| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 06/13/2012 | EP1630856B1 Mutilayer film reflector and x-ray exposure system |
| 06/13/2012 | CN202275261U 薄膜边压块 Film side briquetting |
| 06/13/2012 | CN102495535A Method for obtaining mask three-dimensional vector space image based on Abbe vector imaging model |
| 06/13/2012 | CN102495525A Optically effective surface relief microstructures and method of making them |
| 06/13/2012 | CN102495524A Photomask, conducting wire manufacturing method of flat display panel and conducting wire structure of flat display panel |
| 06/13/2012 | CN101887214B Method for preparing fine metal mask bushing by wet etching |
| 06/13/2012 | CN101738847B Method of manufacturing photomask and pattren transfer method using the smae |
| 06/13/2012 | CN101661218B Method for preparing transparent light mask |
| 06/12/2012 | US8199284 Ink composition for a color filter, a color filter substrate manufactured using the ink composition and method of manufacturing a color filter substrate using the ink composition |
| 06/12/2012 | US8198118 Method for forming a robust mask with reduced light scattering |
| 06/12/2012 | US8198105 Monitor for variation of critical dimensions (CDs) of reticles |
| 06/12/2012 | US8198013 Method for preparing a printing form |
| 06/12/2012 | US8197993 Method of manufacturing transfer mask and method of manufacturing semiconductor device |
| 06/12/2012 | US8197992 Photomask blank, photomask blank manufacturing method, and photomask manufacturing method |
| 06/12/2012 | US8197991 Manufacturing method of a semiconductor device |
| 06/07/2012 | WO2012071748A1 Liquid crystal panel exposure process and mask thereof |
| 06/07/2012 | WO2012027050A3 Mask for near-field lithography and fabrication the same |
| 06/07/2012 | US20120141929 Method for manufacturing half-tone mask, and half-tone mask |
| 06/07/2012 | US20120141928 Methos and device for keeping mask dimensions constant |
| 06/07/2012 | US20120141927 Reflective mask and method for manufacturing the same |
| 06/07/2012 | US20120141926 Lcd panel photolithography process and mask |
| 06/07/2012 | US20120141925 Photo-Mask and Method for Manufacturing Liquid Crystal Display Device Using the Same |
| 06/07/2012 | US20120141924 Multiresolution Mask Writing |
| 06/07/2012 | US20120141923 Protective Cap for Extreme Ultraviolet Lithography Masks |
| 06/06/2012 | EP2461215A1 Flexographic printing original plate |
| 06/06/2012 | EP1962326B1 Reflection-type mask blank for euv lithography, and substrate with electrically conductive film for the mask blank |
| 06/06/2012 | CN202267805U 一种彩膜基板、掩模板及显示装置 One kind of color filter substrate, mask and display device |
| 06/06/2012 | CN1971416B Printing plate, method of manufacturing of printing plate and liquid crystal display device using the same |
| 06/06/2012 | CN102486605A Optical proximity correction method of covered shape |
| 06/06/2012 | CN102486604A Phase shift mask, manufacturing method thereof and haze defect detection method thereof |
| 06/06/2012 | CN101900932B Multi-gradation photomask and method of manufacturing the same, and pattern transfer method |
| 06/06/2012 | CN101840163B Illumination source and photomask optimization |
| 06/06/2012 | CN101738849B Method for amending mark layout graph |
| 06/06/2012 | CN101673048B Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device |
| 06/05/2012 | US8196071 Creating mask data of integrated circuit patterns using calculated etching conversion difference |
| 06/05/2012 | US8196070 Mask fabrication supporting method, mask blank providing method, and mask blank dealing system |
| 06/05/2012 | US8196068 Modeling critical-dimension (CD) scanning-electron-microscopy (CD-SEM) CD extraction |
| 06/05/2012 | US8196067 Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same |
| 06/05/2012 | US8193100 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 06/05/2012 | US8192921 Patterning process |
| 06/05/2012 | US8192919 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns |
| 06/05/2012 | US8192903 Photomasks |
| 06/05/2012 | US8192902 Replaced photomask |
| 06/05/2012 | US8192901 Glass substrate-holding tool |
| 06/05/2012 | US8192900 Advanced phase shift lithography and attenuated phase shift mask for narrow track width d write pole definition |
| 06/05/2012 | US8192899 Pellicle for photolithography |
| 06/05/2012 | US8192579 Method for forming color filter, method for forming light emitting element layer, method for manufacturing color display device comprising them, or color display device |
| 05/31/2012 | WO2012070209A1 Photomask blank, process for production of photomask, and chromium-containing material film |
