| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/26/2011 | US7934173 Reverse dummy insertion algorithm |
| 04/26/2011 | US7933186 Method for manufacturing optical disk master, method for manufacturing optical disk, and apparatus for manufacturing optical disk master |
| 04/26/2011 | US7932003 Methods of forming and using reticles |
| 04/26/2011 | US7932002 Reflection-type mask and method of making the reflection-type mask |
| 04/26/2011 | US7932001 Method of fabricating halftone phase shift mask |
| 04/21/2011 | WO2011046989A1 Generalization of shot definitions for mask and wafer patterning tools |
| 04/21/2011 | WO2011046075A1 Method for producing transfer mask and method for manufacturing semiconductor device |
| 04/21/2011 | WO2011046073A1 Transfer mask, method for producing transfer mask, and method for manufacturing semiconductor device |
| 04/21/2011 | WO2011045132A1 Method, inspection apparatus and substrate for determining an approximate structure of an object on the substrate |
| 04/21/2011 | WO2011045125A1 Inspection method and apparatus |
| 04/21/2011 | US20110091819 Method for forming pattern |
| 04/21/2011 | US20110091797 Superimpose photomask and method of patterning |
| 04/21/2011 | US20110091099 Review apparatus and inspection system |
| 04/20/2011 | EP2312392A2 Photomask blank and photomask |
| 04/20/2011 | EP1718474B1 Combined ablation and exposure system and method |
| 04/20/2011 | CN1924868B Method for narrowing integrated circuit chip area |
| 04/20/2011 | CN102027418A Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in OPC model space |
| 04/20/2011 | CN102023492A Charged particle beam drawing apparatus and proximity effect correction method thereof |
| 04/20/2011 | CN102023473A Method for improving critical dimension uniformity of mask |
| 04/20/2011 | CN102023472A Method for detecting photomask and method for reducing rework rate of semiconductor products by using photomask |
| 04/20/2011 | CN101546112B Method for replacing mask |
| 04/20/2011 | CN101482696B Setting method for photo-etching system NA-sigma |
| 04/20/2011 | CN101452221B Methods and system for lithography process window simulation |
| 04/20/2011 | CN101452205B Dispersion strip forming method |
| 04/20/2011 | CN101338416B Shading member, manufacturing method thereof, film and photo mask using the member |
| 04/20/2011 | CN101286013B Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method |
| 04/19/2011 | US7928580 Semiconductor memory device having wiring with lead portions disposed with a pitch larger than pitch of parallel bit lines |
| 04/19/2011 | US7927969 Cleaning of photolithography masks |
| 04/19/2011 | US7927782 Simplified double mask patterning system |
| 04/19/2011 | US7927773 Memory medium storing original data generation program, memory medium storing illumination condition determination program, original data generation method, illumination condition determination method, and device manufacturing method |
| 04/19/2011 | US7927771 Color filter and fabrication method thereof |
| 04/19/2011 | US7927770 Defect correction method for EUV mask |
| 04/19/2011 | US7927769 Method for fabricating EUVL mask |
| 04/19/2011 | US7927766 Pre-alignment marking and inspection to improve mask substrate defect tolerance |
| 04/19/2011 | US7927765 Adjustable mask blank structure for an EUV phase-shift mask |
| 04/19/2011 | US7927764 an optical proximity correction being applied only to the first mask opening, exposing the photoresist using a second mask pattern including a third mask opening and a fourth mask opening, an optical proximity correction being applied only to the fourth mask opening |
| 04/19/2011 | US7927763 Pellicle for photolithography and pellicle frame |
| 04/14/2011 | WO2011044361A1 An optical imaging writer system |
| 04/14/2011 | WO2011043071A1 Pellicle and mask adhesive therefor |
| 04/14/2011 | WO2011042329A1 Photolithography mask set and masking method |
| 04/14/2011 | WO2010151087A3 Manufacturing method of half tone mask |
| 04/14/2011 | US20110086515 Mask pattern verification apparatus, mask pattern verification method and method of fabricating a semiconductor device |
| 04/14/2011 | US20110086511 Photomask having a reduced field size and method of using the same |
| 04/14/2011 | US20110086314 Melts |
| 04/14/2011 | US20110086297 Programmable Self-Aligning Liquid Magnetic Nanoparticle Masks and Methods for Their Use |
| 04/14/2011 | US20110086296 Phase shift masks |
| 04/14/2011 | US20110085097 Mask for photoaligning an alignement layer, photoalignment method using the same, and liquid crystal display having the photoaligned alignement layer |
| 04/14/2011 | DE10307518B4 Halbtonphasenschiebermaskenrohling, Halbtonphasenschiebermaske und Verfahren zu deren Herstellung Halftone phase shift mask, halftone phase shift mask and process for their preparation |
