| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 08/13/2013 | US8507155 Photomask blank, photomask, and method for manufacturing photomask blank |
| 08/08/2013 | US20130202993 Method of fabricating the pellicle frame |
| 08/08/2013 | US20130202992 Mask and method for forming the mask |
| 08/08/2013 | US20130202991 Process for cleaning shield surfaces in deposition systems |
| 08/08/2013 | US20130202990 Coating of shield surfaces in deposition systems |
| 08/08/2013 | DE112011103629T5 Integriertes Substratreinigungssystem und Verfahren Integrated substrate cleaning system and method |
| 08/08/2013 | DE112004001662B4 Verfahren zur Erzeugung einer Reliefdruckplatte A method for producing a relief printing plate |
| 08/07/2013 | CN203117635U Mask plate processor and plate rack thereof |
| 08/07/2013 | CN203117634U Compatible mask reference design layout |
| 08/07/2013 | CN103235481A Glue uniformization chromium plate manufacturing process |
| 08/07/2013 | CN103235480A Photomask with novel three-layer-film structure, and preparation method thereof |
| 08/07/2013 | CN103235450A Display panel and preparation method thereof, mask plate the preparation method thereof, and display device |
| 08/07/2013 | CN102508962B Method for determining recipe for regularly inserting scattering strips by vectorization parameters |
| 08/07/2013 | CN101989042B Method of manufacturing multi-gray scale photomask and pattern transfer method |
| 08/07/2013 | CN101866107B Four-gradation photomask, its manufacturing method and photomask blank |
| 08/07/2013 | CN101639624B Titania-doped quartz glass member and making method |
| 08/06/2013 | US8504951 Dose-data generating apparatus, dose-data generating method, and manufacturing method of semiconductor device |
| 08/06/2013 | US8503068 Radiation source apparatus and DUV beam generation method |
| 08/06/2013 | US8502516 Voltage adjustment module and power supply device |
| 08/06/2013 | US8502213 Method for producing at least one multilayer body, and multilayer body |
| 08/06/2013 | US8501385 Positive-type radiation-sensitive composition, and resist pattern formation method |
| 08/06/2013 | US8501374 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
| 08/06/2013 | US8501373 Passivation of multi-layer mirror for extreme ultraviolet lithography |
| 08/06/2013 | US8501372 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device |
| 08/06/2013 | US8499621 Scanning probe microscopy inspection and modification system |
| 08/01/2013 | US20130196257 Method and Apparatus For EUV Mask Having Diffusion Barrier |
| 08/01/2013 | US20130196256 Reflection-type photomasks and methods of fabricating the same |
| 08/01/2013 | US20130196255 Reflective mask blank for euv lithography and reflective mask for euv lithography |
| 07/31/2013 | CN203101813U Exposure machine |
| 07/31/2013 | CN1839349B Method for high-resolution processing of thin layers with electron beams |
| 07/31/2013 | CN103229099A Photomask blank, process for production of photomask, and chromium-containing material film |
| 07/31/2013 | CN102495535B Method for obtaining mask three-dimensional vector space image based on Abbe vector imaging model |
| 07/31/2013 | CN102216850B Pellicle film, pellicle used with mask for tft liquid crystal panel production, and photomask containing the pellicle |
| 07/31/2013 | CN102193307B Method for enhancing identifiability of pattern requiring measurement |
| 07/31/2013 | CN102159994B Generation of contact masks for inkjet printing on solar cell substrates |
| 07/31/2013 | CN102132211B Manufacturing method for substrate for mask blank, mask blank, photo mask, and semiconductor device |
| 07/31/2013 | CN101152919B Mask shell, mask box, pattern trasscription mehod and method for manufacturing display device |
| 07/30/2013 | US8496761 Substrate processing apparatus and substrate processing method |
| 07/30/2013 | US8496133 Container for housing a mask blank, method of housing a mask blank, and a mask blank package |
| 07/25/2013 | WO2013109986A1 Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications |
| 07/25/2013 | US20130189609 Thin films organized in nanodomains on the basis of copolymers having polysaccharide blocks for applications in nanotechnology |
| 07/25/2013 | US20130189608 Extreme ultra violet (euv) mask |
| 07/25/2013 | US20130187282 Semiconductor device, method for manufacturing the same, method for generating mask data, mask and computer readable recording medium |
| 07/25/2013 | US20130186436 Apparatus for cleaning photomask |
| 07/24/2013 | EP2618214A1 Automated warehouse and article removal method |
| 07/24/2013 | CN203084413U Mask plate group and mark entity platform |
| 07/23/2013 | US8495529 Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography |
| 07/23/2013 | US8492055 Method and system for fracturing a pattern using lithography with multiple exposure passes |
