| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/28/2011 | WO2011090111A1 Method of extracting contour lines of image data obtained by means of charged particle beam device, and contour line extraction device |
| 07/28/2011 | WO2011089772A1 Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device |
| 07/28/2011 | WO2011026055A3 Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability |
| 07/28/2011 | US20110183240 Mask blank, mask blank manufacturing method, transfer mask, and transfer mask manufacturing method |
| 07/28/2011 | US20110183239 Photolithography Mask, Blank Photomask, Reflective Photomask, and Methods of Manufacturing the Same |
| 07/28/2011 | US20110181868 Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks |
| 07/28/2011 | US20110180931 Robust high aspect ratio semiconductor device |
| 07/28/2011 | DE10333248B4 Verwendung einer zweiten Belichtung zum Unterstützen einer PSM-Belichtung beim Drucken eines engen Bereichs angrenzend an eine grosse Struktur Using a second exposure for supporting PSM exposure when printing a narrow range adjacent to a large structure |
| 07/28/2011 | DE102006017938B4 Fokusüberwachungsverfahren, Photomaske und photolithographisches System Focus monitoring method, photomask and photolithography system |
| 07/27/2011 | EP1177479B1 Streamlined ic mask layout optical and process correction through correction reuse |
| 07/27/2011 | CN1983025B Fabrication method for photomask, fabrication method for device and monitoring method for photomask |
| 07/27/2011 | CN102138106A Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography |
| 07/27/2011 | CN102135725A Method for acquiring total number of cut rectangles of PBOPC (Pixel-Based Optical Proximity Correction) optimal mask pattern |
| 07/27/2011 | CN102135724A Mask for semiconductor process |
| 07/27/2011 | CN102135723A Method for correcting photoetched pattern of current layer based on pattern after substrate etching |
| 07/27/2011 | CN101598894B Photomask, thin film transistor element and manufacturing method of thin film transistor element |
| 07/27/2011 | CN101393867B Substrate processing method |
| 07/27/2011 | CN101364044B Minuteness processing method for upper substrate of glass |
| 07/27/2011 | CN101140416B 光掩模坯 Photomask blank |
| 07/26/2011 | US7987435 Pattern verification method, program thereof, and manufacturing method of semiconductor device |
| 07/26/2011 | US7985517 Lithography simulation method, computer program product, and pattern forming method |
| 07/26/2011 | US7985515 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 07/26/2011 | US7985514 Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots |
| 07/26/2011 | US7985513 Fluorine-passivated reticles for use in lithography and methods for fabricating the same |
| 07/26/2011 | US7985463 Low cost antenna array fabrication technology |
| 07/21/2011 | WO2011085719A1 Method for controlling the electron beam exposure of wafers and masks using proximity correction |
| 07/21/2011 | WO2011049735A3 Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots |
| 07/21/2011 | US20110177457 Mask pattern generating method, manufacturing method of semiconductor device, and computer program product |
| 07/21/2011 | US20110177437 Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same |
| 07/21/2011 | US20110177436 Mask blank and method of manufacturing a transfer mask |
| 07/21/2011 | US20110177435 Photomasks having sub-lithographic features to prevent undesired wafer patterning |
| 07/21/2011 | US20110176719 Inspection system and method |
| 07/21/2011 | US20110175247 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 07/21/2011 | DE102010004939A1 Verfahren zur Steuerung der Elektronenstrahl-Belichtung von Wafern und Masken mit Proximity-Korrektur Method for controlling the electron beam exposure of wafers and masks with proximity correction |
| 07/21/2011 | DE102006031561B4 Fotomaskenanordnung, optisches Abbildungssystem, Verfahren zum Bestimmen der Gitterparameter und Absorptionseigenschaften für ein diffraktives optisches Element und Verfahren zum Herstellen eines diffraktiven optischen Elements Photomask assembly, optical imaging system method for determining the lattice parameters and absorption properties for a diffractive optical element and method for manufacturing a diffractive optical element |
| 07/20/2011 | EP2345525A2 Method for creating a three dimensional freeform surface with haptically and/or optically observable microstructures |
| 07/20/2011 | CN1977360B Exposure apparatus, exposure method |
| 07/20/2011 | CN1940546B Check out test set and method for manufacturing components |
| 07/20/2011 | CN102132211A Manufacturing method for substrate for mask blank, mask blank, photo mask, and semiconductor device |
| 07/20/2011 | CN102132210A Pellicle frame, pellicle and method for using pellicle frame |
| 07/20/2011 | CN102132209A Euv reticle substrates with high thermal conductivity |
| 07/20/2011 | CN102129170A Attenuated phase shift mask production method |
| 07/20/2011 | CN102129169A Auxiliary pattern filling method and device |
| 07/20/2011 | CN102129168A Photoresist graph correction method |
| 07/20/2011 | CN102129167A Photolithographic mask and photolithographic method |
| 07/20/2011 | CN102129166A Method for setting sub-resolution assistance feature and method for producing photoetching mask plate |
