| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 04/28/1993 | EP0538940A1 Segmented mask and exposure system for x-ray lithography |
| 04/28/1993 | EP0538652A2 Pattern plate making system and printed matter printed thereby |
| 04/20/1993 | US5204919 Method of and apparatus for performing detail enhancement |
| 04/20/1993 | US5204886 Method of improving an x-ray lithography beamline uniformity |
| 04/20/1993 | US5204739 Proximity mask alignment using a stored video image |
| 04/20/1993 | US5203961 With solvent to dissolve membrane without contamination |
| 04/14/1993 | EP0536635A1 X-ray mask structure, manufacturing method, x-ray exposure method using same, and device manufactured by using same |
| 04/13/1993 | US5202204 Process of producing exposure mask |
| 04/07/1993 | EP0535229A1 Mask for shifting phase |
| 04/06/1993 | CA1315648C Polysilicon thin film process and product |
| 03/31/1993 | EP0534474A2 Si substrate and method of processing the same |
| 03/31/1993 | EP0534463A2 Pattern exposing method using phase shift and mask used therefor |
| 03/30/1993 | US5199055 X-ray lithographic mask blank with reinforcement |
| 03/24/1993 | EP0533217A2 Photo-mask |
| 03/24/1993 | EP0533168A1 Method for directly making printing plates using ink-jet system |
| 03/23/1993 | US5196283 X-ray mask structure, and x-ray exposure process |
| 03/23/1993 | CA1315023C Photo-mask |
| 03/18/1993 | CA2078361A1 Method for directly making printing plates using ink-jet system |
| 03/17/1993 | EP0532211A1 X-ray mask and semiconductor device manufacturing method using the same |
| 03/17/1993 | EP0532040A1 Discrete phase shift mask writing |
| 03/17/1993 | EP0531779A1 X-ray mask containing a cantilevered tip for gap control and alignment |
| 03/16/1993 | US5194346 Method of fabricating phase shifting reticles with an accurate phase shift layer |
| 03/16/1993 | US5194345 Method of fabricating phase shift reticles |
| 03/16/1993 | US5194344 Method of fabricating phase shift reticles including chemically mechanically planarizing |
| 03/09/1993 | US5192641 Photosensitivity |
| 03/04/1993 | WO1993003928A1 Infra-red direct write imaging media |
| 03/03/1993 | EP0529971A1 High resolution printing technique by using a mask pattern adapted to the technique |
| 03/03/1993 | EP0529827A1 Process and apparatus for controllably separating framed working area from remainder of the membrane |
| 03/03/1993 | EP0529826A1 Optical pellicle holder |
| 03/03/1993 | EP0529338A1 Photomask and method of fabricating the same |
| 03/03/1993 | EP0528969A1 Unit magnification optical system with improved reflective reticle |
| 03/02/1993 | US5191535 Mask control system |
| 03/02/1993 | US5191214 Method of manufacturing design carrier |
| 03/02/1993 | US5190836 Reflection type photomask with phase shifter |
| 03/02/1993 | US5190835 Electroless deposition of palladium or gold |
| 03/02/1993 | US5190637 Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers |
| 02/25/1993 | DE4123864A1 Documents setting unit for printing - uses layout plate with scale for locating paper sheet that can be positioned for various sizes and font types and sizes |
| 02/24/1993 | EP0528687A1 Phase-shift mask and method for making |
| 02/23/1993 | US5188706 Method of manufacturing an x-ray exposure mask and device for controlling the internal stress of thin films |
| 02/23/1993 | CA1313792C Method of manufacturing photo-mask and photo-mask manufactured thereby |
| 02/17/1993 | EP0527166A1 Illumination device. |
| 02/16/1993 | US5187726 High resolution X-ray lithography using phase shift masks |
| 02/16/1993 | US5187372 Apparatus for and a method of transverse position measurement in proximity lithographic systems |
| 02/10/1993 | EP0526982A1 Fine structure evaluation apparatus and method |
| 02/09/1993 | US5185186 Transmission density |
| 02/09/1993 | US5185054 Method for fabricating an exposure mask including a step for adhering mask body substrate to a supporting block |
| 02/03/1993 | EP0526376A1 Shape decomposition system and method |
| 02/03/1993 | EP0525783A2 Image processing modular system and method of allocating jobs to modules |
| 01/27/1993 | EP0524741A1 Method for improving the resolution of a semiconductor mask |
| 01/27/1993 | EP0524499A1 Method for forming a photomask pattern |
| 01/26/1993 | US5182718 Method and apparatus for writing a pattern on a semiconductor sample based on a resist pattern corrected for proximity effects resulting from direct exposure of the sample by a charged-particle beam or light |
