G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
10/2011
10/13/2011	US20110250528 Method for correcting image placement error in photomask
10/13/2011	US20110250527 Mask layout
10/13/2011	US20110249885 Mask inspection apparatus and image generation method
10/13/2011	US20110249247 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
10/13/2011	US20110249244 Lithographic Focus and Dose Measurement Using A 2-D Target
10/13/2011	US20110248373 Method of forming mask for lithography, method of forming mask data for lithography, method of manufacturing back-illuminated solid-state imaging device, back-illuminated solid-state imaging device and electronic device
10/13/2011	US20110247661 Method for cleaning object and system for cleaning object
10/13/2011	DE102011001984A1 Maskenuntersuchungsgerät und Bilderzeugungsverfahren Mask inspection apparatus and image forming method
10/12/2011	EP1951610B1 Method of forming moulds for nano imprinting
10/12/2011	CN202008575U Printed circuit board developing and exposing negative film
10/12/2011	CN1702549B Pattern data manufacturing method, pattern checking method and application thereof
10/12/2011	CN102216850A Pellicle film, pellicle used with mask for tft liquid crystal panel production, and photomask containing the pellicle
10/11/2011	US8037427 Method for manufacturing a photomask
10/11/2011	US8036446 Semiconductor mask inspection using die-to-die and die-to-database comparisons
10/11/2011	US8034545 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide
10/11/2011	US8034544 Method for forming fine contact hole pattern of semiconductor device
10/11/2011	US8034540 System and method employing secondary back exposure of flexographic plate
10/11/2011	US8034517 Color filter and manufacturing method thereof
10/11/2011	US8034516 Photomasks, methods of forming photomasks, and methods of photolithographically-patterning substrates
10/11/2011	US8034515 Pattern forming method, pattern designing method, and mask set
10/06/2011	WO2011122608A1 Method for manufacturing substrate for photomask blank, method for manufacturing photomask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
10/06/2011	WO2011073441A3 Reflective mask for euv lithography
10/06/2011	US20110244688 Method of producing mask
10/06/2011	US20110244379 Method for forming convex pattern, exposure apparatus and photomask
10/06/2011	US20110244378 Device and method for providing wavelength reduction with a photomask
10/06/2011	US20110244377 Fluorine-passivated reticles for use in lithography and methods for fabricating the same
10/06/2011	US20110244376 Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method
10/06/2011	US20110244375 Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device
10/06/2011	US20110244374 Methods of Correcting Optical Parameters in Photomasks
10/06/2011	US20110244373 Mask blank, transfer mask, and methods of manufacturing the same
10/06/2011	US20110244171 Low expansion glass substrate for reflection type mask and method for processing same
10/06/2011	US20110242544 Method and apparatus for measuring structures on photolithography masks
10/06/2011	US20110239706 Method for production of synthetic quartz glass
10/06/2011	DE102011011972A1 Entwicklungsvorrichtung und Entwicklungsverfahren Developing device and development process
10/05/2011	EP2372449A2 Radiation source apparatus and DUV beam generation method
10/05/2011	EP2371773A1 Method for production of synthetic quartz glass
10/05/2011	CN202003137U Halftone mask plate
10/05/2011	CN102207682A Resist coating method, resist coating device, and method for manufacturing photomask plate and photomask using the resist coating method
10/05/2011	CN102207675A Photo mask and manufacturing method thereof
10/05/2011	CN101546135B Charged-particle beam writing method and charged-particle beam writing apparatus
10/05/2011	CN101546134B Electron beam writing apparatus and method
10/05/2011	CN101403852B A type glue and method for mending chromium plate white defect by using the same
10/05/2011	CN101382736B Photo mask verification system and program
10/05/2011	CN101295129B Optical short distance amending method
10/04/2011	US8032845 Correcting 3D effects in phase shifting masks using sub-resolution features
10/04/2011	US8029950 Reflective mask blank for EUV lithography
10/04/2011	US8029949 Photomask for forming contact hole in semiconductor device
10/04/2011	US8029948 Photomask blank, photomask, and methods of manufacturing the same
