| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/23/2013 | US8426088 Method for a lithographic apparatus |
| 04/23/2013 | US8426087 Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method |
| 04/23/2013 | US8426086 Mask and method of manufacturing array substrate using the same |
| 04/23/2013 | US8426085 Method and apparatus for EUV mask having diffusion barrier |
| 04/23/2013 | US8426084 Pellicle for lithography |
| 04/23/2013 | US8426083 Pellicle for lithography |
| 04/23/2013 | US8426082 Programmable self-aligning liquid magnetic nanoparticle masks and methods for their use |
| 04/18/2013 | WO2013055708A1 Capacitive inspection of euv photomasks |
| 04/18/2013 | WO2013055586A1 Method for etching euv reflective multi-material layers utilized to form a photomask |
| 04/18/2013 | WO2013053889A1 Optically transparent and electrically conductive coatings and method for their deposition on a substrate |
| 04/18/2013 | US20130095418 Optimized mask design for fabricating periodic and quasi-periodic patterns |
| 04/18/2013 | US20130095417 Pellicle membrane |
| 04/18/2013 | US20130095416 Photomask and pattern formation method |
| 04/18/2013 | US20130095415 Blankmask and photomask using the same |
| 04/18/2013 | US20130095414 Lithography Mask and Method of Forming a Lithography Mask |
| 04/18/2013 | US20130094752 Defect estimation device and method and inspection system and method |
| 04/18/2013 | US20130094007 Device and Method for Drying a Photomask |
| 04/18/2013 | US20130093878 Defect estimation device and method and inspection system and method |
| 04/17/2013 | EP2581789A1 Optically transparent and electrically conductive coatings and method for their deposition on a substrate |
| 04/17/2013 | CN202886836U 掩膜版 Reticle |
| 04/17/2013 | CN202886835U Reflection-type mask and exposure device |
| 04/17/2013 | CN202886789U Mask plate, color film substrate and liquid crystal display device |
| 04/17/2013 | CN103052272A Exposure film anti-welding manual contraposition graph design method |
| 04/17/2013 | CN103048876A Method of forming patterns of semiconductor device |
| 04/17/2013 | CN103048875A Photomask structure and manufacturing method thereof |
| 04/17/2013 | CN103048874A Blankmask and photomask using the same |
| 04/17/2013 | CN103048873A Optical proximity correction method for hole |
| 04/17/2013 | CN102124542B Reflective mask blank for EUV lithography and method for producing the same |
| 04/17/2013 | CN101246312B Recycling of large-size photomask substrate |
| 04/16/2013 | US8423925 System and method for compressed post-OPC data |
| 04/16/2013 | US8423924 System and method for compressed post-OPC data |
| 04/16/2013 | US8423923 Optical proximity correction method |
| 04/16/2013 | US8423922 Photomask designing method and photomask designing program |
| 04/16/2013 | US8421040 Writing apparatus and writing method |
| 04/16/2013 | US8420300 Method of producing multilayer printed wiring board and photosensitive dry film used therefor |
| 04/16/2013 | US8418733 Purging apparatus and purging method |
| 04/11/2013 | WO2013051384A1 Phase shift mask, asymmetric pattern forming method, diffraction grating manufacturing method and semiconductor device manufacturing method |
| 04/11/2013 | WO2013050199A1 Reflective optical element for the euv wavelength range, method for producing and for correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens |
| 04/11/2013 | WO2013012299A3 Mask, and optical filter manufacturing apparatus comprising same |
| 04/11/2013 | US20130089815 Chromeless phase-shifting photomask with undercut rim-shifting element |
| 04/11/2013 | US20130089814 Pellicle having buffer zone and photomask structure having pellicle |
| 04/11/2013 | US20130089813 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography |
| 04/11/2013 | US20130089753 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography |
| 04/11/2013 | US20130089752 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography |
| 04/11/2013 | US20130088699 Lithographic apparatus and method |
| 04/10/2013 | CN103035512A Production method of non-photosensitive polyimide passivation layer |
| 04/10/2013 | CN103035477A Method for fabricating monocrystalline silicon nanostructure |
| 04/10/2013 | CN103034071A Exposure machine alignment method and control equipment |
| 04/10/2013 | CN103034060A Resist film forming apparatus, resist film forming method, and mold original plate production method |
| 04/10/2013 | CN103034047A Photoetching technology capable of enhancing resolution ratio |
| 04/10/2013 | CN103034046A Mask plate, exposure system and exposure method |
| 04/10/2013 | CN103034045A Halftone mask plate and manufacturing method for same |
| 04/10/2013 | CN103034044A Multi-gray scale photomask, manufacturing method of multi-gray scale photomask and pattern transfer method |
| 04/10/2013 | CN103033975A Mask plate and method for composing a picture with same |
