| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 02/16/2011 | CN101587291B Method of screen printing fine mask on silicon chip surface based on UV curing process |
| 02/15/2011 | US7890908 Method for verifying mask pattern data, method for manufacturing mask, mask pattern verification program, and method for manufacturing semiconductor device |
| 02/15/2011 | US7890203 Wiring forming system and wiring forming method for forming wiring on wiring board |
| 02/15/2011 | US7889411 System and method for calculating aerial image of a spatial light modulator |
| 02/15/2011 | US7887980 Sub-resolutional grayscale reticle |
| 02/15/2011 | US7887979 forming light blocking pattern and phase shift pattern on substrate, forming groove by etching exposed portion of substrate using light blocking and phase shift patterns as etch mask, forming mask, filling groove, exposing, forming mask pattern, reducing critical dimension of pattern, etching |
| 02/15/2011 | US7887978 generating test images of the mask under consideration and inspecting the images on the basis of wafer inspection techniques in order to identify repeatedly occurring defects; improving the efficiency in estimating the printability of photolithography masks such as reticles |
| 02/15/2011 | US7887977 Exposure mask, its manufacture method, pattern transfer method, pattern forming method, and SRAM manufacture method |
| 02/15/2011 | US7887663 Method for forming color filter, method for forming light emitting element layer, method for manufacturing color display device comprising them, or color display device |
| 02/10/2011 | WO2011015412A1 Object inspection systems and methods |
| 02/10/2011 | US20110033788 Charged particle beam drawing apparatus and method |
| 02/10/2011 | US20110033786 Pitch multiplication using self-assembling materials |
| 02/10/2011 | US20110033785 Method of fabricating integrated circuit using alternating phase-shift mask and phase-shift trim mask |
| 02/10/2011 | US20110033025 Apparatus for measuring aerial image of euv mask |
| 02/10/2011 | US20110032502 Polarization evaluation mask, exposure device, and polarization evaluation method |
| 02/10/2011 | US20110032499 Generating method, creating method, exposure method, and storage medium |
| 02/10/2011 | US20110030722 Cleaning water for electronic material, method for cleaning electronic material and system for supplying water containing dissolved gas |
| 02/10/2011 | DE102006022361B4 Verfahren zum mehrfachen Bestrahlen eines Resists Method for multiple irradiation of a resist |
| 02/09/2011 | CN1800970B Forming method of mask pattern |
| 02/09/2011 | CN101971336A Three-dimensional hexagonal matrix memory array and method of manufacturing the same |
| 02/09/2011 | CN101971092A 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof |
| 02/09/2011 | CN101971091A Method for processing an object with miniaturized structures |
| 02/09/2011 | CN101968941A Process for preparing anti-counterfeiting marks by using exposure method |
| 02/09/2011 | CN101968606A Masking film substrate and border adhesive solidification system |
| 02/09/2011 | CN101968605A Etching method and photomask blank processing method |
| 02/08/2011 | US7883837 Transparent electrically conductive film and process for producing the same |
| 02/08/2011 | US7883834 Method for forming pattern |
| 02/08/2011 | US7883823 Photomask and method for manufacturing a semiconductor device using the photomask |
| 02/08/2011 | US7883822 Graded lithographic mask |
| 02/03/2011 | WO2011013317A1 Method of creating template for matching, as well as device for creating template |
| 02/03/2011 | WO2011012265A1 Determination of the relative position of two structures |
| 02/03/2011 | US20110029938 Pattern creating method, computer program product, and method of manufacturing semiconductor device |
| 02/03/2011 | US20110029937 Pattern evaluating method, pattern generating method, and computer program product |
| 02/03/2011 | US20110028299 Tio2-containing silica glass for optical member for euv lithography |
| 02/03/2011 | US20110027703 Reflective mask blank, reflective mask, and method of manufacturing the same |
| 02/03/2011 | US20110027702 Hardcoat composition |
| 02/03/2011 | US20110027701 Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method |
| 02/03/2011 | US20110027700 Pellicle |
| 02/03/2011 | US20110027699 Reducing ion migration of absorber materials of lithography masks by chromium passivation |
| 02/03/2011 | US20110027698 Apparatus and method for repairing photo mask |
| 02/03/2011 | US20110026153 Color filter, method for producing the same, and solid-state imaging device |
| 02/03/2011 | US20110025891 Polymerizable compositions, color filters, production methods thereof, and solid-state imaging devices |
| 02/03/2011 | US20110024817 Flash memory device and mask for fabricating the same |
| 02/03/2011 | DE102009046878A1 Verringerung der lonenwanderung von Absorbermaterialien von Lithographiemasken durch Chrompassivierung Reduction of ionic migration of absorber materials lithography masks by chromium passivation |
| 02/02/2011 | EP2280307A1 Pellicle for photolithography |
| 02/02/2011 | EP2279453A1 Method of making a pillar pattern using triple or quadruple exposure |
| 02/02/2011 | CN1918513B Mask inspection apparatus and method |
