| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 02/28/2013 | WO2013027412A1 Reflective mask and method for manufacturing same |
| 02/28/2013 | US20130052569 Exposure apparatus for forming a reticle and method of forming a reticle using the same |
| 02/28/2013 | US20130052568 Resist pattern forming method, resist pattern, positive resist composition, nanoimprint mold and photomask |
| 02/28/2013 | US20130052567 Resist pattern forming method, resist pattern, crosslinkable negative resist composition, nanoimprint mold and photomask |
| 02/27/2013 | EP2562599A2 Process for producing a photomask on a photopolymeric surface |
| 02/27/2013 | EP2562568A1 Fabrication method of cylindrical gratings |
| 02/27/2013 | CN202758165U Antistatic photomask conveying device |
| 02/27/2013 | CN102947760A Photomask, and laser annealing device and exposure device which use same |
| 02/27/2013 | CN102947759A Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a mask |
| 02/27/2013 | CN102944974A Mask plate and array substrate manufacturing method |
| 02/27/2013 | CN102944973A Pellicle frame, pellicle and method for using pellicle frame |
| 02/27/2013 | CN102944972A Method of producing a relief image |
| 02/27/2013 | CN102944971A Exposure detection method of mask and photoetching material |
| 02/27/2013 | CN102944970A Mask alignment method for basal plate |
| 02/27/2013 | CN101533215B Tools and method for manufacturing integrated circuit mask |
| 02/27/2013 | CN101344716B Halftone mask, manufacturing method and active matrix type display apparatus |
| 02/26/2013 | US8384888 Mask defect measurement method, mask quality determination and method, and manufacturing method of semiconductor device |
| 02/26/2013 | US8383301 Methods of fabricating reticles with subdivided blocking regions |
| 02/26/2013 | US8383300 Exposure mask with double patterning technology and method for fabricating semiconductor device using the same |
| 02/26/2013 | US8383299 Double patterning mask set and method of forming thereof |
| 02/26/2013 | US8383298 Substrate processing method, manufacturing method of EUV mask, and EUV mask |
| 02/26/2013 | US8383297 Pellicle for lithography and method for manufacturing pellicle film |
| 02/26/2013 | US8383296 Method for manufacturing photomasks and device for its implementation |
| 02/21/2013 | US20130045440 Resist pattern forming method, resist pattern, crosslinking negative chemical-amplification resist composition for organic solvent development, nanoimprint mold, and photomask |
| 02/21/2013 | US20130045439 Titania-doped quartz glass and making method |
| 02/20/2013 | EP2560048A1 Self-supporting film, self-supporting structure, method for manufacturing self-supporting film, and pellicle |
| 02/20/2013 | EP2559669A2 Titania-doped quartz glass and making method |
| 02/20/2013 | EP2558906A1 X-ray lithography mask composed of nickel or a nickel base alloy |
| 02/20/2013 | CN101451963B Method and system for defect detection |
| 02/19/2013 | US8381160 Manufacturing method, manufacturing program and manufacturing system for semiconductor device |
| 02/19/2013 | US8379311 Method for fabricating micro-lens, and micro-lens array including the micro-lens |
| 02/19/2013 | US8377613 Reflective photomask and method of fabricating the same |
| 02/19/2013 | US8377612 Titania-doped quartz glass member and making method |
| 02/14/2013 | US20130040232 Method of Patterning NAND Strings Using Perpendicular SRAF |
| 02/14/2013 | US20130040231 Method for etching a molybdenum layer suitable for photomask fabrication |
| 02/14/2013 | US20130040230 Method of determining focus and dose of an apparatus of optical micro-lithography |
| 02/14/2013 | US20130038850 Illumination system and projection objective of a mask inspection apparatus |
| 02/13/2013 | CN202735676U Proximity exposure mask |
| 02/13/2013 | CN202735675U Mask plate |
| 02/13/2013 | CN102929097A Photomask, TFT (Thin Film Transistor) glass substrate and manufacturing method thereof |
| 02/13/2013 | CN102929096A Y-tone mask substrate, gray-tone mask, and formation method of product fabrication mark or product information mark |
| 02/13/2013 | CN101546114B Exposure system, light shield and method for designing same |
| 02/13/2013 | CN101424875B Mask and method for forming a semiconductor device using the same |
| 02/12/2013 | US8373288 Alignment mark, method of manufacturing semiconductor device, and mask set |
| 02/12/2013 | US8372564 Reflective mask, reflective mask blank and method of manufacturing reflective mask |
| 02/12/2013 | US8372563 MEMS lithography mask with improved tungsten deposition topography and method for the same |
| 02/07/2013 | WO2013018730A1 Pellicle for lithography, photomask fitted with pellicle and exposure method |
| 02/07/2013 | WO2013018414A1 Treatment liquid supply device, treatment liquid supply method and computer storage medium |
| 02/07/2013 | US20130034807 Method and System for Design of a Reticle to be Manufactured Using Variable Shaped Beam Lithography |