| 04/10/2013 | CN102375329B Test mask and method for measuring exposure system parameters therewith |
| 04/10/2013 | CN102314074B Mask plate and mask plate manufacturing method |
| 04/10/2013 | CN102262349B Mask plate for semiconductor technique |
| 04/10/2013 | CN102253595B Method for searching defective mask plate |
| 04/10/2013 | CN102243444B Exposure equipment, mask plate and exposure method |
| 04/10/2013 | CN101727517B Method and apparatus for determining a photolithography process model which models the influence of topography variations |
| 04/09/2013 | US8418114 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 04/09/2013 | US8417018 Method for inspecting and judging photomask blank or intermediate thereof |
| 04/09/2013 | US8415077 Simultaneous optical proximity correction and decomposition for double exposure lithography |
| 04/04/2013 | WO2013047195A1 Mold blank, master mold, copy mold, and method for manufacturing mold blank |
| 04/04/2013 | WO2013046641A1 Reflective mask blank, reflective mask, and methods for manufacturing reflective mask blank and reflective mask |
| 04/04/2013 | WO2013046627A1 Mask blank for reflection-type exposure, and mask for reflection-type exposure |
| 04/04/2013 | US20130084518 Negative chemical amplification resist composition, resist film, and, resist-coated mask blanks, method for forming resist pattern, and photomask, each using the same |
| 04/04/2013 | US20130084517 Resist protective film-forming composition and patterning process |
| 04/04/2013 | US20130083321 Apparatus for euv imaging and methods of using same |
| 04/03/2013 | CN103026297A Photomask correcting method and laser processing device |
| 04/03/2013 | CN103026296A Substrate provided with reflecting layer for EUV lithography, and reflective mask blank for EUV lithography |
| 04/03/2013 | CN103019052A Lithography alignment mark, and mask plate and semiconductor chip containing the same |
| 04/03/2013 | CN103019040A Exposure apparatus, mask and micro device manufacturing method and projection optical apparatus |
| 04/03/2013 | CN103019039A Reticle for exposure, exposure method and production method of semiconductor wafer |
| 04/03/2013 | CN103019029A Method and device for reducing strips of photomask plates |
| 04/03/2013 | CN103019028A Mask plate and manufacturing method thereof |
| 04/03/2013 | CN103019027A Method for improving optical proximity simulation from exposure result |
| 04/03/2013 | CN101681091B Mask film to form relief images and method of use |
| 04/03/2013 | CN101349864B Photomask, manufacturing method thereof and pattern transfer printing method |
| 04/02/2013 | US8413084 Photomask throughput by reducing exposure shot count for non-critical elements |
| 04/02/2013 | US8413082 Method for designing masks used to form electronic components |
| 04/02/2013 | US8409790 Method of producing a relief image for printing |
| 04/02/2013 | US8409772 Mask blank and method of manufacturing a transfer mask |
| 04/02/2013 | US8409771 Laser pattern mask and method for fabricating the same |
| 04/02/2013 | US8409770 Blank mask and method of fabricating mask using the same |
| 03/28/2013 | WO2013043406A1 Method and system for optimization of an image on a substrate to be manufactured using optical lithography |
| 03/28/2013 | US20130078555 Mask blank glass substrate, multilayer reflective film coated substrate, mask blank, mask, and methods of manufacturing the same |
| 03/28/2013 | US20130078554 Reflective mask blank, reflective mask and method of manufacturing reflective mask |
| 03/28/2013 | US20130078553 Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device |
| 03/28/2013 | US20130078552 Dedicated Mask and Production Method thereof, LCD Panel Production Method |
| 03/28/2013 | US20130077101 Critical dimension uniformity correction by scanner signature control |
| 03/28/2013 | DE102012207335A1 Projection lens for projection exposure system for imaging distortion correcting reticle on wafer to manufacture e.g. micro-structured component, has optical components, where lens distortion is varied around specific percent of resolution |
| 03/28/2013 | DE102012207125A1 Optical element comprises extreme-ultraviolet radiation layer, reflecting multilayer system, guard layer system, and upper layer containing chemical compound including three or more different chemical elements |
| 03/27/2013 | EP2572241A1 Synthesis of nanopeapods by galvanic displacement of segmented nanowires |
| 03/27/2013 | CN202837806U Photo-mask plate module used for monitoring light-emitting diode (LED) epitaxy and chip front-end process |
| 03/27/2013 | CN202837805U Easy-to-identify photo-mask plate used for light-emitting diode (LED) manufacturing |
| 03/27/2013 | CN102998898A A pellicle for lithography and a method of making thereof |
| 03/27/2013 | CN102998897A Method of manufacturing a mask |
| 03/27/2013 | CN102998896A Basic module-based mask main body graph optimization method |
| 03/27/2013 | CN102998895A Optical proximity correction mask |