| 04/14/2011 | DE10144894B4 Verfahren zur Herstellung einer Phasenverschiebungsmaskenvorform und Verfahren zur Herstellung einer Phasenverschiebungsmaske A method of manufacturing a phase shift mask blank and process for producing a phase shifting mask |
| 04/13/2011 | EP2309533A1 Endpoint detection for photomask etching |
| 04/13/2011 | CN1869811B Reflection mask for EUV photolithography and method of fabricating the reflection mask |
| 04/13/2011 | CN1845007B Substrate and a method for polishing a substrate |
| 04/13/2011 | CN1740909B Optical mask and producing method thereof |
| 04/13/2011 | CN102016717A Reflective mask blank for EUV lithography, and reflective mask for EUV lithography |
| 04/13/2011 | CN102012631A Detection method of mask plate |
| 04/13/2011 | CN101447000B Automatic layout method and device of photomask framework |
| 04/13/2011 | CN101441405B Protective film component, accommodating container for accommodating protective film component and accommodating method |
| 04/13/2011 | CN101369524B Manufacturing method for semiconductor device |
| 04/13/2011 | CN101276141B Method and apparatus for performing model-based OPC for pattern decomposed feature |
| 04/13/2011 | CN101158805B System and method for partitioned dummy fill shapes for reduced mask bias |
| 04/13/2011 | CN101154560B Substrate processing apparatus and substrate processing method |
| 04/12/2011 | US7926010 Method of determining defects in photomask |
| 04/12/2011 | US7926004 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| 04/12/2011 | US7926003 Method for manufacturing a photomask |
| 04/12/2011 | US7926001 Uniformity for semiconductor patterning operations |
| 04/12/2011 | US7923702 System and method for processing an object |
| 04/12/2011 | US7923699 Tracking control method and electron beam writing system |
| 04/12/2011 | US7923192 Base material for pattern-forming material, positive resist composition and method of resist pattern formation |
| 04/12/2011 | US7923181 Methods of forming photomasks |
| 04/12/2011 | US7923180 Cross technology reticles |
| 04/12/2011 | US7923179 Exposure mask and pattern forming method therefor |
| 04/12/2011 | US7923178 Glass substrate for mask blank and method of polishing for producing the same |
| 04/12/2011 | US7923177 Method for making a reflection lithographic mask and mask obtained by said method |
| 04/12/2011 | US7923176 Mask and method of manufacturing the same |
| 04/12/2011 | US7923175 Photomask structure |
| 04/07/2011 | US20110081605 Photomask blank and method for manufacturing the same |
| 04/07/2011 | US20110081604 Pellicle for lithography and a method for making the same |
| 04/07/2011 | US20110081603 Pellicle |
| 04/06/2011 | EP2306241A2 Pellicle |
| 04/06/2011 | EP2306240A2 A pellicle for lithography and a method for making the same |
| 04/06/2011 | CN1790162B Method of forming pattern having step difference and method of making thin film transistor and liquid crystal display using the same |
| 04/06/2011 | CN102007579A Cleaning water for electronic material, method for cleaning electronic material and system for supplying water containing dissolved gas |
| 04/06/2011 | CN101387825B Compensation gray level mask plate structure |
| 04/06/2011 | CN101276783B Method for manufacturing semiconductor integrated circuit device |
| 04/06/2011 | CN101211104B Method for manufacturing photomask and phase shift mask |
| 04/05/2011 | US7921385 Mask-pattern determination using topology types |
| 04/05/2011 | US7919231 Photolithographic method and mask devices utilized for multiple exposures in the field of a feature |
| 04/05/2011 | US7919228 Photoresist patterns are formed between photomask patterns using a self-aligned method employing a negative type photoresist; forming micro photomask patterns |
| 04/05/2011 | US7919217 Pellicle and method for producing pellicle |
| 04/05/2011 | US7919216 Mask and design method thereof |
| 03/31/2011 | WO2011035946A1 Time differential reticle inspection |
| 03/31/2011 | WO2010117626A3 Lithography modelling and applications |
| 03/31/2011 | US20110076600 Method For Manufacturing Parallax Barrier And Method For Manufacturing Photomask |
| 03/31/2011 | US20110076599 Apparatus and method for aligning mask |
| 03/31/2011 | US20110075124 Source and Mask Optimization By Changing Intensity and Shape of the Illumination Source |
| 03/31/2011 | US20110074049 Method of manufacturing semiconductor device, mask and semiconductor device |
| 03/30/2011 | EP2302659A2 Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography |
| 03/30/2011 | EP2302453A2 Photomask blank and photomask |
| 03/30/2011 | EP2302452A2 Photomask blank and photomask |
| 03/30/2011 | EP1811335B1 Method for producing a photomask |