| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/18/2011 | US7871743 used for forming the source/drain layer (S/D layer) of a thin film transistor; comprising source mask, drain mask, and channel mask regions; light-blocking bars are arranged regularly in the channel mask region, and perpendicular to a center line of the channel mask region |
| 01/18/2011 | US7871742 Forming phase shift mask comprising a substrate and a patterned absorber layer and performing a first plasma treatment on the formed mask to reduce the phase angle; for semiconductor manufacture |
| 01/18/2011 | US7871211 Coating and developing system, coating and developing method and storage medium |
| 01/13/2011 | WO2011004850A1 Euv-lithography reflection-type mask blank |
| 01/13/2011 | WO2010085714A3 Pre-opc layout editing for improved image fidelity |
| 01/13/2011 | US20110006401 Method and system for combining photomasks to form semiconductor devices |
| 01/13/2011 | DE10164189B4 Halbton-Phasenverschiebungsmaske und -maskenrohling Halftone phase shift mask and -maskenrohling |
| 01/12/2011 | CN201707542U Novel cathode photolithography mask |
| 01/12/2011 | CN1910516B Computer-implemented methods for detecting defects in reticle design data |
| 01/12/2011 | CN1794085B Multi-transmission phase mask and exposure method using the same |
| 01/12/2011 | CN101946208A Optical component for euvl and smoothing method thereof |
| 01/12/2011 | CN101943855A Phase shift mask plate structure and manufacturing method thereof |
| 01/12/2011 | CN101943854A Design method of half-exposure region of half-gray-scale mask plate and manufacture method thereof |
| 01/12/2011 | CN101943853A Manufacture method of mask |
| 01/12/2011 | CN101458448B Optical close range correction and photo mask production method |
| 01/12/2011 | CN101354528B Mask and related photo-etching method |
| 01/12/2011 | CN101211103B Manufacturing method for photo mask |
| 01/11/2011 | US7870514 Method of designing a pattern |
| 01/11/2011 | US7868629 Proportional variable resistor structures to electrically measure mask misalignment |
| 01/11/2011 | US7868473 Wafer target design and method for determining centroid of wafer target |
| 01/11/2011 | US7867674 allows a desired resist pattern dimension to be attained after a photolithography sequence, so that a uniform resist pattern is formed on the surface of a substrate, independently of the precision level in the light exposure process |
| 01/11/2011 | US7867673 Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program |
| 01/11/2011 | US7867671 Photo-mask having phase and non-phase shifter parts for patterning an insulated gate transistor |
| 01/11/2011 | US7867337 Substrate processing method and substrate processing apparatus |
| 01/06/2011 | WO2011002967A1 Method for printing a material onto a substrate |
| 01/06/2011 | WO2011002806A1 Advanced photomask repair |
| 01/06/2011 | US20110003241 Resin, pigment dispersion, colored curable composition, color filter produced using the same, and method for producing the same |
| 01/06/2011 | US20110001974 Alignment apparatus and fabrication apparatus for planar member and alignment method and fabrication method for planar member |
| 01/06/2011 | US20110001955 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle |
| 01/06/2011 | CA2766589A1 Advanced photomask repair |
| 01/05/2011 | CN101937171A Method for building optical proximity correction model, optical proximity correction method and mask |
| 01/05/2011 | CN101937170A Method for manufacturing phase shift mask, method for manufacturing flat panel display, and phase shift mask |
| 01/05/2011 | CN101937169A Method for manufacturing photo mask blank, method for manufacturing photo mask, and coating apparatus |
| 01/05/2011 | CN101614924B Pixel structure, manufacturing method thereof and display panel |
| 01/05/2011 | CN101424882B Exposing device, pattern, channel, pore forming method, liquid crystal display and method for fabricating the same |
| 01/05/2011 | CN101355023B Manufacturing method of semiconductor device |
| 01/04/2011 | US7865865 Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process |
| 01/04/2011 | US7865863 OPC conflict identification and edge priority system |
| 01/04/2011 | US7864344 Method and system for measuring patterned structures |
| 01/04/2011 | US7864343 Method and system for measuring patterned structures |
| 01/04/2011 | US7864301 Source and mask optimization by changing intensity and shape of the illumination source |
| 01/04/2011 | US7864294 Focus sensitive lithographic apparatus, systems, and methods |
| 01/04/2011 | US7862966 computer programs; development; etching; photolithography; electronics |
| 01/04/2011 | US7862965 photoresists; Scanning Electron Microscope, Charge-Coupled Device camera, image analysis device |
| 01/04/2011 | US7862964 Methods for photo-processing photo-imageable material |
| 01/04/2011 | US7862963 photomasks; silicon oxynitride upper layer; reduces transmittance for inspecting light by increasing reflectance; for enhancing resolution of transfer patterns |