10/04/2011	US8029947 Systems and methods for implementing and manufacturing reticles for use in photolithography tools
09/2011
09/29/2011	WO2011119471A2 Dc voltage charging of cathode for plasma striking
09/29/2011	US20110239170 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
09/29/2011	US20110237087 Pattern inspection method and semiconductor device manufacturing method
09/29/2011	US20110236808 Method and Apparatus for Performing Dark Field Double Dipole Lithography (DDL)
09/29/2011	US20110236807 Pellicle for lithography
09/29/2011	US20110236806 Dc voltage charging of cathode for plasma striking
09/29/2011	US20110236805 MEMS lithography mask with improved tungsten deposition topography and method for the same
09/29/2011	US20110235895 Pattern inspection apparatus and method
09/29/2011	US20110235016 Pellicle, mounting method therefor, pellicle-equipped mask, and mask
09/29/2011	US20110235009 Sub-resolution assist devices and methods
09/29/2011	US20110233687 Semiconductor device and manufacturing method thereof
09/29/2011	US20110233619 exposure mask used for manufacturing a semiconductor device having impurity layer and a semiconductor device
09/29/2011	US20110233543 Test pad structure for reuse of interconnect level masks
09/28/2011	EP2369615A1 Low expansion glass substrate for reflection type mask and method for processing same
09/28/2011	EP2368152A1 Method for determining a repair shape of a defect on or in the vicinity of an edge of a substrate of a photomask
09/28/2011	EP1973147B1 Reflective mask blanc for euv lithography
09/28/2011	CN102203907A Reflection-type mask blank for EUV lithography
09/28/2011	CN102203906A Reflective mask blank for EUV lithography
09/28/2011	CN102201352A Receiving container for dustproof thin film component and trolley for transporting the same
09/28/2011	CN101246813B Substrate processing apparatus
09/28/2011	CN101187776B Method for transferring self-assembled dummy pattern to substrate
09/28/2011	CN101122739B Sub-wavelength continuous surface micro-structure preparation method based on negative refractive rate lens
09/27/2011	US8028267 Pattern designing method, pattern designing program and pattern designing apparatus
09/27/2011	US8026047 Resist pattern forming method, supercritical processing solution for lithography process, and antireflection film forming method
09/27/2011	US8026025 Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method
09/27/2011	US8026024 Mask blank and method for manufacturing transfer mask
09/27/2011	US8026023 Lithographic pellicle
09/27/2011	US8025938 Sensitized photochemical switching for cholesteric liquid crystal displays
09/22/2011	WO2011115131A1 Optical member base material for euv lithography, and method for producing same
09/22/2011	US20110231134 Charged particle beam writing apparatus and method therefor
09/22/2011	US20110229827 Method and Lithography Device with a Mask Reflecting Light
09/22/2011	US20110229824 method of manufacturing a semiconductor integrated circuit device
09/22/2011	US20110229807 Photomask blank, photomask, method of manufacturing the same, and method of manufacturing a semiconductor device
09/22/2011	US20110229806 Phase mask and method of fabrication
09/22/2011	US20110229805 Photomask with assist features
09/22/2011	US20110229804 Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks
09/22/2011	US20110229663 Solid-core panel incorporating decorative and/or functional material
09/22/2011	US20110229010 Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section
09/22/2011	US20110229009 Pattern inspection apparatus and pattern inspection method
09/22/2011	US20110228292 Image processing device, computer readable medium, and image processing method
09/21/2011	CN1854891B Pellicle frame
09/21/2011	CN1673859B Assembly of a reticle holder and a reticle
09/21/2011	CN102197340A Exposure apparatus and photomask
09/21/2011	CN102193753A 图像处理装置和图像处理方法 The image processing apparatus and image processing method
09/21/2011	CN102193308A Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks
09/21/2011	CN102193306A Method for designing optical mask
09/21/2011	CN102193305A Method for increasing OPC precision of high MEEF pattern
09/21/2011	CN102193304A Photomask template and test method implemented by using photomask template
09/21/2011	CN102193303A Optical proximity correction method
09/21/2011	CN102193302A Mask image defection detection method and detection system thereof
09/21/2011	CN102193208A Speckle reduction apparatus and speckle reduction apparatus mask

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