Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
07/2012
07/11/2012CN101989041B Method for increasing two-dimensional pattern resolution
07/11/2012CN101788760B Optimization method of optical proximity correction rule
07/10/2012US8219943 Physical design system and method
07/10/2012US8219942 Pattern verification-test method, optical image intensity distribution acquisition method, and computer program
07/10/2012US8217351 Pattern inspection method and pattern inspection system
07/10/2012US8216774 Patterning process
07/10/2012US8216748 Extreme ultraviolet photomask
07/10/2012US8216747 Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank
07/10/2012US8216746 Method of correcting defect in EUV mask
07/10/2012US8216745 Half-tone mask, half-tone mask blank and method for manufacturing half-tone mask
07/10/2012US8216744 Exposure mask and method for manufacturing same and method for manufacturing semiconductor device
07/05/2012WO2012090439A1 Half-tone mask, half-tone mask blank, and method for producing half-tone mask
07/05/2012US20120171600 Time Differential Reticle Inspection
07/05/2012US20120171433 Fluorinated coating and phototools made therewith
07/04/2012EP2256789B1 Reflective mask blank for euv lithography
07/04/2012CN202306135U 薄膜中压块 Films briquetting
07/04/2012CN102540773A Novel method for inspecting photolithographic process by utilizing optical proximity correction (OPC) models of post exposure bake
07/04/2012CN102540763A Method for reducing overheating of lithography machine lens
07/04/2012CN102540759A Photolithographic led fabrication using phase-shift mask
07/04/2012CN102540754A Optimization flows of source, mask and projection optics
07/04/2012CN102540747A Exposure method for three-dimensional mask of projection type photoetching machine
07/04/2012CN102540742A Exposure method
07/04/2012CN102540700A Method of operating a patterning device and lithographic apparatus
07/04/2012CN102540699A Novel photomask reference mark pattern
07/04/2012CN102540698A Method for computing double absorption layer alternating phase shift mask diffraction field
07/04/2012CN102135725B Method for acquiring total number of cut rectangles of PBOPC (Pixel-Based Optical Proximity Correction) optimal mask pattern
07/04/2012CN102023473B Method for improving critical dimension uniformity of mask
07/04/2012CN101943854B Design method of half-exposure region of half-gray-scale mask plate and manufacture method thereof
07/04/2012CN101930163B Pellicle
07/04/2012CN101846878B Large-size film master mask design and combination method thereof
07/04/2012CN101825841B Mask storing and cleaning system
07/04/2012CN101788757B Multi-color light adjustment mask, its manufacture method and a pattern transfer-printing method
07/04/2012CN101750876B Optical proximity correction method
07/04/2012CN101369095B Exposure manufacture process, production method of image element structure and semi-modulation type photomask using the same
07/04/2012CN101305320B System and method for mask verification using an individual mask error model
07/03/2012US8214776 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
07/03/2012US8211612 Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern
07/03/2012US8211597 Color photoresist with gold nanoparticles and color filters made thereby
07/03/2012US8211490 Double layer UV variable data text
06/2012
06/28/2012WO2012086744A1 Mask blank and method of producing the same, and transfer mask and method of producing the same
06/28/2012WO2012084363A1 Method and system for monitoring the integrity of an article, and euv optical apparatus incorporating the same
06/28/2012WO2012084142A1 Method for characterizing a structure on a mask and device for carrying out said method
06/28/2012WO2011054405A3 Method and apparatus for treating substrates
06/28/2012US20120167020 Pre-OPC Layout Editing For Improved Image Fidelity
06/28/2012US20120164566 Patterning mask and method of formation of mask using step double patterning
06/28/2012US20120164565 Fluorinated coating and phototools made therewith
06/28/2012US20120164564 Advanced photomask repair
06/28/2012US20120164563 High resolution phase shift mask
06/28/2012US20120164562 Lithography mask having sub-resolution phased assist features
06/28/2012US20120164391 Method for Producing at Least One Multilayer Body, and Multilayer Body
06/28/2012US20120162755 Mask inspection microscope with variable illumination setting
06/28/2012US20120160007 Method and calibration mask for calibrating a position measuring apparatus