| 05/31/2012 | US20120135356 Semiconductor device |
| 05/31/2012 | US20120135354 Method of producing a relief image for printing |
| 05/31/2012 | US20120135341 Method for double patterning lithography and photomask layout |
| 05/31/2012 | US20120135340 Photomask and formation method thereof |
| 05/31/2012 | US20120135339 Reflective extreme ultraviolet mask and method of manufacturing the same |
| 05/31/2012 | US20120133927 Defect inspection apparatus and its method |
| 05/30/2012 | EP2139026B1 Reflective mask blank for euv lithography |
| 05/30/2012 | CN102483568A Manufacturing method of half tone mask |
| 05/30/2012 | CN102479279A Method for metal correlated via split for double patterning |
| 05/30/2012 | CN102478764A 双重图形化方法 Double patterning method |
| 05/30/2012 | CN102478761A Photomask manufacturing method and system |
| 05/30/2012 | CN102478760A Optical proximity correction (OPC) method for crossover profile |
| 05/30/2012 | CN102033416B Method for washing light mask |
| 05/30/2012 | CN101840150B Graph size adjustable mask and manufacturing method thereof |
| 05/30/2012 | CN101840149B Mask plate and manufacturing method thereof and mask exposure method |
| 05/30/2012 | CN101750882B Method for determining manufacturability of lithographic mask |
| 05/30/2012 | CN101681093B Methods for performing model-based lithography guided layout design |
| 05/30/2012 | CN101650526B Mask and production method thereof |
| 05/30/2012 | CN101494162B Manufacturing method, manufacturing program and manufacturing system for semiconductor device |
| 05/30/2012 | CN101487973B Dummy pattern injection method and mask |
| 05/30/2012 | CN101477303B Mask and method of fabricating the same |
| 05/30/2012 | CN101319314B Thin-layer metal membrane material and method of producing the same |
| 05/30/2012 | CN101311825B Method for correcting optical adjacency effect |
| 05/30/2012 | CN101236355B Pattern transcription device and method of fabricating bottom plate of the pattern transcription device for the same |
| 05/30/2012 | CN101114657B Display panel, mask and method of manufacturing the same |
| 05/29/2012 | US8189968 Multimode interference coupler for use with slot photonic crystal waveguides |
| 05/29/2012 | US8189903 Photomask evaluation based on lithographic simulation using sidewall angle of photomask pattern |
| 05/29/2012 | US8187776 Color filter substrate, electronic apparatus and manufacturing method thereof |
| 05/29/2012 | US8187775 High resolution photomask |
| 05/29/2012 | US8187774 Mask for EUV lithography and method for exposure using the same |
| 05/29/2012 | US8187773 Method for generating mask pattern data and method for manufacturing mask |
| 05/29/2012 | US8187772 Solid immersion lens lithography |
| 05/24/2012 | US20120129084 Photomask blank and production method thereof, and photomask production method, and semiconductor device production method |
| 05/24/2012 | US20120129083 Method for manufacturing reflective mask and apparatus for manufacturing reflective mask |
| 05/24/2012 | US20120129082 Method of adhering lithographic pellicle and adhering apparatus therefor |
| 05/24/2012 | US20120127467 Object Inspection Systems and Methods |
| 05/24/2012 | US20120127444 Reflection Mask For EUV Lithography, System For EUV Lithography, And Method Of Fixing The Reflection Mask For EUV Lithography |
| 05/24/2012 | US20120127443 Method of producing a relief image for printing |
| 05/23/2012 | EP2455810A2 Method of adhering a lithographic pellicle and adhering apparatus therefor |
| 05/23/2012 | EP2455809A2 A pellicle for lithography |
| 05/23/2012 | CN202230297U Contact type mask |
| 05/23/2012 | CN102472962A 物体检查系统和方法 Object inspection system and method |
| 05/23/2012 | CN102472961A 时间差分掩模版检查 Time difference reticle inspection |
| 05/23/2012 | CN102472960A Pellicle frame and pellicle containing same |
| 05/23/2012 | CN102468182A Method and device for increasing fin device density for unaligned fins |
| 05/23/2012 | CN102466985A Pattern-independent and hybrid matching/tuning including light manipulation by projection optics |
| 05/23/2012 | CN102466984A 源、掩模和投影光学装置的优化 Optimization of the source, a mask and a projection optical device |
| 05/23/2012 | CN102466977A 用于测量投影物镜畸变的标记结构及方法 Tag structure and method for measuring the projection lens distortion |
| 05/23/2012 | CN102466964A 一种光刻技术用防尘薄膜组件 A lithographic technique pellicle |
| 05/23/2012 | CN102466963A 一种掩膜版及一种掩膜曝光的方法 A mask and a mask exposure method |
| 05/23/2012 | CN102466832A 一种制作大高宽比光子筛的方法 A high aspect ratio photon sieve method of making |
| 05/23/2012 | CN102043325B Mask graph correcting method and mask manufacturing method |