Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
05/2012
05/23/2012CN101957556B Mask picture modification method, mask manufacturing method and optical proximity correction method
05/23/2012CN101893821B Method for optical proximity correction of database
05/23/2012CN101750877B Method of determining graphic outer contour for optical proximity correction
05/23/2012CN101655662B Method for selectively correcting layout graph
05/23/2012CN101527255B Ultraviolet irradiation set and ultraviolet irradiation processing unit
05/23/2012CN101498893B OPC method for mask preparation course in semiconductor manufacturing process
05/23/2012CN101482695B Optical mask for exposure
05/23/2012CN101477318B Photomask contraposition exposure method and photomask component
05/23/2012CN101310220B 掩模底板及光掩模 Mask plate and photomask
05/23/2012CN101286007B Manufacturing method of mask blank and manufacturing method of photomask
05/23/2012CN101201538B Soft template with alignment mark and its manufacture method
05/23/2012CN101085698B Crystallized glass and method for producing crystallized glass
05/23/2012CN101042528B Pattern dividing method for correcting optical near-field effect
05/22/2012US8185856 Manufacturing method, manufacturing program and manufacturing system for adjusting signal delay in a semiconductor device
05/22/2012US8185848 Apparatus for performing a manufacturing method of a photomask
05/22/2012US8182598 Violet colorant for colour filters, inks for ink-jet electrophotographic toners and developers and e-inks
05/17/2012US20120124528 Method and device for increasing fin device density for unaligned fins
05/17/2012US20120122025 Pellicle frame and pellicle containing same
05/17/2012US20120122024 Pellicle for lithography
05/17/2012US20120122023 Method and Apparatus for Performing Model-Based OPC for Pattern Decomposed Features
05/17/2012US20120122022 Reflective photomask and method of fabricating the same
05/17/2012US20120121857 Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvl
05/17/2012US20120121160 Method of creating template for matching, as well as device for creating template
05/16/2012EP2453473A1 Substrate-storing container
05/16/2012EP2453464A1 Euv-lithography reflection-type mask blank
05/16/2012EP2453310A2 System for purging reticle storage
05/16/2012CN102460645A Half tone mask and manufacturing method of the same
05/16/2012CN102456540A 应用于外延工艺中的光刻套刻标记的制备方法 Applied to the preparation of epitaxial process of lithography overlay mark
05/16/2012CN102455602A Program storage medium and method for determining exposure condition and mask pattern
05/16/2012CN102455590A 一种光罩夹具 One kind of mask fixture
05/16/2012CN102455589A Pellicle frame and a pellicle
05/16/2012CN102453862A Sputtering target material, silicon-containing film forming method, and photomask blank
05/15/2012US8180141 Wafer repair system
05/15/2012US8179623 Method for producing a color filter
05/15/2012US8179523 Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same
05/15/2012US8178288 Method for fabricating display substrate and liquid crystal display
05/10/2012US20120115328 Electroforming technique for mask formation
05/10/2012US20120115075 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
05/10/2012US20120115074 Methods Of Forming Patterned Masks
05/10/2012US20120115073 Sub-resolution rod in the transition region
05/10/2012US20120112085 Exposure amount evaluation method and photomask
05/10/2012US20120112067 Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system
05/09/2012EP2449427A1 Advanced photomask repair
05/09/2012EP2448764A1 Method for printing a material onto a substrate
05/09/2012CN102449736A Half tone mask and manufacturing method of the same
05/09/2012CN102449735A Half tone mask and manufacturing method of the same
05/09/2012CN102449552A Optical projection device for exposure apparatus, exposure apparatus, method for exposure, method for fabricating substrate, mask, and exposed substrate
05/09/2012CN102446826A Design and application of redundant metal filler testing photo mask on metal layer
05/09/2012CN102445859A Method for testing shading baffle of photo-etching machine
05/09/2012CN102445837A Laser pattern mask and method for fabricating the same
05/09/2012CN102445836A Photomask and exposure method thereof
05/09/2012CN102445835A Optical proximity correction modeling method of SRAM source and drain dimension
