Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
10/2012
10/24/2012CN101191997B Photomask and its manufacture method and pattern definition method
10/23/2012US8295584 Pattern measurement methods and pattern measurement equipment
10/23/2012US8294277 Semiconductor memory device with wiring layout pattern structure
10/23/2012US8293456 Semiconductor device manufacturing method
10/23/2012US8293450 Comprising polymer matrix, labeling dye which absorbs electromagnetic radiation in visible range of 400-700 nm to provide visible coloration, wherein labeling dye forms reaction product upon exposure to radiation energy at wavelength of 400-900 nm, and where product has color different from labeling dye
10/23/2012US8293436 Oxime derivative, photopolymerizable composition, color filter, and process for producing the same
10/23/2012US8293435 Photomask blank, photomask, and methods of manufacturing the same
10/23/2012US8293434 Method for forming convex pattern, exposure apparatus and photomask
10/23/2012US8293433 Pellicle for lithography and a method for making the same
10/23/2012US8293432 Pellicle
10/23/2012US8293431 Lithographic mask and method of forming a lithographic mask
10/23/2012US8293430 Method for etching a molybdenum layer suitable for photomask fabrication
10/23/2012US8293326 Spin-coating method, determination method for spin-coating condition and mask blank
10/18/2012US20120264584 Substrate for euvl optical member
10/18/2012US20120264067 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
10/18/2012US20120264039 Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic el display, image display device and colorant compound
10/17/2012EP2511945A1 Multilayer mirror for euv lithography and process for producing same
10/17/2012EP2511944A1 Reflective-layer-equipped substrate for euv lithography, reflective mask blank for euv lithography, reflective mask for euv lithography, and process for producing reflective-layer-equipped substrate
10/17/2012EP2511943A1 Optical member for use in euv lithography
10/17/2012EP2511764A1 Method for processing an object with miniaturized structures
10/17/2012EP2510397A1 Method for manufacturing a multilayer structure with a lateral pattern for application in the xuv wavelength range, and bf and lmag structures manufactured according to this method
10/17/2012CN202494861U Airing device for mask plate
10/17/2012CN202494860U Mask plate white defect repairing and baking device
10/17/2012CN202494859U Device for attaching protective film to mask plate
10/17/2012CN102741746A Photomask, exposure device, and method for producing liquid crystal display panel
10/17/2012CN102737959A Model of defining a photoresist pattern collapse rule, and photomask layout, semiconductor substrate and method for improving photoresist pattern collapse
10/17/2012CN102736441A Multi-layer reflecting mirror and lithographic device
10/17/2012CN102736405A Photomask and amendment method therefor
10/17/2012CN102736404A Lithographic platemaking imposition process
10/17/2012CN102736403A Method for storing a pellicle
10/17/2012CN102736402A Substrate for photomask, photomask, method for manufacturing photomask and method for transfering pattern
10/17/2012CN102736401A Dustproof pellicle component frame, manufacturing method thereof and dustproof pellicle component
10/17/2012CN102736400A Dustproof pellicle film, manufacturing method thereof, and dustproof pellicle component with pellicle film attached
10/17/2012CN102736399A Method of forming standard mask for inspection system
10/17/2012CN102736398A Substrate for photomask, photomask and pattern transfer method
10/17/2012CN102736397A Photomask substrate, photomask, photomask substrate set, photomask set, method for manufacturing photomask and pattern transfer method
10/17/2012CN101976017B Differential hierarchical processing method for optical proximity correction
10/17/2012CN101923292B Removal method of chromium residues on border of mask
10/17/2012CN101526735B Designing method of photo-mask and method of manufacturing semiconductor device using the photo-mask
10/16/2012US8288812 Semiconductor device and method of manufacturing the same
10/16/2012US8288081 Method and system for exposure of a phase shift mask
10/16/2012US8288062 Reflective mask blank for EUV lithography
10/16/2012US8288061 Reticle and manufacturing method of solid-state image sensor
10/11/2012WO2012138557A2 Method and mask for enhancing the resolution of patterning 2-row holes
10/11/2012US20120260222 Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
10/11/2012US20120258389 Titania-doped quartz glass and making method
10/11/2012US20120258388 Surface treatment method for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask
10/11/2012US20120258387 Method and mask for enhancing the resolution of patterning 2-row holes
10/11/2012US20120258386 Model of defining a photoresist pattern collapse rule, and photomask layout, semiconductor substrate and method for improving photoresist pattern collapse
