| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 05/29/2013 | CN202956584U Photomask positioning structure and photomask box |
| 05/29/2013 | CN103123442A Evaluation of etching conditions for pattern-forming film |
| 05/29/2013 | CN103123441A Evaluation of etch mask film |
| 05/29/2013 | CN102208359B Method and apparatus of patterning semiconductor device |
| 05/29/2013 | CN101989046B Pattern transfer method and mask manufacturing method |
| 05/28/2013 | US8452074 Apparatus and method for pattern inspection |
| 05/28/2013 | US8450030 Thin film evaluation method, mask blank, and transfer mask |
| 05/23/2013 | WO2013071838A1 Color film substrate, tft array substrate, manufacturing method thereof and liquid crystal display panel |
| 05/23/2013 | US20130130163 Masks for microlithography and methods of making and using such masks |
| 05/23/2013 | US20130130162 Reticle Carrier |
| 05/23/2013 | US20130130161 Photomask sets for fabricating semiconductor devices |
| 05/23/2013 | US20130130160 Light pattern exposure method, photomask, and photomask blank |
| 05/23/2013 | US20130130159 Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank |
| 05/23/2013 | US20130130158 Method for fabricating pellicle, photo mask, and semiconductor device |
| 05/23/2013 | US20130130157 Method for manufacturing photo mask, method for manufacturing semiconductor device, and program |
| 05/23/2013 | US20130128253 Exposure apparatus using microlens array and optical member |
| 05/23/2013 | US20130126728 Method for determining the performance of a photolithographic mask |
| 05/23/2013 | DE112011100264B4 Verfahren zur steuerung der elektronenstrahl-belichtung von wafern und masken mit proximity-korrektur Method for controlling the electron beam exposure of wafers and masks with proximity-correction |
| 05/22/2013 | EP2594994A2 Light pattern exposure method, photomask, and photomask blank |
| 05/22/2013 | EP2594993A2 Evaluation of etch mask film |
| 05/22/2013 | EP2594992A2 Evaluation of etching conditions for pattern-forming film |
| 05/22/2013 | EP2594991A2 Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank |
| 05/22/2013 | CN103119517A Automated warehouse and article removal method |
| 05/22/2013 | CN101887215B Mask system employing optical proximity correction target and method of manufacture thereof |
| 05/22/2013 | CN101539721B Frequency doubling using a photo-resist template mask |
| 05/21/2013 | US8446570 System and method for using a two part cover and a box for protecting a reticle |
| 05/21/2013 | US8445166 Fabrication method of lithography mask and formation method of fine pattern using the same |
| 05/21/2013 | US8445165 Pellicle for lithography |
| 05/16/2013 | US20130122407 Reflective mask blank, method of manufacturing the same, and reflective mask |
| 05/16/2013 | US20130122406 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
| 05/16/2013 | US20130122405 Method for forming circular patterns on a surface |
| 05/16/2013 | US20130122404 Method of forming photomasks and photomasks formed by the same |
| 05/16/2013 | US20130122403 Mask for exposure and method of fabricating substrate using said mask |
| 05/16/2013 | US20130120726 Method of structuring a photosensitive material |
| 05/16/2013 | US20130119251 Method and apparatus for charged particle beam inspection |
| 05/15/2013 | EP2592474A1 Pellicle film |
| 05/15/2013 | EP2592123A1 Pellicle and mask adhesive agent for use in same |
| 05/15/2013 | CN103105738A Exposure method and mask plate for exposure |
| 05/15/2013 | CN103105728A Mask printing plate library for photolithography apparatus, and mask printing plate box placing and taking method thereof |
| 05/15/2013 | CN103105727A Photomask and forming method thereof |
| 05/15/2013 | CN103105726A Layout graph correction method |
| 05/15/2013 | CN103105725A Conductive element for electrically coupling an EUVL mask to a supporting chuck |
| 05/15/2013 | CN103105724A Quantum dot exposure plate and photolithography technique with the same |
| 05/15/2013 | CN102209935B Methods for model gauge design for lithography calibration |
| 05/15/2013 | CN101930167B Pellicle frame and lithographic pellicle |
| 05/15/2013 | CN101930165B Pellicle frame and lithographic pellicle |
| 05/14/2013 | US8442320 Pattern inspection apparatus and pattern inspection method |
| 05/14/2013 | US8440373 Mask blank substrate, mask blank, photomask, and methods of manufacturing the same |
| 05/14/2013 | US8440372 Single field zero mask for increased alignment accuracy in field stitching |
| 05/14/2013 | US8440371 Imaging devices, methods of forming same, and methods of forming semiconductor device structures |
