| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 02/22/2012 | CN102360157A Device for removing tiny dust and stains from photomask surface and method thereof |
| 02/22/2012 | CN101276140B 灰阶掩模的缺陷修正方法和制造方法、灰阶掩模及图案转印方法 Grayscale mask defect correction method and manufacturing method, gray mask and pattern transfer method |
| 02/21/2012 | US8122388 Phase-shifting masks with sub-wavelength diffractive optical elements |
| 02/21/2012 | US8122386 Dummy pattern placement apparatus, method and program and semiconductor device |
| 02/21/2012 | US8122385 Mask pattern correcting method |
| 02/21/2012 | US8121387 Mask pattern verifying method |
| 02/21/2012 | US8119309 Reflective photomask and method of fabricating, reflective illumination system and method of process using the same |
| 02/21/2012 | US8119308 Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask |
| 02/16/2012 | US20120040293 Reflective mask, manufacturing method for reflective mask, and manufacturing method for semiconductor device |
| 02/16/2012 | US20120040279 Method, device, and system for forming circular patterns on a surface |
| 02/16/2012 | US20120040278 Intensity selective exposure photomask |
| 02/16/2012 | US20120040277 Damascene reticle and method of manufacture thereof |
| 02/16/2012 | US20120040276 Method of forming and using photolithography mask having a scattering bar structure |
| 02/16/2012 | US20120039522 Mask inspection apparatus and method |
| 02/16/2012 | US20120038866 Color filter and liquid crystal display device, and exposure mask |
| 02/16/2012 | US20120038863 Color filter, liquid crystal display device,and color filter production method |
| 02/16/2012 | DE112006001768B4 Verwendung eines superkritischen Fluids zum Trocknen der Schreiben und zum Reinigen der Linsen in einer Immersionslithographie Using a supercritical fluid to dry the letter and for cleaning the lenses in an immersion lithography |
| 02/15/2012 | EP2418542A2 Binary photomask blank and binary photomask making method |
| 02/15/2012 | CN101923281B 提高Si/Ge发射极窗口图形保真度的方法 Improving methods for Si / Ge emitter window graphics fidelity |
| 02/15/2012 | CN101551587B 平板印刷用防护薄膜组件 Lithographic pellicle |
| 02/15/2012 | CN101258442B 图案复制掩模、焦距变动测定方法及装置、半导体器件的制造方法 Replication method for producing a mask pattern, a method and apparatus for measuring the focal length changes, the semiconductor device |
| 02/15/2012 | CN101120245B 透光性物品的检查方法 Inspection methods translucent objects |
| 02/14/2012 | US8114557 Method for optical proximity correction |
| 02/14/2012 | US8114556 Photomask blank and production method thereof, and photomask production method, and semiconductor device production method |
| 02/09/2012 | US20120034554 Method for Fracturing and Forming a Pattern Using Circular Characters with Charged Particle Beam Lithography |
| 02/09/2012 | US20120034553 Photomask Blank, Photomask, and Pattern Transfer Method Using Photomask |
| 02/09/2012 | US20120034552 Method of manufacturing a photomask |
| 02/09/2012 | US20120034551 Binary photomask blank and binary photomask making method |
| 02/09/2012 | US20120034434 Mask blank, transfer mask, and film density evaluation method |
| 02/09/2012 | DE102006043895B9 Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen Electron microscope for inspecting and editing of an object with miniaturized structures |
| 02/08/2012 | EP2416347A1 Reflective photomask and reflective photomask blank |
| 02/08/2012 | EP2416217A1 Member for masking film, process for producing masking film using same, and process for producing photosensitive resin printing plate |
| 02/08/2012 | CN1637593B 掩模 Mask |
| 02/08/2012 | CN102347279A Silicon groove lithography process and mask suitable for same |
| 02/08/2012 | CN102346378A Exposure method, exposure apparatus, photomask and method for manufacturing photomask |
| 02/08/2012 | CN102346368A Method for manufacturing double pattern exposure mask and double pattern exposure method |
| 02/08/2012 | CN101989035B 光掩膜的铬金属膜去除方法 Chrome photomask film removal method |
| 02/08/2012 | CN101620375B 修正凸块光掩膜图案的方法 Projection light correction method for a mask pattern |
| 02/08/2012 | CN101025576B 激光加工装置及其加工方法 The laser processing apparatus and processing method |
| 02/07/2012 | US8112726 Phase-shifting masks with sub-wavelength diffractive optical elements |
| 02/07/2012 | US8112725 Writing pattern producing method, photomask manufacturing method, and semiconductor device manufacturing method |
| 02/07/2012 | US8112183 Substrate processing apparatus and substrate processing method |
| 02/07/2012 | US8111898 Method for facilitating automatic analysis of defect printability |
| 02/07/2012 | US8111428 Halftone image generation method, threshold matrix generation method, threshold matrix, printing plate manufacturing method, and printing plate |
| 02/07/2012 | US8110800 Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system |
| 02/07/2012 | US8110413 Mask pattern verification apparatus, mask pattern verification method and method of fabricating a semiconductor device |
| 02/07/2012 | US8110323 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film |
| 02/07/2012 | US8109753 Double-sided nano-imprint lithography system |
| 02/02/2012 | WO2012014520A1 Photomask correcting method and laser processing device |
| 02/02/2012 | US20120028194 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 02/02/2012 | US20120026578 Radiation source apparatus and duv beam generation method |