06/28/2012DE102011121532A1 Verfahren zur Charakterisierung einer Struktur auf einer Maske und Vorrichtung zur Durchführung des Verfahrens A method of characterizing a pattern on a mask and apparatus for carrying out the method
06/27/2012EP1454194B1 Method and apparatus for patterning a workpiece
06/27/2012CN1928722B Testing mark for detecting projection object lens image errors, mask and detection method
06/27/2012CN102520594A Marker structure used for Alignment or superposition, mask pattern for defining, photolithography projection apparatus using mask pattern
06/27/2012CN102520593A Alignment verification method for exposure machine
06/27/2012CN102520578A Testing photomask and application thereof
06/27/2012CN102520577A Method for copying mask and pattern for exposure
06/27/2012CN102520576A Data split method and correction method of stepping photoetching mask plate for diagrammed substrate process
06/27/2012CN101893820B Method of optical proximity correction
06/27/2012CN101813883B Mask blank substrate, mask blank, exposure mask, method for manufacturing semiconductor device and method for manufacturing mask blank substrate
06/27/2012CN101443886B Mask blank manufacturing method and transfer mask manufacturing method
06/26/2012US8209640 System and method for lithography simulation
06/26/2012US8208122 Method of measuring a lithographic projection apparatus
06/26/2012US8207514 Charged particle beam drawing apparatus and proximity effect correction method thereof
06/26/2012US8206889 Manufacturing method of semiconductor integrated circuit device
06/21/2012WO2012082336A1 Method for forming stair-step structures
06/21/2012WO2012079723A1 Method for mask insepection, and mask inspection installation
06/21/2012US20120156814 Phase-shift mask with assist phase regions
06/21/2012US20120156597 Lithographic mask and manufacturing method thereof
06/21/2012US20120156596 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
06/21/2012US20120156595 Compositions comprising sugar component and processes for photolithography
06/21/2012US20120156594 Photomask including super lens and manufacturing method thereof
06/21/2012US20120156593 Method for patterning trenches with varying dimension
06/21/2012US20120156592 Use of patterned uv source for photolithography
06/21/2012DE102010063337A1 Verfahren zur Maskeninspektion sowie Maskeninspektionsanlage Method for mask inspection and mask inspection system
06/20/2012EP2465012A1 Lithographic apparatus and method
06/20/2012CN1924697B Halftone phase shift mask blank, halftone phase shift mask, and manufacturing method thereof
06/20/2012CN1896868B Halftone phase shift mask blank, halftone phase shift mask, and manufacturing method thereof
06/20/2012CN1664697B Manufacturing method for exposure mask, generating method for mask substrate information
06/20/2012CN1652022B Manufacture method of exposure mask
06/20/2012CN102511019A Pellicle and mask adhesive therefor
06/20/2012CN102508962A Method for determining recipe for regularly inserting scattering strips by vectorization parameters
06/20/2012CN101799623B Methods for cell boundary isolation in double patterning design
06/20/2012CN101546116B A masstone photomask, a method for manufacturing the same and a pattern transfer method
06/20/2012CN101441407B Photolithography dimension ultra-specification correcting etching method
06/20/2012CN101419398B Method for manufacturing mask blank and method for manufacturing photomask
06/19/2012US8202681 Hybrid multi-layer mask
06/19/2012US8202671 Protective apparatus, mask, mask forming apparatus, mask forming method, exposure apparatus, device fabricating method, and foreign matter detecting apparatus
06/14/2012US20120149204 Method of forming via holes
06/14/2012US20120148946 Color Filter of Liquid Crystal on Silicon Display Device
06/14/2012US20120148945 Resist composition and patterning process
06/14/2012US20120148944 Photomasks and methods of manufacturing the same
06/14/2012US20120148943 Method for Determining A Grey Level Etch Mask
06/14/2012US20120148942 Diagonal interconnect for improved process margin with off-axis illumination
06/14/2012US20120147722 Nanometer Scale Instrument for Biochemically, Chemically, or Catalytically Interacting with a Sample Material
06/14/2012US20120145668 Forming sloped resist, via, and metal conductor structures using banded reticle structures
06/13/2012EP2463250A1 Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvl
06/13/2012EP2462486A1 Object inspection systems and methods
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