Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
08/2012
08/02/2012US20120196209 L-shaped Feature, Method of Making an L-shaped Feature and Method of Making an L-shaped Structure
08/02/2012US20120196208 Multilayer mirror for euv lithography and process for its production
08/02/2012US20120194933 Color filter structure and manufacturing method thereof
08/02/2012DE112009002622T5 Maskenrohlingsubstrat Mask blank substrate
08/01/2012CN202362583U 手动刻蚀装置 Manual cutting apparatus
08/01/2012CN102621803A Manufacturing method of wedge-shaped super-lens
08/01/2012CN102621802A Photomask blank and photomask
08/01/2012CN102621801A Calculation method of conical diffraction field of double-layer attenuation phase-shift L/S mask with assist lines
08/01/2012CN102621800A Calculation method for diffractinonal field of double absorption layer attenuation phase-shift mask with auxiliary line
08/01/2012CN102621799A Calculation method for double absorption layer attenuation phase-shift mask diffractinonal field and degree of polarization
08/01/2012CN102043324B Method for evaluating overlay marker in development of new process
08/01/2012CN101989047B Method for detecting pattern topography of maskplate by dual exposure method
07/2012
07/31/2012US8234600 Computer readable storage medium storing program for generating reticle data, and method of generating reticle data
07/31/2012US8234596 Pattern data creating method, pattern data creating program, and semiconductor device manufacturing method
07/31/2012US8234002 Closed container and control system for closed container
07/31/2012US8233698 Pattern inspection apparatus, corrected image generation method, and computer-readable recording medium storing program
07/31/2012US8233695 Generating image inspection data from subtracted corner-processed design data
07/31/2012US8232029 Methods of fabricating a photomask and use thereof
07/26/2012US20120190197 Mask plate, pattening method and method for manufacturing array substrate
07/26/2012US20120189946 Mask blank and transfer mask
07/26/2012US20120187080 Processing method of row bar for manufacturing slider and bar mask for row bar processing
07/25/2012EP2478418A2 Laser ablation tooling via distributed patterned masks
07/25/2012EP2257853B1 Method for processing an object with miniaturized structures
07/25/2012CN202351611U Large surface film member used frame body and large surface film member
07/25/2012CN1983028B Mask blank and method for manufacturing transfer mask
07/25/2012CN102612665A Thermosetting protective solution for glass mask, and glass mask
07/25/2012CN102610606A Semiconductor device and its manufacturing method and optical proximity processing method
07/25/2012CN102608860A Photoetching method, photomask combination and exposure system
07/25/2012CN102608859A Mask plate and method for applying it to manufacture thin film transistor array substrate
07/25/2012CN102269924B Method for optimizing attenuated phase-shifting mask (ATTPSM) of nonideal photoetching system based on Abbe vector imaging model
07/25/2012CN102005408B Preparation method of metal wire
07/25/2012CN101963753B Multi-color photomask and method of manufacturing the same, and pattern transfer method
07/25/2012CN101681092B Photomask substrate, photomask substrate forming member, photomask substrate manufacturing method, photomask, and exposure method using photomask
07/25/2012CN101609253B Method for fabricating extreme ultraviolet lithography mask
07/25/2012CN101556432B Photomask blank, photomask, and method for manufacturing photomask
07/25/2012CN101533217B Extreme ultraviolet mask and method for fabricating the same
07/25/2012CN101315518B Photomask testing method, photomask manufacture method, electronic component manufacture method
07/25/2012CN101281365B Material pattern, and mold, metal thin-film pattern, and methods of forming metal pattern
07/24/2012US8229206 Photomask inspection method
07/24/2012US8229062 Transmission mask with differential attenuation to improve ISO-dense proximity
07/24/2012US8228455 Exposing device, methods for forming pattern, channel, and hole by using the same, and liquid crystal display device therewith and method for fabricating the same
07/24/2012US8227774 Method and system for feature function aware priority printing
07/24/2012US8227265 Method of measuring pattern shape, method of manufacturing semiconductor device, and process control system
07/24/2012US8227153 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure
07/24/2012US8227152 Reflective mask blank for EUV lithography
07/24/2012US8227151 Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor device
