Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
03/2012
03/22/2012US20120070767 Set of masks, method of generating mask data and method for forming a pattern
03/22/2012US20120069311 Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography
03/21/2012EP2432009A1 Purging apparatus and purging method
03/21/2012EP2430650A1 Patterning a single integrated circuit layer using automatically-generated masks and multiple masking layers
03/21/2012EP1483628B1 Full phase shifting mask in damascene process
03/21/2012CN1955131B Glass-ceramics and a method for manufacturing the same
03/21/2012CN102385649A Rendered database image-to-inspection image optimization for inspection
03/21/2012CN102385263A Method for aligning previous-layer graphs and photomask applicable to method
03/21/2012CN102385242A Method and system for manufacturing mask
03/21/2012CN102385241A Photomask blank and photomask making method
03/21/2012CN101583906B Euv pellicle with increased EUV light transmittance
03/20/2012US8141009 Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process
03/20/2012US8141006 Photomask data processing method, photomask data processing system and manufacturing method
03/20/2012US8138483 Method of measuring phase of phase shift mask
03/20/2012US8137897 Processless development of printing plate
03/20/2012US8137896 Method of preparing lithographic printing plates
03/20/2012US8137872 Reflective mask blank for EUV lithography
03/20/2012US8137870 Method of manufacturing photomask
03/20/2012US8137868 Photomask blank, photomask, and methods of manufacturing the same
03/20/2012US8137867 Photomask blank, photomask, and methods of manufacturing the same
03/20/2012US8137576 Substrate developing method and developing apparatus
03/20/2012US8137574 Processing method of glass substrate, and highly flat and highly smooth glass substrate
03/15/2012WO2012032059A1 Method and device for the depollution of a pelliculated reticle
03/15/2012US20120064732 Method for Determining Position of Auxiliary Pattern, Method for Manufacturing Photomask, and Method for Manufacturing Semiconductor Device
03/15/2012US20120064441 Method for photo-alignment treatment, mask for photo-alignment treatment, and method for producing alignment film
03/15/2012US20120064440 Method for design and manufacture of diagonal patterns with variable shaped beam lithography
03/15/2012US20120064439 Optical compensation devices, systems, and methods
03/15/2012US20120064438 Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film
03/15/2012US20120061349 Method for correcting critical dimension of phase shift mask and method for manufacturing the same
03/15/2012US20120060711 Method for printing a material onto a substrate
03/15/2012DE19960368B4 System zum mikrolithographischen Schreiben mit verbesserter Genauigkeit System for microlithography letter with improved accuracy
03/15/2012DE10214092B4 Halbton-Phasenverschiebungsmasken-Rohling und Halbton-Phasenverschiebungsmaske Halftone phase shift mask blank and halftone phase shift mask
03/15/2012DE102005035144B4 Belichtungsmaskenherstellungsverfahren, Zeichnungsvorrichtung und Halbleiterbauelementherstellungsverfahren Exposure mask manufacturing process, drawing device and semiconductor device manufacturing method
03/14/2012EP2428841A2 Photomask blank and manufacturing method thereof, photomask, light pattern exposure method, and design method of transition metal/silicon base material film
03/14/2012CN102378939A Member for masking film, process for producing masking film using same, and process for producing photosensitive resin printing plate
03/14/2012CN102376638A Process for making conductive post with footing profile
03/14/2012CN102376606A Mask box provided with sensor
03/14/2012CN102376545A Method of forming fine patterns
03/14/2012CN102375330A Method and device for determining optimum focus of exposure equipment
03/14/2012CN102375329A Test mask and method for measuring exposure system parameters therewith
03/14/2012CN102375328A Testing photo mask template and application thereof
03/14/2012CN102375327A Embedded-attenuated phase shift mask and its manufacturing method
03/14/2012CN102375326A Binary photomask blank and binary photomask making method
03/14/2012CN102374977A Transmissivity measuring device, transmissivity detecting device of photomask and transmissivity detecting method
03/14/2012CN102372424A Substrate for masking base, masking base and method for manufacturing transferring mask
03/14/2012CN101046626B Method for etching molybdenum when manufacturing photomask
03/13/2012US8133658 Non-chemical development of printing plates
03/13/2012US8133643 Reflective mask blank for EUV lithography
03/13/2012US8133642 Metal optical grayscale mask and manufacturing method thereof
