| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/15/2011 | CN102096322A Lithographic pellicle |
| 06/15/2011 | CN102096316A Method for improving super-diffraction lithographic resolution and lithographic quality by utilizing island-type structure mask |
| 06/15/2011 | CN102096312A Photoetching method |
| 06/15/2011 | CN102096311A Photomask-forming glass substrate and making method |
| 06/15/2011 | CN102096310A Method for correcting photoresist pattern and etching method |
| 06/15/2011 | CN102096309A Optical proximity correction method |
| 06/15/2011 | CN102096308A Mask graph, method for manufacturing mask, and method for correcting mask graph |
| 06/15/2011 | CN102096190A Metallic photo-thermal drive microswitch and manufacturing method thereof |
| 06/15/2011 | CN102093282A 肟酯光敏引发剂 Oxime ester photoinitiator |
| 06/15/2011 | CN101644890B Optical adjacent correction method suitable for pixel array of image sensor |
| 06/15/2011 | CN101359168B Methof for producing graytone mask and graytone mask |
| 06/15/2011 | CN101320205B Method for producing outer casing of electronic product |
| 06/15/2011 | CN101196681B Detecting device, detecting method, manufacturing method and pattern transferring method for photomask |
| 06/14/2011 | US7962868 Method for forming a semiconductor device using optical proximity correction for the optical lithography |
| 06/14/2011 | US7962865 System and method for employing patterning process statistics for ground rules waivers and optimization |
| 06/14/2011 | US7961292 Sub-resolution assist devices and methods |
| 06/14/2011 | US7960095 Combination of base additives including a room temperature solid base, and a liquid low vapor pressure base; for chromium-containing layers used in mask-making |
| 06/14/2011 | US7960078 Exposure condition setting method, substrate processing device, and computer program |
| 06/14/2011 | US7960077 Reflective-type mask blank for EUV lithography |
| 06/14/2011 | US7960076 Reflective-type mask |
| 06/14/2011 | US7960075 Photomask unit, exposing method and method for manufacturing semiconductor device |
| 06/14/2011 | US7960074 Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus |
| 06/14/2011 | US7958898 Substrate processing apparatus |
| 06/09/2011 | WO2011068223A1 Optical member for euv lithography, and process for production of reflective-layer-attached substrate for euv lithography |
| 06/09/2011 | WO2011068064A1 Silica glass containing tio2 |
| 06/09/2011 | US20110136048 Photomask and pattern formation method using the same |
| 06/09/2011 | US20110132258 Pellicle for lithography and a method for making the same |
| 06/08/2011 | EP2330462A1 Lithographic pellicle |
| 06/08/2011 | CN102089860A Reflective mask blank for EUV lithography and reflective mask for EUV lithography |
| 06/08/2011 | CN102087470A Photomask and implementation method thereof |
| 06/08/2011 | CN102087469A Optical proximity effect corrective modeling method and generating method of test pattern |
| 06/08/2011 | CN102087468A Photomask |
| 06/08/2011 | CN101359690B TFT construction and grey level masking plate construction |
| 06/08/2011 | CN101179082B The thin fime transistor plate and method for making the same |
| 06/07/2011 | US7958463 Computer automated method for manufacturing an integrated circuit pattern layout |
| 06/07/2011 | US7957055 Pattern generator |
| 06/07/2011 | US7955763 Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask |
| 06/07/2011 | US7955762 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film |
| 06/07/2011 | US7955761 Exposure mask, pattern formation method, and exposure mask fabrication method |
| 06/07/2011 | US7955760 Method of correcting defect in photomask |
| 06/03/2011 | WO2011064859A1 Thermosetting protective solution for glass mask, and glass mask |
| 06/02/2011 | US20110129767 Pellicle for lithography |
| 06/02/2011 | US20110129766 Lithographic pellicle |
| 06/02/2011 | US20110129765 Negative resist composition and patterning process |
| 06/01/2011 | EP2328025A1 Photomask blank and photomask making method |
| 06/01/2011 | EP2328024A1 Photomask blank and photomask making method |
| 06/01/2011 | EP2328023A1 Photomask blank and photomask making method |
| 06/01/2011 | EP2328022A1 Photomask blank and photomask making method |
| 06/01/2011 | CN1746769B Lithographic apparatus, method for generating a mask pattern and device manufacturing method using same |
| 06/01/2011 | CN102082161A Organic electroluminescent device, mask plate, luminescent module and application thereof |
| 06/01/2011 | CN102082088A Method for sharing SL mask plate in products of DCMP (direct chemically mechanical polishing) process |
