G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
05/2011
05/18/2011	CN102063011A Laser mask and sequential lateral solidification crystallization method using the same
05/18/2011	CN102063010A Optical proximity correction method
05/18/2011	CN102060432A Titania and sulfur co-doped quartz glass member and making method
05/18/2011	CN101399244B Circuit structure, photo mask for defining the circuit structure
05/18/2011	CN101344717B Light shield repair glue
05/18/2011	CN101135840B Method of forming a mask structure and method of forming a minute pattern using the same
05/18/2011	CN101118379B Microlenses of cmos image sensor and method for fabricating the same
05/17/2011	US7945871 Integrated OPC verification tool
05/17/2011	US7945869 Mask and method for patterning a semiconductor wafer
05/17/2011	US7944063 Application of 2-dimensional photonic crystals in alignment devices
05/17/2011	US7943274 Mask pattern correction and layout method
05/17/2011	US7943273 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
05/17/2011	US7942976 Substrate processing apparatus and substrate processing method
05/12/2011	WO2011056903A1 Compositions and methods for generating conductive films and coatings of oligomers
05/12/2011	WO2011055758A1 Focus test mask, focus measuring method, exposure apparatus, and exposure method
05/12/2011	US20110111333 Heat-resistant flexible color filter
05/12/2011	US20110111332 Phase shift mask blank and phase shift mask
05/12/2011	US20110111331 Metal optical grayscale mask and manufacturing method thereof
05/12/2011	US20110111330 Method of creating photolithographic masks for semiconductor device features with reduced design rule violations
05/11/2011	EP2132556B1 Device for sorting and concentrating electromagnetic energy and apparatus comprising at least one such device
05/11/2011	CN102054092A Pattern selection for full-chip source and mask optimization
05/11/2011	CN102053503A Determination method
05/11/2011	CN102053485A Photoetching method
05/11/2011	CN102053484A Dustproof film assembly
05/11/2011	CN102053483A Dustproof film assembly and framework thereof
05/11/2011	CN102053482A Peeling jig of dust-proof film assembly and peeling method
05/11/2011	CN102053481A Method for repairing damaged graphics
05/11/2011	CN102053480A Method for repairing defect of mask
05/11/2011	CN102053479A Positioning device and positioning method for optical mask defects
05/11/2011	CN101458442B Production of layout and photo mask and graphic method
05/11/2011	CN101446755B Method for preparing photo-mask and method for patterning
05/11/2011	CN101430500B OPC correcting method for forming auxiliary through hole
05/11/2011	CN101393911B 半导体集成电路 The semiconductor integrated circuit
05/11/2011	CN101311821B Method for mending light shield graph with defect
05/10/2011	US7941767 Photomask management method and photomask wash limit generating method
05/10/2011	US7941232 Control method, control system, and program
05/10/2011	US7940385 Defect inspection apparatus and its method
05/10/2011	US7939247 Process of patterning small scale devices
05/10/2011	US7939229 Photomask, semiconductor device, and method for manufacturing semiconductor device
05/10/2011	US7939228 Extreme ultra violet lithography mask and method for fabricating the same
05/10/2011	US7939227 Method and structure for fabricating dark-periphery mask for the manufacture of semiconductor wafers
05/10/2011	US7939226 Binary mask, method for fabricating the binary mask, and method for fabricating fine pattern of semiconductor device using binary mask
05/10/2011	US7939225 Mask for controlling line end shortening and corner rounding arising from proximity effects
05/10/2011	US7939224 Mask with registration marks and method of fabricating integrated circuits
05/10/2011	US7939223 Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
05/10/2011	US7939222 Method and system for improving printing accuracy of a contact layout
05/10/2011	US7938907 Device for fabricating a mask by plasma etching a semiconductor substrate
05/05/2011	WO2011052060A1 Exposure device and photo mask
05/05/2011	WO2011051249A1 Method of pattern selection for source and mask optimization
05/05/2011	WO2011029535A3 Mask inspection microscope with variable illumination setting
05/05/2011	US20110104596 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device
05/05/2011	US20110104595 Reflective mask blank for euv lithography and mask for euv lithography
05/05/2011	US20110104594 Method for Manufacturing a Surface and Integrated Circuit Using Variable Shaped Beam Lithography