03/13/2012US8133641 Half tone mask having multi-half permeation part and a method of manufacturing the same
03/13/2012US8133640 Apparatus and method for mounting pellicle
03/08/2012US20120058421 Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit
03/08/2012US20120058420 Mask for Forming Patterns of Semiconductor Device
03/08/2012US20120058419 Titania-doped quartz glass and making method
03/08/2012US20120057159 Alignment Mark, Substrate, Set of Patterning Devices, and Device Manufacturing Method
03/08/2012US20120056350 Original and article manufacturing method using same
03/08/2012DE112004002199B4 Verfahren zur Herstellung einer Extrem-Ultraviolettstrahlung reflektierenden Maske unter Verwendung von Rasterkraftmikroskop-Lithographie A process for producing extreme ultra-violet radiation of a reflective mask using atomic force microscope lithography
03/07/2012CN102369588A Reflective photomask and reflective photomask blank
03/07/2012CN101989040B Mask layout correction method, mask layout and mask manufacturing method
03/07/2012CN101726991B Test method of optical proximity correction and manufacturing method of photomask
03/07/2012CN101140417B Semiconductor device with a bulb-type recess gate
03/06/2012US8129776 Semiconductor device
03/06/2012US8129698 Charged-particle beam writing method and charged-particle beam writing apparatus
03/06/2012US8129217 Method for producing at least one multilayer body, and multilayer body
03/06/2012US8129078 Mask, method for manufacturing the same, and method for manufacturing semiconductor device
03/01/2012WO2012027050A2 Mask for near-field lithography and fabrication the same
03/01/2012US20120054705 Manufacturing method, manufacturing program and manufacturing system for semiconductor device
03/01/2012US20120054695 Pattern Verification Method, Pattern Verification System, Mask Manufacturing Method and Semiconductor Device Manufacturing Method
03/01/2012US20120052420 Half tone mask having multi-half permeation part and a method of manufacturing the same
03/01/2012US20120052418 Method for optimizing source and mask to control line width roughness and image log slope
03/01/2012US20120052417 Circuit Apparatus Having a Rounded Trace
03/01/2012US20120052416 Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography
03/01/2012CA2807639A1 Mask for near-field lithography and fabrication the same
02/2012
02/29/2012EP2423747A1 Pellicle for lithography and manufacturing method thereof
02/29/2012CN1749861B Method for optimizing mask pattern formed on the substrate
02/29/2012CN102365584A Process for producing a photomask on a photopolymeric surface
02/29/2012CN101813881B Halftone mask and manufacture method thereof
02/29/2012CN101738846B Mask plate and manufacture method thereof
02/29/2012CN101699332B Glass substrate, detection method using glass substrate, and matrix mask
02/29/2012CN101354530B Contraposition scale on mask and method for affirming shield part position using the same
02/29/2012CN101078694B System for forming high resolution image
02/28/2012US8127265 Pattern verification method, program thereof, and manufacturing method of semiconductor device
02/28/2012US8127257 Designing method of photo-mask and method of manufacturing semiconductor device using the photo-mask
02/28/2012US8124325 Methods and apparatus for the manufacture of microstructures
02/28/2012US8124303 Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit
02/28/2012US8124302 Optical component for EUVL and smoothing method thereof
02/28/2012US8124301 Gradated photomask and its fabrication process
02/28/2012US8124300 Method of lithographic mask correction using localized transmission adjustment
02/23/2012US20120047475 Semiconductor device
02/23/2012US20120045714 Pellicle for lithography and manufacturing method thereof
02/23/2012US20120045713 Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same
02/23/2012US20120045712 Extreme ultraviolet light (euv) photomasks, and fabrication methods thereof
02/23/2012US20120045583 Process for producing a photomask on a photopolymeric surface
02/23/2012US20120042988 Purgign apparatus and purging method
02/22/2012EP2010963B1 Reflective mask blank for euv lithography
02/22/2012CN1908812B 执行双重曝光光刻的方法、程序产品和设备 Method of performing double exposure lithography, program product and apparatus
02/22/2012CN102362225A Method for forming resist pattern, and device
02/22/2012CN102362224A Method for forming resist pattern, and device
02/22/2012CN102360159A Halftone mask with multiple half-transmission parts and manufacture method thereof
02/22/2012CN102360158A Cleaning method, and cleaning fluid supplying apparatus
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