G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2011
11/15/2011	US8059076 Display panel, mask and method of manufacturing the same
11/15/2011	US8058614 Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
11/15/2011	US8057968 Mask and method to pattern chromeless phase lithography contact hole
11/15/2011	US8057966 Manufacturing method of photomask for multiple exposure and semiconductor device manufacturing method using above photomask
11/15/2011	US8057965 Mask and method of fabricating the same
11/15/2011	US8057964 Photolithographic reticles with electrostatic discharge protection structures
11/15/2011	US8057963 Maskless vortex phase shift optical direct write lithography
11/10/2011	US20110276928 Method for controlling pattern uniformity of semiconductor device
11/10/2011	US20110275014 Exposure mask with double patterning technology and method for fabricating semiconductor device using the same
11/10/2011	US20110275013 Reflective Extreme Ultraviolet Mask
11/10/2011	US20110275012 Pellicle
11/10/2011	US20110272815 Semiconductor device and layout design method for the same
11/09/2011	EP2385024A1 Improved expansivity in low expansion silica-titania glasses
11/09/2011	EP1971898B1 Substrate with a reflective layer, usable to fabricate a reflective-type mask blank for euv lithography
11/09/2011	EP1875308B1 Adjustable mask blank structure for an euv phase-shift mask
11/09/2011	EP1526406B1 Photomask
11/09/2011	CN102239447A Flexographic element and method of imaging
11/09/2011	CN102239446A Relief printing plate
11/09/2011	CN102237265A Method for controlling pattern uniformity of semiconductor device
11/09/2011	CN102236250A Sticker for dustproof film assembly
11/09/2011	CN102236249A Receiving container for dustproof thin film component
11/09/2011	CN102236248A Method and system for repairing half-tone mask
11/09/2011	CN102236247A Preparation method of photomask
11/09/2011	CN101375372B Exposure method, exposure apparatus, photomask and photomask manufacturing method
11/09/2011	CN101344720B Gray level mask, defect correcting method, manufacturing method and design transfer method
11/09/2011	CN101211102B Apparatus for removing haze in photo mask and method for removing haze in a photo mask
11/08/2011	US8056022 Analysis optimizer
11/08/2011	US8056020 Method of designing semiconductor integrated circuit and mask data generation program
11/08/2011	US8055366 Simulation model creating method, mask data creating method and semiconductor device manufacturing method
11/08/2011	US8053169 Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate
11/08/2011	US8053148 Method for fabricating photomask
11/08/2011	US8053146 Multi-layer body including a diffractive relief structure and method for producing the same
11/08/2011	US8051522 Substrate treatment apparatus
11/03/2011	WO2011078968A3 Method and system for fracturing a pattern, and for charged particle beam lithography with multiple exposure passes
11/03/2011	US20110269060 Photomask
11/03/2011	US20110267867 Semiconductor device
11/03/2011	US20110266140 Process for producing reflective mask blank for euv lithography
11/02/2011	EP1709488B1 Method of forming photosensitive printing sleeves
11/02/2011	CN102230982A Optical diaphragm structure and soft lithography seal master pattern which is used to manufacture optical diaphragm structure
11/02/2011	CN101738848B Method for establishing OPC model based on variable light acid diffusion length
11/02/2011	CN101135842B Method for copying nano autogram formwork
11/02/2011	CN101046624B Pattern defect detection device, pattern defect detection method and manufacturing method for photomask
11/02/2011	CN101031997B Measurement method, exposure method and device manufacturing method
11/01/2011	US8049897 Reticle defect inspection apparatus and inspection method using thereof
11/01/2011	US8048614 Semiconductor integrated circuit device fabrication method
11/01/2011	US8048608 Laser marking
11/01/2011	US8048598 Method of fabricating a halftone mask having a shielding pattern and plural overlapping halftone patterns of different widths
11/01/2011	US8048597 Semiconductor device with a bulb-type recess gate
11/01/2011	US8048596 Photomask producing method and photomask blank
11/01/2011	US8048595 Extreme ultraviolet photomask and methods and apparatuses for manufacturing the extreme ultraviolet photomask
11/01/2011	US8048594 Photomask blank, photomask, and methods of manufacturing the same
11/01/2011	US8048593 Mask blank substrate, mask blank, photomask, and methods of manufacturing the same
11/01/2011	US8048592 Photomask
11/01/2011	US8048591 Mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
