G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849)
12/2013
12/18/2013	CN103454850A Mask plate and method for manufacturing photo-spacer
12/18/2013	CN103454849A Reflective mask and mask blank
12/18/2013	CN102520578B Testing photomask and application thereof
12/18/2013	CN102047183B Multilayer mirror and lithographic apparatus
12/17/2013	US8609307 Thin film evaluation method, mask blank, and transfer mask
12/17/2013	US8609306 Method for forming circular patterns on a surface
12/17/2013	US8609305 Methods of forming a photolithography reticle
12/17/2013	US8609304 Method of manufacturing a transfer mask and method of manufacturing a semiconductor device
12/17/2013	US8609303 Mask pattern generating method and computer program product
12/17/2013	US8609302 Lithography methods, methods for forming patterning tools and patterning tools
12/17/2013	US8609301 Mask, exposure apparatus and device manufacturing method
12/12/2013	WO2013182615A1 Method for the production of micromechanical parts that are difficult to reproduce, and resulting micromechanical parts
12/12/2013	WO2013134605A9 Detection of thin lines for selective sensitivity during reticle inspection using processed images
12/12/2013	US20130330674 Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and photomask using patterned substrate of self-organizing material
12/12/2013	US20130330661 Method for repairing mask for euv exposure and mask for euv exposure
12/12/2013	US20130330660 Hard mask spacer structure and fabrication method thereof
12/12/2013	US20130329209 Mask, exposure apparatus and device manufacturing method
12/12/2013	DE102012011343A1 Vorrichtung und Verfahren zur Interferenzstrukturierung von Proben sowie dergestalt strukturierte Proben Apparatus and method for interference structuring of samples and such structured samples
12/11/2013	CN203337997U Gray scale mask plate
12/11/2013	CN203337996U Mask plate capable of improving data line critical dimension uniformity and array substrate
12/11/2013	CN103443706A Pellicle, adhesive for pellicle, photomask with pellicle, and method for manufacturing semiconductor device
12/11/2013	CN103443161A Antireflective coating composition and process thereof
12/11/2013	CN103439869A Method for measuring graphic density
12/11/2013	CN102687071B Reflective-layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for producing reflective-layer-equipped substrate
12/10/2013	US8603723 Image transfer process
12/10/2013	US8603707 Exposure method and exposure mask
12/10/2013	US8603706 Forming a bridging feature using chromeless phase-shift lithography
12/10/2013	US8603383 Original and article manufacturing method using same
12/05/2013	WO2013179956A1 Pattern inspection device and pattern inspection method
12/05/2013	WO2013178775A1 Determining position and curvature information directly from a surface of a patterning device.
12/05/2013	WO2013178459A1 Gradient-based pattern and evaluation point selection
12/05/2013	WO2013177874A1 Alignment identifier and method using alignment identifier to manufacture workpiece in exposure process
12/05/2013	US20130323928 Method of manufacturing semiconductor device, and mask
12/05/2013	US20130323630 Substrate with conductive film, substrate with multilayer reflective film and reflective mask blank for euv lithography
12/05/2013	US20130323629 Reflection type blank masks, methods of fabricating the same, and methods of fabricating reflection type photo masks using the same
12/05/2013	US20130323628 Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns
12/05/2013	US20130323627 Photomasks, Methods Of Forming A Photomask, And Methods Of Photolithographically Patterning A Substrate
12/05/2013	US20130323626 Reflective mask
12/05/2013	US20130323625 Systems and Methods for Lithography Masks
12/05/2013	US20130321787 Mask
12/05/2013	US20130319873 Photomasks and methods for using same
12/05/2013	DE102012011315A1 Mikroskop und Verfahren zur Charakterisierung von Strukturen auf einem Objekt Microscope and method for characterization of structures on an object
12/04/2013	CN203324648U Two-side alignment exposure device for semiconductor chip
12/04/2013	CN203324647U 掩膜版 Reticle
12/04/2013	CN203324646U Concentric circle lithography plate
12/04/2013	CN103430283A Method for correcting mask for euv exposure, and mask for EUV exposure
12/04/2013	CN103426810A Double patterning method in back-end-of-line
12/04/2013	CN103424992A Stereo photomask, preparation method thereof, and manufacturing method of stereo surface patterning
12/04/2013	CN103424985A Defect detection system for extreme ultraviolet lithography mask
12/04/2013	CN103424984A Photomask blank manufacturing method, photomask blank, photomask, pattern transfer method and sputtering device
12/04/2013	CN103424983A Photomask blank and method for manufacturing photomask
