Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
11/2013
11/21/2013US20130309601 Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift mask
11/21/2013US20130309600 Photomask blank and method for manufacturing photomask
11/21/2013US20130309599 Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method
11/21/2013US20130309598 Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask
11/21/2013US20130308125 Method for characterizing a structure on a mask and device for carrying out said method
11/21/2013US20130307963 Method and apparatus for inspecting patterns formed on a substrate
11/21/2013US20130306884 Method and System for Forming Non-Manhattan Patterns Using Variable Shaped Beam Lithography
11/20/2013EP2664962A1 Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method
11/20/2013EP2664961A1 Photomask blank and method for manufacturing photomask
11/20/2013EP2664960A1 Photomask Blank, Method For Manufacturing Photomask, And Method For Manufacturing Phase Shift Mask
11/20/2013EP2664959A1 Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask
11/20/2013EP2663897A2 Apparatus for euv imaging and methods of using same
11/20/2013CN203300612U Inflatable seat of reticle SMIF pod
11/20/2013CN102799063B Method for preparing photoresist template and patterned ZnO nanorod array
11/20/2013CN102637629B Mask assembly of IC (integrated circuit) device with laminated contact layers for reducing number, as well as method thereof
11/20/2013CN101614953B Method and system for evaluating an object that has a repetitive pattern
11/19/2013US8589830 Method and apparatus for enhanced optical proximity correction
11/19/2013US8589828 Reduce mask overlay error by removing film deposited on blank of mask
11/19/2013US8587887 Color filter substrate and method of manufacturing the same
11/19/2013US8586950 Method and system for feature function aware priority printing
11/19/2013US8586267 Removable transparent membrane for a pellicle
11/19/2013US8585830 Substrate processing apparatus and substrate processing method
11/19/2013US8585391 Photomask cleaning apparatus and methods of cleaning a photomask using the same
11/14/2013WO2013168782A1 Substrate case, substrate conveyance case, case cover, substrate conveyance system, and method for conveying substrate
11/14/2013US20130302726 Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound
11/14/2013US20130302725 System and method for test patttern for lithography process
11/14/2013US20130302724 Mask and method of forming pattern by using the same
11/14/2013US20130301026 Mask and optical filter manufacturing apparatus including the same
11/13/2013CN103390551A Method for manufacturing semiconductor device patterned structure
11/13/2013CN103389618A Anti-dust pellicle assembly frame
11/13/2013CN103389617A Method of manufacturing dustproof thin film assembly
11/13/2013CN103389616A SiGe device manufacturing method improving emitter electrode window size uniformity
11/13/2013CN102789125B Mask plate, mat manufacturing method and LCD panel
11/12/2013US8584057 Non-directional dithering methods
11/12/2013US8584054 Photomask manufacturing method and semiconductor device manufacturing method
11/12/2013US8582077 Pellicle, mounting method therefor, pellicle-equipped mask, and mask
11/12/2013US8580466 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film
11/12/2013US8580465 Multilayer mirror for EUV lithography and process for its production
11/07/2013WO2013165915A1 Cylindrical polymer mask and method of fabrication
11/07/2013US20130295494 Method for repairing photomask
11/07/2013US20130293858 Anisotropic phase shifting mask
11/07/2013DE112012000658T5 Substrat mit leitendem Film, Substrat mit Mehrschicht-Reflexionsfilm und Reflexionsmaskenrohling für eine EUV-Lithographie Substrate with conductive film substrate with multilayer reflective film and reflective mask blank for EUV lithography
11/07/2013DE102013102970A1 Intra-Überlagerungs-Metrologie Intra-overlay metrology
11/06/2013CN103383912A Multiple edge enabled patterning
11/06/2013CN103383523A Photomask, image transfer method and manufacturing method of flat panel display
11/06/2013CN103383522A Photo mask, pattern transfer method and flat panel display manufacturing method
11/06/2013CN103383521A Anisotropic phase shifting mask
11/06/2013CN102692812B Extreme UV-Light photomask, manufacturing method for the same, and method for patterning base material
11/06/2013CN102053503B Determination method of mask pattern and effective light source distribution
11/06/2013CN101802161B Alkaline nonionic surfactant composition
