| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 01/17/2013 | US20130017493 Method for Improving Print Performance of Flexographic Printing Elements |
| 01/17/2013 | US20130017475 Method of inspecting mask, mask inspection device, and method of manufacturing mask |
| 01/17/2013 | US20130017474 Method of forming assist feature patterns |
| 01/16/2013 | CN202677059U Double-side photoetching structure of ceramic wafer |
| 01/16/2013 | CN102879997A Adjustable fixture |
| 01/16/2013 | CN102879996A Method for manufacturing phase shift photomask |
| 01/16/2013 | CN102193305B Method for increasing OPC precision of high MEEF pattern |
| 01/16/2013 | CN102126586B Intake container of protective membrane assembly |
| 01/16/2013 | CN101371193B Photolithographic systems and methods for producing sub-diffraction-limited features |
| 01/15/2013 | US8355123 Defect inspection apparatus and its method |
| 01/15/2013 | US8355044 Reticle defect inspection apparatus and reticle defect inspection method |
| 01/15/2013 | US8354207 Method, device, and system for forming circular patterns on a surface |
| 01/15/2013 | US8354206 Method of generating photomask data, method of fabricating photomask, non-transitory memory medium storing program for generating photomask data, method of manufacturing solid-state image sensor having microlens array and method of manufacturing microlens array |
| 01/15/2013 | US8354205 Mask blank, transfer mask, and methods of manufacturing the same |
| 01/10/2013 | WO2013004992A1 Method of manufacture and apparatus therefor |
| 01/10/2013 | US20130011773 Optical member base material for euv lithography, and method for producing same |
| 01/10/2013 | US20130011772 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film |
| 01/10/2013 | US20130010291 Apparatus and method for pattern inspection |
| 01/10/2013 | US20130010277 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle |
| 01/10/2013 | US20130010274 Masks for use in lithography including image reversal assist features, lithography systems including such masks, and methods of forming such masks |
| 01/10/2013 | US20130009275 Semiconductor integrated circuit device and terminal structure of standard cell |
| 01/10/2013 | DE19609652B4 Verfahren und Vorrichtung zur Korrektur von Maskenmustern Method and apparatus for correction of mask patterns |
| 01/09/2013 | EP2544218A1 Process for production of photoresist pattern |
| 01/09/2013 | CN202661042U Auxiliary examination device for solder mask exposure alignment precision |
| 01/09/2013 | CN102866599A Method for detecting controllability of mask aligner to graph fuzzy imaging |
| 01/09/2013 | CN102866590A Methods and systems for pattern design with tailored response to wavefront aberration |
| 01/09/2013 | CN102866577A Mask conveying box and method for reducing mask pollution |
| 01/09/2013 | CN102866576A Mask plate group and method for determining alignment precision range by using mask plate group |
| 01/09/2013 | CN102866575A Manufacture method of phase-shift optical mask |
| 01/09/2013 | CN102866574A Phase-shift photo-mask manufacturing method |
| 01/09/2013 | CN102181838B Chromium plate manufacturing process |
| 01/09/2013 | CN102169285B Method for repairing redundant chromium points of chromium plate |
| 01/09/2013 | CN102141726B Manufacturing method of photomask, photomask and manufacturing method of display device |
| 01/09/2013 | CN102109758B Testing mask |
| 01/09/2013 | CN101846886B Delta TCC (transmission cross coefficient) for high-speed sensibility model calculation |
| 01/09/2013 | CN101384957B Mask blank and photomask |
| 01/08/2013 | US8352891 Layout decomposition based on partial intensity distribution |
| 01/08/2013 | US8352889 Beam dose computing method and writing method and record carrier body and writing apparatus |
| 01/08/2013 | US8352886 Method for the reproducible determination of the position of structures on a mask with a pellicle frame |
| 01/08/2013 | US8351143 Color filter substrate and manufacturing method thereof |
| 01/08/2013 | US8349528 Semiconductor devices and methods of manufacturing thereof |
| 01/08/2013 | US8349527 Conductive layer including implanted metal ions |
| 01/08/2013 | US8349526 Pellicle for lithography |
| 01/08/2013 | US8349525 Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus |
| 01/08/2013 | US8349241 Method to arrange features on a substrate to replicate features having minimal dimensional variability |
| 01/03/2013 | WO2013003102A1 Method and system for forming patterns with charged particle beam lithography |
| 01/03/2013 | WO2012138557A3 Method and mask for enhancing the resolution of patterning 2-row holes |
| 01/03/2013 | WO2012118615A3 Method and system for design of a surface to be manufactured using charged particle beam lithography |
| 01/03/2013 | US20130004889 Methods of Forming Patterned Masks |
| 01/03/2013 | US20130004888 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition |
