| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 12/20/2012 | US20120321999 Glass substrate-holding tool and method for producing an euv mask blank by employing the same |
| 12/20/2012 | US20120320348 Reflective mask for euv lithography |
| 12/20/2012 | US20120319287 Semiconductor structure and method for fabricating semiconductor layout |
| 12/19/2012 | EP2534674A1 An adjustable shadow mask assembly for use in solar cell fabrications |
| 12/19/2012 | CN202615111U Device for manually cleaning photomask |
| 12/19/2012 | CN102834773A Phase shift mask blank, manufacturing method thereof, and phase shift mask |
| 12/19/2012 | CN102832106A Method of manufacturing semiconductor device |
| 12/19/2012 | CN102830588A Method for fabricating phase-shift photomask |
| 12/19/2012 | CN102830587A Mask plate, CF (Color Filter), LCD (Liquid Crystal Display) device and manufacturing method |
| 12/19/2012 | CN102830586A 掩膜装置及其制作方法 Mask device and manufacturing method thereof |
| 12/19/2012 | CN101261440B Photomask substrate and photomask |
| 12/18/2012 | US8336006 Mask-layout creating method, apparatus therefor, and computer program product |
| 12/18/2012 | US8336004 Dimension assurance of mask using plurality of types of pattern ambient environment |
| 12/18/2012 | US8335369 Mask defect analysis |
| 12/18/2012 | US8335046 Color filter substrate and method of manufacturing the same |
| 12/18/2012 | US8335039 Method of measuring aerial image of EUV mask |
| 12/18/2012 | US8335038 Apparatus for measuring aerial image of EUV mask |
| 12/18/2012 | US8334084 Method for fabricating high aspect ratio nanostructures |
| 12/18/2012 | US8334083 Etch process for controlling pattern CD and integrity in multi-layer masks |
| 12/13/2012 | US20120313179 Modular die and mask for semiconductor processing |
| 12/12/2012 | CN202600360U Dual surface lithography device |
| 12/12/2012 | CN102822744A Photomask unit and method of manufacturing same |
| 12/12/2012 | CN102822743A Method for manufacturing substrate for photomask blank, method for manufacturing photomask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
| 12/12/2012 | CN102822742A Method for controlling the electronic beam exposure of wafers and masks using proximity correction |
| 12/12/2012 | CN102822741A Phase-shift photomask and patterning method |
| 12/12/2012 | CN102820310A Image sensor |
| 12/12/2012 | CN102819184A Storage method for large-scale shield |
| 12/12/2012 | CN102819183A Mask plate, method for manufacturing array substrate by utilizing mask plate, and array substrate |
| 12/12/2012 | CN102819182A Photo mask base plate and manufacturing method thereof, photo mask manufacturing method, and pattern transfer method |
| 12/12/2012 | CN102819181A Grayscale mask and columnar septum object formed therewith |
| 12/12/2012 | CN102819180A Gray-scale mask plate and columnar spacer formed by utilizing same |
| 12/12/2012 | CN101989043B Multi-gray scale photomask, photomask blank, method of manufacturing multi-gray scale photomask and pattern transfer method |
| 12/12/2012 | CN101925860B Method of fabricating photomasks and device for implementing the same |
| 12/12/2012 | CN101713917B Gray mask blank, mask and manufacture methods thereof |
| 12/12/2012 | CN101650534B Method for measuring focal plane uniformity of exposure machine |
| 12/12/2012 | CN101644889B Photoetching scattering strip for improving focal depth and manufacturing method thereof |
| 12/12/2012 | CN101627336B Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material |
| 12/12/2012 | CN101571669B Method for checking optical proximity correction on the basis of model |
| 12/12/2012 | CN101477307B Photomask blank, resist pattern forming process, and photomask preparation process |
| 12/12/2012 | CN101471345B Semiconductor device and photomask |
| 12/11/2012 | US8332784 Semiconductor device |
| 12/11/2012 | US8332783 Control of critical dimensions in optical imaging processes for semiconductor production by extracting imaging imperfections on the basis of imaging tool specific intensity measurements and simulations |
| 12/11/2012 | US8330949 Foreign substance inspection apparatus, exposure apparatus, and method of manufacturing device |
| 12/11/2012 | US8330248 Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method |
| 12/11/2012 | US8329604 Silica glass containing TiO2 and process for its production |
| 12/11/2012 | US8329365 Method for design and manufacture of diagonal patterns with variable shaped beam lithography |
| 12/11/2012 | US8329363 Methods of fabricating halftone phase shift blank photomasks and halftone phase shift photomasks |
| 12/11/2012 | US8329362 Extreme ultraviolet mask |
| 12/11/2012 | US8329361 Reflective mask blank, method of manufacturing a reflective mask blank and method of manufacturing a reflective mask |
| 12/11/2012 | US8329360 Method and apparatus of providing overlay |