05/09/2012CN102445834A Optical modeling proximity correction method of SRAM (Static Random Access Memory) grid dimension
05/09/2012CN102445833A Photo mask defect correction method, pattern transferring method, photo mask and manufacturing method thereof
05/09/2012CN101981500B Metal optical grayscale mask and manufacturing method thereof
05/09/2012CN101881924B Mask design method
05/09/2012CN101728295B Gas filling bearing piece, gas filling bearing piece set and gas filling equipment
05/08/2012US8175737 Method and apparatus for designing and integrated circuit
05/08/2012US8173355 Gradient colored mask
05/08/2012US8173333 Reduced lens heating methods, apparatus, and systems
05/08/2012US8173332 Reflection-type exposure mask and method of manufacturing a semiconductor device
05/08/2012US8173331 Method and apparatus for sub-pellicle defect reduction on photomasks
05/08/2012US8173330 Pellicle
05/03/2012US20120108054 Dual Damascene Copper Process Using a Selected Mask
05/03/2012US20120107733 Reflective mask blank for euv lithography
05/03/2012US20120107732 Curable compositions, method of coating a phototool, and coated phototool
05/03/2012US20120107731 Photomask
05/03/2012US20120107730 Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method
05/03/2012US20120107729 Gate cd control using local design on both sides of neighboring dummy gate level features
05/03/2012US20120105779 Color filter substrate, method of manufacturing thereof and 3d liquid crystal display
05/03/2012US20120104336 Titania-doped quartz glass member and making method
05/03/2012DE102008011530B4 Verfahren zum Bearbeiten eines Objekts mit miniaturisierten Strukturen A method for processing an object with miniaturized structures
05/02/2012EP1664924B1 Method for high-resolution etching of thin layers with electron beams
05/02/2012EP1410105B1 Alleviating line end shortening in transistor endcaps by extending phase shifters
05/02/2012CN102439519A Half tone mask having multi half permeation part and manufacturing method of the same
05/02/2012CN102436151A Forming method of photoetching layout
05/02/2012CN102436138A Ultraviolet mask plate dry cleaning equipment
05/02/2012CN102436137A Method for reducing vaporific defect of maskplate
05/02/2012CN102436136A Synthetic quartz glass substrate and making method
05/02/2012CN102436135A Chromium-free photoetching plate
05/02/2012CN102436134A Method for preventing photomask from being damaged by stress in non-light-transmitting cutting channel
05/02/2012CN102436133A Method for preventing movement of main graphics caused by stress transferred by photomask version
05/02/2012CN102436132A Method for optical proximity correction based on different substrates
05/02/2012CN101533176B A manufacturing method of liquid crystal display panel
05/02/2012CN101452206B Method for forming mask pattern
05/01/2012US8171434 Method for dimension conversion difference prediction, method for manufacturing photomask, method for manufacturing electronic component, and program for dimension conversion difference prediction
05/01/2012US8171433 Method of calculating pattern-failure-occurrence-region, computer program product, pattern-layout evaluating method, and semiconductor-device manufacturing method
05/01/2012US8168959 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle
05/01/2012US8168352 Reflective mask blank for EUV lithography and mask for EUV lithography
05/01/2012US8168351 Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photomask blank
05/01/2012US8168272 Storage container for photomask-forming synthetic quartz glass substrate
05/01/2012US8168036 Apparatus and method for the removal of pellicles from masks
05/01/2012US8166985 Substrate cleaning and processing apparatus with magnetically controlled spin chuck holding pins
04/2012
04/26/2012US20120100470 Mask blank, transfer mask, and method of manufacturing a transfer mask
04/26/2012US20120100469 Exposure mask and method for forming semiconductor device by using the same
04/26/2012US20120100468 Methods of fabricating a photomask and use thereof
04/26/2012US20120100467 Sputtering target material, silicon-containing film forming method, and photomask blank
04/26/2012US20120100466 Mask blank and transfer mask
04/26/2012US20120100465 Photomasks and methods of fabricating the same
04/26/2012US20120100464 Glass substrate-holding tool
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