| 05/10/2013 | WO2013067064A1 Overlay target geometry for measuring multiple pitches |
| 05/09/2013 | US20130115547 Substrate with reflective layer for euv lithography and reflective mask blank for euv lithography |
| 05/09/2013 | US20130114055 Mask and optical filter manufacturing apparatus including the same |
| 05/08/2013 | CN103097953A Mask for near-field lithography and fabrication the same |
| 05/08/2013 | CN103091976A Method for improving homogeneity of critical dimension of photomask |
| 05/08/2013 | CN103091975A Dustproof film assembly |
| 05/08/2013 | CN103091974A Photolithography mask structure |
| 05/08/2013 | CN103091973A Photolithography mask |
| 05/08/2013 | CN103091972A Lithographic mask |
| 05/08/2013 | CN103091971A Mask plate and manufacturing method thereof, and method for monitoring fog pollutions of mask plate |
| 05/08/2013 | CN103091970A Optical proximity correction method applied to square-hole pattern |
| 05/08/2013 | CN103091969A Optical proximity effect correction method for opposite wire ends or nearly opposite wire ends |
| 05/08/2013 | CN101989038B Mask detection device and detection method |
| 05/08/2013 | CN101930166B Pellicle frame and lithographic pellicle |
| 05/07/2013 | US8436402 Exposure mask used for manufacturing a semiconductor device having impurity layer and a semiconductor device |
| 05/07/2013 | US8435724 Fabricating method for touch screen panel |
| 05/07/2013 | US8435705 Methods of correcting optical parameters in photomasks |
| 05/07/2013 | US8435704 Mask blank, transfer mask, and methods of manufacturing the same |
| 05/07/2013 | US8435703 Pellicle |
| 05/07/2013 | US8435702 Manufacturing method of semiconductor device and manufacturing method of mask |
| 05/02/2013 | WO2013062104A1 Manufacturing method of reflective mask blank for euv lithography |
| 05/02/2013 | US20130111420 Mask data producing method and mask data producing program |
| 05/02/2013 | US20130108948 Mask, manufacturing method thereof and mask haze monitoring method |
| 05/01/2013 | EP2587515A1 Inspection system by charged particle beam and method of manufacturing devices using the system |
| 05/01/2013 | EP2587312A1 Electronic grade glass substrate and making method |
| 05/01/2013 | CN103080840A 光刻设备和方法 Lithographic apparatus and method |
| 05/01/2013 | CN103076715A Mask plate and exposure equipment optimal-focal distance monitoring method |
| 05/01/2013 | CN103076701A Liquid crystal display device and manufacturing method therefor |
| 05/01/2013 | CN102067036B Optical member for photomask and method for manufacturing the optical member |
| 05/01/2013 | CN102033420B Photomask, photomask manufacturing method, pattern transfer method and method for manufacturing liquid crystal display device |
| 05/01/2013 | CN101154032B Photo mask blank material, photo mask and manufacture method, photo mask midbody, pattern copy method of the same |
| 04/30/2013 | US8431914 Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur |
| 04/30/2013 | US8431895 Pattern measuring apparatus and pattern measuring method |
| 04/30/2013 | US8431291 Intensity selective exposure photomask |
| 04/30/2013 | US8431290 Photomask blank, photomask, and methods of manufacturing the same |
| 04/25/2013 | WO2013058385A1 Large-sized phase-shift mask, and method for producing large-sized phase-shift mask |
| 04/25/2013 | US20130101927 Pellicle and mask adhesive agent for use in same |
| 04/25/2013 | US20130101926 Halftone Phase Shift Blank Photomasks and Halftone Phase Shift Photomasks |
| 04/25/2013 | US20130101925 Reticle for exposure, exposure method and production method of semiconductor wafer |
| 04/25/2013 | US20130101924 Optical proximity correction photomask |
| 04/25/2013 | US20130100428 Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask |
| 04/25/2013 | DE102004014046B4 Photoaktives Bauelement mit organischen Schichten A photoactive device with organic layers |
| 04/24/2013 | EP2584407A1 Method for Printing Etch-masks Using Phase-change Materials |
| 04/24/2013 | EP2583138A1 Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask |
| 04/24/2013 | CN202904220U Horizontal angle adjusting mechanism for photomask structure of exposure machine |
| 04/24/2013 | CN103064247A Electronic grade glass substrate and making method |
| 04/23/2013 | US8429573 Data generation method for semiconductor device, and electron beam exposure system |
| 04/23/2013 | US8427703 Image processing device, computer readable medium, and image processing method |
| 04/23/2013 | US8427631 Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer |
| 04/23/2013 | US8426832 Cell projection charged particle beam lithography |