| 02/01/2012 | EP2413192A1 Polymerizable monomers |
| 02/01/2012 | EP2413189A1 A method for spreading a conformable material between a substrate and a template |
| 02/01/2012 | EP2412733A1 Polymer, chemically amplified negative resist composition, and patterning process |
| 02/01/2012 | EP2412686A2 Highly reflective, hardened silica-titania article and method of making |
| 02/01/2012 | EP1810078B1 Method for thermally processing photosensitive printing sleeves |
| 02/01/2012 | CN1955840B 光掩膜基板的制造方法 The method of manufacturing a photomask substrate |
| 02/01/2012 | CN102338992A Assembly of a reticle holder and a reticle |
| 02/01/2012 | CN101555097B 玻璃数据设计系统、方法 Glass data design systems, methods |
| 02/01/2012 | CN101273302B 光掩模和使用该光掩模的曝光方法 Use of the photomask and a photomask exposure method |
| 02/01/2012 | CN101221355B 有机电致发光元件制程中的光刻掩膜板的清洗方法及装置 Organic electroluminescent light emitting element method of cleaning process of lithography masks and apparatus |
| 02/01/2012 | CN101171584B 光掩模和设计、制作与检查光掩模的方法 Photomask and design, photomask production and inspection methods |
| 01/31/2012 | US8108824 Pattern verification method, method of manufacturing semiconductor device, and recording media |
| 01/31/2012 | US8108806 Contrast-based resolution enhancement for photolithographic processing |
| 01/31/2012 | US8107063 Transparent article |
| 01/31/2012 | US8105765 Method of manufacturing a semiconductor device |
| 01/31/2012 | US8105757 Method of making a semiconductor device |
| 01/31/2012 | US8105735 Reflective mask blank for EUV lithography and reflective mask for EUV lithography |
| 01/31/2012 | US8105734 Titania-doped quartz glass member and making method |
| 01/26/2012 | WO2012010459A1 Method for producing flexographic printing plates using uv-led irradiation |
| 01/26/2012 | US20120021344 Reflective photomask and reflective photomask blank |
| 01/26/2012 | US20120021343 Process Window Signature Patterns for Lithography Process Control |
| 01/26/2012 | US20120019916 Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the same |
| 01/26/2012 | US20120019805 Calculation method, generation method, program, exposure method, and mask fabrication method |
| 01/26/2012 | CA2804841A1 Method for producing flexographic printing plates using uv-led irradiation |
| 01/25/2012 | EP2410379A2 Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist pattering process |
| 01/25/2012 | CN1983024B Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 01/25/2012 | CN102328265A Method for manufacturing electronic grade synthetic quartz glass substrate |
| 01/25/2012 | CN101788759B Method for correcting auxiliary figure with low resolution |
| 01/25/2012 | CN101634805B Peripheral shading mask structure used for manufacturing semiconductor wafer and manufacturing method thereof |
| 01/24/2012 | US8103984 System and method for compressed design phase contour data |
| 01/24/2012 | US8103980 Beam dose computing method and writing method and record carrier body and writing apparatus |
| 01/24/2012 | US8103977 Semiconductor device and its manufacturing method, semiconductor manufacturing mask, and optical proximity processing method |
| 01/24/2012 | US8103976 Photo mask set for forming multi-layered interconnection lines and semiconductor device fabricated using the same |
| 01/24/2012 | US8102541 Apparatus and method for measuring structures on a mask and or for calculating structures in a photoresist resulting from the structures |
| 01/24/2012 | US8101324 Photomask manufacturing method, photomask manufacturing apparatus and photomask |
| 01/19/2012 | US20120015288 Member for masking film, process for producing masking film using the same, and process for producing photosensitive resin printing plate |
| 01/19/2012 | US20120015287 Method of fabricating a half tone mask having a shielding pattern and plural overlapping halftone patterns of different widths |
| 01/19/2012 | US20120015286 Mask blank substrate, mask blank, photomask, and methods of manufacturing the same |
| 01/19/2012 | US20120014646 Optical fiber, method of preparation thereof and device |
| 01/19/2012 | DE19946447B4 Teilchenoptisches Abbildungssystem für Lithographiezwecke A particle imaging system for lithography purposes |
| 01/19/2012 | DE112009002348T5 Fotomaskenrohling, Fotomaske, Verfahren zu deren Herstellung und Verfahren zur Herstellung eines Halbleiterbauelements Photomask blank photomask, to processes for their preparation and process for the production of a semiconductor device |
| 01/18/2012 | EP1543384B1 Composition which forms an electrically-conducting protective coat and a method for structuring a photoresist using the protective layer |
| 01/18/2012 | EP1055153B1 Photomask with a mask edge provided with a ring-shaped esd protection area |
| 01/18/2012 | CN102323723A Optimization method of optical proximity effect correction based on Abbe vector imaging model |
| 01/18/2012 | CN102323715A Light cover plate for preventing atomization and manufacturing method thereof |
| 01/18/2012 | CN101373326B Photo mask layout |
| 01/17/2012 | CA2416412C Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation |
| 01/12/2012 | WO2012004950A1 Pellicle film |
| 01/12/2012 | US20120009842 Display device, method of manufacturing the same and mask for manufacturing the same |