Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
12/2010
12/23/2010US20100321680 Circuit pattern defect detection apparatus, circuit pattern defect detection method, and program therefor
12/23/2010US20100321656 Transmission mask with differential attenuation to improve iso-dense proximity
12/23/2010US20100320573 Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositions
12/23/2010US20100320464 Thin film transistor, photo mask for defining thin film transistor, and method of making thin film transistor
12/23/2010DE10393131B4 Verfahren zum Herstellen von Maskenrohlingen A method for producing mask blanks
12/22/2010EP2264441A2 Circuit pattern defect detection apparatus, circuit pattern defect detection method, and program therefor
12/22/2010EP1546788B1 Methods and systems for improved boundary contrast
12/22/2010EP1200988B1 Method for milling a target area in a charged particle beam system
12/22/2010CN1964923B Method for forming quartz glass
12/22/2010CN101925860A Method of fabricating photomasks and device for implementing it
12/22/2010CN101924045A Method of forming connecting salient points on semiconductor device
12/22/2010CN101924032A 掩蔽方法 Masking methods
12/22/2010CN101923292A Removal method of chromium residues on border of mask
12/22/2010CN101923281A Method for improving fidelity of Si/Ge emitter window graph
12/22/2010CN101923280A Optical proximity correction figure for enhancing figure fidelity of Si/Ge emitter window
12/22/2010CN101923279A Nano-imprint template and preparation method thereof
12/22/2010CN101923278A Modeling method of phase shift mask in photolithographic process
12/22/2010CN101482697B Method for reducing OPC model residual error
12/22/2010CN101458719B Method for verifying optical approximatino correction
12/22/2010CN101359169B Method for correcting mask pattern
12/22/2010CN101359167B Mask plate and forming method of the mask plate
12/22/2010CN101278375B Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method
12/21/2010US7856613 Method for self-aligned doubled patterning lithography
12/21/2010US7856612 Lithography mask design through mask functional optimization and spatial frequency analysis
12/21/2010US7856606 Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
12/21/2010US7855766 Generation of pattern data with no overlapping or excessive distance between adjacent patterns
12/21/2010US7855047 multilayer photomasking; circuit patterns; connecting opacity zones; adjustment of pattern using photomasking; improved accuracy
12/21/2010US7855046 positioning patterned surface of form mold in proximity to surface of object on which structure is to be formed, filling space between object and patterned surface with gaseous form of radiation sensitive material, creating radiation interference pattern, exposing material to pattern
12/21/2010US7855038 Mask patterns for semiconductor device fabrication and related methods and structures
12/21/2010US7855037 photomasks with test patterns adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during a lithographic process
12/21/2010US7855036 Sputtering target used for production of reflective mask blank for EUV lithography
12/21/2010US7855035 in the second exposure, an exposure light is incident on a region where the inspection mark is projected in the first exposure
12/21/2010US7855034 Layer formed on face of substrate to reflect extreme ultraviolet light; absorbing mask pattern; and conductive layer pattern having elements spaced apart on a rear face used to fix substrate to an electrostatic chuck providing an electrostatic force; reflecting mask is horizontally fixed and flat
12/21/2010US7855033 photoresists with varying transmissive areas; halftones
12/16/2010US20100316942 Photomask making method
12/16/2010US20100316941 Solid-state imaging device producing method and exposure mask
12/16/2010US20100316940 Photomask for Forming Contact Hole in Semiconductor Device
12/16/2010US20100316939 Photolithography Monitoring Mark, Photolithography Mask Comprising An Exposure Monitoring Mark, And Phase Shift Mask Comprising An Exposure Monitoring Mark
12/16/2010US20100316938 Multi-chip reticle photomasks
12/16/2010US20100315611 Exposure method, exposure apparatus, photomask and method for manufacturing photomask
12/15/2010EP2261736A2 Method of manufacturing a photomask
12/15/2010EP1060441B1 Improved pattern generator
12/15/2010EP1060440B1 Pattern generator using euv
12/15/2010CN1940714B System and method for compensating selective optical graph
12/15/2010CN101916039A Manufacturing method of mask plate
12/15/2010CN101385123B Projection optical system, exposure device, exposure method, mask and display manufacturing method
12/15/2010CN101281376B Gantry type light shield cleaning device
