| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/26/2012 | US20120100341 Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvl |
| 04/26/2012 | US20120099615 Laser induced thermal imaging mask, laser irradiation apparatus including the same, and method of manufacturing organic light emitting device by using the same |
| 04/25/2012 | EP2444517A1 Sputtering target material, silicon-containing film forming method, and photomask blank |
| 04/25/2012 | EP2443651A2 Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks |
| 04/25/2012 | EP1393132B1 Exposure control for phase shifting photolithographic masks |
| 04/25/2012 | CN102428046A Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvl |
| 04/25/2012 | CN102426412A 一种掩模板表面微尘去除的方法 One kind of mask surface dust removal method |
| 04/25/2012 | CN102426411A 一种保护掩模板的方法 A protective mask method |
| 04/25/2012 | CN101458445B 一种用于探测刻蚀终点的装置及方法 An apparatus and method for detecting the end point of etching |
| 04/24/2012 | US8166215 Method to control delay between lanes |
| 04/24/2012 | US8163446 Method for manufacturing photomask using self-assembled molecule layer |
| 04/24/2012 | US8163445 Extreme ultraviolet mask and method for fabricating the same |
| 04/24/2012 | US8163444 Mask for crystallizing a semiconductor layer and method of crystallizing a semiconductor layer using the same |
| 04/19/2012 | US20120094220 Photo mask, photolithography method, substrate production method and display panel production method |
| 04/19/2012 | US20120094219 Method for Integrated Circuit Manufacturing and Mask Data Preparation Using Curvilinear Patterns |
| 04/19/2012 | US20120092742 Mask |
| 04/19/2012 | US20120092607 Pixel electrode layer structure of tft-lcd, method for manufacturing the same and mask therefor |
| 04/19/2012 | US20120091592 Double Patterning Technology Using Single-Patterning-Spacer-Technique |
| 04/18/2012 | EP2441736A1 Method for producing tio2-sio2 glass body,method for heat-treating tio2-sio2 glass body,tio2-sio2 glass body,and optical base for euvl |
| 04/18/2012 | CN102422408A Purging apparatus and purging method |
| 04/18/2012 | CN102421713A Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvl |
| 04/18/2012 | CN102419511A 一种清除光刻掩模板表面微尘颗粒的方法 A method of removing dust particles photomask surface method |
| 04/18/2012 | CN102419510A Substrate to be processed, manufacturing method and forming method of resist pattern |
| 04/18/2012 | CN102082088B Method for sharing SL mask plate in products of DCMP (direct chemically mechanical polishing) process |
| 04/18/2012 | CN101995763B 光学邻近校正方法 Optical proximity correction method |
| 04/18/2012 | CN101772424B 预曝光浮雕图像印刷版的方法 The pre-exposure of the relief image printing method |
| 04/18/2012 | CN101750881B 用于确定光刻掩模的可制造性的方法和系统 For determining the lithographic mask manufacturability method and system |
| 04/18/2012 | CN101609787B Method for forming patterns of semiconductor device by using mixed assist feature system |
| 04/18/2012 | CN101517483B Mask blank and method for manufacturing transfer mask |
| 04/18/2012 | CN101458447B Optical close range correction, photo mask production and graphic method |
| 04/18/2012 | CN101458446B Optical approaching correction, photo mask production and graphic method |
| 04/18/2012 | CN101419399B Method for modifying white defect of photomask |
| 04/18/2012 | CN101344718B Light shield mending method |
| 04/17/2012 | US8159649 Exposure method, exposure apparatus, photomask and method for manufacturing photomask |
| 04/17/2012 | US8158311 Method for managing light exposure mask and light exposure mask |
| 04/17/2012 | US8158306 Method and system for combining photomasks to form semiconductor devices |
| 04/17/2012 | US8158305 Photomask for extreme ultraviolet lithography and method for fabricating the same |
| 04/12/2012 | WO2012047745A1 A method of patterning nand strings using perpendicular sraf |
| 04/11/2012 | EP1586007B1 Electron beam processing for mask repair |
| 04/11/2012 | EP1299824B1 Convergence technique for model-based optical and proximity correction |
| 04/11/2012 | CN202189222U Photomask cleaning device |
| 04/11/2012 | CN1983036B 作为对准标记的二进制正弦子波长格栅 As a binary sine sub-wavelength grating alignment mark |
| 04/11/2012 | CN102414787A Laser-reflective mask and method for manufacturing same |
| 04/11/2012 | CN102414615A Method and calibration mask for calibrating a position measuring apparatus |
| 04/11/2012 | CN102414603A Color filter, liquid crystal display device, and exposure mask |
| 04/11/2012 | CN102414278A Mold release composition and surface protective film |
| 04/11/2012 | CN102412255A Method for forming impurity layer, exposure mask and method for producing solid-state imaging device |
| 04/11/2012 | CN102411260A 掩膜板缺陷检测方法 Mask defect detection method |
| 04/11/2012 | CN102411259A 对光掩膜设计版图进行光学临近修正的方法和装置 Method and apparatus for optical mask design layout optical proximity correction performed |
| 04/10/2012 | US8155926 Method and apparatus for accommodating device and/or signal mismatch in a sensor array |
| 04/10/2012 | US8154719 Mask inspection apparatus |