| 06/01/2011 | CN102082068A Method for improving speed of seeking chips on probe table |
| 06/01/2011 | CN102081304A Negative resist composition and patterning process |
| 06/01/2011 | CN102081299A A pellicle for lithography |
| 06/01/2011 | CN101650529B Mask for manufacturing TFT and method for manufacturing source and drain of TFT |
| 05/31/2011 | US7953269 Method for inspecting pattern defect occured on patterns formed on a substrate |
| 05/31/2011 | US7953129 Laser light source device, exposure device, and mask inspection device using this laser light source device |
| 05/31/2011 | US7952696 Exposure measurement method and apparatus, and semiconductor device manufacturing method |
| 05/31/2011 | US7951631 Halftone mask, method of manufacturing the same, and method of manufacturing an array substrate using the same |
| 05/31/2011 | US7951513 Pellicle and method for producing pellicle |
| 05/31/2011 | US7951512 Reticle for projection exposure apparatus and exposure method using the same |
| 05/26/2011 | US20110123912 Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks |
| 05/26/2011 | US20110122347 Filters |
| 05/26/2011 | DE102010048471A1 Dynamisches Maskierungsverfahren zur Mikrofachwerkschaumherstellung Dynamic masking process for microtruss foam production |
| 05/25/2011 | EP2325693A1 Composition for Forming a Patterned Film of Surface-Modified Carbon Nanotubes |
| 05/25/2011 | CN1641485B Exposure system method for evaluating lithography process |
| 05/25/2011 | CN102073224A Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 05/25/2011 | CN102073213A Pellicle |
| 05/25/2011 | CN102073212A Nano grade thickness masking film for deep-UV lithography and preparation method thereof |
| 05/25/2011 | CN102073211A Half tone mask and fabricating method and flat panel display |
| 05/25/2011 | CN102073210A Method for compensating deformation effect after exposure of two-dimensional design layout |
| 05/25/2011 | CN101556431B Translational symmetrical mark and in-situ detection method of wave aberration of projection objective of photoetching machine |
| 05/25/2011 | CN101025571B Device manufacturing method |
| 05/24/2011 | US7949982 Semiconductor integrated circuit design system, semiconductor integrated circuit design method, and computer readable medium |
| 05/24/2011 | US7949967 Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing method |
| 05/24/2011 | US7948697 Method for producing a color filter |
| 05/24/2011 | US7947434 Process for forming a plated film, and process for fabricating a magnetic device and perpendicular magnetic recording head |
| 05/24/2011 | US7947433 Exposure method |
| 05/24/2011 | US7947431 Lithography masks and methods of manufacture thereof |
| 05/24/2011 | US7947415 Reflective mask blank, reflective mask, method of inspecting reflective mask, and method for manufacturing the same |
| 05/24/2011 | US7947414 Method of fabricating halftone phase shift mask |
| 05/24/2011 | US7947413 Pattern evaluation method |
| 05/24/2011 | US7947412 Reduced lens heating methods, apparatus, and systems |
| 05/19/2011 | WO2011058634A1 Exposure apparatus and photomask used therein |
| 05/19/2011 | WO2011057835A1 Optimized mask design for fabricating periodic and quasi-periodic patterns |
| 05/19/2011 | US20110117731 Laser mask and sequential lateral solidification crystallization method using the same |
| 05/19/2011 | US20110117482 Pellicle for lithography |
| 05/19/2011 | US20110117481 Pellicle for lithography |
| 05/19/2011 | US20110117480 Titania and sulfur co-doped quartz glass member and making method |
| 05/19/2011 | US20110117479 Reflective exposure mask, method of manufacturing reflective exposure mask, and method of manufacturing semiconductor device |
| 05/19/2011 | US20110116068 EUV Reticle Substrates With High Thermal Conductivity |
| 05/18/2011 | EP2323138A1 Method for smoothing optical member for euvl and optical member for euvl having smoothed optical surface |
| 05/18/2011 | EP2322992A1 Phase shift masking for complex patterns |
| 05/18/2011 | EP2322490A1 Titania and sulfur co-doped quartz glass member and making method |
| 05/18/2011 | EP2321701A2 Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography |
| 05/18/2011 | EP2059455B1 Packaging for films which contain active substances, and method for producing it |
| 05/18/2011 | EP1446283B1 Providing an image on a flower |
| 05/18/2011 | CN102067283A Reflective mask blank for EUV lithography |
| 05/18/2011 | CN102067036A Optical member for photomask and method for manufacturing the optical member |
| 05/18/2011 | CN102063012A Dustproof film assembly and manufacturing method thereof |