Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
08/2010
08/31/2010US7787686 Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection
08/31/2010US7787174 Pattern generator
08/31/2010US7787079 Generation of pattern data with no overlapping or excessive distance between adjacent dot patterns
08/31/2010US7786437 Pattern inspection method and pattern inspection system
08/31/2010US7785754 Defect repair method for photomask and defect-free photomask
08/31/2010US7785753 partially etching a carbon layer through a pattern in a photoresist silicon layer in an oxygen plasma, the oxygen ions in the plasma react with silicon in the photoresist to form a surface layer of silica on the photoresist and etching the remaining carbon layer in a hydrogen ion plasma; process control
08/31/2010US7785483 Exposure mask and method for fabricating semiconductor device using the same
08/26/2010WO2010094696A2 Nano plasmonic parallel lithography
08/26/2010US20100216064 Semiconductor-device manufacturing method, computer program product, and exposure-parameter creating method
08/26/2010US20100216063 Masks and methods of forming the same
08/26/2010US20100216062 Reflective photomask and method of fabricating, reflective illumination system and method of process using the same
08/26/2010US20100216061 Inverse Lithography For High Transmission Attenuated Phase Shift Mask Design And Creation
08/26/2010US20100215273 Methods and devices for characterizing polarization of illumination system
08/25/2010CN201562121U Photo mask
08/25/2010CN201562120U Mould pressing tool
08/25/2010CN1841388B Method for manufacturing photomask and method for manufacturing semiconductor device using photomask
08/25/2010CN1752844B Mask patterns for semiconductor device fabrication and related methods and structures
08/25/2010CN101813883A Mask blank substrate, mask blank, exposure mask, method for manufacturing semiconductor device and method for manufacturing mask blank substrate
08/25/2010CN101813882A Method for preparing soft surface UV-visible photomask
08/25/2010CN101813881A Halftone mask and manufacture method thereof
08/25/2010CN101424837B Method for manufacturing LCD array substrate
08/25/2010CN101369096B Plug-pull type vibration amplitude mask plate for producing arbitrary refractive index modulation optical fiber optical grating
08/25/2010CN101349863B Method for correcting optical approach effect of polygon rim dynamic cutting by configuration sampling
08/25/2010CN101311824B Photo mask pattern correction method
08/25/2010CN101241319B Machine vision aligning system possessing mask target hierarchy and its alignment method
08/25/2010CN101118378B Preparation method of diamond surface graphics
08/24/2010US7784020 Semiconductor circuit pattern design method for manufacturing semiconductor device or liquid crystal display device
08/24/2010US7784017 Lithography simulation method, photomask manufacturing method, semiconductor device manufacturing method, and recording medium
08/24/2010US7784016 Method and system for context-specific mask writing
08/24/2010US7784015 Method for generating a mask layout and constructing an integrated circuit
08/24/2010US7783108 Document management method and apparatus
08/24/2010US7781749 Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system
08/24/2010US7781349 Method and system for optimizing a BARC stack
08/24/2010US7781156 forming a resist pattern on metal layer covering a substrate, wet etching exposed metal layer, removing resist pattern forming metal layer pattern, exposing a portion of substrate, wet etching, removing metal layer pattern to form a recessed pattern, depositing a compensation layer(SiO2); slim profile
08/24/2010US7781128 photolithography at very short wavelengths; high resolution; improved compromise between performance and production cost; characterized in that the etched pattern is defined by the presence of absorbent resonant optical cavities of the Fabry-Perot type
08/24/2010US7781127 Manufacturing method of pattern formed body, and photomask for vacuum-ultraviolet light
08/24/2010US7781126 Mask and pattern forming method by using the same
08/24/2010US7781125 Lithography mask blank
08/19/2010WO2010092937A1 Substrate for mask blank use, mask blank, and photo mask
08/19/2010WO2010092901A1 Photomask and methods for manufacturing and correcting photomask
08/19/2010WO2010092899A1 Photomask blank and fabrication method therefor, and photomask and fabrication method therefor
08/19/2010WO2010092879A1 Method for manufacturing photomask
08/19/2010US20100211352 Mark arrangement inspecting method, mask data, and manufacturing method of semiconductor device
08/19/2010US20100210053 Photo mask and method of manufacturing in-plane-switching mode liquid crystal display device using the same
08/19/2010US20100209834 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure
08/19/2010US20100209829 Photomask manufacturing method and semiconductor device manufacturing method
08/19/2010US20100209828 Reticle manufacturing method, surface shape measuring apparatus and signal processor
08/19/2010US20100209827 Novel sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same
08/19/2010US20100209826 Apparatus for processing photomask, methods of using the same, and methods of processing photomask
08/19/2010US20100209825 Exposure mask and method for forming semiconductor device by using the same
08/19/2010US20100209824 Photomask
08/19/2010US20100208978 Method of inspecting mask pattern and mask pattern inspection apparatus
