Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2012
11/27/2012US8318387 Mask blank substrate set and mask blank set
11/27/2012US8316698 Determining a repairing form of a defect at or close to an edge of a substrate of a photo mask
11/22/2012WO2012157759A1 Pellicle, pressure-sensitive adhesive for pellicle, photomask with pellicle, and method for manufacturing semiconductor device
11/22/2012WO2012157697A1 Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method
11/22/2012WO2012157629A1 Mask blank substrate, mask blank, reflective mask blank, transfer mask, reflective mask, and method for making these
11/22/2012WO2012157181A1 Pattern inspecting apparatus and pattern inspecting method
11/22/2012US20120297353 Patterning method and semiconductor device
11/22/2012US20120295187 Dummy patterns and method for generating dummy patterns
11/22/2012US20120295186 Double patterning mask set and method of forming thereof
11/22/2012US20120293884 Color filter substrate, display device, and exposure method
11/22/2012US20120293787 Method for controlling the electronic beam exposure of wafers and masks using proximity correction
11/22/2012US20120293763 Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device
11/22/2012US20120292666 Semiconductor device
11/21/2012CN202548530U Mask plate and mask plate system
11/21/2012CN1804601B Apparatus for marking a defect
11/21/2012CN102792222A Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method
11/21/2012CN102791391A Method and apparatus for treating substrates
11/21/2012CN102789126A Photomask and method for manufacturing the same
11/21/2012CN102789125A Mask plate, mat manufacturing method and LCD panel
11/21/2012CN102109757B Negative, design method for same, and circuit substrate made of same
11/21/2012CN102096328B Exposure procedure of liquid crystal panels and mask
11/21/2012CN102053482B Peeling jig of dust-proof film assembly and peeling method
11/21/2012CN102053479B Positioning device and positioning method for optical mask defects
11/21/2012CN101470343B Mask blank manufacturing method and coater
11/20/2012US8316328 Apparatus for manufacturing a photomask
11/20/2012US8315002 Method for producing a color filter
11/20/2012US8314930 Inspection device and inspection method
11/20/2012US8313997 Method of manufacturing a semiconductor memory using two exposure masks to form a same wiring layer
11/20/2012US8313992 Method of patterning NAND strings using perpendicular SRAF
11/20/2012US8313877 Photolithography monitoring mark, photolithography mask comprising an exposure monitoring mark, and phase shift mask comprising an exposure monitoring mark
11/20/2012US8313876 Exposure mask and method for manufacturing semiconductor device using the same
11/15/2012US20120290990 Pattern Measuring Condition Setting Device
11/15/2012US20120288787 Beam Exposure Systems and Methods of Forming a Reticle Using the Same
11/15/2012US20120288786 Rc extraction for single patterning spacer technique
11/15/2012US20120287695 Semiconductor memory device
11/15/2012DE102004010363B4 Verfahren zur Bestimmung einer örtlichen Variation des Reflektions- oder Transmissionsverhaltens über die Oberfläche einer Maske A method for determining a local variation of the reflection or transmission behavior over the surface of a mask
11/14/2012EP2523043A2 Substrate inspection apparatus and mask inspection apparatus
11/14/2012CN202533708U Mask plate clamping frame
11/14/2012CN102782857A 半导体装置 Semiconductor device
11/14/2012CN102782576A Frame for large pellicle and large pellicle
11/14/2012CN102170758B Circuit board double window resistance welding hole filling processing method and resistance welding exposure film
11/14/2012CN101833235B Quality detection system and method for original mask copy
11/14/2012CN101454720B 激光烧蚀抗蚀剂 Laser ablation resist
11/13/2012US8312396 Set of masks, method of generating mask data and method for forming a pattern
11/13/2012US8310509 Direct digital marking systems
11/13/2012US8309279 Pellicle for lithography
11/13/2012US8309278 Guided self-assembly of block copolymer line structures for integrated circuit interconnects
11/13/2012US8309277 Photomask making method
11/08/2012US20120281197 Holographic Mask Inspection System with Spatial Filter
