| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 07/06/2011 | CN102117010A Optical adjacent correcting method |
| 07/06/2011 | CN101192007B Mask plate, mask plate layout design method and defect repairing method |
| 07/05/2011 | US7975246 MEEF reduction by elongation of square shapes |
| 07/05/2011 | US7974457 Method and program for correcting and testing mask pattern for optical proximity effect |
| 07/05/2011 | US7973918 Apparatus and method for pattern inspection |
| 07/05/2011 | US7972932 Mark forming method and method for manufacturing semiconductor device |
| 07/05/2011 | US7972753 Masks for microlithography and methods of making and using such masks |
| 07/05/2011 | US7972752 Photomask and method for forming a resist pattern |
| 07/05/2011 | US7972751 Reflection photolithography mask, and process for fabricating this mask |
| 07/05/2011 | US7972750 Mask blank and mask |
| 07/05/2011 | US7972702 Defect inspection method for a glass substrate for a mask blank, glass substrate for a mask blank, mask blank, exposure mask, method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing an exposure mask |
| 07/05/2011 | US7972553 Method for imprint lithography at constant temperature |
| 06/30/2011 | WO2011078414A2 Substrate for euvl optical member |
| 06/30/2011 | WO2011077992A1 Photomask |
| 06/30/2011 | US20110159417 Method for manufacturing a photomask |
| 06/30/2011 | US20110159416 Blank mask and method of fabricating mask using the same |
| 06/30/2011 | US20110159415 Etching apparatus and method for fabricating alternating phase shift mask using the same |
| 06/30/2011 | US20110159414 Method and system of fabricating alternating phase shift mask |
| 06/30/2011 | US20110159413 Titania-doped quartz glass and making method |
| 06/30/2011 | US20110159412 Method of correcting defect in euv mask |
| 06/30/2011 | US20110159411 Phase-shift photomask and patterning method |
| 06/30/2011 | US20110159410 Cost-effective method for extreme ultraviolet (euv) mask production |
| 06/30/2011 | US20110156046 Photomask and thin-film transistor fabricated using the photomask |
| 06/30/2011 | DE19817714C5 Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche Method for measuring the position of structures on a mask surface |
| 06/29/2011 | EP2339399A2 Photomask-forming glass substrate and making method |
| 06/29/2011 | EP2338087A1 Generation of contact masks for inkjet printing on solar cell substrates |
| 06/29/2011 | CN1577083B Stencil mask having main and auxiliary strut and method of forming the same |
| 06/29/2011 | CN102109758A Testing mask |
| 06/29/2011 | CN102109757A Negative, design method for same, and circuit substrate made of same |
| 06/29/2011 | CN102109756A Substrate regeneration method, mask blank manufacturing method, substrate with multi-layer reflective film and manufacturing method of reflective mask blank |
| 06/29/2011 | CN102109755A Device and method for realizing alignment-deviation measurement in photoetching technology |
| 06/29/2011 | CN102109623A Concavo-convex pattern forming sheet and method for manufacturing the same, reflection preventing body, phase difference plate, process sheet original plate, and method for manufacturing optical element |
| 06/29/2011 | CN101526749B Photolithographic system and method for measuring deviation between variable gap of photolithographic system and center of mask stage |
| 06/29/2011 | CN101419402B Method for making cemented carbide punching mold |
| 06/29/2011 | CN101154029B Method for repairing photomask pattern defects |
| 06/29/2011 | CN101126897B Continuous surface micro-structure forming method based on microlens array |
| 06/28/2011 | US7971160 Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask |
| 06/28/2011 | US7971159 Data generating method, data generating device, and program in an exposure system for irradiating multigradation-controllable spotlights |
| 06/28/2011 | US7970485 Systems and methods for determining width/space limits for a mask layout |
| 06/28/2011 | US7968268 Compositions and processes for immersion lithography |
| 06/28/2011 | US7968257 Halftone mask having a shielding pattern and plural overlapping halftone patterns of different widths |
| 06/28/2011 | US7968256 Near field exposure mask, method of forming resist pattern using the mask, and method of producing device |
| 06/28/2011 | US7968255 Photomask |
| 06/28/2011 | US7968254 forming a photoresist pattern using a light shield layer over a semiconductor substrate; prevent the thinning of the isolated pattern; restrain the straying-in of light due to diffraction, the thinning of the resist pattern can be restrained more effectively |
| 06/28/2011 | US7968253 Nano imprint master and method of manufacturing the same |
| 06/28/2011 | US7968252 Pellicle frame |
| 06/28/2011 | US7967917 Method of cleaning storage case |
| 06/23/2011 | WO2011074430A1 Photomask blank, and process for production of photomask |
| 06/23/2011 | WO2011073441A2 Reflective mask for euv lithography |
| 06/23/2011 | WO2011072409A1 Method and device for producing masks for a laser installation for the production of microstructures |
| 06/23/2011 | WO2010059954A3 Process optimization with free source and free mask |
| 06/23/2011 | US20110151383 Method of manufacturing optical element, and optical element |
| 06/23/2011 | US20110151360 Photolithographic method and mask devices utilized for multiple exposures in the field of a feature |