| 01/04/2011 | US7862961 photomasks; lithography; film protects mask, and film frame between holds film spaced away from surface; extreme ultraviolet radiation |
| 01/04/2011 | US7862960 Prevents occurrence of a transfer pattern defect by correcting a recessed defect existing on the surface of the transparent substrate to cause a reduction in transmission light quantity; crystal display device |
| 01/04/2011 | US7862959 For character-projection (CP) type of electron-beam exposure where a mask defect can be corrected or a pattern changed without making a new mask as part of or all the cells can be exchanged at the mask portion as the mask is made up of blocks of cells in polygon shape |
| 12/30/2010 | US20100333048 Method and apparatus for designing an integrated circuit |
| 12/30/2010 | US20100330502 High Aspect Ratio Microstructures |
| 12/30/2010 | US20100330470 Reflective mask blank for euv lithography and reflective mask for euv lithography |
| 12/30/2010 | US20100330469 Overlay Target for Polarized Light Lithography |
| 12/30/2010 | US20100330468 Halftone mask and manufacturing method thereof and method for forming film using the same |
| 12/30/2010 | US20100330467 Pellicle frame and lithographic pellicle |
| 12/30/2010 | US20100330466 Pellicle frame and lithographic pellicle |
| 12/30/2010 | US20100330465 Photomask For Forming A Line-Type Pattern And Method Of Fabricating The Pattern Using The Photomask |
| 12/30/2010 | US20100330464 Method of Correcting an Error in Phase Difference in a Phase Shift Mask |
| 12/30/2010 | US20100328641 Pellicle frame and lithographic pellicle |
| 12/30/2010 | US20100328635 Pellicle |
| 12/29/2010 | WO2010151087A2 Manufacturing method of half tone mask |
| 12/29/2010 | WO2010150355A1 Multilevel gradation photomask |
| 12/29/2010 | EP2267530A1 Method and apparatus for performing dark field double dipole lithography |
| 12/29/2010 | EP2267529A1 Pellicle |
| 12/29/2010 | EP2267528A2 Pellicle frame and lithographic pellicle |
| 12/29/2010 | EP2267527A2 Pellicle frame and lithographic pellicle |
| 12/29/2010 | EP2267526A2 Pellicle frame and lithographic pellicle |
| 12/29/2010 | CN201689278U Mesh film for mobile phone key-press fading process |
| 12/29/2010 | CN1930520B Method for supporting mask manufacture, method for providing mask blank and mask blank dealing system |
| 12/29/2010 | CN101930484A Method and system of placing printing assist feature for random mask layout |
| 12/29/2010 | CN101930167A Pellicle frame and lithographic pellicle |
| 12/29/2010 | CN101930166A Pellicle frame and lithographic pellicle |
| 12/29/2010 | CN101930165A Pellicle frame and lithographic pellicle |
| 12/29/2010 | CN101930164A Dustproof film component |
| 12/29/2010 | CN101930163A Pellicle |
| 12/29/2010 | CN101927877A Large precision member storage container |
| 12/29/2010 | CN101414117B Method for cleaning photo mask by wet method |
| 12/29/2010 | CN101174083B Protective film assembly container |
| 12/28/2010 | US7861209 Method for interlayer and yield based optical proximity correction |
| 12/28/2010 | US7860675 Pattern inspection apparatus, pattern inspection method, and pattern inspection program |
| 12/28/2010 | US7858450 Optic mask and manufacturing method of thin film transistor array panel using the same |
| 12/28/2010 | US7858273 Method of forming a mask design having advanced oriented assist features for integrated circuit hole patterns |
| 12/28/2010 | US7858272 photomasks; photoresists; semiconductors |
| 12/28/2010 | US7858271 Method of measuring dimension of pattern and method of forming pattern |
| 12/28/2010 | US7858270 Method for etching using a multi-layer mask |
| 12/28/2010 | US7858269 Structure and method for sub-resolution dummy clear shapes for improved gate dimensional control |
| 12/28/2010 | US7858268 Method for generating a circular periodic structure on a basic support material |
| 12/28/2010 | US7858010 patterns comprising moldings formed on the flexible substrates and adjustment markings having a refractive index, formed on the moldings |
| 12/23/2010 | WO2010148343A2 Methods and apparatus for simultaneously inspecting multiple array regions having different pitches |
| 12/23/2010 | WO2010147846A2 Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks |
| 12/23/2010 | WO2010147195A1 Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus |
| 12/23/2010 | WO2010147172A1 Mask blank, transfer mask, and method for manufacturing transfer masks |
| 12/23/2010 | WO2010146965A1 Photo mask, photolithography method, substrate production method and display panel production method |
| 12/23/2010 | US20100324865 Method and system for measuring patterned structures |
| 12/23/2010 | US20100323285 Photosensitive colored composition, color filter and method for producing the same |
| 12/23/2010 | US20100323284 Pigment-dispersed composition, curable composition, color filter and production method thereof |
| 12/23/2010 | US20100323283 Optical compensation devices, systems, and methods |
| 12/23/2010 | US20100323282 method of correcting a flare and computer program product |
| 12/23/2010 | US20100323281 Pellicle |
| 12/23/2010 | US20100323280 Mask for EUV Lithography and Method for Exposure Using the Same |