05/05/2011	US20110104593 Phase-shift mask and method of forming the same
05/05/2011	US20110104592 Photomask blank, photomask, and method for manufacturing photomask blank
05/05/2011	US20110104591 Methods of Fabricating Halftone Phase Shift Blank Photomasks and Halftone Phase Shift Photomasks
05/05/2011	US20110104420 Pellicle and a method for making the same
05/05/2011	US20110100393 Method of cleaning mask and mask cleaning apparatus
05/05/2011	DE10055280B4 Phasenverschiebungs-Photomaskenrohling, Phasenverschiebungs-Photomaske und Verfahren zur Herstellung von Halbleiterbauelementen Phase shift photomask blank, phase shift photomask and method for the production of semiconductor devices
05/04/2011	EP2317385A2 Method for providing flexographic plates, particularly for flexographic printing system, and photoexposure device
05/04/2011	EP2317384A2 Reflective mask blank, reflective mask and methods of producing the mask blank and the mask
05/04/2011	EP2317383A2 Reflective mask blank, reflective mask and methods of producing the mask blank and the mask
05/04/2011	EP2317382A2 Reflective mask blank, reflective mask and methods of producing the mask blank and the mask
05/04/2011	CN1996151B Circuit pattern exposure method and mask
05/04/2011	CN1862376B Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method
05/04/2011	CN102047183A Multilayer mirror and lithographic apparatus
05/04/2011	CN102047152A Method for producing color filter, method for producing substrate with pattern, and small photomask
05/04/2011	CN102043328A Method for correcting defect of photomask, apparatus for correcting defect of photomask, head for correcting defect of photomask, and apparatus for inspecting defect of photomask and method for manufacturing photomask
05/04/2011	CN102043327A Forming method of photomask pattern and photomask layer
05/04/2011	CN102043326A Mask graph correcting method
05/04/2011	CN102043325A Mask graph correcting method and mask manufacturing method
05/04/2011	CN102043324A Method for evaluating overlay marker in development of new process
05/04/2011	CN102043323A Method for manufacturing mask plate
05/04/2011	CN102039290A Vacuum cleaner
05/04/2011	CN101592858B Method for amending photoresist pattern error
05/04/2011	CN101452201B Method for detecting mask printing plate
05/04/2011	CN101349873B Lithographic pellicle
05/03/2011	US7935547 Method of patterning a layer using a pellicle
05/03/2011	US7935462 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
05/03/2011	US7935461 Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank
05/03/2011	US7935460 Mask blank for EUV exposure and mask for EUV exposure
05/03/2011	US7935459 Photo-masks and methods of fabricating surface-relief grating diffractive devices
05/03/2011	US7934391 Synthetic quartz glass body, process for producing the same, optical element, and optical apparatus
04/2011
04/28/2011	WO2011049740A1 Method and system for forming a pattern on a surface using charged particle beam lithography
04/28/2011	WO2011027972A3 Laser-reflective mask and method for manufacturing same
04/28/2011	US20110097654 Color filter and manufacturing method thereof
04/28/2011	US20110097653 Method, program product and apparatus for perfoming decomposition of a pattern for use in a dpt process
04/28/2011	US20110097652 Transparent article
04/28/2011	US20110096324 Reticle defect inspection apparatus and reticle defect inspection method
04/28/2011	US20110095338 Methods of forming pillars for memory cells using sequential sidewall patterning
04/27/2011	EP2198343B1 Improving process model accuracy by modeling mask corner rounding effects
04/27/2011	EP1485757B1 Method of producing an etch-resistant polymer structure using electron beam lithography
04/27/2011	CN102033421A Method for manufacturing dustproof pellicle assembly, dustproof pellicle assembly frame for lithography and dustproof pellicle assembly for lithography
04/27/2011	CN102033420A Photomask, photomask manufacturing method, pattern transfer method and method for manufacturing liquid crystal display device
04/27/2011	CN102033419A Dustproof pellicle assembly
04/27/2011	CN102033418A Characteristic dimension proximity pattern
04/27/2011	CN102033417A Photomask blank, photomask and method for producing photomask
04/27/2011	CN102033416A Method for washing light mask
04/27/2011	CN102033323A Method for manufacturing parallax barrier and method for manufacturing photomask
04/27/2011	CN101126893B Forming method for protecting image

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