Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
09/2012
09/04/2012US8261225 Semiconductor integrated circuit, standard cell, standard cell library, semiconductor integrated circuit designing method, and semiconductor integrated circuit designing equipment
09/04/2012US8261214 Pattern layout creation method, program product, and semiconductor device manufacturing method
09/04/2012US8260031 Pattern inspection apparatus, pattern inspection method, and computer-readable recording medium storing a program
09/04/2012US8257887 Photomask defect correcting method and device
09/04/2012US8257886 Phase shift mask with enhanced resolution and method for fabricating the same
08/2012
08/30/2012WO2012114980A1 Reflective mask blank for euv lithography
08/30/2012US20120219890 Optical member for euv lithography, and process for production of reflective layer-equipped substrate
08/30/2012US20120219889 Photomask blank, photomask, and photomask manufacturing method
08/30/2012US20120219888 Chemically amplified negative resist composition and patterning process
08/30/2012US20120219887 Chemically amplified negative resist composition and patterning process
08/30/2012US20120219886 Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
08/30/2012US20120218537 Exposure apparatus and photomask used therein
08/30/2012US20120217421 Method and system for forming patterns using charged particle beam lithography with overlapping shots
08/29/2012EP2492746A2 Chemically amplified negative resist composition and patterning process
08/29/2012CN202404351U Chromium carbide composite material metal mask plate
08/29/2012CN102650821A Method for preparing high-temperature resistant hard photomask
08/29/2012CN102650820A Mask frame and light curing method
08/29/2012CN102650819A Photo mask and positioning method of photo mask
08/29/2012CN102226867B Clamping apparatus for flushing photomask
08/29/2012CN102053480B Method for repairing defect of mask
08/29/2012CN101454069B Production of micro- and nanopore mass arrangements by self-organization of nanoparticles and sublimation technology
08/28/2012US8253947 Device and method for measuring lithography masks
08/28/2012US8252490 Color filter and solid state imaging device having a colored pattern formed from a curable composition
08/28/2012US8252488 Mask blank substrate manufacturing method, and reflective mask blank manufacturing method
08/28/2012US8252487 Use in lithography; a transparent substrate, a patterned absorber layer to impart projection beam with a pattern in its cross-section
08/23/2012WO2012110602A1 Apparatus and method for analyzing and modifying a specimen surface
08/23/2012US20120214093 Photomask blank, photomask blank manufacturing method, and photomask manufacturing method
08/23/2012US20120214092 Method of manufacturing a photomask
08/23/2012US20120214091 Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition
08/23/2012US20120212721 Substrates and mirrors for euv microlithography, and methods for producing them
08/23/2012US20120212717 Exposure apparatus and photo mask
08/22/2012EP2490227A1 Multilayer film reflector and X-ray exposure system
08/22/2012CN102646594A Groove of electrostatic discharge (ESD) circuit and preparation method of groove
08/22/2012CN102645851A Illumination source and photomask optimization
08/22/2012CN102645839A Mask plate and manufacturing method thereof
08/22/2012CN102645838A 掩膜及其制造方法 Mask and its manufacturing method
08/22/2012CN102645793A Generation method and system of columnar spacer matter as well as liquid crystal display panel
08/22/2012CN102169287B Photolithographic mask and preparation method thereof
08/22/2012CN102129169B Auxiliary pattern filling method and device
08/22/2012CN102129166B Method for setting sub-resolution assistance feature and method for producing photoetching mask plate
08/22/2012CN102129164B Method and system for judging mask defects
08/22/2012CN101620373B Light shield repair method and light shield repair device of LED display screens
08/22/2012CN101430499B Storage container for photomask-forming synthetic quartz glass substrate
08/22/2012CN101025565B Method of modifying defect in gray tone mask and gray tone mask
08/21/2012US8250517 Shape-based geometry engine to perform smoothing and other layout beautification operations
08/21/2012US8250496 Method for transferring self-assembled dummy pattern to substrate
08/21/2012US8247141 Method of generating reticle data, memory medium storing program for generating reticle data and method of producing reticle
08/21/2012US8247140 Mask and method for fabricating the same
08/16/2012US20120208113 Lithographic Processing Method, and Device Manufactured Thereby
08/16/2012US20120208112 Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device
08/16/2012US20120208111 Method of manufacturing photo-mask
08/16/2012US20120206700 Apparatus for manufacturing a photomask
08/15/2012CN202383417U Non-chrome photo-etching plate
08/15/2012CN102640021A Optical member for euv lithography, and process for production of reflective-layer-attached substrate for euv lithography