12/04/2013	CN103424982A Optical proximity correction (OPC) methodology employing multiple opc programs, and system employing same
12/04/2013	CN103424981A Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask
12/04/2013	CN103424980A Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift mask
12/04/2013	CN102819183B Mask plate, method for manufacturing array substrate by utilizing mask plate, and array substrate
12/04/2013	CN102707563B Light source and mask alternate optimization method based on Abbe vector imaging model
12/04/2013	CN101750879B Exposure mask and method for manufacturing semiconductor device using the same
12/03/2013	US8601406 Method of creating photo mask layout, computer readable recording medium storing programmed instructions for executing the method, and mask imaging system
12/03/2013	US8601403 Resolution enhancing technology using phase assignment bridges
12/03/2013	US8597860 Dummy patterns and method for generating dummy patterns
12/03/2013	US8597859 Method and storage system for reducing contamination of a photomask
12/02/2013	DE202010018039U1 Masken und/oder Blenden für eine Laseranlage zur Erzeugung von Mikrostrukturen auf einer Festkörperoberfläche, Mikrostruktur und Vorrichtung zur Herstellung dieser Masken und/oder Blenden sowie dieser Mikrostruktur Masks and / or diaphragms for a laser system for producing microstructures on a solid body surface, microstructure and apparatus for producing these masks and / or diaphragms and this microstructure
11/2013
11/28/2013	WO2013177576A1 Method for fabrication of high aspect ratio trenches and formation of nanoscale features therefrom
11/28/2013	WO2013177208A1 Overlay targets with orthogonal underlayer dummyfill
11/28/2013	WO2013174656A2 Lithographic apparatus
11/28/2013	WO2013174044A1 Photomask and method for manufacturing same
11/28/2013	US20130316273 Method For Fracturing And Forming A Pattern Using Shaped Beam Charged Particle Beam Lithography
11/28/2013	US20130316272 Reflective mask blank for euv lithography
11/28/2013	US20130316271 Method of manufacturing a transfer mask and method of manufacturing a semiconductor device
11/28/2013	US20130316270 Mask having assist pattern
11/28/2013	US20130316269 Photomask and method for manufacturing the same
11/28/2013	US20130314687 Transverse electric-field type liquid crystal display device, process of manufacturing the same, and scan-exposing device
11/28/2013	US20130314685 Mask
11/27/2013	CN103412463A Mask plate and manufacturing method thereof
11/27/2013	CN103412462A Mask plate and liquid crystal panel
11/27/2013	CN102981355B Basic module-based mask auxiliary graph optimizing method
11/27/2013	CN102707582B Light source-mask synchronous optimization based on Abbe vector imaging model
11/27/2013	CN102645839B Mask plate and manufacturing method thereof
11/27/2013	CN101852983B Method for inspecting and judging photomask blank or intermediate thereof
11/26/2013	US8595657 Methods of forming a photo mask
11/26/2013	US8592111 LCD panel photolithography process and mask
11/26/2013	US8592110 Alignment marks for multi-exposure lithography
11/26/2013	US8592109 Patterning a single integrated circuit layer using automatically-generated masks and multiple masking layers
11/26/2013	US8592108 Method for design and manufacture of patterns with variable shaped beam lithography
11/26/2013	US8592107 Method and apparatus of providing overlay
11/26/2013	US8592106 Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device
11/26/2013	US8592105 Photomasks and methods of fabricating the same
11/26/2013	US8592104 Mask for forming patterns of semiconductor device
11/26/2013	US8592103 Extreme ultraviolet masks having annealed light-absorptive borders and associated fabrication methods
11/26/2013	US8592102 Cost-effective method for extreme ultraviolet (EUV) mask production
11/26/2013	US8591749 Chromeless phase-shifting photomask with undercut rim-shifting element
11/26/2013	US8590342 Method for producing TiO2-SiO2 glass body, method for heat-treating TiO2-SiO2 glass body, TiO2-SiO2 glass body, and optical base for EUVL
11/26/2013	US8590281 Method for hermetically closing an air-tight bag for pellicle
11/21/2013	WO2013173285A1 Process sequence for reducing pattern roughness and deformity
11/21/2013	WO2013172515A1 Mask blank, photomask, and method for manufacturing same
11/21/2013	WO2013172248A1 Mask blank, transfer mask, and method for manufacturing blank and mask
11/21/2013	WO2013170608A1 Mask plate and method for manufacturing array substrate
11/21/2013	US20130311959 Multivariable solver for optical proximity correction
11/21/2013	US20130309608 Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
11/21/2013	US20130309602 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

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