| 01/20/1993 | EP0523325A1 Process for the preparation of images on tonable light-sensitive layers |
| 01/12/1993 | US5178977 Manufacturing method of an X-ray exposure mask |
| 01/12/1993 | US5178976 Technique for preparing a photo-mask for imaging three-dimensional objects |
| 01/12/1993 | US5178975 Multilayer element with x-ray radiation transparent layer, patterns and membranes |
| 01/12/1993 | US5178727 Ceramic membrane device and a method of producing the same |
| 01/07/1993 | WO1993000685A1 Diamond membranes for x-ray lithography |
| 01/07/1993 | EP0528969A4 Unit magnification optical system with improved reflective reticle. |
| 01/07/1993 | EP0521721A2 Method for manufacturing a shadow mask by resist etching |
| 01/07/1993 | CA2112477A1 Diamond membranes for x-ray lithography |
| 01/06/1993 | CN1067748A Metal photograph and its manufacturing method |
| 01/05/1993 | US5177773 X-ray mask and method for producing same |
| 12/29/1992 | US5174204 Method of producing decorative designs and articles produced thereby |
| 12/24/1992 | DE4217811A1 Laser beam cutting device for cutting PCB holes - has reflector arrangement ensuring uniform beam distribution over mask surface |
| 12/23/1992 | WO1992016822A3 Fluid cooled contact mask |
| 12/22/1992 | US5173380 Photomask |
| 12/22/1992 | US5173330 Patterning composition and method for patterning on a substrate |
| 12/16/1992 | EP0518633A1 Pattern inspection apparatus and electron beam apparatus |
| 12/16/1992 | EP0518545A1 Dry lithographic etching with gaseous mixtures of oxygen and chlorine |
| 12/16/1992 | EP0517923A1 Method of forming minute resist pattern |
| 12/15/1992 | US5172190 Alignment patterns for two objects to be aligned relative to each other |
| 12/15/1992 | US5171785 Film for pellicle |
| 12/09/1992 | EP0517382A1 Method for forming resist mask pattern by light exposure |
| 12/09/1992 | CN1066925A Printing lettering method for drawings and charts duplication |
| 12/08/1992 | US5170293 Exposure mechanism |
| 12/08/1992 | US5169488 Method of forming planarized, reusable calibration grids |
| 12/08/1992 | US5169440 Silicon carbide membrane for X-ray lithography and method for the preparation thereof |
| 12/08/1992 | US5168993 Optical pellicle holder |
| 12/01/1992 | CA1310853C Photographic masks for tonal correction |
| 11/26/1992 | WO1992021066A1 Pressure relieving pellicle |
| 11/26/1992 | WO1992020720A1 Soluble perfluoroelastomers and use in pellicles |
| 11/26/1992 | DE4117127A1 Light-sensitive recording element with mask formed directly on top coat - comprising tear-resistant polymer, used as resist or esp. in computer to plate process |
| 11/26/1992 | DE4117124A1 Direct free-hand drawing on light-sensitive recording element and copying - by exposure with actinic light and development to printing plate |
| 11/25/1992 | EP0514977A1 Antistatic drafting films |
| 11/24/1992 | US5166962 X-ray mask, method of manufacturing the same, and exposure method using the same |
| 11/24/1992 | US5166888 Fabrication of particle beam masks |
| 11/24/1992 | US5165954 Images and masking, then scanning with an ion beam |
| 11/19/1992 | EP0513859A2 Method of producing films and jig for producing the same |
| 11/19/1992 | EP0513218A1 Improved method and means for producing photomasks |
| 11/19/1992 | DE4215489A1 Optical phase shift mask for submicron features - has pattern edges defined by etched chromium@ features and super imposed optical phase shift layer giving edge and cut-off effect stress |
| 11/17/1992 | US5164565 Repair system for microcircuits |
| 11/17/1992 | US5164285 Method for forming plate characters in a half-tone gravure platemaking process |
| 11/12/1992 | WO1992020011A1 Overcoats for diazo-containing layers with chemical and abrasion resistance |
| 11/12/1992 | DE4215210A1 Optical phase shifting mask mfr. - has sidewall phase shifting layer on both sides of each phase shifting layer for spatial frequency modulation |
| 11/10/1992 | US5163005 Method of cloning printed wiring boards |
| 11/04/1992 | EP0511368A1 Optical printing system with discontinuous print medium. |
| 11/03/1992 | US5161114 Method of manufacturing a reticule |
| 11/03/1992 | US5161059 High-efficiency, multilevel, diffractive optical elements |
| 11/03/1992 | US5160959 Device and method for the alignment of masks |
| 10/28/1992 | EP0510684A1 Method for producing color filter |