07/24/2012US8227150 Holographic reticle and patterning method
07/24/2012US8227149 Masks and methods of forming the same
07/19/2012WO2012096847A2 Apparatus for euv imaging and methods of using same
07/19/2012US20120183893 Resist composition and patterning process
07/19/2012US20120183892 Resist composition and patterning process
07/19/2012US20120183891 Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device
07/19/2012US20120183890 Method for fabricating a mask
07/19/2012US20120183889 Multiple lithographic system mask shape sleeving
07/18/2012EP2477072A1 A pellicle film and a pellicle for EUV application, and a method for manufacturing the film
07/18/2012CN1912740B 曝光掩模 Exposure mask
07/18/2012CN102597890A Holographic mask inspection system with spatial filter
07/18/2012CN102597881A Exposure apparatus and photomask used therein
07/18/2012CN102597880A Exposure device and photo mask
07/18/2012CN102597873A Focus test mask, focus measuring method, exposure apparatus, and exposure method
07/18/2012CN102597872A Method of pattern selection for source and mask optimization
07/18/2012CN102591139A Photoetching method of superfine structure
07/18/2012CN102591138A Double-light-resistance wall and preparation method thereof
07/18/2012CN102591137A Ablative black film for directly making plate by flexographic plate computer and preparation method of ablative black film
07/18/2012CN102591136A Pellicle film and a pellicle for EUV application, and a method for manufacturing the film
07/18/2012CN102591135A Monitoring method for graphic changes caused by lens heating during continuous exposure
07/18/2012CN102591134A Mask plate and preparing method thereof
07/18/2012CN102583974A Titania-doped quartz glass and method for manufacturing the same
07/18/2012CN101894756B Groove formation method, metal wire formation method, photoetching method and equipment
07/18/2012CN101271864B Photo mask and method for fabricating image sensor using the same
07/18/2012CN101238412B Exposure mask manufacture method, pattern copy method
07/17/2012US8224590 Apparatus and method of inspecting mask
07/17/2012US8223403 Inspection apparatus, inspection method and manufacturing method of mask for exposure, and mask for exposure
07/17/2012US8222051 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
07/17/2012US8221965 Antireflective coating compositions
07/17/2012US8221964 Integrated color mask
07/17/2012US8221945 Pellicle frame and lithographic pellicle
07/17/2012US8221944 Pellicle frame and lithographic pellicle
07/17/2012US8221943 Photomask with assist features
07/17/2012US8221942 Pattern correction method, exposure mask, manufacturing method of exposure mask, and manufacturing method of semiconductor device
07/17/2012US8221941 Photomask blank manufacturing method and photomask manufacturing method
07/17/2012US8221940 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
07/17/2012US8221939 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages
07/12/2012WO2012093834A2 Pellicle membrane and method of manufacturing same
07/12/2012US20120176590 Exposure Method, Exposure Apparatus, Light Converging Pattern Formation Member, Mask, and Device Manufacturing Method
07/11/2012EP2474999A2 Laser-reflective mask and method for manufacturing same
07/11/2012CN1924698B Binary photomask having a compensation layer and method of manufacturing the same
07/11/2012CN1898603B Extreme ultraviolet mask with molybdenum phase shifter
07/11/2012CN102576188A Method, inspection apparatus and substrate for determining an approximate structure of an object on the substrate
07/11/2012CN102569192A Method for manufacturing array substrate of semi-transmission and semi-reflection type liquid crystal display
07/11/2012CN102566311A Dynamic stability measuring method for plate making photoetching device
07/11/2012CN102566301A Measuring method, apparatus and substrate
07/11/2012CN102566299A Pattern-dependent proximity matching/tuning including light manipulation by projection optics
07/11/2012CN102566257A Method for cleaning mask plates by means of ultraviolet light and reactive gas
07/11/2012CN102566256A Device and method for repairing mask plate
07/11/2012CN102566255A Photomask for aligning exposure machine and photomask alignment mark production method
07/11/2012CN102566254A Methods for performing model-based lithography guided layout design
07/11/2012CN102566253A Nickel alloy light guide plate cavity
07/11/2012CN102096309B Optical proximity correction method
07/11/2012CN102043326B Mask graph correcting method
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