| 01/03/2013 | US20130004711 Self-supporting film, self-supporting structure, method for manufacturing self-supporting film, and pellicle |
| 01/03/2013 | US20130003036 Photo mask unit comprising a photomask and a pellicle and a method for manufacturing the same |
| 01/03/2013 | US20130001552 Test pad structure for reuse of interconnect level masks |
| 01/03/2013 | US20130001193 Alignment marks for multi-exposure lithography |
| 01/02/2013 | CN202649668U Automatic mask cleaning system and exposure equipment |
| 01/02/2013 | CN102859397A Self-supporting film, self-supporting structure, method for manufacturing self-supporting film, and pellicle |
| 01/02/2013 | CN102854759A Method for reducing photoresist pattern defect and equipment for forming photoresist pattern |
| 01/02/2013 | CN102854740A Gray tone mask inspecting device and method, and pattern transferring method |
| 01/02/2013 | CN102854739A Photomask clamp of photomask box |
| 01/02/2013 | CN102854656A Colored light filtering substrate and relative manufacturing method thereof |
| 01/02/2013 | CN102849929A Titania-doped quartz glass member and making method |
| 01/02/2013 | CN102096310B Method for correcting photoresist pattern and etching method |
| 01/02/2013 | CN102027418B Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in OPC model space |
| 01/02/2013 | CN101937171B Method for building optical proximity correction model, optical proximity correction method and mask |
| 01/02/2013 | CN101842744B Half-tone mask, half-tone mask blank and method for manufacturing half-tone mask |
| 01/02/2013 | CN101713918B Techniques for reducing degradation and/or modifying feature size of photomasks |
| 01/02/2013 | CN101384968B Scanning exposure apparatus, micro device manufacturing method, mask, projection optical apparatus and mask manufacturing method |
| 01/02/2013 | CN101158804B Mask for forming fine pattern and method of forming the same |
| 01/01/2013 | US8347241 Pattern generation method, computer-readable recording medium, and semiconductor device manufacturing method |
| 01/01/2013 | US8347240 Split-layer design for double patterning lithography |
| 01/01/2013 | US8345311 Reduction of harmonic artifacts in halftone screens |
| 01/01/2013 | US8343695 Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography |
| 01/01/2013 | US8343694 Photomask blank, resist pattern forming process, and photomask preparation process |
| 01/01/2013 | US8343693 Focus test mask, focus measurement method, exposure method and exposure apparatus |
| 01/01/2013 | US8343692 Exposure apparatus inspection mask and exposure apparatus inspection method |
| 12/27/2012 | WO2012125647A3 Euv actinic reticle inspection system using imaging sensor with thin film spectral purity filter coating |
| 12/27/2012 | WO2012125581A3 Method and apparatus for inspecting a reflective lithographic mask blank and improving mask quality |
| 12/27/2012 | US20120328992 Semiconductor device manufacturing method |
| 12/27/2012 | US20120328974 Photomask defect correcting method and device |
| 12/27/2012 | US20120328181 Pattern inspection apparatus and method |
| 12/27/2012 | US20120325349 Substrate accommodation device |
| 12/26/2012 | CN202633368U Patterned substrate and mask for manufacturing same |
| 12/26/2012 | CN202631948U Mask for forming alignment marks on array substrate and/or color film substrate |
| 12/26/2012 | CN202631947U Mask plate |
| 12/26/2012 | CN102841509A Integration of lithography apparatus and mask optimization process with multiple patterning process |
| 12/26/2012 | CN102841501A 掩膜及其制造方法 Mask and method for manufacturing |
| 12/26/2012 | CN102841500A Mask-shift-aware RC extraction for double patterning design |
| 12/26/2012 | CN102841499A Phase-shift photomask fabrication method |
| 12/26/2012 | CN102047152B Method for producing color filter, method for producing substrate with pattern, and small photomask |
| 12/26/2012 | CN101471231B Method of forming a micro pattern of a semiconductor device |
| 12/26/2012 | CN101435990B Mask plate and manufacturing method thereof |
| 12/25/2012 | US8341560 Method of designing semiconductor device including adjusting for gate antenna violation |
| 12/25/2012 | US8339614 Method of measuring shot shape and mask |
| 12/25/2012 | US8338805 Reticle manufacturing method, surface shape measuring apparatus and signal processor |
| 12/25/2012 | US8338212 Method of forming mask for lithography, method of forming mask data for lithography, method of manufacturing back-illuminated solid-state imaging device, back-illuminated solid-state imaging device and electronic device |
| 12/25/2012 | US8338061 Fluorine-passivated reticles for use in lithography and methods for fabricating the same |
| 12/25/2012 | US8338060 Pellicle for lithography and method for manufacturing the same |
| 12/20/2012 | WO2012172642A1 Pellicle application device |
| 12/20/2012 | WO2012146647A3 Method and apparatus for processing a substrate with a focussed particle beam |
| 12/20/2012 | US20120322000 Reflective mask blank for euv lithography and process for producing the same |