| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/12/2013 | WO2013134605A1 Detection of thin lines for selective sensitivity during reticle inspection using processed images |
| 09/12/2013 | WO2013134487A1 Imaging overlay metrology target and complimentary overlay metrology measurement system |
| 09/12/2013 | WO2013134155A1 Uv mask with anti-reflection coating and uv absorption material |
| 09/12/2013 | WO2013133321A1 Mask, mask unit, exposure device, substrate treatment apparatus and method for manufacturing device |
| 09/12/2013 | US20130236819 Thin film evaluation method, mask blank, and transfer mask |
| 09/12/2013 | US20130236818 Photomask having patterns for euv light and duv light |
| 09/11/2013 | CN103299241A Half-tone mask, half-tone mask blank, and method for producing half-tone mask |
| 09/11/2013 | CN103293849A Mask for size material coating and fabricating method thereof |
| 09/11/2013 | CN103293848A Photoresist treatment method and preparation method of semiconductor device |
| 09/11/2013 | CN103293847A Mask plate and preparation method of mask plate |
| 09/11/2013 | CN103293846A Reticle design for the reduction of lens heating phenomenon |
| 09/11/2013 | CN102692814B Light source-mask mixed optimizing method based on Abbe vector imaging model |
| 09/11/2013 | CN102466832B Method for manufacturing photon sieve with high height-width ratio |
| 09/11/2013 | CN101393385B Transmittance-adjustable half tone mask and method for manufacturing same |
| 09/10/2013 | US8533634 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 09/10/2013 | US8532395 Pattern inspection method and semiconductor device manufacturing method |
| 09/10/2013 | US8530836 Electron-beam dimension measuring apparatus and electron-beam dimension measuring method |
| 09/10/2013 | US8530145 Method for manufacturing a semiconductor device |
| 09/10/2013 | US8530117 Method of producing a relief image for printing |
| 09/05/2013 | US20130230796 Photomask blank, process for production of photomask, and chromium-containing material film |
| 09/05/2013 | US20130230795 Photomask blank, photomask, and methods of manufacturing the same |
| 09/04/2013 | CN1637598B Surface protective film and surface protection material using the same film |
| 09/04/2013 | CN103279008A Method for designing mask plate cover film |
| 09/04/2013 | CN102187275B Mask blank substrate, mask blank substrate set and manufacture method of semiconductor device |
| 09/04/2013 | CN101950125B Method of manufacturing a photomask |
| 09/04/2013 | CN101592871B Manufacturing method of semiconductor integrated circuit device |
| 09/03/2013 | US8527917 Semiconductor cell for photomask data verification and semiconductor chip |
| 09/03/2013 | US8525135 System and method of electron beam writing |
| 09/03/2013 | US8524424 Optical proximity correction photomask |
| 09/03/2013 | US8524423 Method of forming assist feature patterns |
| 09/03/2013 | US8524422 Low expansion glass substrate for reflection type mask and method for processing same |
| 09/03/2013 | US8524421 Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device |
| 09/03/2013 | US8524151 Method for radiation sterilization of medical devices |
| 08/29/2013 | WO2013126135A1 Dual hard mask lithography process |
| 08/29/2013 | US20130224638 Method for manufacturing laser reflective mask |
| 08/29/2013 | US20130224637 Photomask and semiconductor apparatus manufacturing method |
| 08/29/2013 | US20130224636 Mask for near-field lithography and fabrication the same |
| 08/29/2013 | US20130224635 Mask pattern creation method, recording medium, and semiconductor device manufacturing method |
| 08/29/2013 | US20130221388 Method for manufacturing group iii nitride semiconductor light-emitting element, group iii nitride semiconductor light-emitting element, lamp, and reticle |
| 08/29/2013 | US20130220971 Method for manufacturing a multilayer structure with a lateral pattern for application in the xuv wavelength range, and bf and lmag structures manufactured according to this method |
| 08/29/2013 | DE102005063547B4 Verfahren zum Untersuchen einer Lithographiemaske mittels eines elektronischen Mikroskopieverfahrens A method for inspecting a lithography mask using an electronic microscopy method |
| 08/28/2013 | CN203164592U A contact exposure mask plate |
| 08/28/2013 | CN103268056A Flexible mask plate and making method thereof |
| 08/28/2013 | CN102621801B Calculation method of conical diffraction field of double-layer attenuation phase-shift L/S mask with assist lines |
| 08/28/2013 | CN102621800B Calculation method for diffractional field of double absorption layer attenuation phase-shift mask with auxiliary line |
| 08/28/2013 | CN102096316B Method for improving super-diffraction lithographic resolution and lithographic quality by utilizing island-type structure mask |
| 08/28/2013 | CN101354527B Photomask protective film system and method for manufacturing integrated circuit |
| 08/27/2013 | US8521481 Method, program product and apparatus for modeling resist development of a lithography process |
| 08/27/2013 | US8520060 Method and a system for calibrating and/or visualizing a multi image display and for reducing ghosting artifacts |
