Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2010
11/09/2010US7829871 Sheet beam-type testing apparatus
11/09/2010US7829266 Multiple exposure technique using OPC to correct distortion
11/09/2010US7829248 Pellicle stress relief
11/09/2010US7829247 Transparent substrate, square mask cells having a side shorter than a resolution limit of an exposing device; cell includes a light transmitting region and a light shielding region; a planar region; cells transmitting lights greater than or equal to zero and less than the second light intensity
11/09/2010US7829246 interconnecting, via phase shifting photomasks, photoresists, with sacrificial film on or over wafer; etching
11/09/2010US7829245 Mask for sequential lateral solidification and method of manufacturing the same
11/09/2010US7829243 Method for plasma etching a chromium layer suitable for photomask fabrication
11/04/2010WO2010126166A1 Pellicle, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus
11/04/2010WO2010125933A1 Mold release composition and surface protective film
11/04/2010WO2010125825A1 Color filter, liquid crystal display device, and exposure mask
11/04/2010WO2010124791A1 Method and calibration mask for calibrating a position measuring apparatus
11/04/2010US20100280808 Method and system for measuring patterned structures
11/04/2010US20100280807 Method and system for measuring patterned structures
11/04/2010US20100279212 Photomask
11/04/2010US20100279211 Method for designing assistant pattern
11/04/2010DE102009019140A1 Verfahren und Kalibriermaske zum Kalibrieren einer Positionsmessvorrichtung Procedures and calibration mask for calibrating a position measuring device
11/04/2010DE102007023034B4 Dummy-Rohling und Verfahren zum Bestimmen einer Rohlingschicht Dummy blank and method for determining a blank layer
11/04/2010DE102005048380B4 Vorrichtung zum Belichten eines Substrats, Photomaske und modifiziertes Beleuchtungssystem der Vorrichtung und Verfahren zum Bilden eines Musters an einem Substrat unter Verwendung der Vorrichtung An apparatus for exposing a substrate, photomask and modified illumination system of the apparatus and method for forming a pattern on a substrate using the apparatus
11/03/2010EP2246738A1 Photomask and photomask/pellicle assembly
11/03/2010EP2246737A1 Photomask blank and photomask
11/03/2010EP2245510A1 Optical component for euvl and smoothing method thereof
11/03/2010EP1365288B1 Pattern forming method using a photo mask
11/03/2010CN101876786A Photomask
11/03/2010CN101876785A Mask repairing method
11/03/2010CN101582373B Gas charging equipment and gas inlet port device
11/03/2010CN101052917B Photomask blank and photomask
11/02/2010US7827518 Incrementally resolved phase-shift conflicts in layouts for phase-shifted features
11/02/2010US7826655 Pattern correcting method of mask for manufacturing a semiconductor device
11/02/2010US7826033 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect
11/02/2010US7825404 Integrated circuit comprising an organic semiconductor, and method for the production of an integrated circuit
11/02/2010US7824826 Method and apparatus for performing dark field double dipole lithography (DDL)
11/02/2010US7824825 stencil mask in which various surface patterns can be formed, and in which deformation is suppressed when charged particles are introduced; mask for limiting an irradiation area of charged particles on a surface of a substrate to a predetermined shape; for semiconductor
11/02/2010US7824824 first layer of light transmissive material, layer of etch stop material and 2nd layer of light transmissive material have thicknesses such that light of the given wavelength directed from a light source through etched portions of the substrate to pattern a photosensitive surface will be shifted in phase
11/02/2010US7824823 Mask, method of fabricating the same, and method of fabricating organic electro-luminescence device using the same
10/2010
10/28/2010WO2010122697A1 Pellicle for lithography and manufacturing method thereof
10/28/2010US20100275177 Method for transferring self-assembled dummy pattern to substrate
10/28/2010US20100275174 Semiconductor device pattern creation method, pattern data processing method, pattern data processing program, and semiconductor device manufacturing method
10/28/2010US20100273115 Particle inspection apparatus, exposure apparatus, and device manufacturing method
10/28/2010US20100273098 Mask blank, production method of mask blank and production method of mask
10/28/2010US20100273097 Pellicle
10/28/2010US20100272959 Method and unit for micro-structuring a moving substrate
10/28/2010US20100271602 Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus
10/28/2010US20100271577 Display substrate, method of manufacturing the same and display device having the same
10/28/2010US20100270264 Near field exposure mask, method of forming resist pattern using the mask, and method of producing device
10/28/2010DE102010010106A1 Vorrichtung zur Prüfung und Entfernung von Partikeln und Programm zur Prüfung und Entfernung von Partikeln Apparatus for testing and removal of particles and program for testing and removal of particles
10/28/2010DE102007049923B4 Photomasken-Layoutmuster Photomask layout pattern
10/27/2010EP1888455B1 A method for creating an article using a pin of a microarray spotter
10/27/2010CN1910517B Adaptive real time control of a reticle/mask system
10/27/2010CN1655056B Optic mask and manufacturing method of thin film transistor array panel using the same
