| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 09/22/2010 | EP1833080B1 Reflective photomask blank, reflective photomask, and method for manufacturing semiconductor device using same |
| 09/22/2010 | CN1831651B Method for providing layout design and photomask |
| 09/22/2010 | CN101842744A Half-tone mask, half-tone mask blank and method for manufacturing half-tone mask |
| 09/22/2010 | CN101840163A Illumination source and photomask optimization |
| 09/22/2010 | CN101840150A Graph size adjustable mask and manufacturing method thereof |
| 09/22/2010 | CN101840149A Mask plate and manufacturing method thereof and mask exposure method |
| 09/22/2010 | CN101840100A Liquid crystal display device and manufacture method of color film substrate thereof |
| 09/22/2010 | CN101013705B Thin film transistor substrate and method of manufacturing the same and mask for manufacturing thin film transistor substrate |
| 09/21/2010 | US7802225 Optical proximity correction method, optical proximity correction apparatus, and optical proximity correction program, method of manufacturing semiconductor device, design rule formulating method, and optical proximity correction condition calculating method |
| 09/21/2010 | US7802224 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 09/21/2010 | US7801709 Simulation method using a simulation system that provides information on a transfer pattern of a predetermined mask pattern transferred to a wafer by optical photolithography and method of modifying mask pattern |
| 09/21/2010 | US7800815 Pattern generator |
| 09/21/2010 | US7800747 Inspection apparatus and inspection method |
| 09/21/2010 | US7800140 Semiconductor integrated circuit |
| 09/21/2010 | US7799510 Method for correcting mask pattern, photomask, method for fabricating photomask, electron beam writing method for fabricating photomask, exposure method, semiconductor device, and method for fabricating semiconductor device |
| 09/21/2010 | US7799490 Optical masks and methods for measuring aberration of a beam |
| 09/21/2010 | US7799488 forming a conductive layer on a mask substrate; reducing a predetermined area of the mask substrate, on which the conductive layer is formed, into silicon; etching the predetermined area; and removing the conductive layer; conductive layer comprises a polymer |
| 09/21/2010 | US7799487 optical and process correction in creating printed wafer photolithography mask; obtain data representative of a number of polygons defining pattern; add data representing subresolution assist features; fragment data; map SRAF edge segments to printing feature edge fragment; executable by a computer |
| 09/21/2010 | US7799486 forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern; electronic applications, e.g. computers, cellular phone |
| 09/21/2010 | CA2329412C Elastomeric mask and use in fabrication of devices, including pixelated electroluminescent displays |
| 09/16/2010 | WO2010086850A3 Process for producing a photomask on a photopolymeric surface |
| 09/16/2010 | WO2010074481A3 Half tone mask and fabricating method |
| 09/16/2010 | US20100234973 Pattern verifying method, method of manufacturing a semiconductor device and pattern verifying program |
| 09/16/2010 | US20100233598 Pattern correcting apparatus, mask-pattern forming method, and method of manufacturing semiconductor device |
| 09/16/2010 | US20100233596 Thiourethane compound and photosensitive resin composition |
| 09/16/2010 | US20100233594 System and method for quality assurance for reticles used in manufacturing of integrated circuits |
| 09/16/2010 | US20100233593 Reflective photomask and method of fabricating the same |
| 09/16/2010 | US20100233592 Photomask and method of forming photomask |
| 09/16/2010 | US20100233591 Process for producing pellicle, and pellicle |
| 09/16/2010 | US20100233590 Method for Manufacturing Photo Mask Using Fluorescence Layer |
| 09/16/2010 | US20100233589 Method for Manufacturing Photomask Using Self-assembled Molecule Layer |
| 09/16/2010 | US20100233588 Phase Shift Mask with Enhanced Resolution and Method for Fabricating the Same |
| 09/16/2010 | US20100232679 Pattern verification method, pattern verification apparatus, and pattern verification program |
| 09/16/2010 | US20100232225 Semiconductor storage device |
| 09/16/2010 | US20100230647 Compound or its tautomer, metal complex compound, colored photosensitive curing composition, color filter, and production |
| 09/16/2010 | US20100229902 Particle inspection and removal apparatus and particle inspection and removal program |
| 09/15/2010 | EP2228683A1 Process for Producing Pellicle |
| 09/15/2010 | CN101836161A Technique for determining mask patterns and write patterns |
| 09/15/2010 | CN101833236A Gray tone mask |
| 09/15/2010 | CN101833235A Quality detection system and method for original mask copy |
| 09/15/2010 | CN101833201A Method for marking sequence number of scanning lines and mask plate |
| 09/15/2010 | CN101832949A Particle inspection and removal apparatus, and particle inspection removal program |
| 09/15/2010 | CN101241312B Photo-etching machine image-forming quality on-site measurement method |
| 09/15/2010 | CN101086612B Protection film components containing vessel and manufacturing method thereof |
| 09/14/2010 | USRE41681 Enhanced illuminator for use in photolithographic systems |
| 09/14/2010 | US7796803 Image correction method and apparatus for use in pattern inspection system |
| 09/14/2010 | US7795165 Powder of 4-80 wt % Bi2O3, 1-20 % SiO2, 0.5-10 % Al2O3, 5-20 % B2O3, 1-20 % ZnO, 0-5 % ZrO2, 0-15 % alkaline earth metal oxides and 0.1 to 2 wt % of optical absorption oxides mixed with a photosensitive resin; barriers and dielectric layers for plasma display panels and field emission displays; accuracy |
| 09/14/2010 | US7794917 Curable composition, color filter and manufacturing method thereof |