| 02/07/2013 | US20130034806 Photomask making method, photomask blank and dry etching method |
| 02/07/2013 | US20130033705 Inspection device and inspection method |
| 02/06/2013 | EP2555052A1 Photomask unit and method of manufacturing same |
| 02/06/2013 | CN102915945A Method for manufacturing integrated circuit |
| 02/05/2013 | US8370773 Method and apparatus for designing an integrated circuit using inverse lithography technology |
| 02/05/2013 | US8368018 Method and apparatus for charged particle beam inspection |
| 02/05/2013 | US8367309 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 02/05/2013 | US8367306 Method of continuous or batch fabrication of large area polymer micro-truss structured materials |
| 02/05/2013 | US8367280 Color filter and photomask to be employed for the manufacture of color filter |
| 02/05/2013 | US8367279 Reflective mask blank, reflective mask, and method of manufacturing the same |
| 02/05/2013 | US8367278 Halftone mask and manufacturing method thereof and method for forming film using the same |
| 02/05/2013 | US8367277 Method for producing a multi-layer body, and multi-layer body |
| 02/05/2013 | US8367276 Mask blank and method of manufacturing mask |
| 01/31/2013 | WO2013013849A1 Lithographic apparatus and device manufacturing method |
| 01/31/2013 | US20130029255 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition |
| 01/31/2013 | US20130029254 Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition |
| 01/31/2013 | US20130028505 Analyses of measurement data |
| 01/31/2013 | DE102011080100A1 Method for processing defects of extreme UV mask for extreme UV wavelength range in photolithography for manufacturing integrated circuits, involves locally changing reflection of multilayer structure at region of defect |
| 01/30/2013 | CN202712247U Patterned substrate, and mask for manufacturing the patterned substrate |
| 01/30/2013 | CN202710919U Gray scale mask template, array substrate and display device |
| 01/30/2013 | CN102902167A Method for detecting accuracy of mask plate hood of photoetching machine |
| 01/30/2013 | CN102902155A 光掩模及曝光装置 A photomask and exposure apparatus |
| 01/30/2013 | CN102902154A Modeling method for optical proximity correction process model |
| 01/30/2013 | CN102902153A Method for fabricating phase shift photomask |
| 01/30/2013 | CN101976018B Photo-mask and manufacturing method thereof |
| 01/29/2013 | US8365108 Generating cut mask for double-patterning process |
| 01/29/2013 | US8365106 Method for optimization of light effective source while target pattern is changed |
| 01/29/2013 | US8365105 Method of performing optical proximity effect corrections to photomask pattern |
| 01/29/2013 | US8365104 Original data producing method and original data producing program |
| 01/29/2013 | US8364437 Mark arrangement inspecting method, mask data, and manufacturing method of semiconductor device |
| 01/29/2013 | US8361692 Negative resist composition and patterning process using the same |
| 01/29/2013 | US8361679 Phase shift masks |
| 01/24/2013 | WO2013012299A2 Mask, and optical filter manufacturing apparatus comprising same |
| 01/24/2013 | WO2013011112A1 Method and apparatus for determining a critical dimension variation of a photolithographic mask |
| 01/24/2013 | WO2013010976A2 Method and apparatus for analyzing and for removing a defect of an euv photomask |
| 01/24/2013 | US20130022900 Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 01/24/2013 | US20130021662 Displays having self-aligned apertures and methods of making the same |
| 01/24/2013 | US20130021589 Projection Optical System, Exposure Apparatus, Exposure Method, Display Manufacturing Method, Mask, and Mask Manufacturing Method |
| 01/24/2013 | DE102011079382A1 Verfahren und Vorrichtung zum Analysieren und zum Beseitigen eines Defekts einer EUV Maske Method and apparatus for analyzing and eliminating a defect of an EUV mask |
| 01/23/2013 | EP2362268B1 Polymer, chemically amplified positive resist compositions and pattern forming process |
| 01/23/2013 | CN202693994U 印刷掩模板 Printing mask |
| 01/23/2013 | CN202693993U Bracket for chemical process |
| 01/23/2013 | CN102262351B Photomask layer and its formation method |
| 01/23/2013 | CN102132210B Pellicle frame, pellicle and method for using pellicle frame |
| 01/23/2013 | CN102103326B Method of manufacturing optical element |
| 01/23/2013 | CN101995764B Dustproof thin film assembly accepting container |
| 01/23/2013 | CN101968606B Masking film substrate and border adhesive solidification system |
| 01/22/2013 | US8358402 Method of structuring a photosensitive material |
| 01/22/2013 | US8357484 Multilayer dry film resist, method of manufacturing the resist, and method of manufacturing display plate for liquid crystal display panel using the resist |
| 01/22/2013 | US8356849 Pellicle handling tool |
| 01/17/2013 | WO2013009219A1 Method for producing a mask on a substrate surface |