| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 07/03/2013 | CN103186036A Simple mask-cleaning method |
| 07/03/2013 | CN103186035A Mask, manufacturing method of mask and method for exposing photoresist layer |
| 07/03/2013 | CN103186034A Optical proximity correction method |
| 07/03/2013 | CN103186033A Optical proximity correction method and manufacture method of connecting holes |
| 07/03/2013 | CN103186032A Optical proximity effect correction method and corresponding mask pattern forming method |
| 07/03/2013 | CN103186031A Method for correcting layout pattern and method for manufacturing photomask |
| 07/03/2013 | CN103186030A Optical proximity correction method |
| 07/03/2013 | CN102591139B Photoetching method of superfine structure |
| 07/03/2013 | CN102317860B Substrate for mask blank use, mask blank, and photo mask |
| 07/02/2013 | US8475978 Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film |
| 07/02/2013 | US8475977 Protective cap for extreme ultraviolet lithography masks |
| 07/02/2013 | US8475976 Method of fabricating integrated circuit using alternating phase-shift mask and phase-shift trim mask |
| 06/27/2013 | WO2013094756A1 Large phase shift mask and method for manufacturing phase shift mask |
| 06/27/2013 | WO2013094555A1 Exposure device and exposure mask |
| 06/27/2013 | WO2013094286A1 Substrate processing device, device manufacturing system and device manufacturing method |
| 06/27/2013 | US20130164660 Reflective mask blank for euv lithography |
| 06/27/2013 | US20130164659 Structures comprising masks comprising carbon |
| 06/27/2013 | US20130164657 EUV Photoresist Encapsulation |
| 06/27/2013 | US20130164656 Photomask and manufacturing method thereof |
| 06/26/2013 | CN103176372A Bifocal wave zone plate interference microscopic-inspection device based on phase grating light splitting |
| 06/26/2013 | CN103176351A Printing mask template |
| 06/26/2013 | CN103176350A Mask fabricating method for maximizing quantity of chips on wafer |
| 06/25/2013 | US8473874 Method and apparatus for automatically fixing double patterning loop violations |
| 06/25/2013 | US8470696 Laser mask and crystallization method using the same |
| 06/25/2013 | US8470501 Mask used for fabrication of microlens, and fabrication method for microlens using the mask |
| 06/25/2013 | US8470500 Reflective extreme ultraviolet mask |
| 06/25/2013 | US8470499 Method and system of fabricating alternating phase shift mask |
| 06/25/2013 | CA2662771C Packaging for films which contain active substances, and method for producing it |
| 06/20/2013 | WO2013086913A1 Detection method for space imaging overlay and array substrate |
| 06/20/2013 | US20130157473 Mask Manufacturing Device |
| 06/20/2013 | US20130157179 Reticles with subdivided blocking regions |
| 06/20/2013 | US20130157178 Method for correcting layout pattern and method for manufacturing photomask |
| 06/20/2013 | US20130157177 Euv mask and method for forming the same |
| 06/20/2013 | US20130157176 Photomask |
| 06/20/2013 | US20130156939 Method and apparatus for analyzing and/or repairing of an euv mask defect |
| 06/20/2013 | US20130152977 Method And Device for The Depollution Of A Pelliculated Reticle |
| 06/19/2013 | EP2603835A2 Modified mask for photolithography of a wafer with recess |
| 06/19/2013 | CN203012349U Dustproof protection device for mask plate |
| 06/19/2013 | CN203012348U Light shield |
| 06/19/2013 | CN103163729A Photomask |
| 06/19/2013 | CN103163728A OPC correction method based on photoetching process window |
| 06/19/2013 | CN103163727A Mask pattern correction method |
| 06/19/2013 | CN103163726A Method for manufacturing chromium sidewall attenuation type phase-shifting mask used in extreme ultra-violet lithography |
| 06/19/2013 | CN102239446B 凸版印刷板 Letterpress printing plates |
| 06/19/2013 | CN102230982B Optical diaphragm structure and soft lithography seal master pattern which is used to manufacture optical diaphragm structure |
| 06/19/2013 | CN102224459B Fast freeform source and mask co-optimization method |
| 06/19/2013 | CN102103325B Photomask for forming fine pattern and method for forming fine pattern with the photomask |
| 06/19/2013 | CN102023425B TFT-LCD array substrate and double-tuned mask board for manufacturing array substrate |
| 06/19/2013 | CN101989039B Method for fabricating photomask |
| 06/19/2013 | CN101971091B Method for processing an object with miniaturized structures |
| 06/19/2013 | CN101689028B Method for processing pattern data and method for manufacturing electronic device |
| 06/19/2013 | CN101446756B Photo mask and method for manufacturing semiconductor device using same |
| 06/19/2013 | CN101419411B System and method for lithography simulation |