| 04/10/2012 | US8153339 Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask |
| 04/10/2012 | US8153338 Apparatus and method for repairing photo mask |
| 04/10/2012 | US8153337 Photomask and method for fabricating source/drain electrode of thin film transistor |
| 04/10/2012 | US8153336 Photomask substrate, photomask substrate forming member, photomask substrate fabricating method, photomask, and exposing method that uses the photomask |
| 04/10/2012 | US8153335 Lithography masks, systems, and manufacturing methods |
| 04/10/2012 | US8153334 Method for stripping pellicle and stripping apparatus used therein |
| 04/05/2012 | WO2012043695A1 Mask blank, method for producing same, and transfer mask |
| 04/05/2012 | WO2012020382A3 Modified mask for photolithography of a wafer with recess, method for producing such a mask and method for photolithography of a wafer with recess |
| 04/05/2012 | US20120083124 Method of Patterning NAND Strings Using Perpendicular SRAF |
| 04/05/2012 | US20120082925 Method for manufacturing flexible color filter substrate |
| 04/05/2012 | US20120082924 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 04/05/2012 | US20120082923 photomask throughput by reducing exposure shot count for non-critical elements |
| 04/05/2012 | DE102011083774A1 Verfahren und Vorrichtung zum Bestimmen von Laser korrigierenden Tool-Parametern Method and apparatus for determining corrective laser tool parameters |
| 04/04/2012 | EP1743217B1 Method for imprint lithography at constant temperature |
| 04/04/2012 | CN102405440A Pellicle for lithography and manufacturing method thereof |
| 04/04/2012 | CN102402118A 制备x射线衍射光学元件的方法 Methods for preparing x-ray diffraction optical element |
| 04/04/2012 | CN102402117A Photomask blank and manufacturing method thereof, photomask, light pattern exposure method, and design method of transition metal/silicon base material film |
| 04/04/2012 | CN101713912B 光刻光掩模、对准方法和检验对准精确度的方法 Lithography photomask, alignment methods and inspection methods alignment accuracy |
| 04/04/2012 | CN101075087B Semiconductor device and method of designing the semiconductor device |
| 04/03/2012 | US8151225 Pattern layout designing method, semiconductor device manufacturing method, and computer program product |
| 04/03/2012 | US8151220 Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data |
| 04/03/2012 | US8149396 Defect inspection apparatus and its method |
| 04/03/2012 | US8148037 Optical component for EUVL and smoothing method thereof |
| 04/03/2012 | US8148036 Photomask blank and photomask |
| 04/03/2012 | US8146447 Contamination analysis unit and method thereof, and reticle cleaning system |
| 03/29/2012 | US20120077114 Method, Program Product and Apparatus for Model Based Geometry Decomposition for Use in a Multiple Exposure Process |
| 03/29/2012 | US20120075606 Mask Inspection with Fourier Filtering and Image Compare |
| 03/29/2012 | US20120074499 Integrated Circuits and Methods of Design and Manufacture Thereof |
| 03/29/2012 | DE102010047050A1 Verfahren zur Charakterisierung einer Struktur auf einer Maske und Vorrichtung zur Durchführung des Verfahrens A method of characterizing a pattern on a mask and apparatus for carrying out the method |
| 03/28/2012 | EP2434345A1 Method and system for evaluating euv mask flatness |
| 03/28/2012 | CN202177777U 一种液晶显示器用掩膜板 A liquid crystal display panel with a mask |
| 03/28/2012 | CN1577080B Marker structure for alignment or overlay, mask pattern defined it and lithographic projector using the same |
| 03/28/2012 | CN102395923A Mask inspection with fourier filtering and image compare |
| 03/28/2012 | CN101943853B Manufacture method of mask |
| 03/28/2012 | CN101923279B Nano-imprint template and preparation method thereof |
| 03/28/2012 | CN101872114B Mask plate layout for manufacturing metal interconnecting wires |
| 03/28/2012 | CN101589340B Pressure-sensitive adhesive tape for the protection of photo masks |
| 03/28/2012 | CN101310221B Photomask, method for manufacturing such photomask and pattern forming method using such photomask |
| 03/27/2012 | US8146022 Mask pattern data generation method, mask manufacturing method, semiconductor device manufacturing method, and pattern data generation program |
| 03/27/2012 | US8144967 Mask data generation method, mask fabrication method, exposure method, device fabrication method, and storage medium |
| 03/27/2012 | US8142987 Method of producing a relief image for printing |
| 03/27/2012 | US8142978 Planographic printing plate precursor and printing method using the same |
| 03/27/2012 | US8142965 Method and system for measuring in patterned structures |
| 03/27/2012 | US8142963 Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device |
| 03/27/2012 | US8142962 Reflective photomask and method of fabricating the same |
| 03/27/2012 | US8142961 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method |
| 03/27/2012 | US8142959 Method and apparatus for gating photomask contamination |
| 03/27/2012 | US8142958 EUV mask and method for repairing an EUV mask |
| 03/22/2012 | US20120070768 Reticles with subdivided blocking regions and methods of fabrication |