| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/30/2011 | US8007959 Photomask and pattern formation method using the same |
| 08/25/2011 | WO2011101926A1 Manufacturing method for semiconductor device(s) and photomask |
| 08/25/2011 | WO2011101331A1 Illumination system and projection objective of a mask inspection apparatus |
| 08/25/2011 | US20110209107 Mask-layout creating method, apparatus therefor, and computer program product |
| 08/25/2011 | US20110207055 Fabricating method for touch screen panel |
| 08/25/2011 | US20110207053 Exposure method and method of making a semiconductor device |
| 08/25/2011 | US20110207034 Matching method of pattern layouts from inverse lithography |
| 08/25/2011 | US20110207033 Method and structure for fabricating dark-periphery mask for the manufacture of semiconductor wafers |
| 08/25/2011 | US20110207032 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film |
| 08/25/2011 | US20110207031 Substrate processing method, manufacturing method of euv mask, and euv mask |
| 08/25/2011 | US20110207030 Pellicle for lithography and method for manufacturing pellicle film |
| 08/25/2011 | US20110206270 Storage medium storing computer program for determining at least one of exposure condition and mask pattern |
| 08/25/2011 | US20110205549 Device and method for measuring lithography masks |
| 08/25/2011 | US20110205534 Defect Inspection Apparatus and Its Method |
| 08/25/2011 | US20110203611 Mask cleaning method, mask cleaning apparatus, and pellicle |
| 08/25/2011 | DE102010009022A1 Beleuchtungssystem sowie Projektionsobjektiv einer Maskeninspektionsanlage Lighting system and projection lens of a mask inspection system |
| 08/24/2011 | EP2359389A2 Laser ablation tooling via sparse patterned masks |
| 08/24/2011 | EP2359190A2 Flexographic element and method of imaging |
| 08/24/2011 | EP1783103B1 Method for forming quartz glass |
| 08/24/2011 | CN201945799U 一种光刻版 A lithographic printing plate |
| 08/24/2011 | CN1862385B System and method for detecting focus change in photolithographic process using test characteristic |
| 08/24/2011 | CN102165369A Photomask blank, photomask, process for producing same, and process for producing semiconductor device |
| 08/24/2011 | CN102163097A Fabricating method for touch screen panel |
| 08/23/2011 | US8006203 Bulk image modeling for optical proximity correction |
| 08/23/2011 | US8006202 Systems and methods for UV lithography |
| 08/23/2011 | US8004655 Automatic focus adjusting mechanism and optical image acquisition apparatus |
| 08/23/2011 | US8003307 Rorming an insulation layer over a substrate in a logic circuit and a pixel region;forming a photoresist over the insulation layer;patterning the photoresist where the insulation layer in the pixel region is exposed and the insulation layer in the logic circuit region is not exposed; etching |
| 08/23/2011 | US8003303 Intensity selective exposure method and apparatus |
| 08/23/2011 | US8003302 Method for fabricating patterns using a photomask |
| 08/23/2011 | US8003299 Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method |
| 08/23/2011 | US8003284 Photomask blank and photomask |
| 08/23/2011 | US8003283 System and a method for improved crosshatch nanomachining of small high aspect three dimensional structures by creating alternating superficial surface channels |
| 08/23/2011 | US8003282 Reflective mask blank for EUV lithography, and substrate with functional film for the mask blank |
| 08/23/2011 | US8003281 Hybrid multi-layer mask |
| 08/18/2011 | WO2011078414A3 Substrate for euvl optical member |
| 08/18/2011 | US20110201138 Mask verifying method, manufacturing method of semiconductor device, and computer program product |
| 08/18/2011 | US20110200920 Reflective mask blank for euv lithography |
| 08/18/2011 | US20110200919 Chemically amplified positive resist composition and pattern forming process |
| 08/18/2011 | US20110198757 Semiconductor structure having an air-gap region and a method of manufacturing the same |
| 08/17/2011 | EP2357528A1 Model-based SRAF insertion |
| 08/17/2011 | EP2356513A1 Relief printing plate |
| 08/17/2011 | CN1690866B Device and method for treating panel |
| 08/17/2011 | CN102159994A Generation of contact masks for inkjet printing on solar cell substrates |
| 08/17/2011 | CN102156382A Method for judging optical proximity correction |
| 08/17/2011 | CN101339360B Pattern defect inspecting method, and pattern defect inspecting device |
| 08/16/2011 | US8001495 System and method of predicting problematic areas for lithography in a circuit design |
| 08/16/2011 | US7998812 Semiconductor device |
| 08/16/2011 | US7998759 Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 08/16/2011 | US7998645 Method for finishing surface of preliminary polished glass substrate |
| 08/16/2011 | US7998644 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method |
| 08/16/2011 | US7998642 Mask pattern data creation method and mask |