| 07/23/2013 | US8492054 Mechanisms for patterning fine features |
| 07/18/2013 | WO2013106101A1 Method and appparatus for database-assisted requalification reticle inspection |
| 07/18/2013 | US20130183832 Near-neighbor trimming of dummy fill shapes with built-in optical proximity corrections for semiconductor applications |
| 07/18/2013 | US20130183612 Method for producing substrate for liquid crystal display panel, and photomask |
| 07/18/2013 | US20130183611 Lithographic mask, lithographic apparatus and method |
| 07/18/2013 | US20130183610 Design method for mask patterns |
| 07/17/2013 | EP2614407A1 Method and device for the depollution of a pelliculated reticle |
| 07/17/2013 | CN103207518A A sagging preventive mask framework and a sagging preventive mask assembly |
| 07/17/2013 | CN103207517A Mask plate clamping frame |
| 07/17/2013 | CN103207516A Lithographic mask, lithographic apparatus and method |
| 07/17/2013 | CN103207515A A three-dimensional mask plate and a production process thereof |
| 07/17/2013 | CN102323723B Optimization method of optical proximity effect correction based on Abbe vector imaging model |
| 07/17/2013 | CN102239447B Flexographic element and method of imaging |
| 07/17/2013 | CN102193303B Optical proximity correction method |
| 07/17/2013 | CN102023492B Charged particle beam drawing apparatus and proximity effect correction method thereof |
| 07/17/2013 | CN101133362B Methods for repairing an alternating phase-shift mask |
| 07/16/2013 | US8490032 Flash-based anti-aliasing techniques for high-accuracy high-efficiency mask synthesis |
| 07/16/2013 | US8488866 Method of inspecting mask pattern and mask pattern inspection apparatus |
| 07/16/2013 | US8486590 Reflective mask for EUV lithography |
| 07/16/2013 | US8486589 Lithographic processing method, and device manufactured thereby |
| 07/16/2013 | US8486588 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film |
| 07/16/2013 | US8486587 Method for correcting layout pattern and method for manufacturing photomask |
| 07/16/2013 | US8486586 Laser irradiation device and method of fabricating organic light emitting display device using the same |
| 07/11/2013 | US20130179846 Photomask manufacturing method and semiconductor device manufacturing method |
| 07/11/2013 | US20130178068 Dual damascene process and apparatus |
| 07/11/2013 | US20130177841 Mask blank, method of manufacturing the same, and transfer mask |
| 07/11/2013 | US20130177840 Alignment marks for multi-exposure lithography |
| 07/11/2013 | US20130176549 Reticle Operation System |
| 07/11/2013 | US20130175240 Test pattern selection method for opc model calibration |
| 07/10/2013 | CN103199057A Optical mask applied to dual damascene metal interconnection process |
| 07/10/2013 | CN103197503A Fast simulation method for extreme ultraviolet photoetching thick mask defects |
| 07/10/2013 | CN103197502A Concentric circle mask, graphical substrate and manufacture method |
| 07/10/2013 | CN103197501A Array substrate and preparation method thereof, and display device |
| 07/10/2013 | CN103197500A Method for measuring mirror surface shape compensation effect |
| 07/10/2013 | CN102360158B Cleaning method, and cleaning fluid supplying apparatus |
| 07/10/2013 | CN101539720B Photomask, system for manufacturing semiconductor device, and method of manufacturing semiconductor device |
| 07/10/2013 | CN101501568B Method to minimize CD etch bias |
| 07/09/2013 | US8484585 Method for controlling pattern uniformity of semiconductor device |
| 07/09/2013 | US8484584 Systems, methods and computer program products for forming photomasks with reduced likelihood of feature collapse, and photomasks so formed |
| 07/09/2013 | US8481964 Charged particle beam drawing apparatus and method |
| 07/09/2013 | US8481936 Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system |
| 07/04/2013 | WO2013101202A1 Techniques for phase tuning for process optimization |
| 07/04/2013 | WO2013101133A1 Photolithography mask synthesis for spacer patterning |
| 07/04/2013 | WO2013101129A1 Improved mask layout patterns for closely spaced primitives in phase shift photolithography masks |
| 07/04/2013 | WO2013101118A1 Photolithography mask design simplification |
| 07/04/2013 | WO2013101115A1 Defective artifact removal in photolithography masks corrected for optical proximity |
| 07/04/2013 | WO2013101103A1 Lithography mask having sub-resolution phased assist features |
| 07/04/2013 | WO2013101090A1 Improved masks for double patterning photolithography |
| 07/04/2013 | US20130171548 Patterning A Single Integrated Circuit Layer Using Automatically-Generated Masks And Multiple Masking Layers |
| 07/03/2013 | EP2610373A1 Fluorite |
| 07/03/2013 | EP2609467A2 Mask for near-field lithography and fabrication the same |
| 07/03/2013 | CN103186059A Mask overlay method, mask, and semiconductor device using the same |