| 12/06/2012 | WO2012164824A1 Method for manufacturing microstructure, and microstructured die |
| 12/06/2012 | WO2012118616A3 Method and system for forming patterns using charged particle beam lithography |
| 12/06/2012 | WO2012093834A3 Pellicle membrane and method of manufacturing same |
| 12/06/2012 | US20120309136 Manufacture methods of thin film transistor and array substrate and mask |
| 12/06/2012 | US20120308922 Pellicle mounting apparatus and assembly with pellicle mounted on mask |
| 12/06/2012 | US20120308921 Method of optimizing a die size, method of designing a pattern device manufacturing method, and computer program product |
| 12/06/2012 | US20120308920 Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process |
| 12/06/2012 | US20120308919 Manufacturing Method for Color Filter Substrate, Photomask and Photoreactive Layer |
| 12/06/2012 | US20120308152 Apparatus for Forming Image for Pattern Matching |
| 12/05/2012 | EP2530527A1 Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device |
| 12/05/2012 | CN202583692U Sagging preventive mask framework and sagging preventive mask component |
| 12/05/2012 | CN202583691U Nickel alloy light guide plate mold kernel |
| 12/05/2012 | CN102810472A Method of reducing striation on a sidewall of a recess |
| 12/05/2012 | CN102809896A Mask and photolithography method thereof |
| 12/05/2012 | CN102809895A Photoetching layout, photoresist graph and method for measuring exposure error of photoresist graph |
| 12/05/2012 | CN102809894A Method for computing diffraction of masks of contact holes of multiple absorbing layers |
| 12/05/2012 | CN102289146B Method for optimizing two-phase phase shift mask based on generalized wavelet penalty function |
| 12/05/2012 | CN102193304B Photomask template and test method implemented by using photomask template |
| 12/05/2012 | CN102129168B Photoresist graph correction method |
| 12/05/2012 | CN102129165B Attenuation phase shift mask |
| 12/05/2012 | CN102087468B Method for forming inspected pattern on substrate photoresist by photomask |
| 12/04/2012 | US8323869 Positive resist composition and method of forming resist pattern |
| 12/04/2012 | US8323867 Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
| 12/04/2012 | US8323859 Optical compensation devices, systems, and methods |
| 12/04/2012 | US8323858 Photomask blank, photomask, and methods of manufacturing the same |
| 12/04/2012 | US8323857 Phase-shift mask with assist phase regions |
| 12/04/2012 | US8323856 Mask blanks |
| 12/04/2012 | US8323855 Pellicle frame apparatus, mask, exposing method, exposure apparatus, and device fabricating method |
| 11/29/2012 | US20120301817 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method |
| 11/29/2012 | US20120300054 Method of Extracting Contour Lines of Image Data Obtained By Means of Charged Particle Beam Device, and Contour Line Extraction Device |
| 11/29/2012 | DE112006003495B4 Maskenrohling und Maske Mask blank and mask |
| 11/28/2012 | EP2526462A1 Method for controlling the electron beam exposure of wafers and masks using proximity correction |
| 11/28/2012 | CN202563242U Photomask of exposure machine |
| 11/28/2012 | CN202563241U Mask plate |
| 11/28/2012 | CN102804063A Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks |
| 11/28/2012 | CN102803939A Methods and apparatus for simultaneously inspecting multiple array regions having different pitches |
| 11/28/2012 | CN102799063A Method for preparing photoresist template and patterned ZnO nanorod array |
| 11/28/2012 | CN102799062A Mask, wafer and monitor method |
| 11/28/2012 | CN102799061A Photomask set for double exposure manufacture process and formation method thereof |
| 11/28/2012 | CN102799060A Dummy pattern and method for forming same |
| 11/28/2012 | CN102799059A Grayscale mask, array substrate and its preparation method thereof, and display device |
| 11/28/2012 | CN102073224B Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 11/28/2012 | CN101836161B Technique for determining mask patterns and write patterns |
| 11/28/2012 | CN101788762B Pattern correction method, exposure mask, semiconductor device and manufacturing method of semiconductor device |
| 11/28/2012 | CN101740325B Cleaning device for semiconductor base material |
| 11/27/2012 | US8321822 Method and computer-readable medium of optical proximity correction |
| 11/27/2012 | US8321815 Recording medium storing original data generation program, original data generation method, original fabricating method, exposure method, and device manufacturing method |
| 11/27/2012 | US8318390 Halftone mask having shielding parts and plural overapping halftone patterns of different widths |
| 11/27/2012 | US8318389 Image sensor photo mask and apparatus |
| 11/27/2012 | US8318388 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method |