| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/15/2011 | US7906058 Bifurcated contact printing technique |
| 03/10/2011 | WO2011027972A2 Laser-reflective mask and method for manufacturing same |
| 03/10/2011 | WO2011027647A1 Method for manufacturing half-tone mask, and half-tone mask |
| 03/10/2011 | US20110059606 Method of manufacturing semiconductor device and mask |
| 03/10/2011 | US20110059402 Exposure method |
| 03/10/2011 | US20110059391 Reflective mask, reflective mask blank and method of manufacturing reflective mask |
| 03/10/2011 | US20110059390 Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask |
| 03/10/2011 | US20110057333 Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in opc model space |
| 03/10/2011 | DE112009001219T5 Überprüfungs- und Modifikationsverfahren von Regeln von nicht-zu-untersuchenden Bereichen, Computerprogramm und Vorrichtung für eine derartige Überprüfung und Modifikation Review and modification of rules of procedure not-to-be investigated areas, computer program and device for such a review and modification |
| 03/10/2011 | DE112009000965T5 Reflektive Maske, reflektiver Maskenrohling und Verfahren zum Herstellen einer reflektiven Maske Reflective mask, reflective mask blank and method for producing a reflective mask |
| 03/10/2011 | DE102007007696B4 Halbleiterbauelement und Verfahren zum Herstellen eines Halbleiterbauelements A semiconductor device and method of manufacturing a semiconductor device |
| 03/10/2011 | DE102006043895B4 Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen Electron microscope for inspecting and editing of an object with miniaturized structures |
| 03/09/2011 | EP1395877B1 Lithographic method of manufacturing a device |
| 03/09/2011 | CN1904726B Method for producing optical shield pattern |
| 03/09/2011 | CN101176039B Making a relief image using a removable film |
| 03/08/2011 | US7904851 Photomask manufacturing method and semiconductor device manufacturing method |
| 03/08/2011 | US7901872 Exposure process and photomask set used therein |
| 03/08/2011 | US7901864 Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition |
| 03/08/2011 | US7901853 Pattern prediction method, pattern correction method, semiconductor device, and recording medium |
| 03/08/2011 | US7901849 Photomask and method of fabricating the same |
| 03/08/2011 | US7901848 Method of fabricating a photomask using self assembly molecule |
| 03/08/2011 | US7901847 Use of soft adhesive to attach pellicle to reticle |
| 03/08/2011 | US7901846 Pellicle and method for manufacturing the same |
| 03/08/2011 | US7901844 Method with correction of hard mask pattern critical dimension for fabricating photomask |
| 03/08/2011 | US7901843 Process for smoothing surface of glass substrate |
| 03/08/2011 | US7901842 Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor device |
| 03/08/2011 | US7901841 Soft pressure sensitive adhesive absorbs irregularity of frame; dust protection without affecting flatness of photomask |
| 03/08/2011 | US7901840 Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method |
| 03/03/2011 | WO2011026055A2 Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability |
| 03/03/2011 | WO2011025795A1 Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur |
| 03/03/2011 | WO2010137857A3 Half tone mask and manufacturing method of the same |
| 03/03/2011 | WO2010137856A3 Half tone mask and manufacturing method of the same |
| 03/03/2011 | WO2010065094A3 Flexographic element and method of imaging |
| 03/03/2011 | US20110055776 Method of designing semiconductor device |
| 03/03/2011 | US20110053323 Photomask and method for fabricating source/drain electrode of thin film transistor |
| 03/03/2011 | US20110053093 Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur |
| 03/03/2011 | US20110053059 Mask blanks |
| 03/03/2011 | US20110053058 Semiconductor device fabrication mask and method of manufacturing the same |
| 03/03/2011 | US20110053057 Mask blank, transfer mask, and methods of manufacturing the same |
| 03/03/2011 | US20110053056 Method for Fracturing and Forming a Pattern Using Curvilinear Characters with Charged Particle Beam Lithography |
| 03/03/2011 | US20110051131 Inspection device and inspection method |
| 03/03/2011 | US20110051130 Foreign substance inspection apparatus, exposure apparatus, and method of manufacturing device |
| 03/03/2011 | US20110049601 Semiconductor device and method of manufacturing the same |
| 03/03/2011 | US20110049362 Pattern measuring apparatus and pattern measuring method |
| 03/02/2011 | EP1472575B1 Radiation patterning tools, and methods of forming radiation patterning tools |
| 03/02/2011 | EP1321820B1 Halftone phase shift photomask and blank for halftone phase shift photomask |
| 03/02/2011 | CN1892440B Focus determination method, device manufacturing method, and mask |
| 03/01/2011 | US7898698 Method and device for creating print data, program for creating print data, and computer-readable recording medium containing the program |
| 03/01/2011 | US7898650 Inspection method for transparent article |
| 03/01/2011 | US7897324 Lithographic method |
| 03/01/2011 | US7897319 Positive resist composition and method of forming resist pattern |