10/11/2012US20120255454 Method for printing a pattern on a substrate
10/10/2012EP2509102A1 Optical member for euv lithography, and process for production of reflective-layer-attached substrate for euv lithography
10/10/2012EP2509099A2 Electron beam exposure apparatus and electron beam exposure method
10/10/2012CN102722082A Mask and overlay measuring method
10/10/2012CN102103323B Half-tone mask plate and manufacturing method thereof
10/10/2012CN102087469B Optical proximity effect corrective modeling method and generating method of test pattern
10/10/2012CN102073210B Method for compensating deformation effect after exposure of two-dimensional design layout
10/10/2012CN102016717B Reflective mask blank for EUV lithography, and reflective mask for EUV lithography
10/10/2012CN101819377B Method for evaluating multi-gray scale photomas
10/10/2012CN101809499B Mask blank, and method for production of imprint mold
10/10/2012CN101738851B Method of manufacturing photomask, lithography apparatus, method and apparatus for inspecting photomask
10/10/2012CN101526733B Multicolor photo mask and pattern transfer printing method using same
10/09/2012US8285031 Pattern inspection apparatus and method
10/09/2012US8284356 LCD device including a reflection film having a convex-concave surface
10/09/2012US8283094 Method for fracturing and forming a pattern using circular characters with charged particle beam lithography
10/09/2012US8283093 Optical proximity correction process
10/09/2012US8283092 Photomask blank, photomask, and photomask manufacturing method
10/04/2012WO2012133109A1 Method for correcting mask for euv exposure, and mask for euv exposure
10/04/2012WO2012131479A1 Antireflective coating composition and process thereof
10/04/2012US20120251931 Transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
10/04/2012US20120251930 Photomask blank and method for manufacturing photomask
10/04/2012US20120251929 Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank
10/04/2012US20120251928 Method of manufacturing a transfer mask and method of manufacturing a semiconductor device
10/04/2012US20120250011 Pattern verification-test method, optical image intensity distribution acquisition method, and computer program
10/03/2012EP1587113B1 Stylus system for modifying small structures
10/03/2012CN202472237U Flat photoetching plate
10/03/2012CN202472184U 掩膜装置 Mask device
10/03/2012CN102714169A Substrate storing device
10/03/2012CN102707582A Light source-mask synchronous optimization based on Abbe vector imaging model
10/03/2012CN102707563A Light source and mask alternate optimization method based on Abbe vector imaging model
10/03/2012CN102707352A Color filter and method for manufacturing same
10/03/2012CN102269925B Phase-shift mask optimizing method based on Abbe vector imaging model
10/03/2012CN102147567B Cell-based hierarchical optical proximity correction (OPC) method
10/03/2012CN102129170B Attenuated phase shift mask production method
10/03/2012CN101957555B Mask picture modification method, mask manufacturing method and optical proximity correction method
10/03/2012CN101923280B Optical proximity correction figure for enhancing figure fidelity of Si/Ge emitter window
10/03/2012CN101750902B Atomization effect compensation method of exposure conditions of diverse electron beams and exposure method thereof
10/03/2012CN101546118B Mask for lithography, method of forming mask data for lithography, manufacturing back-illuminated solid-state imaging device, method thereof, and electronic device
10/03/2012CN101482893B Semiconductor-device manufacturing method
10/02/2012US8280632 Apparatus and method for inspecting overlapping figure, and charged particle beam writing apparatus
10/02/2012US8280147 Pattern verification method, pattern verification apparatus, and pattern verification program
10/02/2012US8279432 Particle inspection and removal apparatus and particle inspection and removal program
10/02/2012US8278760 Semiconductor integrated circuit and method for manufacturing same, and mask
10/02/2012US8278028 Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same
10/02/2012US8278014 Photomask and pattern formation method using the same
09/2012
09/27/2012US20120246603 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium
09/27/2012US20120244714 Exposure mask and method for manufacturing same and method for manufacturing semiconductor device
09/27/2012US20120244707 Method of correcting mask pattern, computer program product, mask pattern correcting apparatus, and method of manufacturing semiconductor device
09/27/2012US20120244477 Pellicle for lithography
09/27/2012US20120244460 Mechanisms for patterning fine features
09/27/2012US20120244459 Method for evaluating overlay error and mask for the same
1 ... 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 ... 249