| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/21/2011 | CN102189066A Dustproof film assembly manufacturing method |
| 09/21/2011 | CN101251698B Liquid crystal display panel and method for making the same |
| 09/21/2011 | CN101231458B Grey mask and pattern transfer printing method |
| 09/21/2011 | CN101030034B Method and apparatus for separating a stamper from a patterned substrate |
| 09/20/2011 | US8024676 Multi-pitch scatterometry targets |
| 09/20/2011 | US8023723 Mask pattern dimensional inspection apparatus and method |
| 09/20/2011 | US8023122 Method and system for measuring patterned structures |
| 09/20/2011 | US8023112 Alignment apparatus and fabrication apparatus for planar member and alignment method and fabrication method for planar member |
| 09/20/2011 | US8022376 Method for manufacturing semiconductor device or photomask |
| 09/20/2011 | US8021829 Method of forming photoresist pattern and method of manufacturing perpendicular magnetic recording head |
| 09/20/2011 | US8021819 Sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition |
| 09/20/2011 | US8021807 Reflective mask blank and method of producing the same, and method of producing a reflective mask |
| 09/20/2011 | US8021806 Photomask blank, photomask, and methods of manufacturing the same |
| 09/20/2011 | US8021805 Backside phase grating mask and method for manufacturing the same |
| 09/20/2011 | US8021804 Photomask manufacturing method |
| 09/20/2011 | US8021803 Multi-chip reticle photomasks |
| 09/20/2011 | US8021802 Phase shift mask for double patterning and method for exposing wafer using the same |
| 09/20/2011 | US8021801 depositing a phase shift layer of MoSiON, a first light blocking layer, an insulating layer, and a second light blocking layer on a transparent substrate; selectively exposing a surface of second light blocking layer to define the pattern ; high uniformity in a critical dimension (CD) of a pattern |
| 09/15/2011 | WO2011111801A1 Frame for large pellicle and large pellicle |
| 09/15/2011 | WO2011111479A1 Photomask, exposure device, and method for producing liquid crystal display panel |
| 09/15/2011 | WO2011090579A3 Phase-shift photomask and patterning method |
| 09/15/2011 | US20110223524 On-track process for patterning hardmask by multiple dark field exposures |
| 09/15/2011 | US20110220904 Mask for sequential lateral solidification and sequential lateral solidification apparatus having the same |
| 09/15/2011 | US20110220815 Light source apparatus |
| 09/15/2011 | DE102005035769B4 EUV-Lithographiemaske mit magnetischem Kontrast und zugehöriges Herstellungsverfahren sowie zugehöriges Verfahren zum Herstellen eines Halbleiterbauelements EUV lithography mask with magnetic contrast and manufacturing method thereof, and associated method for manufacturing a semiconductor device |
| 09/14/2011 | EP1562755B1 Method for producing a partially metallised film-type element |
| 09/14/2011 | CN201974632U 掩膜版及掩膜版组 Mask and mask group |
| 09/14/2011 | CN201974631U 掩膜版及掩膜版组 Mask and mask group |
| 09/14/2011 | CN1672098B Method for forming and correcting lithographic template having a repaired gap defect |
| 09/14/2011 | CN102187281A Euv lithography device and method for processing an optical element |
| 09/14/2011 | CN102187275A Mask blank substrate |
| 09/14/2011 | CN102183874A Method for optimizing three-dimension phase-shifting mask (PSM) based on boundary layer (BL) model |
| 09/14/2011 | CN102181838A Chromium plate manufacturing process |
| 09/14/2011 | CN101692417B Control method of platform |
| 09/14/2011 | CN101561633B Method for monitoring photoetching technology and monitoring mark |
| 09/14/2011 | CN101359170B Multivariable solver for optical proximity correction |
| 09/13/2011 | US8019149 Pattern shape evaluation method and pattern shape evaluation apparatus utilizing the same |
| 09/13/2011 | US8017305 Pattern forming method, semiconductor device manufacturing method and exposure mask set |
| 09/13/2011 | US8017287 Development method, method of manufacturing photomask, and method of manufacturing semiconductor device |
| 09/13/2011 | US8017285 Masking process using photoresist |
| 09/09/2011 | WO2011108470A1 Reflection-type mask blank for euv lithography and method for producing the same |
| 09/09/2011 | WO2011108259A1 Process for production of photoresist pattern |
| 09/09/2011 | WO2011108215A1 Substrate storing device |
| 09/09/2011 | WO2011108178A1 Semiconductor device |
| 09/08/2011 | US20110217843 Patterning mask and method of formation of mask using step double patterning |
| 09/08/2011 | US20110217637 Polymerizable composition for color filter, color filter, and solid-state imaging device |
| 09/08/2011 | US20110217636 Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device |
| 09/08/2011 | US20110217635 Method of manufacturing transfer mask and method of manufacturing semiconductor device |
