G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
12/2011
12/08/2011	US20110299016 Colored photosensitive resin composition, coating film of colored photosensitive resin composition, photosensitive resin transfer material, method of foaming photosensitive resin layer, color filter, method for producing color filter, and liquid crystal display device
12/08/2011	DE102008011531B4 Verfahren zum Bearbeiten eines Objekts mit miniaturisierten Strukturen A method for processing an object with miniaturized structures
12/07/2011	EP2391924A2 Process for producing a photomask on a photopolymeric surface
12/07/2011	CN1936703B 灰调掩模及其制造方法 Gray tone mask and its manufacturing method
12/07/2011	CN1637594B 曝光掩模和使用该曝光掩模的曝光方法 Exposure mask and using the exposure mask exposure method
12/07/2011	CN102270651A 装置和图像传感器 Apparatus and an image sensor
12/07/2011	CN102269929A 图案化的无机层、基于辐射的图案化组合物和相应方法 Patterning the inorganic layer, radiation based patterning compositions and corresponding methods
12/07/2011	CN102269926A 基于Abbe矢量成像模型的非理想光刻系统OPC的优化方法 Non-ideal lithography system Abbe vector imaging model optimization method based on OPC
12/07/2011	CN102269925A 一种基于Abbe矢量成像模型的相移掩膜优化方法 Abbe vector image of a phase shift mask model-based optimization method
12/07/2011	CN102269924A 基于Abbe矢量成像模型的非理想光刻系统ATTPSM的优化方法 Abbe lithography systems based on non-ideal imaging model ATTPSM vector optimization methods
12/07/2011	CN101750878B 光学邻近校正方法 Optical proximity correction method
12/07/2011	CN101738850B 光学临近修正参数采集方法 Optical proximity correction parameter acquisition methods
12/07/2011	CN101634813B 改进照明系统、曝光装置和形成线/间隔电路图形的方法 Improved illumination system, an exposure apparatus and a forming line / space pattern was the method
12/07/2011	CN101493535B 连续性微透镜阵列的制造方法 The method of manufacturing a microlens array Continuity
12/07/2011	CN101382729B 光掩模的制造方法、图案复制方法、光掩模以及数据库 The method of manufacturing a photomask, pattern replication method, a photomask and a database
12/07/2011	CN101034254B 用于增强的光刻图案化的方法和系统 For enhancing lithographic patterning method and system
12/06/2011	US8074188 Method for designing mask including forming a mesh dummy pattern
12/06/2011	US8072615 Alignment method, alignment system, and product with alignment mark
12/06/2011	US8072592 Reticle defect inspection apparatus and reticle defect inspection method
12/06/2011	US8071278 Multiple patterning technique using a single reticle
12/06/2011	US8071271 Conductive film and method for producing the same
12/06/2011	US8071264 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
12/06/2011	US8071263 Reflective mask and manufacturing method for reflective mask
12/06/2011	US8071262 Reticles with subdivided blocking regions
12/06/2011	US8071261 Lithography masks and methods of manufacture thereof
12/06/2011	US8070971 Etch method
12/06/2011	US8070919 Method for preparing one dimensional spin photonic crystal device and one dimensional spin photonic crystal device prepared by the same
12/01/2011	WO2011148018A1 Method for moulding the surfaces of curable materials
12/01/2011	US20110294263 Pattern verification method, program thereof, and manufacturing method of semiconductor device
12/01/2011	US20110294239 Sub-resolution assist feature arranging method and computer program product and manufacturing method of semiconductor device
12/01/2011	US20110294050 Pigment dispersion composition, red colored composition, colored curable composition, color filter for a solid state imaging device and method for producing the same, and solid state imaging device
12/01/2011	US20110294049 Polymerizable composition, cured film, color filter, method of producing color filter and solid-state image sensor
12/01/2011	US20110294048 Mounting a pellicle to a frame
12/01/2011	US20110294047 Photomask blank, resist pattern forming process, and photomask preparation process
12/01/2011	US20110294046 Photo mask and method for fabricating image sensors
12/01/2011	US20110294045 Photomask and methods for manufacturing and correcting photomask
12/01/2011	US20110293305 Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device
12/01/2011	US20110291214 Photo mask and method for fabricating image sensors
11/2011
11/30/2011	EP2390239A2 Synthetic quartz glass substrate and making method
11/30/2011	CN102265381A 半色调掩模及制造方法 Half-tone mask and the manufacturing method
11/30/2011	CN102262354A 多色调光掩模的制造方法和图案转印方法 Method for producing multi-tone photomask and pattern transfer method
11/30/2011	CN102262353A 多色调光掩模的制造方法和图案转印方法 Method for producing multi-tone photomask and pattern transfer method
11/30/2011	CN102262352A 制作掩膜版的方法、对布局图形进行光学邻近修正方法 The method of making the mask, graphic layout optical proximity correction method
11/30/2011	CN102262351A 光掩膜层及其形成方法 Mask layer and method of forming
11/30/2011	CN102262350A 曝光机的曝光程序的验证方法及其使用的掩模 Exposure machine authentication methods and procedures used in the exposure mask
11/30/2011	CN102262349A 一种用于半导体工艺中的掩模板 A semiconductor process mask for
11/30/2011	CN101846888B 曝光机台、阵列基板、图案化薄膜、光刻胶层及形成方法 Exposure machine, the array substrate, a patterned film, and method of forming the photoresist layer
