| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 03/27/2013 | CN102998894A Photomask blank, photomask, and making method |
| 03/27/2013 | CN102998893A Reflective mask plate, exposure device and exposure method |
| 03/27/2013 | CN102314076B Composite mask and manufacturing method thereof |
| 03/27/2013 | CN102314075B Composite mask and manufacturing method thereof |
| 03/27/2013 | CN102183874B Method for optimizing three-dimension phase-shifting mask (PSM) based on boundary layer (BL) model |
| 03/27/2013 | CN102122115B Method of generating photomask data, method of fabricating photomask, solid-state image sensor having microlens array and method of manufacturing same |
| 03/27/2013 | CN101650527B Gray tone mask blank, gray tone mask and forming method of product machining identification or product information identification |
| 03/27/2013 | CN101533229B Reticle for projection exposure apparatus and exposure method using the same |
| 03/27/2013 | CN101533216B Manufacturing method of a semiconductor device |
| 03/27/2013 | CN101477302B Phase shift mask and method for forming pattern |
| 03/27/2013 | CN101321727B 肟酯光敏引发剂 Oxime ester photoinitiator |
| 03/27/2013 | CN101315515B Frequency tripling using spacer mask having interposed regions |
| 03/26/2013 | US8407629 Pattern verification-test method, optical image intensity distribution acquisition method, and computer program |
| 03/26/2013 | US8407628 Photomask manufacturing method and semiconductor device manufacturing method |
| 03/26/2013 | US8407627 Method and system for context-specific mask inspection |
| 03/26/2013 | US8404409 Method and structure for fabricating dark-periphery mask for the manufacture of semiconductor wafers |
| 03/26/2013 | US8404407 Mask blank, mask blank manufacturing method, transfer mask, and transfer mask manufacturing method |
| 03/26/2013 | US8404406 Photomask blank and method for manufacturing the same |
| 03/26/2013 | US8404405 Pellicle frame, pellicle, lithography apparatus, and method of fabricating the pellicle frame |
| 03/26/2013 | US8404404 Method and system for manufacturing a surface using character projection lithography with variable magnification |
| 03/26/2013 | US8404403 Mask design and OPC for device manufacture |
| 03/21/2013 | WO2013037607A1 Apparatus for monitoring a lithographic patterning device |
| 03/21/2013 | US20130071779 Reflective mask blank and method of manufacturing a reflective mask |
| 03/21/2013 | US20130071778 Extreme ultraviolet mask and method of manufacturing the same |
| 03/21/2013 | US20130071777 Phase shift mask blank, method of manufacturing the same, and phase shift mask |
| 03/21/2013 | US20130071776 Generalization Of Shot Definitions For Mask And Wafer Writing Tools |
| 03/21/2013 | US20130071775 Method of Manufacturing a Mask |
| 03/21/2013 | DE102011082956A1 Transfermasken zur lokalen Bedampfung von Substraten und Verfahren zu deren Herstellung Transfer masks for local vapor deposition of substrates and processes for their preparation |
| 03/21/2013 | DE102011082939A1 Microstructured transfer mask for locally differentiated transmission of organic materials on substrate, has intermediate carrier, textured light-reflecting layer, and light absorbing layer having anisotropic thermal conductivity |
| 03/20/2013 | EP2570854A1 Illumination-source shape definition in optical lithography |
| 03/20/2013 | CN102981356A Method for reducing mask board splicing errors |
| 03/20/2013 | CN102981355A Basic module-based mask auxiliary graph optimizing method |
| 03/20/2013 | CN102221775B Substrate manufacturing method, blank manufacturing method, regenerating photomask and manufacturing method thereof |
| 03/20/2013 | CN102081304B Negative resist composition and patterning process |
| 03/20/2013 | CN101978468B Reflective mask blank for EUV lithography and manufacture method thereof |
| 03/20/2013 | CN101689018B Frame of large pellicle and grasping method of frame |
| 03/19/2013 | US8402407 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 03/19/2013 | US8399833 Charged particle beam writing method, method for detecting position of reference mark for charged particle beam writing, and charged particle beam writing apparatus |
| 03/19/2013 | US8399179 High aspect ratio microstructures |
| 03/19/2013 | US8399177 Enhanced relief printing plate |
| 03/19/2013 | US8399160 Multilayer reflective film coated substrate, reflective mask blank, and method of manufacturing a reflective mask |
| 03/19/2013 | US8399159 Mask blank substrate |
| 03/19/2013 | US8399158 High resolution phase shift mask |
| 03/19/2013 | US8399157 Lithography mask having sub-resolution phased assist features |
| 03/14/2013 | WO2013036163A1 Method for forming a masking image in positive electronic resists |
| 03/14/2013 | WO2013010976A3 Method and apparatus for analyzing and for removing a defect of an euv photomask |
| 03/14/2013 | US20130065346 Reticle and manufacturing method of solid-state image sensor |
| 03/14/2013 | US20130065166 Phase shift mask blank and phase shift mask |