| 06/19/2013 | CN101114119B Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin-film transistor substrate by using the same |
| 06/18/2013 | US8467594 Method and apparatus for inspecting patterns formed on a substrate |
| 06/18/2013 | US8467035 Pellicle frame and lithographic pellicle |
| 06/18/2013 | US8465907 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 06/18/2013 | US8465885 Boundary layer formation and resultant structures |
| 06/18/2013 | US8465884 Electron beam depicting pattern design, photomask, methods of depicting and fabricating photomask, and method of fabricating semiconductor device using the same |
| 06/13/2013 | WO2013084978A1 Photomask substrate for titania-silica glass euv lithography |
| 06/13/2013 | WO2013082980A1 Optical proximity correction method |
| 06/13/2013 | WO2013082800A1 Method for manufacturing chromium sidewall attenuation type phase-shifting mask used in euv lithography |
| 06/13/2013 | US20130149638 Mask design and opc for device manufacture |
| 06/13/2013 | US20130149637 Titania and sulfur co-doped quartz glass member and making method |
| 06/13/2013 | US20130149636 Pattern determining method, pattern determining apparatus and storage medium |
| 06/12/2013 | CN202995252U Mask plate with fixed auxiliary edge |
| 06/12/2013 | CN103149793A Intelligent photolithography and realizing method thereof |
| 06/12/2013 | CN103149792A Optical proximity correction method |
| 06/12/2013 | CN103149791A Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank |
| 06/12/2013 | CN103149790A 掩模板 Mask |
| 06/12/2013 | CN102375328B Testing photo mask template and application thereof |
| 06/12/2013 | CN102073211B Half tone mask and fabricating method and flat panel display |
| 06/12/2013 | CN102007579B Cleaning water for electronic material, method for cleaning electronic material and system for supplying water containing dissolved gas |
| 06/12/2013 | CN101750874B Extreme ultraviolet photomask and methods and apparatuses for manufacturing the extreme ultraviolet photomask |
| 06/12/2013 | CN101713914B Photomask and method of fabricating a photomask |
| 06/12/2013 | CN101692150B Method of manufacturing relief printing plate and printing plate precursor for laser engraving |
| 06/12/2013 | CN101666972B Photomask and method for detecting contamination |
| 06/11/2013 | US8460843 Method for finishing surface of preliminary polished glass substrate |
| 06/11/2013 | US8460842 Defect repair apparatus and method for EUV mask using a hydrogen ion beam |
| 06/11/2013 | US8460061 Method for producing large-size synthetic quartz glass substrate |
| 06/06/2013 | US20130143150 Method for manufacturing photomask and photomask manufactured using the same |
| 06/06/2013 | US20130143149 Mask for use in photolithography, manufacturing method thereof and manufacturing method of devices by using the mask |
| 06/06/2013 | US20130143007 Mask |
| 06/06/2013 | US20130141708 Substrate processing method, manufacturing method of euv mask, and euv mask |
| 06/06/2013 | US20130140707 Semiconductor device and layout design method for the same |
| 06/05/2013 | EP2600388A1 Substrate provided with reflecting layer for euv lithography, and reflective mask blank for euv lithography |
| 06/05/2013 | CN103135366A Bifocal oblique incidence interference microscopic device for detecting extreme ultraviolet photolithographic mask defect |
| 06/05/2013 | CN103135362A Light pattern exposure method, photomask, and photomask blank |
| 06/05/2013 | CN103135335A Negative plate manufacture method and device for printed circuit board |
| 06/05/2013 | CN103135334A Color film layer mask plate, color filter manufacturing method and color filter |
| 06/05/2013 | CN102645838B Mask and manufacturing method thereof |
| 06/05/2013 | CN101930484B Method and system of placing printing assist feature for random mask layout |
| 06/05/2013 | CN101846876B Photomask blank, processing method, and etching method |
| 06/04/2013 | US8456694 System and method for proofing a page for color discriminability problems based on color names |
| 06/04/2013 | US8455159 Method for correcting critical dimension of phase shift mask and method for manufacturing the same |
| 06/04/2013 | US8455158 Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 05/30/2013 | WO2013077430A1 Reflective mask blank for euv lithography and production method thereof |
| 05/30/2013 | US20130137017 Photomask Constructions Having Liners of Specified Compositions Along Sidewalls of Multi-Layered Structures |
| 05/30/2013 | US20130137016 Phase shift focus monitor reticle, manufacturing method thereof and method for monitoring focus difference |
| 05/30/2013 | US20130137015 Mask and pattern forming method |