| 08/16/2011 | US7998641 Photomask and pattern formation method using the same |
| 08/16/2011 | US7998640 Mask reuse in semiconductor processing |
| 08/16/2011 | US7997890 Device and method for lithography |
| 08/11/2011 | WO2011096081A1 Ionizing radiation-curable protective solution for emulsion mask, and emulsion mask produced using same |
| 08/11/2011 | US20110195352 Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same |
| 08/11/2011 | US20110195351 Pellicle for lithography |
| 08/11/2011 | US20110195350 Pellicle for lithography |
| 08/11/2011 | US20110195349 Chromeless phase-shifting photomask with undercut rim-shifting element |
| 08/11/2011 | US20110195348 Method and system for automated generation of masks for spacer formation from a desired final wafer pattern |
| 08/11/2011 | US20110194751 Pattern verification method, pattern generating method, device fabrication method, pattern verification program, and pattern verification system |
| 08/11/2011 | US20110194095 Exposure apparatus and photomask |
| 08/11/2011 | DE10085017B4 Datenpfad für Hochleistungs-Mustergenerator Data path for high-performance pattern generator |
| 08/10/2011 | EP1761471B1 Process for polishing glass substrate |
| 08/10/2011 | CN102150218A Method for smoothing optical member for EUVL and optical member for EUVL having smoothed optical surface |
| 08/10/2011 | CN101442109B Organic electroluminescent device and down-lead structure, mask plate, drive chip thereof |
| 08/10/2011 | CN101311792B Display substrate and its manufacture method and display device possessing the display substrate |
| 08/10/2011 | CN101073034B Method for imprint lithography at constant temperature |
| 08/09/2011 | US7996794 Mask data processing method for optimizing hierarchical structure |
| 08/09/2011 | US7994450 Debris minimization and improved spatial resolution in pulsed laser ablation of materials |
| 08/09/2011 | US7993820 Pattern manufacturing equipments, organic thin-film transistors and manufacturing methods for organic thin-film transistor |
| 08/09/2011 | US7993819 Electrowetting display devices and fabrication methods thereof |
| 08/09/2011 | US7993803 Method for fabricating chromeless phase shift mask |
| 08/09/2011 | US7993802 Method for correcting pattern critical dimension in photomask |
| 08/09/2011 | US7993801 Multilayer active mask lithography |
| 08/09/2011 | US7993800 Multilayer active mask lithography |
| 08/04/2011 | WO2011093436A1 Apparatus for forming image for pattern matching |
| 08/04/2011 | WO2011091877A1 Holographic mask inspection system with spatial filter |
| 08/04/2011 | US20110189598 Dye-containing negative curable composition, color filter using same, method of producing color filter, and solid-state imaging device |
| 08/04/2011 | US20110189597 Method of forming exposure patterns |
| 08/04/2011 | US20110189596 Method for Manufacturing a Surface and Integrated Circuit Using Variable Shaped Beam Lithography |
| 08/04/2011 | US20110189595 Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, method of manufacturing a transfer mask , and method of manufacturing a semiconductor device |
| 08/04/2011 | US20110189594 Pellicle for lithography and method for manufacturing the same |
| 08/04/2011 | US20110189593 Defect repair apparatus and method for EUV mask |
| 08/04/2011 | US20110189592 Extreme ultraviolet mask and method of manufacturing the same |
| 08/04/2011 | US20110188734 Defect estimation device and method and inspection system and method |
| 08/04/2011 | DE102011008924A1 Defekt-Reperaturvorrichtung und Verfahren für EUV Maske Defect repair apparatus and method for EUV mask |
| 08/03/2011 | EP2351712A1 Process for production of synthetic quartz glass |
| 08/03/2011 | EP1608596B1 Silica glass containing tio2 and process for its production |
| 08/03/2011 | CN102141728A Method for forming three-dimensional pattern |
| 08/03/2011 | CN102141727A Pellicle for lithography and method for manufacturing the same |
| 08/03/2011 | CN102141726A Manufacturing method of photomask, photomask and manufacturing method of display device |
| 08/03/2011 | CN101546117B Masstone photomask and pattern transfer method using the same |
| 08/02/2011 | US7990530 Optical inspection method and optical inspection apparatus |
| 08/02/2011 | US7989253 Method of forming mask for lithography, method of forming mask data for lithography, method of manufacturing back-illuminated solid-state imaging device, back-illuminated solid-state imaging device and electronic device |
| 08/02/2011 | US7989153 Method and apparatus for selectively patterning free standing quantum DOT (FSQDT) polymer composites |
| 08/02/2011 | US7989124 Photomask blank and photomask making method |
| 08/02/2011 | US7989123 Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask |
| 08/02/2011 | US7989122 Photomask blank, photomask, and methods of manufacturing the same |
| 07/28/2011 | WO2011090579A2 Phase-shift photomask and patterning method |