| 07/20/2011 | CN102129165A Attenuation phase shift mask |
| 07/20/2011 | CN102129164A Method and system for judging mask defects |
| 07/20/2011 | CN102126586A Intake container of protective membrane assembly |
| 07/20/2011 | CN102125921A Transmission method of optical mask in cleaning process |
| 07/20/2011 | CN101430502B Method of correcting mask pattern, method of manufacturing semiconductor device, and semiconductor device |
| 07/20/2011 | CN101398613B Metallic layer circuit board diagram pre-correcting method |
| 07/20/2011 | CN101354529B Photomask data generation method, photomask generation method, exposure method, and device manufacturing method |
| 07/20/2011 | CN101224457B Method for coating bonding adhesive on protecting film framework |
| 07/20/2011 | CN101191998B Method and system for improving critical dimension proximity control of patterns on a mask or wafer |
| 07/19/2011 | US7984392 Matching method for designing layout patterns on a photomask from inverse lithography |
| 07/19/2011 | US7984390 Data processing method in semiconductor device, program of the same, and manufacturing method of semiconductor device |
| 07/19/2011 | US7983471 Pattern inspection apparatus and method |
| 07/19/2011 | US7982851 Method for measuring flare amount, mask for measuring flare amount, and method for manufacturing device |
| 07/19/2011 | US7981576 Method and apparatus for performing dark field double dipole lithography (DDL) |
| 07/19/2011 | US7981574 Reticle, and method of laying out wirings and vias |
| 07/19/2011 | US7981573 Photoresists; extreme ultraviolet region and absorber layer for exposure light; semiconductors |
| 07/14/2011 | WO2011083540A1 Method and device for testing defect using sem |
| 07/14/2011 | WO2011034728A3 Laser ablation tooling via distributed patterned masks |
| 07/14/2011 | US20110171821 Semiconductor Devices and Methods of Manufacturing Thereof |
| 07/14/2011 | US20110171569 Sulfonium derivatives and the use therof as latent acids |
| 07/14/2011 | US20110171568 Mask blank substrate |
| 07/14/2011 | US20110171567 Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank |
| 07/14/2011 | US20110171566 Reflective mask blank for euv lithography |
| 07/14/2011 | US20110170328 Semiconductor memory device |
| 07/14/2011 | US20110170197 Method of Fabricating a Photomask Used to Form a Lens |
| 07/14/2011 | US20110169495 Monitoring module including e-field-induced esd-sensitive pattern and photomask including the module |
| 07/13/2011 | CN201897692U Masking plate with alignment marks |
| 07/13/2011 | CN1890603B Methods and devices for fabricating three-dimensional nanoscale structures |
| 07/13/2011 | CN102124542A Reflective mask blank for EUV lithography and method for producing the same |
| 07/13/2011 | CN102122115A Method of generating photomask data, method of fabricating photomask, solid-state image sensor having microlens array and method of manufacturing same |
| 07/13/2011 | CN102122111A Pixel-based optimization method for optical proximity correction |
| 07/13/2011 | CN101625521B Optical proximity correction method |
| 07/13/2011 | CN101344715B Photomask detection method and on-line immediate photomask detection method |
| 07/13/2011 | CN101290468B Mask preparation method |
| 07/12/2011 | US7979811 Intermediate layout for resolution enhancement in semiconductor fabrication |
| 07/12/2011 | US7977247 Field effect transistor device including an array of channel elements |
| 07/12/2011 | US7977233 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 07/12/2011 | US7977017 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect |
| 07/12/2011 | US7977016 Method for fabricating extreme ultraviolet lithography mask |
| 07/07/2011 | WO2011080873A1 Pattern measuring condition setting device |
| 07/07/2011 | US20110167394 Opc conflict identification and edge priority system |
| 07/07/2011 | US20110165778 Electron beam depicting pattern design, photomask, methods of depicting and fabricating photomask, and method of fabricating semiconductor device using the same |
| 07/07/2011 | US20110165520 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 07/07/2011 | US20110165506 Photomasks and Methods Of Forming Photomasks |
| 07/07/2011 | US20110165505 Photomasks, Methods of Forming Photomasks, and Methods of Photolithographically-Patterning Substrates |
| 07/07/2011 | US20110165504 Reflective mask blank for euv lithography, process for producing the same and mask for euv lithography |
| 07/07/2011 | US20110165503 Method of generating photomask data, method of fabricating photomask, memory medium storing program for generating photomask data, method of manufacturing solid-state image sensor having microlens array and method of manufacturing microlens array |
| 07/07/2011 | US20110165502 Method and system for feature function aware priority printing |
| 07/07/2011 | US20110164313 Microscope for reticle inspection with variable illumination settings |
| 07/07/2011 | DE10393095B4 Lithografiemaskenrohling Lithography mask blank |
| 07/06/2011 | EP2341036A1 Titania-doped quartz glass member and making method |
| 07/06/2011 | CN1637595B Forming image method |
| 07/06/2011 | CN102117012A Method for increasing focal depth in lithography process |
| 07/06/2011 | CN102117011A Optical proximity correction method for active area in Bipolar-CMOS (Complementary Metal-Oxide-Semiconductor Transistor) technology |