| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/12/2012 | US20120009512 Extreme ultraviolet photomask |
| 01/12/2012 | US20120009511 Method and apparatus for correcting errors of a photolithographic mask |
| 01/12/2012 | US20120009510 Lithography mask and method of manufacturing semiconductor device |
| 01/12/2012 | US20120009509 Generation method, creation method, exposure method, device fabrication method, storage medium, and generation apparatus |
| 01/12/2012 | US20120008123 Method of measuring aerial image of euv mask |
| 01/12/2012 | DE102011078927A1 Verfahren und Vorrichtung zum Korrigieren von Fehlern einer photolithographischen Maske Method and apparatus for correcting errors of a photolithographic mask |
| 01/12/2012 | DE102011006354A1 Maskenrohling, Übertragungsmaske, Verfahren zu ihrer Herstellung und Verfahren zum Herstellen eines Halbleiterbauelements Mask blank mask transmission, to processes for their preparation and method of manufacturing a semiconductor device |
| 01/11/2012 | CN202110373U Surface film accommodating container |
| 01/11/2012 | CN102317860A Substrate for mask blank use, mask blank, and photo mask |
| 01/11/2012 | CN102314102A Treatment of synthetic quartz glass substrate |
| 01/11/2012 | CN102314076A Composite mask and manufacturing method thereof |
| 01/11/2012 | CN102314075A Composite mask and manufacturing method thereof |
| 01/11/2012 | CN102314074A Mask plate and mask plate manufacturing method |
| 01/11/2012 | CN102314073A Photoetching plate and overlaying method thereof |
| 01/11/2012 | CN102314072A Comparison management method for particle attached to mask plate |
| 01/11/2012 | CN102311529A Diazoresin, photosensitive resin composition and photosensitive film for screen plate |
| 01/11/2012 | CN101441408B Photomask, manufacturing method thereof, and pattern transfer print method |
| 01/11/2012 | CN101322072B Photomask, method for manufacturing such photomask, pattern forming method using such photomask and mask data creating method |
| 01/11/2012 | CN101206393B Optical mask employed for manufacturing array substrate, array substrate and method for manufacturing the same |
| 01/10/2012 | US8095897 Methods and systems for layout and routing using alternating aperture phase shift masks |
| 01/10/2012 | US8092960 Exposing mask and production method therefor and exposing method |
| 01/10/2012 | US8092959 Means for transferring a pattern to an object |
| 01/10/2012 | US8092958 Irradiating the resist layer through a mask to expose an upper surface of the wafer |
| 01/10/2012 | DE202011102911U1 Eine auswechselbare, teilweise lichtdurchlässige Maske für Bildschirme zur Herstellung von grafischen Bildern A replaceable, partially translucent mask for screens for producing graphic images |
| 01/05/2012 | US20120005636 Method for manufacturing a photomask |
| 01/05/2012 | US20120003573 Photomasks |
| 01/05/2012 | US20120002860 Method and apparatus for inspecting patterns formed on a substrate |
| 01/04/2012 | EP2401061A1 Polymer-containing solvent purifying process |
| 01/04/2012 | CN202102241U Photoetching board of wide-grid bipolar static induction transistor |
| 01/04/2012 | CN202102240U Exposure film |
| 01/04/2012 | CN102308256A Photomask and methods for manufacturing and correcting photomask |
| 01/04/2012 | CN101923278B Modeling method of phase shift mask in photolithographic process |
| 01/04/2012 | CN101097399B Moulds fabricating method |
| 01/03/2012 | US8091048 Method for predicting resist pattern shape, computer readable medium storing program for predicting resist pattern shape, and computer for predicting resist pattern shape |
| 01/03/2012 | US8091046 Set of masks, method of generating mask data and method for forming a pattern |
| 01/03/2012 | US8090188 Apparatus including defect correcting system which repeats a correcting of a reticle pattern defect and a correcting method using the apparatus |
| 01/03/2012 | US8088547 Resist composition |
| 01/03/2012 | US8088538 Reflective mask blank for EUV lithography |
| 01/03/2012 | CA2657509C Diffraction grating-fabricating phase mask, and its fabrication method |
| 12/29/2011 | WO2011162890A2 Mask design and opc for device manufacture |
| 12/29/2011 | WO2011161243A1 Method and apparatus for analyzing and / or repairing of an euv mask defect |
| 12/29/2011 | WO2011160861A1 Lithographic apparatus and method |
| 12/29/2011 | US20110318674 Photomask blank, photomask, and methods of manufacturing the same |
| 12/29/2011 | US20110318673 System and method for test pattern for lithography process |
| 12/29/2011 | US20110318672 Mask design and opc for device manufacture |
| 12/29/2011 | DE102010025033A1 Verfahren und Vorrichtung zur Defekterkennung und Reparatur von EUV-Masken Method and apparatus for defect detection and repair of EUV masks |
| 12/28/2011 | EP2399166A2 Nano plasmonic parallel lithography |
| 12/28/2011 | EP2177487B1 Method of removing contaminant from surface of glass substrate |
| 12/28/2011 | EP1987395B1 Method for structuring the surface of a pressed sheet or an endless strip |