08/15/2012CN102637629A Mask assembly of IC (integrated circuit) device with laminated contact layers for reducing number, as well as method thereof
08/15/2012CN102636952A Manufacturing method for preventing laser plotting film deformation
08/15/2012CN102636951A Computing method for diffraction field of double-absorbing-layer alternating phase shift contact hole mask
08/15/2012CN102269926B Method for optimizing optical proximity correction (OPC) of nonideal photoetching system based on Abbe vector imaging model
08/14/2012US8243524 Semiconductor storage device
08/14/2012US8243263 Optical inspection method and optical inspection apparatus
08/14/2012US8241923 Method for correcting mask pattern and method for manufacturing acceleration sensor and angular velocity sensor by using the method for correcting the mask pattern
08/14/2012US8241841 Patterning methods and products
08/14/2012US8241821 Reflective mask blank for EUV lithography, process for producing the same and mask for EUV lithography
08/14/2012US8241820 Photomask used in fabrication of semiconductor device
08/09/2012WO2012105698A1 Substrate with conductive film, substrate with multilayer reflection film, and reflective mask blank for euv lithography
08/09/2012WO2012105508A1 Reflective mask blank for euv lithography
08/09/2012WO2012103933A1 Method and apparatus for correcting errors in an euv lithography system
08/09/2012WO2012080008A3 Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
08/09/2012US20120202349 Photo-imageable Hardmask with Dual Tones for Microphotolithography
08/09/2012US20120202144 Pellicle and mask adhesive therefor
08/09/2012US20120202143 Reduced lens heating methods, apparatus, and systems
08/09/2012US20120202142 Manufacturing method of exposure mask, shipment judgment method and manufacturing method of semiconductor device using exposure mask
08/09/2012US20120202141 Chemical amplification type positive resist composition, and resist film, resist coated mask blanks and resist pattern forming method using the composition
08/09/2012US20120202140 Flare prediction method, photomask manufacturing method, semiconductor device manufacturing method, and computer-readable medium
08/09/2012US20120202139 Boundary Layer Formation and Resultant Structures
08/09/2012US20120202138 Single Field Zero Mask For Increased Alignment Accuracy in Field Stitching
08/09/2012US20120200835 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle
08/09/2012US20120199284 Method for forming color filter, method for forming light emitting element layer, method for manufacturing color display device comprising them, or color display device
08/09/2012DE102012201719A1 Verfahren zur Herstellung einer elektrisch korrekten integrierten Schaltung A process for producing an electrically correct integrated circuit
08/08/2012CN202372752U Photomask shielding unit for stepped lithography machine
08/08/2012CN102629080A Production method for film-like product, production apparatus for film-like product, and mask
08/08/2012CN102103322B Flexographic plate for direct plate making of computer and preparation method thereof
08/08/2012CN102096334B Super-diffraction imaging device for improving resolution based on phase shifting principle and manufacturing method thereof
08/08/2012CN102023472B Method for detecting photomask and method for reducing rework rate of semiconductor products by using photomask
08/08/2012CN101986206B Method for utilizing functional mask board to manufacture mask substrate for solidifying sealing glue
08/08/2012CN101794070B Device for reducing projection super-resolution imaging and photoetching method
08/08/2012CN101713919B A multilevel greyscale photo mask and method for producing the same
08/08/2012CN101349862B Method for calibrating optical approach correcting model based on multi-photoresist active diffusion length
08/08/2012CN101228478B Method for generating photo mask graphic data, photo mask generated by the data and manufacturing method of semiconductor device using the photo mask
08/07/2012US8239789 System and method of predicting problematic areas for lithography in a circuit design
08/07/2012US8239787 Method of generating original plate data by repeatedly calculating approximate aerial image
08/07/2012US8237139 Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus
08/07/2012US8236482 Photoresist compositions and methods of use in high index immersion lithography
08/07/2012US8236479 Method for printing a pattern on a substrate
08/07/2012US8236464 Method for fabricating a mask
08/07/2012US8235212 Mask transport system configured to transport a mask into and out of a lithographic apparatus
08/02/2012WO2012102313A1 Method for manufacturing photomask
08/02/2012US20120196212 Method and apparatus for sub-pellicle defect reduction on photomasks
08/02/2012US20120196211 Resist pattern forming process
08/02/2012US20120196210 Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge
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