| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 03/30/2011 | CN201780452U Cleaning device for cleaning graphic region on master plate of exposure equipment |
| 03/30/2011 | CN1800972B Phase-shift mask for manufacturing semiconductor device |
| 03/30/2011 | CN101995764A Dustproof thin film assembly accepting container |
| 03/30/2011 | CN101995763A Optical proximity correction method |
| 03/30/2011 | CN101995762A Mask and preparation method thereof |
| 03/30/2011 | CN101995408A 检查方法和设备 Inspection method and apparatus |
| 03/30/2011 | CN101539719B Manufacturing method of vibration amplitude mask template used for manufacturing sampling fiber grating |
| 03/30/2011 | CN101461031B Temperature control method for photolithographic substrate |
| 03/30/2011 | CN101305323B Methods and systems for pattern generation based on multiple forms of design data |
| 03/30/2011 | CN101271268B Method and system for optimizing lithography focus and/or energy |
| 03/30/2011 | CN101144974B Photomask having self-masking layer and methods of etching same |
| 03/30/2011 | CN101144971B Phase shifting photomask and a method of fabricating thereof |
| 03/29/2011 | US7917871 Method and program for pattern data generation using a modification guide |
| 03/29/2011 | US7915171 Double patterning techniques and structures |
| 03/29/2011 | US7914971 Light exposure mask and method for manufacturing semiconductor device using the same |
| 03/29/2011 | US7914957 Production method for color filter |
| 03/29/2011 | US7914955 Masks, lithography device and semiconductor component |
| 03/29/2011 | US7914953 Photomask and pattern formation method using the same |
| 03/29/2011 | US7914952 Lithographic pellicle |
| 03/29/2011 | US7914951 Method of correcting pattern critical dimension of photomask |
| 03/29/2011 | US7914950 Method and resulting structure for mosaic of multi-transmission rate optical mask structures |
| 03/29/2011 | US7914949 Method for testing a photomask |
| 03/24/2011 | WO2011034728A2 Laser ablation tooling via distributed patterned masks |
| 03/24/2011 | US20110072402 Photomask designing method and photomask designing program |
| 03/24/2011 | US20110071783 Verification and modification method of rules of do-not-inspect regions, computer program, and apparatus for such verification and modification |
| 03/24/2011 | US20110070534 Reflective mask blank for euv lithography |
| 03/24/2011 | US20110070533 Photomask blank, photomask , and method for manufacturing photomask blank |
| 03/24/2011 | US20110070532 Color filter manufacturing method, patterned substrate manufacturing method, and small photomask |
| 03/24/2011 | US20110070531 Photomask designing method, photomask manufacturing method, and photomask designing program |
| 03/24/2011 | US20110069895 Defect inspection system |
| 03/24/2011 | US20110068281 Charged particle beam drawing apparatus and proximity effect correction method thereof |
| 03/24/2011 | US20110067630 Mask assembly, deposition apparatus for flat panel displays including the same, and associated methods |
| 03/24/2011 | DE102009041405A1 Maskeninspektionsmikroskop mit variabler Beleuchtungseinstellung Mask inspection microscope with variable illumination setting |
| 03/24/2011 | DE10144893B4 Phasenverschiebungsmaskenvorform, Phasenverschiebungsmaske und Verfahren zu ihrer Herstellung Phase shift mask blank, the phase shift mask and process for their preparation |
| 03/23/2011 | EP2297609A1 Method and apparatus for determining the effect of process variations |
| 03/23/2011 | EP1269264B1 Method of analyzing a wafer manufacturing process |
| 03/23/2011 | CN201773262U Optical enclosure cleaning and drying device |
| 03/23/2011 | CN101989047A Method for detecting pattern topography of maskplate by dual exposure method |
| 03/23/2011 | CN101989046A Pattern transfer method and mask manufacturing method |
| 03/23/2011 | CN101989043A Multi-gray scale photomask, photomask blank, method of manufacturing multi-gray scale photomask and pattern transfer method |
| 03/23/2011 | CN101989042A Method of manufacturing multi-gray scale photomask and pattern transfer method |
| 03/23/2011 | CN101989041A Method for increasing two-dimensional pattern resolution |
| 03/23/2011 | CN101989040A Mask layout correction method, mask layout and mask manufacturing method |
| 03/23/2011 | CN101989039A Method for fabricating photomask |
| 03/23/2011 | CN101989038A Mask detection device and detection method |
| 03/23/2011 | CN101989037A Method for reducing foggy defect of sediment on photomask |
| 03/23/2011 | CN101989036A Repairing method of shielding layer residue of phase shifting mask |
| 03/23/2011 | CN101989035A Method for removing chromium metal film from photographic mask |
| 03/23/2011 | CN101625492B Manufacturing method of array base plate of film transistor |
| 03/23/2011 | CN101576708B Method of photolithographic patterning |
| 03/23/2011 | CN101556429B Cleaning method for controlling reticle CD value |