| 09/14/2010 | US7794901 formed with resist pattern by electron beam writing and having laminated film including a first film and a second film; first film is not charged up during patterning, second film is charged up during the patterning by the electron beam writing; prevent mask film from being formed at the side surface |
| 09/14/2010 | US7794900 preparing a plate-like substrate with a rectangular main surface, forming a marker for identifying the substrate on each of at least a plurality of end faces among four end faces of the substrate, the four end faces continuous with sides of the main surface; avoiding defective portion; semiconductors |
| 09/14/2010 | US7794899 Photo mask, exposure method using the same, and method of generating data |
| 09/14/2010 | US7794898 Method of fabricating photomask |
| 09/14/2010 | US7794897 forming a desired pattern on a wafer by changing design pattern based on the allowable dimensional change quantity defined for the each design pattern; photomasking |
| 09/10/2010 | WO2010101048A1 Flare-measuring mask, flare-measuring method, and exposure method |
| 09/09/2010 | US20100228501 Apparatus and method of inspecting mask |
| 09/09/2010 | US20100228379 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 09/09/2010 | US20100227444 Mask, method for manufacturing the same, and method for manufacturing semiconductor device |
| 09/09/2010 | US20100227261 Flare-measuring mask, flare-measuring method, and exposure method |
| 09/09/2010 | US20100227260 Photomasks, Methods Of Forming Photomasks, And Methods Of Photolithographically-Patterning Substrates |
| 09/09/2010 | US20100225890 Method for evaluating flare in exposure tool |
| 09/09/2010 | DE19945170B4 Verfahren zur Herstellung einer Schablonenmaske A process for producing a stencil mask |
| 09/08/2010 | CN1886442B Pellicle and novel fluoropolymer |
| 09/08/2010 | CN1774823B Photoactive component comprising organic layers |
| 09/08/2010 | CN101826475A Apparatus and mask of inspecting mask, and apparatus and method of generating virtual chart |
| 09/08/2010 | CN101825845A Surface plasmon imaging lithography method for processing nano graphic with high aspect ratio |
| 09/08/2010 | CN101825841A Mask storing and cleaning system |
| 09/08/2010 | CN101823180A Optical processing method and mask |
| 09/08/2010 | CN101572290B Method for preparing columnar nanometer heating electrode |
| 09/08/2010 | CN101398859B Method for introducing light shield partial increment magnification coefficient into optical proximity effect model building |
| 09/08/2010 | CN101349861B Method of smoothing regulation type optical approach correcting light mask pattern |
| 09/07/2010 | US7793252 Mask pattern preparation method, semiconductor device manufacturing method and recording medium |
| 09/07/2010 | US7791740 Method and system for measuring patterned structures |
| 09/07/2010 | US7791718 Measurement method, exposure method, and device manufacturing method |
| 09/07/2010 | US7790811 Pellicle and novel fluoropolymer |
| 09/07/2010 | US7790341 Provides two-block laser mask capable of preventing or minimizing a shot mark by sequential irradiation of each block with two different lasers; liquid crystal displays, light emitting diodes; Flat panel displays having a polycrystalline silicon thin film transistor as a switching device |
| 09/07/2010 | US7790340 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same |
| 09/07/2010 | US7790339 Photomask blank |
| 09/07/2010 | US7790338 Optical compensation region positioned proximate tothe first patterned region and the secondthat is configured to change a phase of the illumination radiation incident on the the first patterned region and the second by altering an optical property of the substrate; subresolution photolithography |
| 09/07/2010 | US7790337 Auxiliary pattern for increasing the contrast of light intensity distribution on imaging face of the exposing light having passed through the principal pattern disposed away from principal pattern by a distance of 0.8xMx lambda/NA (wavelength, reduction optical system of a projection aligner |
| 09/07/2010 | US7790336 Reticles collectively map circuit arrangement on semiconductor substrate; optics |
| 09/07/2010 | US7790335 Photomask and manufacturing method of semiconductor device |
| 09/07/2010 | US7790334 Method for photomask plasma etching using a protected mask |
| 09/07/2010 | US7790333 Microlithography method using a mask with curved surface |
| 09/07/2010 | US7789964 Method for cleaning a surface of a photomask |
| 09/07/2010 | US7789577 Coating and developing system, coating and developing method and storage medium |
| 09/07/2010 | US7789576 PEB embedded exposure apparatus |
| 09/02/2010 | WO2010098819A1 Polymer-containing solvent purifying process |
| 09/02/2010 | WO2010098352A1 Process for producing porous quartz glass object, and optical member for euv lithography |
| 09/02/2010 | WO2010098017A1 Pattern measurement apparatus |
| 09/01/2010 | CN1869809B Halftone mask and method of fabricating the same, and method of fabricating display device using the same |
| 09/01/2010 | CN1756992B Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC |
| 09/01/2010 | CN101821676A Process for producing gray tone mask |
| 09/01/2010 | CN101819377A Method for evaluating multi-gray scale photomas |
| 09/01/2010 | CN101819288A Optical element and method for making the same, master and method for making the same, and display apparatus |
| 09/01/2010 | CN101201874B OPC verification using auto-windowed regions |
| 08/31/2010 | US7788630 Method and apparatus for determining an optical model that models the effect of optical proximity correction |
| 08/31/2010 | US7788629 Systems configured to perform a non-contact method for determining a property of a specimen |
| 08/31/2010 | US7788627 Lithography verification using guard bands |
| 08/31/2010 | US7788626 Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method |
| 08/31/2010 | US7787687 Pattern shape evaluation apparatus, pattern shape evaluation method, method of manufacturing semiconductor device, and program |