| 02/02/2011 | CN101963762A Preparation device for synthesizing gene chip in situ |
| 02/02/2011 | CN101963753A Multi-color photomask and method of manufacturing the same, and pattern transfer method |
| 02/02/2011 | CN101963752A Manufacturing method of photomask |
| 02/02/2011 | CN101554758B Method for producing hot molding die with nano material modified PDMS |
| 02/02/2011 | CN101236360B Method and apparatus for inspecting defects on mask |
| 02/02/2011 | CN101111802B Macrotype light shield protective film accepting container |
| 02/02/2011 | CN101105637B System and method for using a two part cover for protecting a reticle |
| 02/01/2011 | US7881520 Defect inspection system |
| 02/01/2011 | US7879729 Method of forming a micro pattern of a semiconductor device |
| 02/01/2011 | US7879537 Double patterning is achieved with a single reticle while maintaining the integrity of in-scribe patterns and without blading the reticle; using a blank to prevent the target region from being exposed more than once; semiconductors |
| 02/01/2011 | US7879535 Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material |
| 02/01/2011 | US7879532 Method of manufacturing semiconductor device |
| 02/01/2011 | US7879524 Heat sensitive transfer image receiver sheet and heat sensitive transfer sheet on support; dye receiver layer; heat insulation layer containing hollow polymer particles and hydrophilic polymer |
| 02/01/2011 | US7879514 Lithographic method and patterning device |
| 02/01/2011 | US7879513 Decreasing error of line width on coarse/dense pattern; adjusting numerical aperture and/or coherence factor |
| 02/01/2011 | US7879512 Photomask, manufacturing method thereof, and electronic device manufacturing method |
| 02/01/2011 | US7879511 first and third portions are translucent to light, and second portion is opaque; for production of multi-boundary polycrystalline silicon |
| 02/01/2011 | US7879510 Method for quartz photomask plasma etching |
| 01/27/2011 | US20110020956 Method of measuring pattern shape, method of manufacturing semiconductor device, and process control system |
| 01/27/2011 | US20110020738 Metal phthalocyanine dye mixture, curable composition, color filter, and method for producing color filter |
| 01/27/2011 | US20110020737 Reflection-type exposure mask and method of manufacturing a semiconductor device |
| 01/27/2011 | US20110020736 Method of producing holographic images of ic topologies |
| 01/27/2011 | US20110019200 Apparatus for visual inspection |
| 01/27/2011 | US20110018879 Pattern generation method and pattern generation program |
| 01/26/2011 | EP2278395A1 Reflective-type mask blank for EUV lithography |
| 01/26/2011 | EP2278394A1 Reflective-type mask blank for EUV lithography |
| 01/26/2011 | EP2277084A1 Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in opc model space |
| 01/26/2011 | CN1975568B Pattern forming method using photomask |
| 01/26/2011 | CN101957557A System and method for evaluating error sources |
| 01/26/2011 | CN101957556A Mask picture modification method, mask manufacturing method and optical proximity correction method |
| 01/26/2011 | CN101957555A Mask picture modification method, mask manufacturing method and optical proximity correction method |
| 01/26/2011 | CN101957554A Method for removing protective film glue on photomask |
| 01/26/2011 | CN101256551B Method and system for detecting photo mask, computer readable storage medium |
| 01/25/2011 | US7876952 Removal of relatively unimportant shapes from a set of shapes |
| 01/25/2011 | US7875409 Method of manufacturing semiconductor device, mask and semiconductor device |
| 01/25/2011 | US7875406 photomasks; photolithography; semiconductors; integrated circuits |
| 01/25/2011 | US7875198 Method of deriving etching correction values for patterns of photomask and method of fabricating photomask |
| 01/25/2011 | CA2401187C Substrate having character/symbol section and processing method of character/symbol section |
| 01/20/2011 | WO2011007800A1 Mask blank and transfer mask |
| 01/20/2011 | WO2011007523A1 Pellicle frame and pellicle containing same |
| 01/20/2011 | US20110016437 Method and apparatus for measuring of masks for the photo-lithography |
| 01/20/2011 | US20110014577 Pellicle inspection device, exposure apparatus using same, and device manufacturing method |
| 01/20/2011 | US20110014554 Colored curable composition, color filter, and method for producing color filter |
| 01/20/2011 | US20110014553 Semiconductor device with a bulb-type recess gate |
| 01/20/2011 | US20110014552 Method and Apparatus for Performing Dark Field Double Dipole Lithography (DDL) |
| 01/20/2011 | US20110014551 Reticle and manufacturing method of solid-state image sensor |
| 01/19/2011 | EP2275870A1 Method of manufacturing cylinder-shaped flexographic plates using digital images |
| 01/19/2011 | CN1912739B Light exposure mask and method for manufacturing semiconductor device using the same |
| 01/19/2011 | CN101950125A Method of manufacturing a photomask |
| 01/19/2011 | CN101442028B Method for manufacturing planar display |
| 01/19/2011 | CN101082781B Tracing system and method, exposure parameter calculating device and method, substrate manufacturing method |
| 01/18/2011 | US7873937 System and method for lithography simulation |
| 01/18/2011 | US7871761 Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern |