| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/27/2012 | US20120244458 Etch process for controlling pattern cd and integrity in multi-layer masks |
| 09/27/2012 | DE102011006055A1 Position measuring device for mask inspection device for inspecting lithographic mask of arrangement of a positioning system, is configured by location or tilted position or certain position of object |
| 09/26/2012 | EP2503390A2 Phase shift mask, semiconductor device and method of manufacturing the same |
| 09/26/2012 | CN202453647U Mask, exposure device and system |
| 09/26/2012 | CN102694094A Patterned substrate, mask and patterned substrate manufacturing method |
| 09/26/2012 | CN102692831A Counterpoint mark and method for using same to manufacture workpieces in exposure process |
| 09/26/2012 | CN102692830A Method for evaluating overlay error and mask for the same |
| 09/26/2012 | CN102692820A Device and method for measuring projection lens distortion |
| 09/26/2012 | CN102692816A Manufacturing method of optical mask, image transferring method and manufacturing method of display device |
| 09/26/2012 | CN102692815A Photomask and method for manufacturing same |
| 09/26/2012 | CN102692814A Light source-mask mixed optimizing method based on Abbe vector imaging model |
| 09/26/2012 | CN102692813A Manufacturing method of optical mask, image transferring method and manufacturing method of display device |
| 09/26/2012 | CN102692812A Extreme UV-Light photomask, manufacturing method for the same, and method for patterning base material |
| 09/26/2012 | CN102117010B Optical adjacent correcting method |
| 09/26/2012 | CN102109755B Device and method for realizing alignment-deviation measurement in photoetching technology |
| 09/26/2012 | CN101656225B Hybrid multi-layer photo-mask set and manufacturing method thereof |
| 09/26/2012 | CN101650528B System and method for using a two part cover for protecting a reticle |
| 09/26/2012 | CN101256349B Defect correction method and manufacturing method for grey level mask and grey level mask |
| 09/25/2012 | US8276103 Photomask designing method, photomask manufacturing method, and photomask designing program |
| 09/25/2012 | US8275189 Defect inspection system |
| 09/25/2012 | US8274047 Substrate surface inspection method and inspection apparatus |
| 09/25/2012 | US8273522 Exposure mask and method for manufacturing semiconductor device using the same |
| 09/25/2012 | US8273520 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same |
| 09/25/2012 | US8273507 Pellicle for lithography and a method for making the same |
| 09/25/2012 | US8273506 Method of manufacturing optical element, and optical element |
| 09/25/2012 | US8273505 Mask blank and method of manufacturing an imprint mold |
| 09/25/2012 | US8273179 Deposition mask for display device and method for fabricating the same |
| 09/20/2012 | WO2012125647A2 Euv actinic reticle inspection system using imaging sensor with thin film spectral purity filter coating |
| 09/20/2012 | WO2012125581A2 Method and apparatus for inspecting a reflective lithographic mask blank and improving mask quality |
| 09/20/2012 | WO2012122751A1 Method for fabricating paraboloidal type two-dimensional focusing x-ray combined refraction lens |
| 09/20/2012 | US20120238096 Method and apparatus for inspecting a reflective lithographic mask blank and improving mask quality |
| 09/20/2012 | US20120237879 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns |
| 09/20/2012 | US20120237861 Photomask and photomask substrate with reduced light scattering properties |
| 09/20/2012 | US20120237860 Reflective extreme ultraviolet mask and method of manufacturing the same |
| 09/20/2012 | US20120237859 Method of approximating value of critical dimension of pattern formed by photolithography and method of fabricating photomask including opc based on approximated value of a cd of a pattern |
| 09/20/2012 | US20120237858 Photomask and a method for determining a pattern of a photomask |
| 09/20/2012 | US20120237857 Photomask and method for forming overlay mark using the same |
| 09/20/2012 | US20120237731 Method and device for producing masks for a laser installation |
| 09/20/2012 | US20120236279 Mask Pattern Correction Device, Method of Correcting Mask Pattern, Light Exposure Correction Device, and Method of Correcting Light Exposure |
| 09/19/2012 | EP2499539A1 Optimized mask design for fabricating periodic and quasi-periodic patterns |
| 09/19/2012 | CN202443245U Mask plate and detection system thereof |
| 09/19/2012 | CN202443226U Mask plate and voltage control system thereof |
| 09/19/2012 | CN102687078A Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device |
| 09/19/2012 | CN102687073A Inspection method and apparatus |
| 09/19/2012 | CN102687072A Method and device for producing masks for a laser installation for the production of microstructures |
| 09/19/2012 | CN102687071A Reflective-layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for producing reflective-layer-equipped substrate |
| 09/19/2012 | CN102681334A Grasping method of frame of large pellicle |
| 09/19/2012 | CN102681333A Method for calculating distribution in near field of one dimensional photomask with multiple absorption layers |
