| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
|---|
| 10/22/2013 | US8563224 Data process for E-beam lithography |
| 10/22/2013 | US8563201 Mask, manufacturing method thereof and mask haze monitoring method |
| 10/22/2013 | US8563200 Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device |
| 10/22/2013 | US8563199 Forming a bridging feature using chromeless phase-shift lithography |
| 10/22/2013 | US8563198 Device and method for providing wavelength reduction with a photomask |
| 10/17/2013 | WO2013155232A1 Arrangement of reticle positioning device for actinic inspection of euv reticles |
| 10/17/2013 | WO2013152921A1 Pellicle, reticle assembly and lithographic apparatus |
| 10/17/2013 | WO2013152516A1 Defect detection system for extreme ultraviolet lithography mask |
| 10/17/2013 | US20130273738 Mask blank, method of manufacturing the same, transfer mask, and method of manufacturing the same |
| 10/17/2013 | US20130273463 Mitigation of mask defects by pattern shifting |
| 10/17/2013 | US20130271740 Lithographic Apparatus, Substrate and Device Manufacturing Method |
| 10/16/2013 | CN203241697U Flexible mask |
| 10/16/2013 | CN102262353B Manufacturing method of multicolour dimming mask and pattern transfer method |
| 10/16/2013 | CN102201352B Trolley for transporting receiving container for dustproof thin film component |
| 10/15/2013 | US8560978 Pattern-dependent proximity matching/tuning including light manipulation by projection optics |
| 10/15/2013 | US8559697 Mask inspection apparatus and image generation method |
| 10/10/2013 | WO2013152023A1 System and method for cleaning surfaces and components of mask and wafer inspection systems based on the positive column of a glow discharge plasma |
| 10/10/2013 | WO2013149477A1 Thin film transistor, mask plate for manufacturing thereof, array substrate and display device |
| 10/10/2013 | US20130266893 Method for generating mask pattern |
| 10/09/2013 | CN203232243U Mask plate |
| 10/09/2013 | CN103345118A Photomask, glass substrate and manufacturing method of glass substrate |
| 10/09/2013 | CN103345117A Mask and liquid crystal display manufacturing method |
| 10/09/2013 | CN102203906B Reflective mask blank for EUV lithography |
| 10/09/2013 | CN101900939B Negative resist composition and patterning process using the same |
| 10/08/2013 | US8553198 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure |
| 10/08/2013 | US8551675 Mounting a pellicle to a frame |
| 10/08/2013 | US8551674 Photomask having transcribing pattern and method of forming photoresist pattern using the same |
| 10/08/2013 | US8551346 Photomask-forming glass substrate and making method |
| 10/03/2013 | WO2013148607A1 Apparatus and methods for reticle handling in an euv reticle inspection tool |
| 10/03/2013 | WO2013146991A1 Substrate for mask blank, substrate with multilayer reflective film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and method for manufacturing semiconductor device |
| 10/03/2013 | WO2013146990A1 Mask blank substrate, substrate with multilayer reflection film, transparent mask blank, reflecting mask, transparent mask, and reflecting mask and semiconductor fabrication method |
| 10/03/2013 | WO2013146488A1 Method for manufacturing substrate provided with multilayer reflection film, method for manufacturing reflective mask blank, and method for manufacturing reflective mask |
| 10/03/2013 | WO2013145800A1 Mask conveyance device, mask holding device, mask substrate, substrate processing device, and method for producing device |
| 10/03/2013 | WO2013145044A1 Photomask, method for forming pattern using same and exposure device |
| 10/03/2013 | WO2013143666A1 Measuring device for measuring an illumination property |
| 10/03/2013 | US20130263064 Methods and system for model-based generic matching and tuning |
| 10/03/2013 | US20130263063 Mask design method, program, and mask design system |
| 10/03/2013 | US20130260293 Photomask, and pattern formation method and exposure apparatus using the photomask |
| 10/03/2013 | US20130260292 Method for manufacturing reflective mask and apparatus for manufacturing reflective mask |
| 10/03/2013 | US20130260291 Modified mask for photolithography of a wafer with recess, method for producing such a mask and method for photolithography of a wafer with recess |
| 10/03/2013 | US20130260290 Near-field exposure mask and pattern forming method |
| 10/03/2013 | US20130260289 Method of making a lithography mask |
| 10/03/2013 | US20130260288 Extreme ultraviolet lithography process and mask |
| 10/03/2013 | US20130258304 Enhanced euv lithography system |
| 10/02/2013 | EP2645166A1 Photomask blank, process for production of photomask, and chromium-containing material film |
| 10/02/2013 | CN103337522A Metal oxide thin film transistor array substrate and manufacturing method thereof |
| 10/02/2013 | CN103336407A Method for rapidly positioning position of single through hole |
| 10/02/2013 | CN103336406A Graph pretreatment method for removing negative OPC (Optical Proximity Correction) |
| 10/01/2013 | US8548223 Inspection system and method |