12/15/2010CN101025564B Four-gradation photomask manufacturing method and photomask blank for use therein
12/14/2010US7851110 Secure photomask with blocking aperture
12/14/2010US7851109 A lithographic reticle pellicle comprising a membrane and a frame support of a first material having an elastic modulus between approximately 200MPa-10 GPa further and a second material having a higher elastic modulus material to confine deformation to the the first material upon aapplying stress
12/14/2010US7851108 Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
12/14/2010US7850009 Clean container having elastic positioning structure
12/14/2010US7849711 Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate
12/09/2010WO2010140223A1 Pressing body and pellicle sticking device
12/09/2010US20100311242 Methods for fabricating semiconductor devices
12/09/2010US20100311241 Three-state mask and method of manufacturing semiconductor device using the same
12/09/2010US20100311235 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
12/09/2010US20100310974 Method of fabricating photo mask for organic light emitting display and photo mask so fabricated
12/09/2010US20100310973 Pressure body and pellicle mounting apparatus
12/09/2010US20100310972 Performing double exposure photolithography using a single reticle
12/09/2010US20100310180 Pattern Inspection Method and Pattern Inspection System
12/09/2010US20100308377 Semiconductor integrated circuit
12/08/2010EP2257853A2 Method for processing an object with miniaturized structures
12/08/2010CN101910941A Mask blank, production method of mask blank and production method of mask
12/08/2010CN101910940A Spacer double patterning for lithography operations
12/08/2010CN101907821A Orthographic projection screen and manufacturing method thereof
12/08/2010CN101614920B Method for manufacturing liquid crystal display device
12/08/2010CN101546077B Pixel structure of thin film transistor-liquid crystal display and manufacturing method thereof
12/08/2010CN101313235B Color filter and photo mask used for manufacturing the same
12/08/2010CN101304026B Layout method for mask, semiconductor device and method for manufacturing the same
12/08/2010CN101183212B Optical tool and method for forming soldering-resistant pattern
12/08/2010CN101121348B Ink-jetting pattern transfer producing process and its device
12/07/2010US7848563 Method and apparatus for inspecting a defect of a pattern
12/07/2010US7847928 Inspection device and inspection method
12/07/2010US7847926 Defining a pattern on a substrate
12/07/2010US7847272 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system
12/07/2010US7846849 Frequency tripling using spacer mask having interposed regions
12/07/2010US7846647 Method of producing pattern-formed structure and photomask used in the same
12/07/2010US7846643 Method and system for providing a structure in a microelectronic device using a chromeless alternating phase shift mask
12/07/2010US7846625 Phase shift mask
12/07/2010US7846621 photomasks; extreme ultra violet lithography (EUVL); etch resistance
12/07/2010US7846620 Phase shift mask and method for manufacturing light-collecting device
12/07/2010US7846619 Hybrid photomask and method of fabricating the same
12/07/2010US7846618 Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same
12/07/2010US7846617 Pattern forming method and phase shift mask manufacturing method
12/07/2010US7846616 Lithography masks and methods
12/02/2010WO2010137857A2 Half tone mask and manufacturing method of the same
12/02/2010WO2010137856A2 Half tone mask and manufacturing method of the same
12/02/2010US20100304568 Pattern forming method
12/02/2010US20100304301 Negative resist composition and patterning process using the same
12/02/2010US20100304284 Thermally stable cationic photocurable compositions
12/02/2010US20100304283 Reflective mask blank for euv lithography
12/02/2010US20100304282 Method for finishing surface of preliminary polished glass substrate
12/02/2010US20100304281 Exposure mask and method for manufacturing same and method for manufacturing semiconductor device
12/02/2010US20100304280 Method of forming a template, and method of manufacturing a semiconductor device using the template
12/02/2010US20100304279 Manufacturing method of phase shift mask, creating method of mask data of phase shift mask, and manufacturing method of semiconductor device
12/02/2010US20100304278 Method for Fabricating a Phase Shift Mask Using a Binary Blank
12/02/2010US20100304277 Photomask for Extreme Ultraviolet Lithography and Method for Fabricating the Same
12/02/2010US20100304276 Mask and method for fabricating the same
12/02/2010US20100301457 Lithography Masks, Systems, and Manufacturing Methods
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