| Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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| 03/20/1991 | EP0417952A2 Shaping using area patterning mask |
| 03/20/1991 | CN1049966A Laser shaping with area patterning mask |
| 03/19/1991 | US5001764 Guardbands for pattern inspector |
| 03/13/1991 | EP0416528A2 Amorphous fluoropolymer pellicle films |
| 03/13/1991 | EP0416517A2 Non-glare pellicle |
| 03/12/1991 | US4999511 Surface state inspecting device for inspecting the state of parallel first and second surfaces |
| 03/12/1991 | US4999510 Apparatus for detecting foreign particles on a surface of a reticle or pellicle |
| 03/12/1991 | US4999277 Computer aided design, dichroic parabolic radio frequency reflector |
| 03/07/1991 | CA2024617A1 Non-glare pellicle |
| 03/06/1991 | EP0415131A2 Forming a pattern on a substrate |
| 03/06/1991 | CA2021110A1 Laser shaping with an area patterning mask |
| 03/05/1991 | US4998267 X-ray lithography carbon mask and method of manufacturing the same |
| 03/05/1991 | US4997733 Dry Dot Etching |
| 02/27/1991 | CN1049582A Apparatus and method for automatically tensioning and relaxing record material |
| 02/26/1991 | US4996434 Electron-beam lithographic apparatus |
| 02/26/1991 | US4996106 Used as dust-proof cover during exposure of photomask or reticle |
| 02/21/1991 | WO1991002294A1 Dust-preventing film |
| 02/21/1991 | DE3927162A1 Vorrichtung zum automatischen auf- und abspannen von aufzeichnungsmaterial und betriebsweise der vorrichtung Device for automatic up and wind down from record material and operation, the device |
| 02/19/1991 | US4994141 Method of manufacturing a mask support of SiC for radiation lithography masks |
| 02/18/1991 | WO1991003121A1 Device for automatically clamping and releasing data supports and its operation |
| 02/18/1991 | CA2065363A1 Device for automatically clamping and releasing data supports and its operation |
| 02/13/1991 | EP0412690A2 Device manufacture involving lithographic processing |
| 02/13/1991 | EP0412301A1 Boron nitride membrane in wafer structure |
| 02/12/1991 | US4992822 Optical printing system |
| 02/12/1991 | US4992355 System for the production of dot-etched lithographic films |
| 01/30/1991 | EP0410269A1 Membrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the same |
| 01/30/1991 | EP0410106A2 System for magnification correction of conductive x-ray lithography mask substrates |
| 01/23/1991 | EP0409169A2 Exposing method |
| 01/22/1991 | US4987048 Image forming material |
| 01/22/1991 | US4986869 Method employing input and output staging chamber devices for reduced pressure lamination |
| 01/22/1991 | US4986007 Reticle frame assembly |
| 01/21/1991 | CA2021474A1 Exposure process |
| 01/16/1991 | EP0408349A2 Mask for lithography |
| 01/16/1991 | EP0408056A2 Method of reproducing images of plurality of copy pages on single plate |
| 01/15/1991 | US4985319 Process for manufacturing a photomask |
| 01/15/1991 | US4985116 Three dimensional plating or etching process and masks therefor |
| 01/01/1991 | US4981771 Lithography, x-ray mask |
| 01/01/1991 | US4981765 Photosensitive polymer |
| 12/27/1990 | EP0404742A2 Method of making and using a high resolution lithographic mask |
| 12/27/1990 | EP0404040A1 Method of forming stable images on silicate glass articles |
| 12/25/1990 | US4980536 Removal of particles from solid-state surfaces by laser bombardment |
| 12/19/1990 | EP0403220A1 Producing exposure masks |
| 12/19/1990 | EP0403080A2 Bonding devices |
| 12/19/1990 | EP0402894A2 Photoresist |
| 12/19/1990 | EP0402616A1 Emulsion printing plate relief coatings |
| 12/19/1990 | EP0277982B1 Marking of articles with photochromic compounds |
| 12/18/1990 | US4978421 Masking one side of a wafer, removal of undoped silicon to expose doped silicon membrane on the opposite side |
| 12/13/1990 | DE4018135A1 Emulsion mask defect repair - by applying contoured UV beam of excimer laser |
| 12/13/1990 | DE3917957A1 Printing method applying motifs to textiles, foil or paper - using VDU work-station for monitoring and modification of video images prior to computer controlled printing |
| 12/12/1990 | EP0401795A2 Phase-shifting photomask for negative resist and process for forming isolated, negative resist pattern using the phaseshifting photomask |
