| 07/27/2010 | US7763397 the registration errors of the optical pattern are corrected as the optical pattern physically moves due to the action of the stress generation portions |
| 07/27/2010 | US7763395 pre-baked pellicle is purged with an inert gas; purged pellicle is radiated by a radiation at a wavelength; improved mechanical integrity, stability, and durability |
| 07/27/2010 | US7763394 protective means are contrived to keep the interfering particles at a distance from the patterns which is greater than or equal to the two values taken by the depth of focus of the device and the height of pattern/interfering particle; patterned masked used in optical lithography |
| 07/27/2010 | CA2691136A1 Method of processing synthetic quartz glass substrate for semiconductor |
| 07/27/2010 | CA2408717C Method of molecular-scale pattern imprinting at surfaces |
| 07/22/2010 | WO2010082586A1 OPTICAL MEMBER COMPRISING SILICA GLASS CONTAINING TiO2 |
| 07/22/2010 | WO2010082416A1 Material for forming coating film, laminate, and process for production of laminate |
| 07/22/2010 | WO2010081276A1 Metal optical grayscale mask and manufacturing method thereof |
| 07/22/2010 | US20100185313 Pattern data creating method, computer program product, and semiconductor device manufacturing method |
| 07/22/2010 | US20100183961 Integrated circuit layout design |
| 07/22/2010 | US20100183960 Pattern correction method, exposure mask, manufacturing method of exposure mask, and manufacturing method of semiconductor device |
| 07/22/2010 | US20100183959 Method of generating reticle data, memory medium storing program for generating reticle data and method of producing reticle |
| 07/22/2010 | US20100183958 Method of fabricating semiconductor device, and photomask |
| 07/22/2010 | US20100183957 Method of Patterned Media Template Formation and Templates |
| 07/22/2010 | US20100182603 Surface Inspection Device |
| 07/22/2010 | US20100182580 Photolithography systems with local exposure correction and associated methods |
| 07/21/2010 | EP2209048A2 Method for manufacturing a photomask, photomask blank and dry etching method |
| 07/21/2010 | EP2209047A1 Deposition of a protective layer by charged particle beam sputtering and processing of the layer by a charged particle beam |
| 07/21/2010 | EP2209046A1 Method and apparatus for registration correction of masks |
| 07/21/2010 | CN201532522U Alignment target pattern for negative exposure |
| 07/21/2010 | CN201532521U Handheld mask pick |
| 07/21/2010 | CN101785096A Semiconductor integrated circuit device |
| 07/21/2010 | CN101782720A Method, control wafer and photomask for measuring and monitoring numerical aperture of exposure machine |
| 07/21/2010 | CN101782718A Transfer printing method, photomask for transfer printing and manufacturing method thereof |
| 07/21/2010 | CN101030039B Lampshade seat |
| 07/20/2010 | US7761840 Mask data generation including a main pattern and an auxiliary pattern |
| 07/20/2010 | US7761839 Performance in model-based OPC engine utilizing efficient polygon pinning method |
| 07/20/2010 | US7761837 Method of making alternating phase shift masks |