11/30/2011	CN101727014B 控制特征尺寸的光刻方法及光刻系统 Lithographic feature size control method and lithography system
11/30/2011	CN101644888B 曝光方法、掩模版和掩模版设计方法 Exposure method, mask and mask design method
11/30/2011	CN101241309B 利用间距偏移量校准次纳米关键尺寸的方法 The use of sub-nanometer spacing offset calibration method for critical dimension
11/29/2011	US8068663 Simulation method of optical image intensity distribution, program, and method of manufacturing semiconductor device
11/29/2011	US8068213 Photomask, method of lithography, and method for manufacturing the photomask
11/29/2011	US8067753 Electron beam writing apparatus and method
11/29/2011	US8067311 Mask and method for fabricating semiconductor device using the same
11/29/2011	US8067133 Phase shift mask with two-phase clear feature
11/29/2011	US8067132 Photomask and exposure method
11/24/2011	WO2011146142A1 Synthesis of nanopeapods by galvanic displacement of segmented nanowires
11/24/2011	WO2011145242A1 Semiconductor integrated circuit device and terminal construction of reference cell
11/24/2011	US20110287349 Multi-chip reticle photomasks
11/24/2011	US20110287348 Laser-reflective mask and method for manufacturing same
11/24/2011	US20110287347 Thin film evaluation method, mask blank, and transfer mask
11/24/2011	US20110287346 Mask blank manufacturing method, transfer mask manufacturing method, mask blank, and transfer mask
11/24/2011	US20110287345 Electron beam drawing apparatus, electron beam drawing method, semiconductor device manufacturing mask manufacturing method, and semiconductor device manufacturing template manufacturing method
11/24/2011	US20110287344 Reflective photomask, manufacturing method of the photomask, and pattern formation method
11/24/2011	US20110287219 Synthetic quartz glass substrate and making method
11/24/2011	US20110286658 Pattern inspection method and semiconductor device manufacturing method
11/24/2011	US20110286319 Charged particle beam writing apparatus, write data creation method and charged particle beam writing method
11/24/2011	US20110286002 Light reflecting mask, exposure apparatus, and measuring method
11/24/2011	US20110285975 Method of managing euv exposure mask and exposure method
11/24/2011	US20110285547 External Conditions Audio Playback System and Method
11/23/2011	CN202049330U Synchronous switching mechanism for clamping photomask
11/23/2011	CN102253595A Method for searching defective mask plate
11/23/2011	CN101398612B Photomask, manufacturing method thereof and pattern transfer printing method
11/22/2011	US8065637 Semiconductor device
11/22/2011	US8064681 Method and apparatus for inspecting reticle
11/22/2011	US8064040 Projection objective, projection exposure apparatus and reflective reticle for microlithography
11/22/2011	US8062814 Optical compensation devices, systems, and methods
11/22/2011	US8062812 Image mask and image mask assembly
11/22/2011	US8062811 Mask for manufacturing TFT, TFT, and manufacturing thereof
11/22/2011	US8062810 Method of correcting a mask pattern and method of manufacturing a semiconductor device
11/22/2011	US8062693 Generation of contact masks for inkjet printing on solar cell substrates
11/17/2011	WO2011142892A2 Test pattern for contour calibration in opc model build
11/17/2011	US20110281221 Applications of semiconductor nano-sized particles for photolithography
11/17/2011	US20110281208 Hybrid Multi-Layer Mask
11/17/2011	US20110281207 Reflective mask blank and method of manufacturing a reflective mask
11/17/2011	US20110281206 Exposure apparatus, mask plate and exposing method
11/17/2011	US20110280503 Method for hermetically closing an air-tight bag for pellicle
11/17/2011	US20110279816 Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same
11/17/2011	US20110279799 EUV Lithography Device and Method For Processing An Optical Element
11/17/2011	US20110279759 Dispersed composition, polymerizable composition, light shielding color filter, liquid crystal display device having light shielding color filter, solid-state imaging device, wafer-level lens, and imaging unit having wafer level lens
11/17/2011	US20110278679 Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method
11/16/2011	EP1801647B1 Photomask blank and photomask
11/16/2011	CN102246281A Method for cleaning object and system for cleaning object
11/16/2011	CN102246269A Low expansion glass substrate for reflection type mask and method for processing same
11/16/2011	CN102246100A Method for forming projected pattern, exposure apparatus and photomask
11/16/2011	CN101846875B Gray-scale photomask for defining patterns of source electrode, drain electrode and semiconductor layer of TFT
11/16/2011	CN101144972B 掩模坯板和掩模 Mask blanks and masks
11/15/2011	US8060842 Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
11/15/2011	US8059269 Particle inspection apparatus, exposure apparatus, and device manufacturing method
11/15/2011	US8059262 Calculation program, and exposure method for calculating light intensity distribution formed on image plane

1 ... 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 ... 249