| 03/14/2013 | US20130065165 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 03/14/2013 | US20130065164 Pellicle for lithography and a method of making thereof |
| 03/14/2013 | US20130065163 Method of manufacturing euv mask |
| 03/14/2013 | US20130065162 Method of fabricating wave-shaped mask and exposure method of fabricating nano-scaled structure using the wave-shaped mask |
| 03/14/2013 | US20130065161 Wave-shaped mask of fabricating nano-scaled structure |
| 03/14/2013 | US20130065160 Removable transparent membrane for a pellicle |
| 03/14/2013 | DE102011113940A1 Method for determining dose alterations for adapting e.g. diameter of contact holes of mask for manufacturing semiconductor component, involves determining alterations as variations in intensity values from extreme intensity value |
| 03/13/2013 | EP2568336A2 A pellicle for lithography and a method of making thereof |
| 03/13/2013 | EP2568335A2 Photomask blank, photomask, and making method |
| 03/13/2013 | CN202794842U Dustproof protective device for mask |
| 03/13/2013 | CN202794841U Dustproof protective device for mask |
| 03/13/2013 | CN202794840U Dust-proof protective device for photomask plate |
| 03/13/2013 | CN202794839U Dustproof protective device for mask |
| 03/13/2013 | CN102971673A Pellicle and mask adhesive agent for use in same |
| 03/13/2013 | CN102968000A Dual-sided processing method and exposure device |
| 03/13/2013 | CN102967992A Array substrate, mask plate and manufacturings method thereof, as well as display device |
| 03/13/2013 | CN102236249B Receiving container for dustproof thin film component |
| 03/13/2013 | CN102221776B Multivariable solver for optical proximity correction |
| 03/13/2013 | CN101661220B Liquid crystal display panel and mask plate |
| 03/13/2013 | CN101458449B Graytone mask blank, method of manufacturing graytone mask and graytone mask, and pattern transfer method |
| 03/13/2013 | CN101339362B Fault correcting method for gray tone mask, gray tone mask and manufacturing method thereof |
| 03/13/2013 | CN101075086B 光掩模和曝光方法 Photomask exposure method and |
| 03/12/2013 | US8397182 Pattern verifying method, pattern verifying device, program, and manufacturing method of semiconductor device |
| 03/12/2013 | US8394570 Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process |
| 03/12/2013 | US8394558 Reflection type photomask blank, manufacturing method thereof, reflection type photomask, and manufacturing method of semiconductor device |
| 03/12/2013 | US8394557 Lithographic pellicle |
| 03/07/2013 | WO2013031863A1 Reflective mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank |
| 03/07/2013 | WO2013031230A1 Method for manufacturing display panel |
| 03/07/2013 | WO2013030820A1 Method and apparatus for locally deforming an optical element for photolithography |
| 03/07/2013 | US20130059238 Reverse optical proximity correction method |
| 03/07/2013 | US20130059237 Method for fabricating a photomask for euv lithography |
| 03/07/2013 | US20130059236 Mask blank, transfer mask and process for manufacturing semiconductor devices |
| 03/07/2013 | US20130059235 Photomask blank, photomask, and making method |
| 03/07/2013 | US20130059234 Exposure method and exposure mask |
| 03/07/2013 | US20130058558 Defect inspection system |
| 03/06/2013 | EP2565713A2 Binary silica-titania glass articles having a ternary doped silica-titania critical zone |
| 03/06/2013 | EP2565686A1 Method for making optically effective surface relief microstructures |
| 03/06/2013 | CN202771152U Metal plastic compound photo-mask |
| 03/06/2013 | CN1530743B Light mask and diffuse-reflecting board |
| 03/06/2013 | CN102959468A Pellicle film |
| 03/06/2013 | CN102955373A Approaching exposure apparatus and approaching type exposure method |
| 03/06/2013 | CN102955354A Mask plate and manufacturing method thereof |
| 03/06/2013 | CN102955353A 掩模板 Mask |
| 03/06/2013 | CN101770588B Management method and system for automatic photo-mask identification |
| 03/06/2013 | CN101436216B Method and system for evaluating an evaluated pattern of a mask |
| 03/05/2013 | US8392856 Semiconductor device and layout design method for the same |
| 03/05/2013 | US8391588 Apparatus for examining pattern defects, a method thereof, and a computer-readable recording medium having recorded therein a program thereof |
| 03/05/2013 | US8390469 External conditions audio playback system and method |
| 03/05/2013 | US8389890 Method for minimizing sample damage during the ablation of a first biological material disposed on a second biological material using a focused ultrashort pulsed laser beam wherein the slope of fluence breakdown is a function of the pulse width |
| 03/05/2013 | US8389184 Reflective mask blank and method of manufacturing a reflective mask |
| 03/05/2013 | US8389183 Chromeless phase-shifting photomask with undercut rim-shifting element |
| 02/28/2013 | WO2013027453A1 Method for estimating shape before shrink, and cd-sem apparatus |