| 09/08/2011 | US20110217634 Multilayer reflective film coated substrate, reflective mask blank, and method of manufacturing a reflective mask |
| 09/08/2011 | US20110217633 Reflective mask blank and method of manufacturing a reflective mask |
| 09/08/2011 | US20110217632 Reduced lens heating methods, apparatus, and systems |
| 09/08/2011 | US20110217631 Method of fabricating a halftone mask having a shielding pattern and plural overlapping halftone patterns of different widths |
| 09/08/2011 | US20110217630 Intensity selective exposure photomask |
| 09/08/2011 | US20110217629 Illumination device, display device, and method of manufacturing light modulator |
| 09/08/2011 | US20110215602 Pellicle handling tool |
| 09/07/2011 | CN101726989B Method for manufacturing base plate with recognized mark |
| 09/07/2011 | CN101566786B Method for repairing phase shift mask defect |
| 09/07/2011 | CN101446753B Photomask and detecting device, detecting method, manufacturing method and pattern transferring method for the same |
| 09/07/2011 | CN101382732B Method for making pattern material layer |
| 09/07/2011 | CN101196680B Detecting device, detecting method, manufacturing method and pattern transferring method for photomask |
| 09/06/2011 | US8013361 Semiconductor device and method for fabricating the same |
| 09/06/2011 | US8012665 Positive photosensitive composition and pattern forming method using the same |
| 09/06/2011 | US8012654 Photomask blank and photomask |
| 09/06/2011 | US8012653 Substrate for EUV mask blanks |
| 09/06/2011 | US8012652 Method of forming a thin film pattern and method of fabricating a liquid crystal display device |
| 09/06/2011 | US8012651 Mounting a pellicle to a frame |
| 09/06/2011 | US8012650 Semiconductor device manufacturing method and wafer |
| 09/06/2011 | US8012563 Large-size substrate |
| 09/06/2011 | US8012314 Manufacturing method and apparatus of phase shift mask blank |
| 09/01/2011 | WO2011105461A1 Optical projection device for exposure apparatus, exposure apparatus, method for exposure, method for fabricating substrate, mask, and exposed substrate |
| 09/01/2011 | WO2011105217A1 Adhesive sheet |
| 09/01/2011 | WO2011104617A1 Analyses of measurement data |
| 09/01/2011 | WO2011104613A1 Critical dimension uniformity correction by scanner signature control |
| 09/01/2011 | US20110212392 Photomask blank, photomask, and methods of manufacturing the same |
| 09/01/2011 | US20110212391 Polymer, chemically amplified positive resist composition and pattern forming process |
| 09/01/2011 | US20110212390 Chemically amplified negative resist composition and patterning process |
| 09/01/2011 | US20110212389 Focus test mask, focus measurement method, exposure method and exposure apparatus |
| 09/01/2011 | US20110212388 Advanced phase shift lithography and attenuated phase shift mask for narrow track width d write pole definition |
| 08/31/2011 | EP2362268A1 Polymer, chemically amplified positive resist composition and pattern forming process |
| 08/31/2011 | EP2362267A1 Chemically amplified negative resist composition and patterning process |
| 08/31/2011 | EP2361402A1 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof |
| 08/31/2011 | CN201955618U 加固型光阻墙光罩 Wall Reinforcement resist mask |
| 08/31/2011 | CN1892419B Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device |
| 08/31/2011 | CN102169847A Dustproof film assembly receiving container |
| 08/31/2011 | CN102169287A Photolithographic mask and preparation method thereof |
| 08/31/2011 | CN102169286A A substrate for a mask blank, a mask blank and method of manufacturing a transfer mask |
| 08/31/2011 | CN102169285A Method for repairing redundant chromium points of chromium plate |
| 08/31/2011 | CN102169284A Method for checking chromium plate |
| 08/31/2011 | CN101289000B Guard film module housing container and production method thereof |
| 08/31/2011 | CN101211108B Method for repairing bridge in photo mask |
| 08/30/2011 | US8009285 Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same |
| 08/30/2011 | US8009264 Composition for photo-alignment film, photo-alignment film, and optically anisotropic medium |
| 08/30/2011 | US8007989 Method and solution for forming a patterned ferroelectric layer on a substrate |
| 08/30/2011 | US8007966 Multiple technology node mask |
| 08/30/2011 | US8007965 Optical wavelength division multiplexed multiplexer/demultiplexer for an optical printed circuit board and a method of manufacturing the same |
| 08/30/2011 | US8007964 Photomask blank and photomask |
| 08/30/2011 | US8007963 Photomask |
| 08/30/2011 | US8007962 Photomask |
| 08/30/2011 | US8007961 Mask blank substrate set and mask blank set |
| 08/30/2011 | US8007960 Light reflecting mask, exposure apparatus, and measuring method |