| 06/23/2011 | US20110151359 Integrated circuit layout design |
| 06/23/2011 | US20110151358 Reflective exposure mask, method of fabricating reflective exposure mask, method of inspecting reflective exposure mask, and method of cleaning reflective exposure mask |
| 06/23/2011 | US20110151357 Exposure dose monitoring method and method of manufacturing exposure dose monitoring mask |
| 06/23/2011 | US20110151194 Synthetic quartz glass body, process for producing the same, optical element, and optical apparatus |
| 06/23/2011 | CA2784623A1 Method and device for producing masks for a laser installation for the production of microstructures |
| 06/22/2011 | EP2336823A1 Method and device for producing masks for a laser assembly for generating microstructures |
| 06/22/2011 | EP1557869B1 Exposure transfer mask and exposure transfer mask pattern exchange method |
| 06/22/2011 | DE102009054986A1 Reflektive Maske für die EUV-Lithographie Reflective mask for EUV lithography |
| 06/22/2011 | CN1904727B Cluster tool and method for process integration in manufacturing of a photomask |
| 06/22/2011 | CN1690849B Optics film and its manufacturing method |
| 06/22/2011 | CN102103326A Method of manufacturing optical element, and optical element |
| 06/22/2011 | CN102103325A Photomask for forming fine pattern and method for forming fine pattern with the photomask |
| 06/22/2011 | CN102103324A Optical proximity effect correction method |
| 06/22/2011 | CN102103323A Half-tone mask plate and manufacturing method thereof |
| 06/22/2011 | CN102103322A Flexographic plate for direct plate making of computer and preparation method thereof |
| 06/22/2011 | CN101470344B Method for performing pattern decomposition for a full chip design |
| 06/22/2011 | CN101382731B Method for repairing black spot like defect on mask plate special for IC |
| 06/22/2011 | CN101373323B Optical mask and manufacturing method thereof |
| 06/22/2011 | CN101118375B 洁净储料机和物品的保管方法 Clean reservoir storage method feeder and articles |
| 06/22/2011 | CN101063806B Method and apparatus for solving mask precipitated defect |
| 06/21/2011 | US7966584 Pattern-producing method for semiconductor device |
| 06/21/2011 | US7966580 Process-model generation method, computer program product, and pattern correction method |
| 06/21/2011 | US7965387 Image plane measurement method, exposure method, device manufacturing method, and exposure apparatus |
| 06/21/2011 | US7965375 Lithography mask, rewritable mask, process for manufacturing a mask, device for processing a substrate, lithographic system and a semiconductor device |
| 06/21/2011 | US7964335 Ink receptive film and methods of using the ink receptive film. The ink receptive film is generally suitable for etching patterns into substrates, and typically includes a photosensitive laminate structure containing at least an ink |
| 06/21/2011 | US7964326 Exposure mask for divided exposure |
| 06/21/2011 | US7964325 Mask and method for forming a semiconductor device using the same |
| 06/21/2011 | CA2426443C Phase mask for forming diffraction grating, and optical fiber and optical waveguide having diffraction grating duplicated using the phase mask |
| 06/16/2011 | WO2011071380A1 Method for manufacturing a multilayer structure with a lateral pattern for application in the xuv wavelength range, and bf and lmag structures manufactured according to this method |
| 06/16/2011 | WO2011071126A1 Multilayer mirror for euv lithography and process for producing same |
| 06/16/2011 | WO2011071123A1 Reflective-layer-equipped substrate for euv lithography, reflective mask blank for euv lithography, reflective mask for euv lithography, and process for producing reflective-layer-equipped substrate |
| 06/16/2011 | WO2011071086A1 Optical member for use in euv lithography |
| 06/16/2011 | US20110145775 Cell library, layout method, and layout apparatus |
| 06/16/2011 | US20110143270 Azo compound, azo pigment, pigment dispersion, coloring composition, ink for inkjet recording, coloring composition for color filter, color filter, and process for preparing a coloring composition for color filter |
| 06/16/2011 | US20110143269 Radiation source, lithographic apparatus, and device manufacturing method |
| 06/16/2011 | US20110143268 Scattering Bar OPC Application Method for Sub-Half Wavelength Lithography Patterning |
| 06/16/2011 | US20110143267 Photomask-forming glass substrate and making method |
| 06/16/2011 | US20110143266 Negative resist composition and patterning process |
| 06/16/2011 | DE102009005972B4 Verfahren zum Erzeugen eines periodischen Musters A method for generating a periodic pattern |
| 06/15/2011 | EP2333816A1 Reflective mask blank for euv lithography and method for producing the same |
| 06/15/2011 | EP2333607A2 A pellicle for lithography |
| 06/15/2011 | EP1642171B1 Method of designing an exposure mask, exposure method, pattern forming method and device manufacturing method |
| 06/15/2011 | CN201867584U 掩膜版 Reticle |
| 06/15/2011 | CN1695150B Methods and systems for process control of corner feature embellishment |
| 06/15/2011 | CN1490671B Method for designing mask and manufacturing face plate |
| 06/15/2011 | CN102096334A Super-diffraction imaging device for improving resolution based on phase shifting principle and manufacturing method thereof |
| 06/15/2011 | CN102096328A Exposure procedure of liquid crystal panels and mask |