11/01/2011	US8048590 Photolithography mask having a scattering bar structure that includes transverse linear assist features
11/01/2011	US8048589 Phase shift photomask performance assurance method
11/01/2011	US8048588 Method and apparatus for removing radiation side lobes
11/01/2011	US8048354 Producing superposed layers on a substrate, each layer comprising areas of different materials, patterns in reverse on the substrate, 3D patterns, having height differences; producing a layer of the predetermined material on this multilayer stack; eliminating the substrate; support with features remain
11/01/2011	US8047023 Method for producing titania-doped fused silica glass
10/2011
10/27/2011	US20110265047 Mask data processing method for optimizing hierarchical structure
10/27/2011	US20110263122 Method For Making A Laminated Chip And Method For Aligning a Lithographic Mask
10/27/2011	US20110262867 Method of creating an evaluation map, system, method of manufacturing a semiconductor device and computer program product
10/27/2011	US20110262849 Photomask and pattern formation method using the same
10/27/2011	US20110262848 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
10/27/2011	US20110262847 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
10/27/2011	US20110262846 Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device
10/27/2011	US20110261477 Substrate for display device, method for manufacturing same, and display device
10/26/2011	EP2381309A1 Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure
10/26/2011	CN102226867A Clamping apparatus for flushing photomask
10/26/2011	CN101639623B Method and device for detecting photomask
10/25/2011	US8046843 Nanometer scale instrument for biochemically, chemically, or catalytically interacting with a sample material
10/25/2011	US8046722 Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device
10/25/2011	US8043985 Crystallized glass, and method for producing crystallized glass
10/25/2011	US8043790 Printing original plate capable of being laser-engraved
10/25/2011	US8043771 Phase shift mask blank and method of manufacturing phase shift mask
10/25/2011	US8043770 Photomask and method of forming overlay vernier of semiconductor device using the same
10/20/2011	WO2011129378A1 Self-supporting film, self-supporting structure, method for manufacturing self-supporting film, and pellicle
10/20/2011	WO2011128031A1 X-ray lithography mask composed of nickel or a nickel base alloy
10/20/2011	US20110256473 Mask blank substrate set and mask blank set
10/20/2011	US20110255770 Inspection system and method for inspecting line width and/or positional errors of a pattern
10/20/2011	US20110255082 Optical inspection method and optical inspection apparatus
10/20/2011	US20110255065 Method and apparatus for modifying a substrate surface of a photolithographic mask
10/20/2011	US20110253912 Charged particle beam writing apparatus and charged particle beam writing method
10/20/2011	DE102010015124A1 Röntgenlithographiemaske aus Nickel oder einer Nickelbasislegierung X-ray lithography mask of nickel or a nickel-based alloy
10/19/2011	EP2378360A1 Metal optical grayscale mask and manufacturing method thereof
10/19/2011	EP2377826A1 OPTICAL MEMBER COMPRISING SILICA GLASS CONTAINING TiO2
10/19/2011	CN102221776A Multivariable solver for optical proximity correction
10/19/2011	CN102221775A Substrate manufacturing method, blank manufacturing method, regenerating photomask and manufacturing method thereof
10/19/2011	CN101436564B Substrate processing apparatus, substrate washing apparatus and substrate processing apparatus
10/19/2011	CN101373324B Method for acquiring optical mask information and method for representing quality of optical mask
10/18/2011	US8042067 Pattern forming method and system, and method of manufacturing a semiconductor device
10/18/2011	US8039409 TiO2-containing silica glass for optical member for EUV lithography
10/18/2011	US8039180 Scattering bar OPC application method for sub-half wavelength lithography patterning
10/18/2011	US8039178 Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks
10/18/2011	US8039177 Method of correcting a flare and computer program product
10/13/2011	WO2011125407A1 Photomask unit and method of manufacturing same
10/13/2011	WO2011125337A1 Phase shift mask blank, manufacturing method thereof, and phase shift mask
10/13/2011	US20110250531 Photosensitive Resin Composition for Color Filter, and Color Filter Using the Same
10/13/2011	US20110250530 Semiconductor Devices and Methods of Manufacturing Thereof
10/13/2011	US20110250529 Photomask blank, photomask, and methods of manufacturing the same

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