| 03/01/2011 | US7897302 Error diffusion-derived sub-resolutional grayscale reticle |
| 03/01/2011 | US7897301 Fine pattern forming method and stamper |
| 03/01/2011 | US7897300 Gray scale mask |
| 03/01/2011 | US7897299 Phase-shift mask and method of forming the same |
| 03/01/2011 | US7897298 Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method |
| 03/01/2011 | US7897297 Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask |
| 02/24/2011 | WO2011022703A1 Method and system for manufacturing a surface using character projection lithography with variable magnification |
| 02/24/2011 | WO2010148343A3 Methods and apparatus for simultaneously inspecting multiple array regions having different pitches |
| 02/24/2011 | WO2010134774A3 Half tone mask and manufacturing method of the same |
| 02/24/2011 | US20110047518 Pattern determining method |
| 02/24/2011 | US20110045389 Method to Recover the Exposure Sensitivity of Chemically Amplified Resins from Post Coat Delay Effect |
| 02/24/2011 | US20110045388 Masks for microlithography and methods of making and using such masks |
| 02/24/2011 | US20110045387 Method of Forming a Relief Pattern by E-Beam Lithography Using Chemical Amplification, and Derived Articles |
| 02/24/2011 | US20110044529 Inspection system and inspection method |
| 02/24/2011 | US20110044528 Inspection system |
| 02/24/2011 | US20110043811 Mask defect measurement method, mask quality determination method, and manufacturing method of semiconductor device |
| 02/24/2011 | US20110043780 Lithographic apparatus and device manufacturing method |
| 02/24/2011 | DE112008003774T5 Strukturmessgerät und Strukturmessverfahren Structure gauge and structure measurement method |
| 02/23/2011 | EP2287664A1 Solid inks for printed masks |
| 02/23/2011 | CN101981512A Alignment device for planar element, manufacturing equipment for the same, alignment method for the same, and manufacturing method for the same |
| 02/23/2011 | CN101241300B Method, computer readable medium, device manufacture method and mask for performing decomposition of a pattern |
| 02/22/2011 | US7895541 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 02/22/2011 | US7894051 Reticle defect inspection apparatus and reticle defect inspection method |
| 02/22/2011 | US7894023 Method of producing fine particles of anthraquinone structure-containing pigment, fine particles of anthraquinone structure-containing pigment produced thereby, colored pigment dispersion composition therewith, colored photosensitive resin composition therewith and photosensitive resin transfer material therewith, and color filter and liquid crystal display device using the same |
| 02/22/2011 | US7892952 Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment |
| 02/22/2011 | US7892722 Pattern forming method |
| 02/22/2011 | US7892708 Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method |
| 02/22/2011 | US7892707 Scattering bar OPC application method for sub-half wavelength lithography patterning |
| 02/22/2011 | US7892706 Sub-wavelength diffractive elements to reduce corner rounding |
| 02/22/2011 | US7892705 Photomask and method of making thereof |
| 02/22/2011 | US7892703 CPL mask and a method and program product for generating the same |
| 02/17/2011 | WO2010134779A3 Half tone mask having multi half permeation part and manufacturing method of the same |
| 02/17/2011 | US20110041104 Semiconductor circuit pattern design method for manufacturing semiconductor device or liquid crystal display device |
| 02/17/2011 | US20110039195 Photosensitive transparent resin composition, production method of color filter, and color filter |
| 02/17/2011 | US20110039194 Solid inks for masks for printed circuit boards and other electronic devices |
| 02/17/2011 | US20110039193 Solid inks for printed masks |
| 02/17/2011 | DE102004040764B4 Verfahren zum Korrigieren von Verletzungen von Maskenregeln nach optischer Nachbarschaftskorrektur A method for correcting violations of rules after optical proximity correction mask |
| 02/17/2011 | DE102004026206B4 Belichtungsmaskensubstrat-Herstellungsverfahren und Belichtungsmasken-Herstellungsverfahren Exposure mask substrate manufacturing method, and exposure mask manufacturing method |
| 02/16/2011 | EP2284609A2 Method for preparing a composite printing form |
| 02/16/2011 | EP2283396A1 Multilayer mirror and lithographic apparatus |
| 02/16/2011 | EP2283310A1 Method and apparatus for overlay compensation between subsequently patterned layers on workpiece |
| 02/16/2011 | EP2282977A1 Tio2-containing silica glass for optical member for euv lithography |
| 02/16/2011 | EP1730596B1 Projection objective and projection exposure apparatus |
| 02/16/2011 | CN201749291U Lithography system and shielding group for patterned integrated circuit layer |
| 02/16/2011 | CN1776524B Method of descaling a mask |
| 02/16/2011 | CN1763632B Photomask blank, photomask and fabrication method thereof |
| 02/16/2011 | CN101978468A Reflective mask blank for EUV lithography |
| 02/16/2011 | CN101976018A Photo-mask and manufacturing method thereof |
| 02/16/2011 | CN101976017A Differential hierarchical processing method for optical proximity correction |