11/06/2013CN101046625B Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method
11/05/2013US8576485 Photo-induced dichroic polarizers and fabrication methods thereof
11/05/2013US8574822 Nanoimprint resist
11/05/2013US8574793 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
11/05/2013US8574792 Photomask including super lens and manufacturing method thereof
10/2013
10/31/2013WO2013161943A1 Production method for permanent film for optical material, cured film produced thereby, and organic el display device and liquid-crystal display device using same
10/31/2013WO2013161942A1 Production method for permanent film for optical material, cured film produced thereby, and organic el display device and liquid-crystal display device using same
10/31/2013WO2013159943A1 Method for cleaning photomasks using megasonic energy
10/31/2013US20130290913 Method for optical proximity correction of a reticle to be manufactured using shaped beam lithography
10/31/2013US20130288166 Reflective extreme ultraviolet mask and method of forming a pattern using the same
10/31/2013US20130288165 Phase-shift blankmask and method for fabricating the same
10/31/2013US20130288164 Pattern correction method, storage medium, information processing apparatus, method of manufacturing mask, exposure apparatus, and method of manufacturing device
10/31/2013US20130288163 Photomask blank and manufacturing method thereof
10/31/2013US20130288162 Photocurable composition
10/31/2013DE102012207003A1 Optische Elemente mit magnetostriktivem Material Optical elements with magnetostrictive material
10/31/2013DE102012008220A1 Verfahren zum Reinigen von Fotomasken unter Verwendung von Megaschall A method for cleaning photomasks using megasonic
10/30/2013EP2657768A2 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film
10/30/2013EP2657764A2 Photomask blank and manufacturing method thereof
10/30/2013CN103376645A General mask and application thereof
10/30/2013CN103376644A Mask pattern correction method
10/30/2013CN103376643A Method for correcting layout diagrams
10/30/2013CN103376642A Photomask blank and manufacturing method thereof
10/30/2013CN103376641A Phase-shift blankmask and method for fabricating the same
10/29/2013US8568944 Reflective extreme ultraviolet mask and method of manufacturing the same
10/24/2013WO2013158574A1 Method and system for critical dimension uniformity using charged particle beam lithography
10/24/2013WO2013158573A1 Method and system for forming patterns using charged particle beam lithograph
10/24/2013WO2013158527A1 Silicon hardmask layer for directed self-assembly
10/24/2013WO2013157382A1 Heat-curable protective liquid for glass mask and glass mask
10/24/2013WO2013156328A2 Mask for lithographic apparatus and methods of inspection
10/24/2013US20130280909 Metal cut process flow
10/24/2013US20130280646 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
10/24/2013US20130280645 Mask Set for Double Exposure Process and Method of Using the Mask Set
10/24/2013US20130280644 Mask and method for forming the same
10/24/2013US20130280643 Reflective mask and method of making same
10/24/2013US20130276480 Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvl
10/24/2013DE112004002429B4 Verfahren und Vorrichtung zum Erzeugen von Druckdaten Method and apparatus for generating print data
10/23/2013CN203250106U Intelligent photomask
10/23/2013CN103367191A Failpoint locating method
10/23/2013CN103367120A Forming method for high-resolution channel pattern
10/23/2013CN103365112A Exposure device and exposure method, and method for manufacturing pattern film
10/23/2013CN103365110A Extreme ultraviolet lithography process and mask
10/23/2013CN103365074A A dustproof thin film assembly frame and a dustproof thin film assembly
10/23/2013CN103365073A Extreme ultraviolet lithographic mask defect detection system
10/23/2013CN103365072A Method for generating mask pattern
10/23/2013CN103365071A Optical proximity correction method for mask plate
10/23/2013CN103365070A Phase shift mask plate of PSS (patterned sapphire substrates) graphics and preparation method thereof
10/23/2013CN103365069A A method of fabricating a lithography mask
10/23/2013CN102478760B Optical proximity correction (OPC) method for crossover profile
10/22/2013US8566757 Layout of phase shifting photolithographic masks with refined shifter shapes
10/22/2013US8566756 Processing condition determining method and apparatus, display method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, substrate processing system, and program and information recording medium
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