| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 09/05/1995 | US5448350 Surface state inspection apparatus and exposure apparatus including the same |
| 09/05/1995 | US5447810 Masks for improved lithographic patterning for off-axis illumination lithography |
| 08/29/1995 | US5446587 Projection method and projection system and mask therefor |
| 08/29/1995 | US5446540 Method of inspecting phase shift masks employing phase-error enhancing |
| 08/29/1995 | US5446521 Phase-shifted opaquing ring |
| 08/29/1995 | US5445997 Patterning method |
| 08/23/1995 | EP0668690A1 Light integrating cavity for a film scanner |
| 08/23/1995 | EP0668539A2 Thinfilm materials for the preparation of attenuating phase shift masks |
| 08/22/1995 | US5444753 X-ray lithography mask, light exposure apparatus and process therefore |
| 08/22/1995 | US5444020 Method for forming contact holes having different depths |
| 08/22/1995 | US5443931 Polysiloxane |
| 08/17/1995 | WO1995022085A1 Masks for lithographic patterning using off-axis illumination |
| 08/17/1995 | WO1995022083A2 Photomask blanks |
| 08/15/1995 | US5442714 Design rule checking method and a method of fabricating a phase shift mask |
| 08/15/1995 | US5441836 Forming lens in mask surface opposite mask defect area |
| 08/15/1995 | US5441835 Transmitting light for exposure through a converging portion; convex portion made of transparent or translucent material; for transfer of fine patterns into different positions on wafer |
| 08/15/1995 | US5441834 Process for fabricating phase shift mask and process of semiconductor integrated circuit device |
| 08/09/1995 | EP0666503A1 Photo mask and method for manufacturing the same |
| 08/08/1995 | US5439767 Phase shift mask and its inspection method |
| 08/08/1995 | US5439765 Photomask for semiconductor integrated circuit device |
| 08/08/1995 | US5439764 Mask having multiple patterns |
| 08/08/1995 | US5439763 Including light intercepting pattern on transparent substrate, phase shifter provided at predetermined openings, etching stopper film between phase shifter and light intercepting pattern |
| 08/03/1995 | WO1995020776A1 Method of producing a liquid crystal polymer photomask |
| 08/02/1995 | EP0664744A1 35 mm format transparencies. |
| 08/01/1995 | US5438204 Twin-mask, and method and system for using same to pattern microelectronic substrates |
| 08/01/1995 | US5437947 Phase shifting mask and method of manufacturing the same |
| 07/26/1995 | EP0664033A1 Rasterizer for a pattern generation apparatus |
| 07/26/1995 | EP0664015A1 Method and apparatus for converting image color values from a first to a second color space |
| 07/25/1995 | US5436096 Lithography |
| 07/25/1995 | US5436095 Manufacturing method or an exposing method for a semiconductor device for a semiconductor integrated circuit device and a mask used therefor |
| 07/18/1995 | US5434961 Computerized publishing method and system of typesetting with content-based classification and layout of material |
| 07/11/1995 | US5432314 Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate |
| 07/11/1995 | US5432044 Method of forming a pattern using a phase shifting mask |
| 07/11/1995 | US5432003 Continuous thin diamond film and method for making same |
| 07/06/1995 | WO1995018480A1 Holographic technique for extreme microcircuitry size reduction |
| 07/06/1995 | DE4447264A1 Prodn. of phase shift mask with improved yield |
| 07/04/1995 | USH1463 Method for detecting positions of photomask and substrate |
| 07/04/1995 | US5430548 Method and apparatus for pattern detection |
| 07/04/1995 | US5430292 Pattern inspection apparatus and electron beam apparatus |
| 07/04/1995 | US5429897 Attenuating type phase shifting mask and method of manufacturing thereof |
| 07/04/1995 | US5429896 Photomask and pattern forming method employing the same |
| 07/04/1995 | US5429730 Smoothing semiconductor bump by depositing thin film and then etching to flatten |
| 06/28/1995 | EP0660371A2 Reticle having a number of subfields |
| 06/28/1995 | EP0660185A2 Simplified fabrication methods for rim phase-shift masks |
| 06/28/1995 | EP0660184A2 Phase shift mask using liquid phase oxide deposition |
| 06/28/1995 | EP0660183A2 Mask for transferring a pattern for use in a semiconductor device and method for manufacturing the same |
| 06/28/1995 | EP0659287A1 Image-transfer process. |
| 06/27/1995 | US5428478 Optical mask and exposure method using the optical mask |
| 06/27/1995 | US5427894 Process for preparing images on tonable, light-sensitive layers |
| 06/27/1995 | US5427876 Transparent substrate with light shielding region formed on top major surface, main phase shifting region, auxiliary phase shifting region on periphery; accuracy |
| 06/21/1995 | EP0659013A2 Method and apparatus for scanning an object |