10/27/2010CN101872114A Mask plate layout for manufacturing metal interconnecting wires
10/27/2010CN101191999B Central symmetry continuous diffraction element mask microstructure graph transfer method
10/26/2010US7823103 Method and system of introducing hierarchy into design rule checking test cases and rotation of test case data
10/26/2010US7821714 Apparatus and method for measuring aerial image of EUV mask
10/26/2010US7821654 System for scatterometric measurements and applications
10/26/2010US7821644 Apparatus for visual inspection
10/26/2010US7821628 Mask defect inspection computer program product
10/26/2010US7820364 forming a transfer pattern of desired size with high accuracy, by performing multiple exposure using a plurality of masks having different patterns over different mask substrates
10/26/2010US7820345 improve the depth of focus margin to allow for the high integration of a semiconductor device; light blocking pattern having first and second patterns, and an assist feature disposed between the first and second patterns and including a dot pattern
10/26/2010US7820344 Method for forming line pattern array, photomask having the same and semiconductor device fabricated thereby
10/26/2010US7820343 Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate
10/26/2010US7820342 elongated mask openings having different orientations relative to the spatial direction of an oblique implantation; different dopings in different mask regions, but also different doping intensities in different mask regions; semiconductor devices
10/26/2010US7820341 Method of two dimensional feature model calibration and optimization
10/26/2010US7819594 Development processing device
10/21/2010WO2010119811A1 Mask blank, transfer mask, and film density evaluation method
10/21/2010WO2010118927A1 Mask inspection with fourier filtering and image compare
10/21/2010US20100266939 Lithographic Mask and Method of Forming a Lithographic Mask
10/21/2010US20100266938 Reflective mask blank and method of manufacturing a reflective mask
10/21/2010US20100266937 Method for repairing phase shift masks
10/21/2010DE102010011155A1 Schreibverfahren mit geladenem Partikelstrahl, Verfahren zum Erfassen der Position einer Referenzmarkierung für ein Beschreiben mit geladenem Partikelstrahl, und eine Schreibvorrichtung mit geladenem Partikelstrahl The writing method with a charged particle beam method for detecting the position of a reference mark for describing a charged particle beam, and a writing device with a charged particle beam
10/21/2010DE102009017952A1 Lithographische Maske und Verfahren zur Herstellung der lithographischen Maske Lithographic mask and method of manufacturing the lithographic mask
10/21/2010DE102009016952A1 Verifikationsverfahren für Reparaturen auf Photolithographiemasken Verification procedures for repairs on photolithography masks
10/20/2010EP1853971B1 Mask blanks
10/20/2010EP1171798B1 Method and apparatus for monitoring electrostatic discharge effects
10/20/2010CN201611423U 掩膜装置 Mask device
10/20/2010CN1837956B Graytone mask and film transistor substrate manufacturing method
10/20/2010CN101866107A Four-gradation photomask, its manufacturing method and photomask blank
10/20/2010CN101866093A Preparation method of shutter baffle
10/20/2010CN101271280B Lithography method for forming a circuit pattern
10/19/2010US7818711 System and method for making photomasks
10/19/2010US7818709 Circuit-pattern-data correction method and semiconductor-device manufacturing method
10/19/2010US7816196 Laser mask and crystallization method using the same
10/19/2010US7816061 Lithography masks for improved line-end patterning
10/19/2010US7816060 photosensitive resin films with selective opening patterns; photoresists
10/19/2010CA2502254C Photosensitive resin printing plate precursor, method for producing the same, and method for producing letterpress printing plate using the same
10/19/2010CA2335313C Automated opening and closing of ultra clean storage containers
10/14/2010WO2010117626A2 Lithography modelling and applications
10/14/2010WO2010116647A1 Method for forming resist pattern, and device
10/14/2010WO2010116646A1 Method for forming resist pattern, and device
10/14/2010WO2010094696A3 Nano plasmonic parallel lithography
10/14/2010US20100261121 Pattern forming method
10/14/2010US20100261104 Pigment-containing heat-curable composition, color filter, image-recording material, and method of producing color filter
10/14/2010US20100261103 Organic pigment fine particles and method of producing the same, pigment-dispersion composition, photocurable composition and ink-jet ink containing the same, and color filter using the same and method of producing the same
10/14/2010US20100261102 Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask
10/14/2010US20100261101 Photomask blank and photomask
10/14/2010US20100261100 Photomask blank and photomask
10/14/2010US20100261099 Photomask blank and photomask making method
10/14/2010US20100261098 High resolution photomask
10/14/2010US20100261097 Photo-imageable Hardmask with Positive Tone for Microphotolithography
10/14/2010US20100261096 Half-tone mask, half-tone mask blank and method for manufacturing half-tone mask
10/14/2010US20100261095 Methods, Photomasks and Methods of Fabricating Photomasks for Improving Damascene Wire Uniformity Without Reducing Performance
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