11/07/2012CN202522841U Mask
11/07/2012CN1942827B Method of producing a relief image
11/07/2012CN102770806A Reflective mask for EUV lithography
11/07/2012CN102769082A Patterned substrate, formation method of patterned substrate and mask for producing patterned substrate
11/07/2012CN102768465A Color photosensitive resin composition and hardened product of the same
11/07/2012CN102082161B Organic electroluminescent device, mask plate, luminescent module and application thereof
11/07/2012CN101464626B Device and method for removal of pellicle of mask plate
11/07/2012CN101213488B System and method for critical dimension reduction and pitch reduction
11/06/2012US8307310 Pattern generating method, method of manufacturing semiconductor device, computer program product, and pattern-shape-determination-parameter generating method
11/06/2012US8306310 Apparatus and method for pattern inspection
11/06/2012US8305681 Light source apparatus
11/06/2012US8305556 Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method
11/06/2012US8304180 Lithographic apparatus and device manufacturing method
11/06/2012US8304162 Processless printing plates
11/06/2012US8304148 Method and system for design of a reticle to be manufactured using variable shaped beam lithography
11/06/2012US8304147 Photomask blank, photomask, and method for manufacturing photomask blank
11/06/2012US8304146 Photomask making method, photomask blank and dry etching method
11/06/2012US8303717 Alkali-type nonionic surfactant composition
11/01/2012WO2012146647A2 Method and apparatus for processing a substrate with a fo-cussed particle beam
11/01/2012WO2012096847A3 Apparatus for euv imaging and methods of using same
11/01/2012US20120276475 Blank substrates for extreme ultra violet photo masks and methods of fabricating an extreme ultra violet photo mask using the same
11/01/2012US20120276474 Method of cleaning substrate
11/01/2012US20120276473 Pellicle for lithography
11/01/2012US20120273899 System and methods for converting planar design to finfet design
11/01/2012US20120273660 Optical inspection method and optical inspection apparatus
10/2012
10/31/2012EP2518563A1 Lithographic apparatus and method
10/31/2012EP2518561A1 A pellicle for lithography
10/31/2012EP2516340A2 Substrate for euvl optical member
10/31/2012CN202513200U Graphic substrate and mask plate used for manufacture of the same
10/31/2012CN102762683A 粘合片 Adhesive sheet
10/31/2012CN102759861A Photoetching modifying method for integrated circuit manufacture
10/31/2012CN102759853A Method of manufacturing discrete track magnetic recording medium
10/31/2012CN102759852A Pellicle for lithography
10/31/2012CN102759851A Phase-shifting mask with auxiliary phase areas
10/31/2012CN102096308B Mask graph, method for manufacturing mask, and method for correcting mask graph
10/31/2012CN101720448B Method and apparatus for determining the effect of process variations
10/31/2012CN101286001B Focusing evaluation method
10/30/2012US8301914 Power supply control device
10/30/2012US8301291 Charged particle beam writing apparatus, write data creation method and charged particle beam writing method
10/30/2012US8298732 Exposure method and method of making a semiconductor device
10/30/2012US8298730 Semiconductor devices and methods of manufacturing thereof
10/30/2012US8298729 Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks
10/30/2012US8298728 Mask plate and manufacturing method thereof
10/24/2012EP2515169A1 Photomask blank, and process for production of photomask
10/24/2012EP2515168A2 Methods and apparatus for calculating electromagnetic scattering properties of a structure and for reconstruction of approximate structures
10/24/2012EP2513721A2 Reflective mask for euv lithography
10/24/2012EP2513720A1 Method and device for producing masks for a laser installation for the production of microstructures
10/24/2012CN102754025A Ionizing radiation-curable protective solution for emulsion mask, and emulsion mask produced using same
10/24/2012CN102749802A Mask for black matrix
10/24/2012CN102749801A Mask plate
10/24/2012CN101364042B Substrate and mask blank substrate for manufacturing mask blank substrate and mask manufacturing method
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