| 12/28/2011 | EP1636653B1 Adhesion method using gray-scale photolithography |
| 12/28/2011 | EP1373978B1 Extreme ultraviolet mask with improved absorber |
| 12/28/2011 | CN202093314U 一种印刷线路板的曝光菲林 A printed wiring board film exposure |
| 12/28/2011 | CN202087567U 光掩模冲洗的装卡装置 Photomask wash chucking device |
| 12/28/2011 | CN101661907B 液晶显示装置的阵列基板制造方法 Array substrate of a liquid crystal display device manufacturing method |
| 12/28/2011 | CN101661199B 半透过式液晶显示装置的阵列基板制造方法 Array substrate device manufacturing method and a half through the liquid crystal display |
| 12/28/2011 | CN101659391B 一种圆滑曲面微结构的制作方法 A method of making smooth the surface microstructure of |
| 12/28/2011 | CN101206394B 曝光掩模及使用该曝光掩模制造半导体器件的方法 Exposure mask and method of using the exposure mask manufacturing a semiconductor device |
| 12/28/2011 | CN101002141B 生成用于生成掩模版的仿真图像的仿真程序的输入的计算机实现的方法 Method for inputting a computer generated simulation image generating reticle simulation program implemented |
| 12/27/2011 | US8086973 Pattern management method and pattern management program |
| 12/27/2011 | US8084279 Method of manufacturing semiconductor device that uses both a normal photomask and a phase shift mask for defining interconnect patterns |
| 12/27/2011 | US8084169 Dual metric OPC |
| 12/22/2011 | WO2011158630A1 Photomask, and laser annealing device and exposure device which use same |
| 12/22/2011 | WO2011157643A1 Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask |
| 12/22/2011 | US20110310492 Mask used for fabrication of microlens, and fabrication method for microlens using the mask |
| 12/22/2011 | US20110308737 Treatment of synthetic quartz glass substrate |
| 12/22/2011 | DE102010030261A1 Vorrichtung sowie Verfahren zum ortsaufgelösten Vermessen einer von einer Lithographie-Maske erzeugten Strahlungsverteilung Apparatus and method for spatially resolved measurement of a radiation distribution generated by a lithography mask |
| 12/21/2011 | EP2397904A1 Treatment of synthetic quartz glass substrate |
| 12/21/2011 | EP2397900A1 Photomask and methods for manufacturing and correcting photomask |
| 12/21/2011 | EP2397899A1 Mask holding device |
| 12/21/2011 | CN102292807A Euv光刻用反射型掩模基板的制造方法 Euv lithography method for manufacturing a reflective mask substrate |
| 12/21/2011 | CN102289146A 基于广义小波罚函数优化二相位相移掩膜的方法 Wavelet penalty function optimization based on the generalized phase two phase-shift mask method |
| 12/21/2011 | CN101692439B 薄膜晶体管数组基板的制作方法 Making thin film transistor array substrate method |
| 12/21/2011 | CN101346665B 表面保护薄膜 Surface protection film |
| 12/20/2011 | US8082525 Technique for correcting hotspots in mask patterns and write patterns |
| 12/20/2011 | US8081384 Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask |
| 12/20/2011 | US8080478 Method of producing mask |
| 12/20/2011 | US8080349 Exposure mask and method for manufacturing semiconductor device using the same |
| 12/15/2011 | US20110306216 Mask holding device |
| 12/15/2011 | US20110305979 Resist top coat composition and patterning process |
| 12/15/2011 | US20110305978 Photomask blank, photomask, and method of manufacturing photomask blank |
| 12/15/2011 | US20110305977 Optical proximity correction process |
| 12/14/2011 | EP2395394A2 Method for printing etch masks using phase-change materials |
| 12/14/2011 | EP2394200A1 Co-crystals and their use |
| 12/14/2011 | EP2393751A1 Method for producing a stamp for hot embossing |
| 12/14/2011 | CN102279488A 彩色滤光基板的制作方法及彩色滤光基板用的曝光光罩 A color filter substrate manufacturing method and color filter substrate exposure mask |
| 12/14/2011 | CN102275641A 防尘薄膜组件收纳容器的收纳密闭方法 The method of storing a closed container of the pellicle |
| 12/14/2011 | CN101893819B 提高掩膜板图形关键尺寸均匀性的方法 Improved graphics mask critical dimension uniformity Method |
| 12/14/2011 | CN101727007B 一种用于高深宽比纳米图形加工的反射式表面等离子体成像光刻方法 Reflective surface plasmon imaging lithography process for high aspect NONSTOICHIOMETRIC graphics processing |
| 12/14/2011 | CN101726990B 一种用于200nm以下线宽超衍射光刻的硅掩模及其制作方法 An ultra below 200nm linewidth silicon lithography mask diffraction method for its production |
| 12/14/2011 | CN101346664B 掩模坯料及光掩模 Mask blanks and photomasks |
| 12/13/2011 | US8078996 Method and system for correcting a mask pattern design |
| 12/13/2011 | US8078012 Pattern inspection apparatus and method |
| 12/13/2011 | US8077391 Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method |
| 12/13/2011 | US8076208 Method for forming transistor with high breakdown voltage using pitch multiplication technique |
| 12/13/2011 | US8076052 Positive-working imageable elements with chemical resistance |
| 12/08/2011 | WO2011151381A1 Substrate for optical elements |
| 12/08/2011 | WO2011151116A1 A method for determining the performance of a photolithographic mask |
| 12/08/2011 | US20110302543 Pattern designing method, pattern designing program and pattern designing apparatus |
| 12/08/2011 | US20110300473 Method for nanopatterning using nanomasks and light exposure |
| 12/08/2011 | US20110300472 Exposure Apparatus Inspection Mask and Exposure Apparatus Inspection Method |