| 03/23/2011 | CN101408723B Light shield capable of improving yield |
| 03/23/2011 | CN101329506B Optical close distance correcting method, photo mask making method and graphic method |
| 03/23/2011 | CN101315514B Mask plate and matching method of photo-etching machine nesting precision using mask plate |
| 03/23/2011 | CN101311822B Optical close distance correction method |
| 03/23/2011 | CN101295705B Test substrate, test substrate mask and test substrate forming method |
| 03/23/2011 | CN101241302B Preparation method for improving mask critical size trend |
| 03/23/2011 | CN101228527B Manufacturing aware design and design aware manufacturing for IC |
| 03/23/2011 | CN101201539B Pattern mask for forming microlens, image sensor and fabricating method thereof |
| 03/23/2011 | CN101144976B Photoetching system mask proximity effect correction method |
| 03/22/2011 | US7913197 Method for double patterning lithography |
| 03/22/2011 | US7912275 Method of evaluating a photo mask and method of manufacturing a semiconductor device |
| 03/22/2011 | US7911624 Device and method for the interferometric measurement of phase masks |
| 03/22/2011 | US7911600 Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuits |
| 03/22/2011 | US7911599 Reticle defect inspection apparatus and reticle defect inspection method |
| 03/22/2011 | US7911588 Exposure apparatus and original |
| 03/22/2011 | US7910288 Mask material conversion |
| 03/22/2011 | US7910270 Reticle constructions |
| 03/22/2011 | US7910269 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same |
| 03/22/2011 | US7910268 Method for fabricating fine pattern in photomask |
| 03/22/2011 | US7910267 Method and system for providing optical proximity correction for structures such as a PMR nose |
| 03/22/2011 | US7910266 Pattern forming method and mask |
| 03/22/2011 | US7910265 Reticle for use in a semiconductor lithographic system and method for modifying the same |
| 03/22/2011 | US7910264 Reflective mask blank for exposure, reflective mask for exposure, method of producing a semiconductor device, and substrate provided with multilayer reflective film |
| 03/17/2011 | WO2011030521A1 Method for manufacturing mask blank, method for manufacturing mask for transfer, and method for manufacturing reflective mask |
| 03/17/2011 | WO2011029535A2 Mask inspection microscope with variable illumination setting |
| 03/17/2011 | WO2010147846A3 Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks |
| 03/17/2011 | US20110065030 Mask pattern determining method, mask manufacturing method, and device manufacturing method |
| 03/17/2011 | US20110065029 Method of manufacturing mask structure |
| 03/17/2011 | US20110065028 Pattern generating method, manufacturing method of mask, and manufacturing method of semiconductor device |
| 03/17/2011 | US20110065027 Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor device |
| 03/17/2011 | DE112005002263B4 Kalibrierung von optischen Linienverkürzungsmessungen Calibration of optical line shortening measurements |
| 03/16/2011 | EP2296041A2 Lithographic systems and methods with extended depth of focus |
| 03/16/2011 | EP2296038A1 Mask defect testing apparatus |
| 03/16/2011 | EP1358623B1 Method and apparatus for inspecting a substrate |
| 03/16/2011 | EP1299771B1 Method of designing a phase shift masking for complex patterns |
| 03/16/2011 | CN201765432U Improved cathode photolithography mask |
| 03/16/2011 | CN101986206A Method for utilizing functional mask board to manufacture mask substrate for solidifying sealing glue |
| 03/16/2011 | CN101986205A Pellicle |
| 03/15/2011 | US7907771 Pattern data processing system, pattern data processing method, and pattern data processing program |
| 03/15/2011 | US7907270 Inspection apparatus and method, and production method for pattern substrates |
| 03/15/2011 | US7906350 Method for calibrating a metrology tool |
| 03/15/2011 | US7906259 Reflective mask blank for EUV lithography |
| 03/15/2011 | US7906258 Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device |
| 03/15/2011 | US7906257 Photomask manufacturing method and semiconductor device manufacturing method |
| 03/15/2011 | US7906256 Remove light-shielding film from used substrate; sand blast; repolish to regenerate glass stock; apply light-shielding film to stock to yield a regenerated photomask-forming blank; process blank into a pattern; photomask substrates on the array side or color filter side of TFT liquid crystal panels |
| 03/15/2011 | US7906255 Photo-masks and methods of fabricating periodic optical structures |
| 03/15/2011 | US7906254 Method and process for design of integrated circuits using regular geometry patterns to obtain geometrically consistent component features |
| 03/15/2011 | US7906253 System and method for making photomasks |
| 03/15/2011 | US7906252 Multiple resist layer phase shift mask (PSM) blank and PSM formation method |