| 10/01/2013 | US8546283 Substrate for EUVL optical member |
| 10/01/2013 | US8546048 Forming sloped resist, via, and metal conductor structures using banded reticle structures |
| 10/01/2013 | US8546047 Reflective mask blank and method of manufacturing a reflective mask |
| 10/01/2013 | US8545928 Double layer UV variable data text |
| 09/26/2013 | WO2013142448A1 Illumination system with time multiplexed sources for reticle inspection |
| 09/26/2013 | WO2013141325A1 Pellicle, pellicle frame, and method for manufacturing pellicle |
| 09/26/2013 | WO2013141268A1 Substrate with multilayer reflective film, reflective mask blank for euv lithography, method for producing reflective mask for euv lithography, and method for manufacturing semiconductor device |
| 09/26/2013 | WO2013140887A1 Mask blank, transfer mask, and method for manufacturing mask blank and transfer mask |
| 09/26/2013 | US20130252429 Mask and method for fabricating semiconductor device |
| 09/26/2013 | US20130252176 Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device |
| 09/26/2013 | US20130252142 Imaging devices, methods of forming same, and methods of forming semiconductor device structures |
| 09/26/2013 | US20130252141 Method for manufacturing a photomask |
| 09/25/2013 | CN103324035A Mask plate and manufacture method of array base plate |
| 09/25/2013 | CN103324034A Pellicles for use during euv photolithography processes |
| 09/25/2013 | CN103324027A Photomask blank and photomask making method |
| 09/25/2013 | CN103324026A Methods of patterning layered-material and forming imprinting mold |
| 09/25/2013 | CN103324025A Mask plate and method for detecting exposure defects through mask plate |
| 09/25/2013 | CN103324024A Photomask blank and photomask making method |
| 09/25/2013 | CN102681330B Photomask and method for forming overlay mark using same and precision improvement method for counterpoint of secondary pattern technology |
| 09/25/2013 | CN102308256B Photomask and methods for manufacturing and correcting photomask |
| 09/25/2013 | CN101957557B System and method for evaluating error sources |
| 09/24/2013 | US8541149 Method of adhering lithographic pellicle and adhering apparatus therefor |
| 09/24/2013 | US8541147 System and method of selective optical pattern enhancement for semiconductor manufacturing |
| 09/24/2013 | US8540824 Substrate processing method |
| 09/24/2013 | US8539797 Titania and sulfur co-doped quartz glass member and making method |
| 09/19/2013 | WO2013138285A1 System and method for particle control near a reticle |
| 09/19/2013 | WO2013137358A1 Mask for calibration and method for calibration |
| 09/19/2013 | WO2013136882A1 Mask blank, and method for producing mask for transcription use |
| 09/19/2013 | WO2013136881A1 Mask blank, and method for producing mask for transcription use |
| 09/19/2013 | US20130244144 Gate cd control using local design on both sides of neighboring dummy gate level features |
| 09/19/2013 | US20130244143 Optimum Imaging Position Detecting Method, Optimum Imaging Position Detecting Device, Photomask Manufacturing Method, and Semiconductor Device Manufacturing Method |
| 09/19/2013 | US20130244142 Method and Apparatus for Inspecting a Mask Substrate for Defects, Method of Manufacturing a Photomask, and Method of Manufacturing a Semiconductor Device |
| 09/19/2013 | US20130244141 Photomask and pattern forming method |
| 09/19/2013 | US20130244140 Non-Planar Lithography Mask and System and Methods |
| 09/19/2013 | US20130244139 Reflective Lithography Masks and Systems and Methods |
| 09/19/2013 | DE10297658B4 Verfahren und System zum Reparieren defekter Photomasken Method and system for repairing defective photomasks |
| 09/18/2013 | CN103311103A Layout-layer designing method of semiconductor chip and masking plate thereof |
| 09/18/2013 | CN103311102A Methods of making jogged layout routings double patterning compliant |
| 09/18/2013 | CN103309178A Double-face alignment exposure device for semiconductor wafer |
| 09/18/2013 | CN103309171A Generation method and information processing apparatus |
| 09/18/2013 | CN103309168A Reflective lithography masks and systems and methods |
| 09/18/2013 | CN103309151A Method for processing photoresist, and method of manufacturing semiconductor device |
| 09/18/2013 | CN103309150A Processing method for layout data |
| 09/18/2013 | CN103309149A Optical proximity effect correction method |
| 09/18/2013 | CN103309148A Optical proximity effect correction method |
| 09/18/2013 | CN102193308B Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks |
| 09/17/2013 | US8539390 Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge |
| 09/17/2013 | US8535856 Lithographic mask and manufacturing method thereof |
| 09/17/2013 | US8535855 Mask blank manufacturing method, transfer mask manufacturing method, mask blank, and transfer mask |
| 09/17/2013 | US8535854 Reflective exposure mask, method of fabricating reflective exposure mask, method of inspecting reflective exposure mask, and method of cleaning reflective exposure mask |
| 09/12/2013 | WO2013134609A1 Reticle defect inspection with systematic defect filter |