| 09/19/2012 | CN102681332A Resist film peeling method, mask blank manufacturing method and transfer mask manufacturing method |
| 09/19/2012 | CN102681331A A photomask and a method for determining a pattern of the photomask |
| 09/19/2012 | CN102681330A Photomask and method for forming overlay mark using the same and precision improvement method for counterpoint of secondary pattern technology |
| 09/19/2012 | CN102681067A Color filter and preparation method thereof |
| 09/19/2012 | CN102096190B Metallic photo-thermal drive microswitch and manufacturing method thereof |
| 09/19/2012 | CN101625523B Resist patterning forming process and manufacturing method of photo mask |
| 09/19/2012 | CN101587294B Pellicle and method for producing pellicle |
| 09/19/2012 | CN101271267B Production method of exposure light shield and thin film graphic pattern layer |
| 09/18/2012 | US8268530 Positive resist composition, method of forming resist pattern, polymeric compound, and compound |
| 09/18/2012 | US8268518 Method and lithography device with a mask reflecting light |
| 09/18/2012 | US8268517 Photolithographic method and mask devices utilized for multiple exposures in the field of a feature |
| 09/18/2012 | US8268516 Method for repairing phase shift masks |
| 09/18/2012 | US8268515 Mask blank and method of manufacturing a transfer mask |
| 09/18/2012 | US8268513 Mask blank manufacturing method |
| 09/13/2012 | WO2012121159A1 Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate |
| 09/13/2012 | US20120231378 Reflective layer-equipped substrate for euv lithography, reflective mask blank for euv lithography, reflective mask for euv lithography, and process for production of the reflective layer-equipped substrate |
| 09/13/2012 | US20120228804 Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method |
| 09/13/2012 | US20120228743 Methods of Manufacturing Semiconductor Devices and Optical Proximity Correction |
| 09/13/2012 | DE102007043097B4 Layout-Verfahren für eine Maske Layout method for a mask |
| 09/12/2012 | EP2498129A1 Focus test mask, focus measuring method, exposure apparatus, and exposure method |
| 09/12/2012 | CN102667622A Photomask |
| 09/12/2012 | CN102662309A System and method for mask verification using individual mask error model |
| 09/12/2012 | CN102662303A Calculating method of two-dimensional photomask near-field distribution of multi-absorbed layer |
| 09/12/2012 | CN101201537B Checking device for grey mask, manufacture method and pattern transprinting method thereof |
| 09/11/2012 | US8266552 Pattern generating method, method of manufacturing semiconductor device, and recording medium |
| 09/11/2012 | US8264535 Method and apparatus for analyzing a group of photolithographic masks |
| 09/11/2012 | US8264466 Touch screen having reduced visibility transparent conductor pattern |
| 09/11/2012 | US8263319 Display member exposing method and plasma display member manufacturing method |
| 09/11/2012 | US8263295 Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography |
| 09/11/2012 | US8263294 Lithographic mask and manufacturing method thereof |
| 09/11/2012 | US8263293 Photolithography; monolithic; photopolymerization |
| 09/07/2012 | WO2012118616A2 Method and system for forming patterns using charged particle beam lithography |
| 09/07/2012 | WO2012118615A2 Method and system for design of a surface to be manufactured using charged particle beam lithography |
| 09/06/2012 | US20120225375 Optical member for euv lithography |
| 09/06/2012 | US20120225374 Photomask and method for manufacturing the same |
| 09/05/2012 | CN202421717U Mask plate |
| 09/05/2012 | CN202421716U Integrated sensor structure |
| 09/05/2012 | CN1908816B Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material |
| 09/05/2012 | CN1873530B Display device, method of manufacturing the same and mask for manufacturing the same |
| 09/05/2012 | CN102656516A Photomask blank, and process for production of photomask |
| 09/05/2012 | CN102655175A TFT (thin film transistor), array base plate, display device and mask plate for preparing TFT |
| 09/05/2012 | CN102655095A Manufacture methods of thin film transistor and array base plate |
| 09/05/2012 | CN102654730A Photomask blank, photomask and fabrication method thereof |
| 09/05/2012 | CN102654729A Computing method of dual-layer attenuated phase shift contact hole mask diffraction field with assist features |
| 09/05/2012 | CN102193306B Method for designing optical mask |
| 09/05/2012 | CN102135723B Method for correcting photoetched pattern of current layer based on pattern after substrate etching |
| 09/05/2012 | CN102125921B Transmission method of optical mask in cleaning process |
| 09/05/2012 | CN101937169B Method for manufacturing photo mask blank, method for manufacturing photo mask, and coating apparatus |
| 09/05/2012 | CN101770162B Backside phase grating mask and method for manufacturing the same |
| 09/05/2012 | CN101726988B Design and layout of phase shifting photolithographic masks |
| 09/05/2012 | CN101675385B Improving process model accuracy by modeling mask corner rounding effects |
| 09/05/2012 | CN101236164B Method and system for defect detection |