| 08/27/2013 | US8518613 Optical member base material for EUV lithography, and method for producing same |
| 08/27/2013 | US8518612 Pellicle for lithography and manufacturing method thereof |
| 08/27/2013 | US8518611 Multiple lithographic system mask shape sleeving |
| 08/27/2013 | US8518610 Method for fabricating photomask |
| 08/27/2013 | US8518609 Photomask blank, photomask, and photomask manufacturing method |
| 08/22/2013 | WO2013123260A1 Time-varying intensity map generation for reticles |
| 08/22/2013 | US20130217174 Method for manufacturing a semiconductor device |
| 08/22/2013 | US20130216941 Lithography mask having sub-resolution phased assist features |
| 08/21/2013 | CN203149266U Alignment device for inner layer printed circuit board of PCB (Printed Circuit Board) exposure machine |
| 08/21/2013 | CN103257522A Method of manufacturing dustproof thin film assembly |
| 08/21/2013 | CN102157350B Manufacturing method for semiconductor device |
| 08/21/2013 | CN101852984B Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photomask blank or its intermediate |
| 08/21/2013 | CN101261410B LCD device including a reflection film having a convex-concave surface |
| 08/20/2013 | US8516405 System and method for lithography simulation |
| 08/20/2013 | US8515154 Verification method for repairs on photolithography masks |
| 08/20/2013 | US8513777 Method and apparatus for generating reticle data |
| 08/20/2013 | US8513631 Light processing apparatus |
| 08/20/2013 | US8513332 Ink composition for color filter, method for preparing a color filter using the same, and color filter |
| 08/20/2013 | US8512919 Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
| 08/20/2013 | US8512918 Multilayer reflective film coated substrate for a reflective mask, reflective mask blank, and methods of manufacturing the same |
| 08/20/2013 | US8512917 Photomask |
| 08/20/2013 | US8512916 Photomask blank, photomask, and method for manufacturing photomask blank |
| 08/15/2013 | US20130211388 Apparatus for Minimizing Sample Damage During the Ablation of Biological Tissue Using a Focused Ultrashort Pulsed Laser Beam Wherein the Slope of Fluence Breakdown is a Function of the Pulse Width |
| 08/15/2013 | US20130209927 Method and Apparatus For EUV Mask Having Diffusion Barrier |
| 08/15/2013 | US20130209925 Mask blank, reflective mask blank, photomask, reflective mask, photomask set and method of manufacturing a semiconductor device |
| 08/15/2013 | US20130209924 Abrasive-free planarization for euv mask substrates |
| 08/15/2013 | US20130209923 Mask, pattern disposing method thereof and exposing method thereof |
| 08/15/2013 | US20130209922 Chemically amplified negative resist composition and pattern forming process |
| 08/15/2013 | US20130209921 Photoresist composition |
| 08/14/2013 | DE102004021151B4 Verfahren zum Reduzieren von Ungleichförmigkeit und Bildverkürzung in einem auf ein Substrat belichteten Bild unter Verwendung einer photolithographischen Maske, und photolithographische Maske A method for reducing non-uniformity and image shortening in an exposed image on a substrate using a photolithographic mask, and photolithographic mask |
| 08/14/2013 | CN203133472U Double-rotary mask plate washing device |
| 08/14/2013 | CN203133471U Mask box |
| 08/14/2013 | CN103247575A Patterning process for fin-like field effect transistor (Finfet) device |
| 08/14/2013 | CN103247574A Cut-mask patterning process for fin-like field effect transistor (Finfet) device |
| 08/14/2013 | CN103246175A Lens heating aware source mask optimization for advanced lithography |
| 08/14/2013 | CN103246174A Substrate-topography-aware lithography modeling |
| 08/14/2013 | CN103246173A Lithography model for 3D resist profile simulations |
| 08/14/2013 | CN103246159A Device for removing vaporific defects on mask and method thereof |
| 08/14/2013 | CN103246158A Mask as well as pattern collocation method and exposure method thereof |
| 08/14/2013 | CN103246157A Dustproof film framework, optical mask and installation method thereof |
| 08/14/2013 | CN103246156A Method for forming self-aligned overlay mark |
| 08/14/2013 | CN103246155A Photolithography mask and exposure method thereof |
| 08/14/2013 | CN103246154A Manufacturing method of mask plate for solidifying and shielding sealing frame glue |
| 08/14/2013 | CN103246153A Territory map layer design method of semiconductor chip and mask plate thereof |
| 08/14/2013 | CN103246152A Method of determining overlay error and control system for dynamic control of reticle position |
| 08/14/2013 | CN102169847B Dustproof film assembly receiving container |
| 08/13/2013 | US8507377 Semiconductor device, method of manufacturing the same, and phase shift mask |
| 08/13/2013 | US8507181 Method for developing and sealing of lithographic printing plates |
| 08/13/2013 | US8507158 Pellicle frame and pellicle containing same |
| 08/13/2013 | US8507157 Mask for hardening sealant and method of manufacturing flat display device using the mask |
| 08/13/2013 | US8507156 Laser mask and sequential lateral solidification crystallization method using the same |