08/19/2010US20100208327 Pattern generator
08/19/2010US20100207205 Structures and Methods for Improving Trench-Shielded Semiconductor Devices and Schottky Barrier Rectifier Devices
08/19/2010DE10310137B4 Satz von wenigstens zwei Masken zur Projektion von jeweils auf den Masken gebildeten und aufeinander abgestimmten Strukturmustern und Verfahren zur Herstellung der Masken Set of at least two masks for the projection of the respectively formed on the masks and concerted structure patterns and methods for making the masks
08/19/2010DE102009060677A1 Fertigungsverfahren für Photomaskenrohling und Fertigungsverfahren für Photomaske Manufacturing processes for photomask blank and photomask manufacturing processes for
08/19/2010DE102006037433B4 Verfahren zur Herstellung eines Mehrschichtkörpers sowie Mehrschichtkörper A process for producing a multilayer body as well as multi-layer body
08/18/2010EP2217968A1 Ultra-thin polymeric adhesion layer
08/18/2010CN201556025U Covering template
08/18/2010CN1950749B Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method
08/18/2010CN1791836B Process for fabricating semiconductor device and method for generating mask pattern data
08/18/2010CN101809709A Mask case, transfer apparatus, exposure apparatus, mask transfer method and device manufacturing method
08/18/2010CN101809499A Mask blank, and method for production of imprint mold
08/18/2010CN101806997A Photo mask
08/18/2010CN101806996A Preparation method of nanoimprint hard templates
08/18/2010CN101060769B A method for producing the 3D products suitable for foldable forming
08/18/2010CN101006021B Large-size glass substrate for photomask and making method, and mother glass exposure method
08/17/2010US7777204 System and method of electron beam writing
08/17/2010US7776514 Reduces the optical proximity effect by the light interference, and reduce the aberration of a projection lens such as the coma aberration; enhances the resolution limit
08/17/2010US7776504 Dye-containing resist composition and color filter using same
08/17/2010US7776497 Mask having multiple transmittances
08/17/2010US7776496 Photomask layout pattern
08/17/2010US7776495 Forming a slit in the middle of each mask pattern so as not to expose parts of wafer, the aperture of the wafer becomes nearly cocoon-shaped with a constriction in the middle; thus peripheral length of the aperture can be increased without changing the occupation rate of the mask patterns
08/17/2010US7776494 Attenuated phase shift mask; layer of quartz, patterned absorbing phase shift material, recess etched into quartz in alignment with pattern layer; pass radiation through mask of MoSi; etch optically transparent quartz adjacent to pattern to effect 180 degree phase shift; binary sub resolution assist
08/17/2010US7776493 laser induced thermal imaging (LITI); used to make organic light emitting display device (OLEDs), mask capable of preventing distortion of a patterned image
08/17/2010US7776492 Photomask, manufacturing method thereof, and manufacturing method of electronic device
08/17/2010US7776390 Applying lacquer over wire structure on substrate i depositing aluminum nitride, ruthenium, iridium, gold , silver, silicon nitride, rhodium carbon; removal the lacquer; baking
08/12/2010WO2010090132A1 Reflective mask blank and method for producing reflective mask
08/12/2010WO2010089954A1 Mask inspection apparatus and image creation method
08/12/2010WO2010089595A1 Co-crystals and their use
08/12/2010WO2010088765A1 Method for producing a stamp for hot embossing
08/12/2010US20100203457 Patterning process
08/12/2010US20100203432 Exposure mask and method for manufacturing same and method for manufacturing semiconductor device
08/12/2010US20100203431 Beam-induced etching
08/12/2010US20100203430 Methods for performing model-based lithography guided layout design
08/12/2010US20100202028 Method for producing counterfeit-proof confidential and valuable documents, master for use in this method and confidential and valuable documents produced therewith
08/12/2010DE102009007770A1 Corrective action determining method for electron beam lithographic mask writer, involves evaluating aerial image by test mask with respect to observation of tolerances based on test structures, and determining corrective action
08/12/2010DE102005034669B4 Photolithographische Maske und Verfahren zum Bilden eines Musters auf der Maske Photolithographic mask and method for forming a pattern on the mask
08/12/2010CA2751057A1 Method for producing a stamp for hot embossing
08/11/2010EP1222497B1 Uv-absorbing support layers and flexographic printing elements comprising same
08/11/2010CN1871555B Forming partial-depth features in polymer film
08/11/2010CN1755519B Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method
08/11/2010CN101802161A Alkaline nonionic surfactant composition
08/11/2010CN101799623A Methods for cell boundary isolation in double patterning design
08/11/2010CN101799433A Pattern inspection method, pattern inspection device, photomask manufacturing method and pattern transfer method
08/11/2010CN101246305B Graphic method
08/11/2010CN101206406B Photolithography detection pattern and photolithography edition territory
08/10/2010US7774738 Lithography method for forming a circuit pattern
08/10/2010US7774737 Performance in model-based OPC engine utilizing efficient polygon pinning method
08/10/2010US7774736 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
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