| 12/04/1990 | US4975860 Apparatus for Automatically drawing a dot pattern |
| 12/04/1990 | CA1277432C Semiconductor device fabrication including a non- destructive method for examining lithographically defined features |
| 11/29/1990 | WO1990014219A1 Perfluoropolymer coated pellicles |
| 11/28/1990 | EP0399998A2 Process for the fabrication of high definition silicon shadow masks |
| 11/28/1990 | EP0399735A2 X-ray lithography mask and method for manufacturing such a mask |
| 11/27/1990 | US4973543 System for the production of dot-etched lithographic films |
| 11/22/1990 | EP0398566A2 Support apparatus for panels |
| 11/22/1990 | EP0397988A2 Plasma processing with metal mask integration |
| 11/20/1990 | US4972329 System for creating images, in particular dummies for printing advertising documents such as wrappers, labels or the like |
| 11/20/1990 | US4971851 Multilayer x-ray membranes, masking, silicon with silicon dioxide coating, lithography |
| 11/14/1990 | EP0397161A2 Methods for device transplantation |
| 11/14/1990 | EP0396768A1 Pattern correction method |
| 11/13/1990 | US4970099 Perfluoropolymer coated pellicles |
| 11/07/1990 | EP0396259A2 Optical image forming apparatus |
| 11/06/1990 | US4968390 Electrodeposition using scanning electrochemical microscope |
| 11/01/1990 | WO1990013131A1 X-ray masks, their fabrication and use |
| 11/01/1990 | WO1990012685A1 Index marking article for superposed sheets |
| 10/31/1990 | EP0395425A2 Mask, mask producing method and pattern forming method using mask |
| 10/31/1990 | EP0394880A2 Handy-size electronic rule with built-in calculator |
| 10/31/1990 | EP0394871A2 Apparatus for forming an image with a reversible thermosensitive medium |
| 10/30/1990 | US4967229 Process for forming dicing lines on wafer |
| 10/30/1990 | US4966813 Reflection-preventive pellicle film |
| 10/30/1990 | US4966457 Inspecting apparatus for determining presence and location of foreign particles on reticles or pellicles |
| 10/30/1990 | US4966428 Manufacture of integrated circuits using holographic techniques |
| 10/16/1990 | US4964145 System for magnification correction of conductive X-ray lithography mask substrates |
| 10/16/1990 | US4963924 Linewidth loss measurement |
| 10/16/1990 | US4963921 Device for holding a mask |
| 10/10/1990 | EP0391636A2 Method of correcting proximity effects |
| 10/10/1990 | EP0391314A2 Method for patterning on a substrate |
| 10/09/1990 | CA1274996A1 Composite optical membrane including anti-reflective coating |
| 09/26/1990 | EP0389259A2 X-ray exposure apparatus |
| 09/26/1990 | EP0389198A2 Method of manufacturing an X-ray exposure mask and device for controlling the internal stress of thin films |
| 09/20/1990 | DE4007069A1 Projection exposure system for photolithography - has coupled optic elements for direct magnification control |
| 09/18/1990 | US4958083 Inspecting apparatus capable of accurately inspecting an object |
| 09/18/1990 | US4958074 For X-ray or corpuscular beam lithography |
| 09/18/1990 | US4957835 Masked electron beam lithography |
| 09/18/1990 | US4957834 Molybdenum silicide film on quartz substrate, overcoated with a resist, plasma etched |
| 09/18/1990 | US4956906 Method of preparing pre-distorted images for decorating a shaped blank |
| 09/17/1990 | CA2012258A1 Image-forming material and process for forming images |
| 09/12/1990 | EP0386786A2 X-ray mask structure, and x-ray exposure process |
| 09/11/1990 | US4956649 Image recording apparatus forming photomasking pattern on photosensitive medium |
| 09/11/1990 | US4956249 Multilayer lithography, plates, films, patterns,for electronics |
| 09/11/1990 | CA1273783A1 Mounting preparation for optical membrane |
| 09/05/1990 | EP0385480A2 Aperture pattern printing plate for shadow mask and method of manufacturing the same |
| 09/05/1990 | EP0385013A1 Production of precision patterns on curved surfaces |
| 09/05/1990 | CN1009522B Recording method of printing plate |
| 09/04/1990 | US4954717 Pattern on transparent sustrate |
| 08/29/1990 | EP0384754A2 Localized vacuum apparatus and method |
| 08/28/1990 | US4952421 Method for repairing a pattern |
| 08/22/1990 | EP0383534A2 Exposure mask, method of manufacturing the same, and exposure method using the same |