| 06/20/1995 | US5426503 Method of testing a phase shift mask and a testing apparatus used therein in the ultraviolet wavelength range |
| 06/20/1995 | US5426007 Photomask and process of making semiconductor device by the use of the photomask |
| 06/14/1995 | EP0658040A1 Method and apparatus for generating an output device control signal |
| 06/14/1995 | EP0657780A1 Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another |
| 06/14/1995 | EP0634973A4 Lithographic mask, comprising a membrane having improved strength. |
| 06/14/1995 | EP0527166B1 Illumination device |
| 06/14/1995 | CN1028916C Method for manufactura of original for exposed photographic printing |
| 06/13/1995 | US5424154 Lithographic emhancement method and apparatus for randomly spaced structures |
| 06/13/1995 | US5424153 Radiation transparent substrate, light blocking layer, phase shift layer; photolithography |
| 06/07/1995 | EP0656565A1 Exposure method and method of producing a photolithographic mask |
| 06/06/1995 | US5422921 X-ray mask structure and manufacturing methods including forming a metal oxide film on a portion of an X-ray permeable film having no X-ray absorber thereon |
| 06/06/1995 | US5422704 Pellicle frame |
| 06/06/1995 | US5422491 Mask and charged particle beam exposure method using the mask |
| 06/06/1995 | US5422206 Anti-reflection film inserted between a transparent glass substrate and light shielding pattern |
| 06/06/1995 | US5422205 Micropattern forming method |
| 05/30/1995 | US5419989 Method of making a printing mask sheet |
| 05/30/1995 | US5419988 Photomask blank and phase shift photomask |
| 05/30/1995 | US5419972 Frame-supported pellicle for dustproof protection of photomask |
| 05/24/1995 | EP0654935A1 Duplicating radiographic, medical or other black and white images using laser thermal digital halftone printing |
| 05/24/1995 | EP0654151A1 Process and element for making a relief image using an ir sensitive layer |
| 05/24/1995 | EP0654150A1 A flexographic printing element having an ir ablatable layer and process for making a flexographic printing plate. |
| 05/23/1995 | US5418598 Projection exposure apparatus |
| 05/23/1995 | US5418095 Method of fabricating phase shifters with absorbing/attenuating sidewalls using an additive process |
| 05/23/1995 | US5418093 Projection exposure method and an optical mask for use in projection exposure |
| 05/23/1995 | US5418092 Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process |
| 05/18/1995 | DE4440821A1 Novel photomask used in the prodn. of semiconductor devices |
| 05/17/1995 | EP0653728A2 Method and apparatus for managing document layout data |
| 05/17/1995 | EP0653679A2 Mask, mask producing method and pattern forming method using mask |
| 05/17/1995 | EP0652920A1 Antistatic agent and method for suppressing electrification |
| 05/16/1995 | US5415953 A metal-oxy-carbo-nitride, lithography |
| 05/16/1995 | US5415952 Fine pattern lithography with positive use of interference |
| 05/16/1995 | US5415951 Method of manufacturing a photomask comprising a phase shifter with a stepped edge |
| 05/11/1995 | DE4440230A1 Verfahren zur Ausbildung feiner Halbleitervorrichtungsmuster Method for forming fine semiconductor device pattern |
| 05/10/1995 | EP0610183B1 Exposure device |
| 05/10/1995 | EP0511368B1 Optical printing system with discontinuous print medium |
| 05/09/1995 | US5414746 X-ray exposure mask and fabrication method thereof |
| 05/09/1995 | US5413664 Apparatus for preparing a semiconductor device, photo treatment apparatus, pattern forming apparatus and fabrication apparatus |
| 05/04/1995 | DE4438616A1 Phase-shift mask, and process for the producton thereof |
| 05/02/1995 | US5411824 Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging |
| 05/02/1995 | US5411823 Exposure method, phase shift mask used in the same, and process of fabricating semiconductor integrated circuit device using the same |
| 04/26/1995 | EP0650090A1 Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask |
| 04/25/1995 | US5409790 Process for fabricating masks for use in X-ray lithography |
| 04/25/1995 | US5409789 Highly defind pattern; improved resolution |
| 04/20/1995 | WO1995010849A1 Pattern and method for evaluating focal point |
| 04/20/1995 | DE4435773A1 Phase-shifting mask and production method therefor |
| 04/18/1995 | US5407785 Coating with photoresist; masking; underexposure to bleach portions |
| 04/12/1995 | EP0648041A1 Method of and apparatus for modifying base separation figure |
| 04/11/1995 | US5406325 Method and apparatus for forming a source-independent image data metric from second generation photographic films |
| 04/11/1995 | US5406070 Method and apparatus for scanning an object and correcting image data using concurrently generated illumination data |